公开(公告)号：US06645880B1

公开(公告)日：2003-11-11

申请号：US10335302

申请日：2002-12-31

申请人： Kazuhito Shigemori ,  Masakazu Sanada

发明人： Kazuhito Shigemori ,  Masakazu Sanada

IPC分类号： H01L2131

CPC分类号： H01L21/6715 ,  G03F7/162

摘要： A substrate spinning step is executed for spinning a substrate in a plane parallel to a principal plane thereof at a first spinning speed of 100 rpm to 500 rpm. Then, a first applying step is executed for supplying a treating solution to a surface of the substrate by moving a nozzle from a position opposed to an edge of the substrate in a spin toward a position opposed to a spin center of the substrate while delivering the treating solution from the nozzle. Next, a second applying step is executed for supplying the treating solution to the surface of the substrate by stopping the nozzle at the position opposed to the spin center of the substrate in the spin while delivering the treating solution from the nozzle. Finally, a film thickness adjusting step is executed for stopping delivery of the treating solution from the nozzle, and spinning the substrate in the plane parallel to the principal plane thereof at a second spinning speed faster than the first spinning speed.

摘要翻译： 执行基板纺丝步骤，以100rpm至500rpm的第一纺丝速度在平行于其主平面的平面中纺丝基材。 然后，执行第一施加步骤，用于通过使喷嘴从与基板的边缘相反的位置在旋转中向与基板的自旋中心相对的位置移动而将处理溶液供给到基板的表面，同时输送 从喷嘴处理溶液。 接下来，执行第二施加步骤，通过在从喷嘴输送处理溶液的同时将喷嘴停止在与旋转基板的旋转中心相对的位置处，将处理液供给到基板的表面。 最后，进行膜厚调整工序，停止从喷嘴输送处理液，并以与第一纺丝速度相比更快的第二纺丝速度在与主面平行的面内旋转基板。

公开(公告)号：US08920522B2

公开(公告)日：2014-12-30

申请号：US12888070

申请日：2010-09-22

申请人： Takeshi Matsuda ,  Masakazu Sanada ,  Kenta Hiramatsu

发明人： Takeshi Matsuda ,  Masakazu Sanada ,  Kenta Hiramatsu

IPC分类号： H01M10/0585 ,  H01M10/0525 ,  H01M10/0565

CPC分类号： H01M10/0585 ,  H01M10/0525 ,  H01M10/0565 ,  Y02E60/122 ,  Y02P70/54 ,  Y10T29/49108 ,  Y10T29/49115

摘要： A negative-electrode active material layer having an uneven pattern is formed on a surface of a copper foil as a negative-electrode current collector by applying an application liquid by a nozzle-scan coating method. Subsequently, an application liquid containing a polymer electrolyte material is applied by a spin coating method, thereby forming a solid electrolyte layer in conformity with the uneven pattern. Subsequently, an application liquid is applied by a doctor blade method, thereby forming a positive-electrode active material layer whose lower surface conforms to the unevenness and whose upper surface is substantially flat. A thin and high-performance all-solid-state battery can be produced by laminating an aluminum foil as a positive-electrode current collector before the application liquid is cured.

摘要翻译： 通过喷嘴扫描涂布法施加涂布液，在作为负极集电体的铜箔的表面上形成具有凹凸图案的负极活性物质层。 随后，通过旋涂法涂布含有聚合物电解质材料的涂布液，从而形成与不匀图案一致的固体电解质层。 随后，通过刮刀法施加涂布液，从而形成其下表面符合凹凸且其上表面基本平坦的正极活性物质层。 在施加液体固化之前，可以通过层压铝箔作为正极集电体来制造薄而高性能的全固态电池。

公开(公告)号：US20120242008A1

公开(公告)日：2012-09-27

申请号：US13349291

申请日：2012-01-12

申请人： Masanobu IWASHIMA ,  Masakazu Sanada

发明人： Masanobu IWASHIMA ,  Masakazu Sanada

IPC分类号： B29C35/08

CPC分类号： H01L31/022433 ,  Y02E10/50

摘要： A nozzle N which moves in a scan direction Ds along a surface Wf of a substrate W discharges an application liquid which contains a photo-curing material, and a light emitter E moving as if to follow the nozzle N irradiates light (UV light for instance) upon the application liquid. Arriving at an application end position, the nozzle N stops discharging the application liquid and retracts in a direction away from the substrate surface Wf. Meanwhile, the light emitter E keeps moving in the scan direction Ds, thereby irradiating even the terminating end of the application liquid with the light without fail.

摘要翻译： 沿着基板W的表面Wf沿扫描方向Ds移动的喷嘴N排出包含光固化材料的涂布液，并且如同遵循喷嘴N一样移动的发光体E照射光（例如UV光 ）对应用液体。 到达应用结束位置时，喷嘴N停止排出涂敷液体，并沿远离基板表面Wf的方向缩回。 同时，光发射体E在扫描方向Ds上保持移动，从而甚至用光照射施加液的终止端。

公开(公告)号：US20070059640A1

公开(公告)日：2007-03-15

申请号：US11531538

申请日：2006-09-13

申请人： Masakazu Sanada

发明人： Masakazu Sanada

IPC分类号： G03C1/00

CPC分类号： G03F7/32 ,  G03F7/322

摘要： A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate collection of waste liquid. Before a developer is fed from a developer discharge nozzle 30 onto a resist film having been exposed that is formed on the surface of a substrate W to make processing of the resist film, a solution containing a surface-active agent is fed from a solution discharge nozzle 34 onto the resist film, and subsequently pure water is fed onto the resist film on which the solution containing a surface-active agent has been fed to make prewetting.

摘要翻译： 基板的加工方法能够改善相对于显影剂的抗蚀剂膜表面的润湿性，而不会对抗蚀剂图案的加工尺寸产生不利影响，也不会对抗蚀剂膜造成损伤。 在处理方法中，也不需要分开收集废液。 在显影剂从显影剂排出喷嘴30供给到形成在基板W的表面上的已曝光的抗蚀剂膜上以进行抗蚀剂膜的处理之前，从溶液放电中供给含有表面活性剂的溶液 喷嘴34到抗蚀剂膜上，然后将纯水进料到其上已经供给含有表面活性剂的溶液的抗蚀剂膜上以进行预润湿。

公开(公告)号：US06869234B2

公开(公告)日：2005-03-22

申请号：US10637774

申请日：2003-08-07

申请人： Masakazu Sanada ,  Masahiko Harumoto ,  Hiroshi Kobayashi ,  Minobu Matsunaga ,  Akihiko Morita

发明人： Masakazu Sanada ,  Masahiko Harumoto ,  Hiroshi Kobayashi ,  Minobu Matsunaga ,  Akihiko Morita

IPC分类号： G03D5/00

CPC分类号： G03D5/00

摘要： A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.

摘要翻译： 基板（SW）通过晶片保持旋转机构（810）可旋转地保持在大致水平的位置。 冲洗液供给喷嘴（840）的一端由冲洗液供给喷嘴旋转支撑机构（850）可旋转地支撑，从而越过基板（SW）。 响应于冲洗液体供给喷嘴（840）的旋转，冲洗液体供给喷嘴（840）的旋转轴线在更靠近或远离基板（SW）的旋转轴线的方向上移动，由此投影量 的清洗液供给喷嘴（840）的顶端部分减少。

公开(公告)号：US06749351B2

公开(公告)日：2004-06-15

申请号：US10330883

申请日：2002-12-26

申请人： Masakazu Sanada ,  Masahiko Harumoto

发明人： Masakazu Sanada ,  Masahiko Harumoto

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  G03F7/3021 ,  Y10S134/902

摘要： A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.

摘要翻译： 显影剂供应喷嘴从用于将显影剂供应到基板的整个主表面的基板的第一端移向第二端。 在经过所需的显影时间之后，冲洗排出喷嘴从基板的第一端向第二端移动，以向基板的整个主表面提供冲洗。 提供隔板，用于防止从冲洗排放喷嘴的狭缝排出口排出到基板上的冲洗物沿着冲洗排放喷嘴的运动方向向前流动或者将前面提供的显影剂洗掉。

公开(公告)号：US06558053B2

公开(公告)日：2003-05-06

申请号：US10125229

申请日：2002-04-18

申请人： Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

发明人： Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

IPC分类号： G03D500

CPC分类号： H01L21/67161 ,  H01L21/6715 ,  H01L21/67167 ,  H01L21/67178

摘要： A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.

公开(公告)号：US09142837B2

公开(公告)日：2015-09-22

申请号：US13590717

申请日：2012-08-21

申请人： Masakazu Sanada

发明人： Masakazu Sanada

IPC分类号： H01M4/02 ,  H01M4/64 ,  H01M10/04

CPC分类号： H01M4/70 ,  H01M4/02 ,  H01M4/64 ,  H01M10/0436 ,  H01M10/0525 ,  H01M10/0585 ,  H01M2004/021 ,  H01M2004/025 ,  Y10T29/49108 ,  Y10T29/4911

摘要： A separator-type lithium ion secondary battery having large capacity and charge-discharge performance not destroying the separator, even with an active material layer having concavo-convex structure of high aspect ratio. The battery comprises a first electrode comprising a first current collector, and a first active material layer formed by plural convex first active material parts provided on the first current collector, a second electrode comprising a second current collector, and a second active material layer formed by plural convex second active material parts provided on the second current collector, and a separator provided between the first electrode and the second electrode, wherein the first electrode and the second electrode are integrated so that the convex first active material part is faced between the adjacent convex second active material parts, and the convex first active material part does not enter between the convex second active material parts.

摘要翻译： 即使具有高纵横比的凹凸结构的活性物质层，也具有不破坏隔膜的大容量和充放电性能的分离型锂离子二次电池。 该电池包括第一电极，该第一电极包括第一集电器和由设置在第一集电器上的多个凸起的第一活性材料部分形成的第一活性材料层，包括第二集电器的第二电极和由第二集电体形成的第二活性材料层， 设置在第二集电体上的多个凸起的第二活性物质部分和设置在第一电极和第二电极之间的隔板，其中第一电极和第二电极被一体化，使得凸起的第一活性材料部分面对相邻的凸起 第二活性物质部分，并且凸状第一活性物质部分不进入凸状第二活性物质部分之间。

公开(公告)号：US08999587B2

公开(公告)日：2015-04-07

申请号：US13220244

申请日：2011-08-29

申请人： Takeshi Matsuda ,  Masakazu Sanada ,  Kenta Hiramatsu ,  Kiyoshi Kanamura

发明人： Takeshi Matsuda ,  Masakazu Sanada ,  Kenta Hiramatsu ,  Kiyoshi Kanamura

IPC分类号： H01M10/056 ,  H01M10/0585 ,  H01M10/04 ,  H01M10/0525 ,  H01M4/04 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/485 ,  H01M10/0565 ,  H01M10/42 ,  H01M4/525 ,  H01M4/02

CPC分类号： H01M10/0525 ,  H01M4/0404 ,  H01M4/0411 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/485 ,  H01M4/525 ,  H01M10/0565 ,  H01M10/425 ,  H01M2004/025 ,  H01M2004/027 ,  Y02E60/122 ,  Y02P70/54 ,  Y02T10/7011 ,  Y10T29/49108 ,  Y10T29/49112 ,  Y10T29/49115

摘要： A negative-electrode active material layer 12 contains Li4Ti5O12 as a negative-electrode active material, and a positive-electrode active material layer 14 contains LiCoO2 as a positive-electrode active material. A solid electrolyte layer 13 contains polyethylene oxide and polystyrene as an electrolyte material. Gradients of surfaces of stripe-shaped pattern elements 121 forming the negative-electrode active material layer 12 are smaller than 90° when viewed from a surface of the negative-electrode current collector 11. By such a construction, it is possible to construct a battery having a high capacity in relation to the used amount of the active materials and good charge and discharge characteristics.

摘要翻译： 负极活性物质层12含有Li 4 Ti 5 O 12作为负极活性物质，正极活性物质层14含有作为正极活性物质的LiCoO 2。 固体电解质层13含有作为电解质材料的聚环氧乙烷和聚苯乙烯。 形成负极活性物质层12的条状图案元件121的表面的梯度从负极集电体11的表面观察时小于90°。通过这样的结构，可以构成电池 相对于活性物质的使用量具有高容量和良好的充放电特性。

公开(公告)号：US08826518B2

公开(公告)日：2014-09-09

申请号：US13011245

申请日：2011-01-21

申请人： Masakazu Sanada

发明人： Masakazu Sanada

IPC分类号： B23P19/00 ,  H05K13/04 ,  H01L31/0224

CPC分类号： H01L31/022425 ,  Y02E10/50 ,  Y10T29/49124 ,  Y10T29/49204 ,  Y10T29/53091 ,  Y10T29/5313 ,  Y10T29/53261

摘要： The invention aims at reducing unevenness at the intersections of mutually crossing electrodes with a method of and an apparatus for forming electrodes on a substrate. After forming a number of finger electrodes on a substrate, wide bus electrodes intersecting them are formed by application of an application liquid. Upon applying the application liquid which contains an electrode material and a photo-curing resin to the substrate, the application liquid is irradiated with UV light after a predetermined time and the application liquid is thus made to harden. A time difference since applying until light irradiation is set based on the result of measurement on changes of the height of the application liquid experimentally applied.

摘要翻译： 本发明旨在通过在基板上形成电极的方法和装置来减少交叉电极交叉点的不均匀性。 在基板上形成多个指状电极之后，通过涂布液形成与其相交的宽的总线电极。 在将含有电极材料和光固化树脂的涂布液施加到基板上时，在规定时间后用UV光照射涂布液，使涂布液硬化。 基于对实验施加的涂布液的高度的变化的测量结果来设定施加到光照射之前的时间差。