公开(公告)号：US5118549A

公开(公告)日：1992-06-02

申请号：US554664

申请日：1990-07-17

申请人： Alfons Hausler ,  Rainer Ludwig ,  Michael Geisler ,  Michael Jung

发明人： Alfons Hausler ,  Rainer Ludwig ,  Michael Geisler ,  Michael Jung

IPC分类号： G11B7/253 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/258

CPC分类号： G11B7/258 ,  G11B7/2533 ,  G11B7/2534 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/12007 ,  Y10T428/31507 ,  Y10T428/31678

摘要： An optical recording medium for an audio-video or ROM compact disc comprises a pitted translucent base material and a layer of a corrosion resistant metal or combination of metals from the group consisting of tantalum, chromium, cobalt, and nickel. For example, TaNi or CrCo can be applied to the surface, providing good adhesion, reflecting light, providing a printable surface, and not requiring any further coating such as a protective lacquer.

公开(公告)号：US5102523A

公开(公告)日：1992-04-07

申请号：US603795

申请日：1990-10-25

申请人： Siegfried Beisswenger ,  Barbara Beichler ,  Michael Geisler ,  Stefan Reineck

发明人： Siegfried Beisswenger ,  Barbara Beichler ,  Michael Geisler ,  Stefan Reineck

IPC分类号： H01J37/32

CPC分类号： H01J37/32009 ,  H01J37/3244 ,  H01J37/32532

摘要： The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.

摘要翻译： 本发明涉及一种用于制造等离子体以及用于将带电荷和不带电粒子施加到基底上的装置。 提供连接到电压源的两个区域电极，其间被高频能量激发的等离子体体积点燃。 两个电极的面积比是可变的，以便影响撞击在衬底上的离子的能量。 此外，可以在整个基板区域上分配的处理气体的供给。

公开(公告)号：US5053244A

公开(公告)日：1991-10-01

申请号：US158217

申请日：1988-02-19

申请人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

发明人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

IPC分类号： C23C16/511 ,  H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32275 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32366 ,  H01J37/32678 ,  H05H1/46

摘要： The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

摘要翻译： 本发明涉及一种用于生产等离子体和处理基板的设备。 通过微波产生的等离子体用于涂覆位于具有金属壁（6,7,12,13）的腔室（5）中的基底。 微波在金属壁（6,7,12,13）处反复反射，使得腔室（5）具有许多微波模式。 通过将永久磁铁放置在腔室（5）的内部或室（5）外部的待涂覆衬底附近，可以在该腔室（5）内产生电子回旋加速器 允许局部控制等离子体点火的共振。