公开(公告)号：US5053244A

公开(公告)日：1991-10-01

申请号：US158217

申请日：1988-02-19

申请人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

发明人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

IPC分类号： C23C16/511 ,  H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32275 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32366 ,  H01J37/32678 ,  H05H1/46

摘要： The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

摘要翻译： 本发明涉及一种用于生产等离子体和处理基板的设备。 通过微波产生的等离子体用于涂覆位于具有金属壁（6,7,12,13）的腔室（5）中的基底。 微波在金属壁（6,7,12,13）处反复反射，使得腔室（5）具有许多微波模式。 通过将永久磁铁放置在腔室（5）的内部或室（5）外部的待涂覆衬底附近，可以在该腔室（5）内产生电子回旋加速器 允许局部控制等离子体点火的共振。

公开(公告)号：US4939424A

公开(公告)日：1990-07-03

申请号：US355886

申请日：1989-05-23

申请人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

发明人： Jorg Kieser ,  Michael Geisler ,  Rolf Wilhelm ,  Eberhard Rauchle

IPC分类号： H05H1/46 ,  C23C16/40 ,  C23C16/44 ,  C23C16/50 ,  C23C16/511 ,  H01J37/32

CPC分类号： H01J37/32275 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32366 ,  H01J37/32678

摘要： The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

摘要翻译： 在存在磁场和气体的情况下通过微波产生的等离子体用于涂覆位于具有金属壁的室中的衬底。 微波在金属壁处反复反射，使得腔室具有许多微波模式。 通过将永磁体放置在腔室内或室内的待涂覆衬底附近的永磁体，可以在该室内产生电子回旋共振，其允许局部控制点火 等离子体。

公开(公告)号：US4933064A

公开(公告)日：1990-06-12

申请号：US126776

申请日：1987-11-30

申请人： Michael Geisler ,  Jorg Kieser ,  Reiner Kukla

发明人： Michael Geisler ,  Jorg Kieser ,  Reiner Kukla

IPC分类号： C23C14/36 ,  C23C14/34 ,  C23C14/35 ,  H01J37/34

CPC分类号： H01J37/3423 ,  H01J37/3408 ,  H01J37/3426 ,  H01J37/3452

摘要： A sputtering cathode for the coating of substrates. The cathode has a base, a target of nonmagnetic material, and a magnet system having exposed pole faces for the production of a tunnel of magnetic lines of force overarching the sputtering surface. The target is provided with at least two continuous projections lying one inside the other, which contain at least one sputtering surface between them, and have confronting wall surfaces. The pole faces are located on both sides of the projections and sputtering surface between them such that magnetic lines of force issue perpendicularly from the one wall surface and, after crossing the sputtering surface, re-enter perpendicularly the opposite wall surface. The magnet system has permanent magnets magnetized parallel to the projections, which are yoked together on the sides facing away from the projections by a soft-magnetic base, and are provided on the sides facing the projections with soft-magnetic pole shoes extending over at least a part of the height of the projections.

摘要翻译： 用于涂覆基材的溅射阴极。 阴极具有基极，非磁性材料的靶，以及具有暴露极面的磁体系统，用于产生覆盖溅射表面的磁力线的隧道。 目标设置有至少两个连续的突起，一个在另一个内部，其在它们之间包含至少一个溅射表面，并且具有面对的壁表面。 极面位于突起的两侧并且在它们之间的溅射表面，使得磁力线从一个壁表面垂直地发生，并且在穿过溅射表面之后，垂直地重新进入相​​对的壁表面。 磁体系统具有平行于凸起磁化的永久磁体，它们通过软磁性底座在背对凸起的侧面上一起被钩住，并且在面向突出部的侧面上设置有至少延伸的软磁极靴 投影高度的一部分。

公开(公告)号：US4767641A

公开(公告)日：1988-08-30

申请号：US881706

申请日：1986-07-03

申请人： Jorg Kieser ,  Michael Sellschopp ,  Michael Geisler

发明人： Jorg Kieser ,  Michael Sellschopp ,  Michael Geisler

IPC分类号： H01L21/302 ,  B29C59/14 ,  C23C16/02 ,  C23F4/00 ,  H01J37/32 ,  H01L21/3065 ,  H05H1/46 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01J37/32009 ,  B29C59/14 ,  H01J37/32082 ,  H01J37/32541

摘要： Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.

摘要翻译： 用于在由高频源（6）提供的两个电极（3,8）之间的高频激发等离子体放电中等离子体处理衬底（7）的装置。 第一电极被构造为中空阳极（3），并且承载基板（7）的第二电极（8）沉积在中空阳极的中空空间（10）的前面，或者可以通过该中空阳极。 此外，空心阳极（3）具有沿着第二电极（8）的方向拉出的边缘（9），并且相对于第二电极形成间隙s1，其周围不超过10mm 宽度。 为了形成电极，使得间隙宽度不是关键特征，突起（12）设置在中空阳极（3）的中空空间（10）中，所述突起增加了中空阳极（3）的内表面积（11） 空心阳极（3）。 优选地，这些突起（12）构造为肋结构，其也可以呈现蜂窝形式。

公开(公告)号：US4966677A

公开(公告)日：1990-10-30

申请号：US344244

申请日：1989-04-27

申请人： Hans Aichert ,  Rainer Gegenwart ,  Reiner Kukla ,  Klaus Wilmes ,  Jorg Kieser

发明人： Hans Aichert ,  Rainer Gegenwart ,  Reiner Kukla ,  Klaus Wilmes ,  Jorg Kieser

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： C23C14/3407 ,  H01J37/3405

摘要： Cathode sputtering apparatus having a hollow cathode on the magnetron principle with a cathode base (5) in which a hollow target (9) with a cylindrical sputtering surface (10) and a cylindrical outer surface is disposed. The cathode base (5) has a cooling passage (6). The target is externally surrounded by a magnet system (18) with magnet poles for the production of a rotationally symmetrical tunnel of magnetic lines of force closed on the circumference and over the sputtering surface. Outside of the space surrounded by the sputtering surface (10) there is disposed at least one anode (3, 4). A transport path for a substrate to be coated passes through the target (9) and the at least one anode.The cooling passage (6) is sealed off from the target (9) by a wall (7). Due to a narrow clearance, as soon as the target (9) reaches its operating temperature it comes in thermal contact with the wall (7). The [north] pole faces (N) of the magnet system (18) are on one side and the other [south] pole faces (S) lie on the other side of the end faces of the target (9) and radially on a radius which is equal to or greater than the radius of the sputtering surface (10). The magnet system (18) is held at a freely adjustable ("floating") potential in operation by insulating spaces (11, 19, 10).

摘要翻译： 在具有阴极基体（5）的磁控管原理上具有空心阴极的阴极溅射装置设置有具有圆柱形溅射表面（10）的中空靶（9）和圆柱形外表面。 阴极基座（5）具有冷却通道（6）。 目标被具有磁极的磁体系统（18）外部包围，用于产生在圆周上和溅射表面上的磁力线的旋转对称的隧道。 在由溅射表面（10）围绕的空间的外部设置有至少一个阳极（3,4）。 待涂覆的基底的输送路径穿过靶（9）和至少一个阳极。 冷却通道（6）通过壁（7）与靶（9）密封。 由于狭窄的间隙，只要目标（9）达到其工作温度，它就与墙壁（7）热接触。 磁体系（18）的[北]极面（N）位于一侧，另一[南]极面（S）位于靶（9）端面的另一侧， 半径等于或大于溅射表面（10）的半径。 磁体系统（18）通过绝缘空间（11,19,10）保持在操作中可自由调节（“浮动”）的电位。

公开(公告)号：US5859579A

公开(公告)日：1999-01-12

申请号：US586705

申请日：1996-01-26

申请人： David Walter Branston ,  Jorg Kieser ,  Werner Hartmann ,  Reinhard Maier

发明人： David Walter Branston ,  Jorg Kieser ,  Werner Hartmann ,  Reinhard Maier

IPC分类号： H01H73/22 ,  H01H71/12 ,  H01H71/14 ,  H01H77/04 ,  H01H81/02 ,  H01H37/36 ,  H01H37/72 ,  H05B3/10

CPC分类号： H01H71/14 ,  H01H2077/025 ,  H01H71/127 ,  H01H77/04

摘要： Such switches have current connections for contacts. One contact may be a fixed contact and the other contact may be a mobile contact. A drive opens the mobile contact when a predetermined electric current intensity is exceeded. The electric drive is a thermoelectric drive. For that purpose, the contacts (2,3) are arranged in a closed housing (1) made of an insulating material and a disk-shaped resistive member (4) is arranged between the contacts (2,3). A switch of this type may also be advantageously designed as a bistable limiter.

摘要翻译： PCT No.PCT / DE94 / 00862 Sec。 371日期1996年1月26日 102（e）日期1996年1月26日PCT提交1994年7月25日PCT公布。 第WO95 / 03619号公报 日期1995年2月2日这些开关具有用于触点的当前连接。 一个联系人可以是固定联系人，另一个联系人可以是移动联系人。 当超过预定的电流强度时，驱动器打开移动接点。 电驱动器是热电驱动器。 为此，触点（2,3）布置在由绝缘材料制成的封闭壳体（1）中，并且在触头（2,3）之间布置有盘形电阻构件（4）。 这种类型的开关也可以有利地设计为双稳态限制器。

公开(公告)号：US5844331A

公开(公告)日：1998-12-01

申请号：US817988

申请日：1997-08-11

申请人： Jorg Kieser ,  David-Walter Branston ,  Reinhard Maier ,  Erich Voss

发明人： Jorg Kieser ,  David-Walter Branston ,  Reinhard Maier ,  Erich Voss

IPC分类号： G01R31/327 ,  H01H1/00 ,  H02H3/26

CPC分类号： G01R31/3274 ,  H01H1/0015 ,  H01H1/20 ,  Y10T307/924

摘要： A switching device including a measuring means for monitoring contact erosion, which is provided between a contact element and an associated contact support. The switching device includes an electrically insulated signal line, which is usable in individual and/or multiple contacts, is used as the measuring means, the signal line being integrated into a single monitoring circuit. In the switching device, there is arranged, between at least one of the contact elements and the associated contact support or in the contact material, an electrical conductor with insulator as the signal line, damage to or destruction of the insulator and/or the conductor being utilized to generate an external signal as an indication of the end of the service life of the contact element.

摘要翻译： PCT No.PCT / DE95 / 01483 Sec。 371日期：1996年5月9日 102（e）日期1996年5月9日PCT提交1995年10月25日PCT公布。 公开号WO96 / 13732 PCT 日期1996年5月9日一种开关装置，包括用于监测接触侵蚀的测量装置，其设置在接触元件和相关接触支撑件之间。 开关装置包括可用于单个和/或多个触点的电绝缘信号线，用作测量装置，信号线集成到单个监测电路中。 在开关装置中，在至少一个接触元件和相关接触支撑件之间或在接触材料中布置有具有绝缘体作为信号线的电导体，绝缘体和/或导体的损坏或破坏 用于产生外部信号作为接触元件的使用寿命结束的指示。

公开(公告)号：US4847460A

公开(公告)日：1989-07-11

申请号：US70399

申请日：1987-07-07

申请人： Jorg Kieser ,  Hans G. Lotz ,  Gonde Dittmer ,  Michael Sellschopp

发明人： Jorg Kieser ,  Hans G. Lotz ,  Gonde Dittmer ,  Michael Sellschopp

IPC分类号： H01P5/12 ,  H05B6/70

CPC分类号： H05B6/78 ,  H01P5/12 ,  H05B6/70

摘要： A microwave apparatus injects microwave energy into a receptacle that is at least partially transparent to microwave energy. The receptacle has a window of microwave transparent material. The apparatus includes at least one microwave transmitter and one open microwave guide which is connected to the microwave transmitter and which is situated in the immediate vicinity of the receptacle. The open microwave guide has a plurality of parallel rungs and forming a slow - wave structure of the strapped bar type. The microwave guide is of a symmetrical V-shape, and at the apex of the V it is at a smaller distance from the window than at its feed point. A microwave feeder is disposed at at least both ends of the open microwave guide.

摘要翻译： 微波装置将微波能量注入到对微波能量至少部分透明的容器中。 容器具有微波透明材料窗口。 该装置包括至少一个微波发射器和一个开放的微波导管，其连接到微波发射器并位于容器附近。 开放的微波导管具有多个平行的梯级并形成捆扎杆型的慢波结构。 微波导管具有对称的V形，并且在V的顶点处，距离窗口的距离小于其馈电点。 微波馈电器设置在开放的微波导管的至少两端。

公开(公告)号：US20070261383A1

公开(公告)日：2007-11-15

申请号：US11663779

申请日：2005-09-22

申请人： Werner Hartmann ,  Jorg Kieser

发明人： Werner Hartmann ,  Jorg Kieser

IPC分类号： F02C3/00

CPC分类号： F23C99/001 ,  F23C2900/99005 ,  F23R2900/00013

摘要： An embodiment of the invention relates to the use of electromagnetic fields for influencing combustion processes. According to an embodiment of the invention, the flame is controlled by the coupling of repeated, inductive, pulsed energy. The associated device uses at least one induction coil that at least partially surrounds the flame and the device is equipped with a controllable switch or a high frequency generator.

摘要翻译： 本发明的一个实施例涉及电磁场用于影响燃烧过程的用途。 根据本发明的实施例，火焰通过重复的，感应的，脉冲能量的耦合来控制。 相关联的装置使用至少一个至少部分地围绕火焰的感应线圈，并且该装置配备有可控开关或高频发生器。

公开(公告)号：US5747984A

公开(公告)日：1998-05-05

申请号：US525796

申请日：1995-09-22

申请人： Dietrich Amft ,  David-Walter Branston ,  Jorg Kieser ,  Reinhard Maier

发明人： Dietrich Amft ,  David-Walter Branston ,  Jorg Kieser ,  Reinhard Maier

IPC分类号： G01R31/327 ,  G01R31/333 ,  H01H1/00 ,  H01H1/20 ,  H01H33/00 ,  G01R31/00 ,  H01H71/04

CPC分类号： H01H1/20 ,  H01H1/0015

摘要： Switching components with contact parts that are mounted on a contact carrier in a switch housing may include devices for monitoring the contact erosion. The contact carrier may be split (sub-divided) and contact parts can be slotted at the rear and mounted on the sub-divided contact carrier. Thus, the oscillation response (vibration response) of the contact carrier in particular can be used as a measure of the erosion of the contact parts.

摘要翻译： PCT No.PCT / DE94 / 00244 Sec。 371日期1995年9月22日 102（e）日期1995年9月22日PCT 1994年3月10日PCT公布。 WO94 / 22153 PCT出版物 日期1994年9月29日具有安装在开关壳体中的触点支架上的接触部件的开关元件可能包括用于监测触点侵蚀的装置。 接触载体可以分开（分分割），接触部分可以在后部开槽并安装在分分离的载体上。 因此，接触载体的振动响应（振动响应）特别可以用作接触部件的侵蚀的量度。