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    Lithographic apparatus and device manufacturing method
    31.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07317510B2

    公开(公告)日：2008-01-08

    申请号：US11020643

    申请日：2004-12-27

    申请人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

    发明人： Marcel Bontekoe ,  Patricius Aloysius Jacobus Tinnemans ,  Lambertus Gerardus Maria Kessels ,  Marco Cornelis Jacobus Martinus Van Hassel ,  Wouter Frans Willem Mulckhuyse

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70508

    摘要： A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

    摘要翻译： 一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投影为辐射子束阵列和被配置成调制辐射子束的独立可控元件的阵列，以在衬底上形成所请求的剂量图案。 所要求的剂量模式随着时间的推移从局部暴露的阵列中建立起来，其中至少相邻的局部曝光在基本上不同的时间成像，并且其中每个局部曝光由辐射的子束之一产生。 光刻设备还包括光栅化器装置，其被设置为将定义所请求的剂量图案的数据转换成在图案内的相应的点序列处表示所请求的剂量的数据序列，以及数据操纵装置，被配置为接收数据序列， 构成适于控制单独可控元件阵列的控制信号。

    Calibration method and apparatus
    35.
    发明授权
    Calibration method and apparatus 有权
    校准方法和仪器

    公开(公告)号：US08553218B2

    公开(公告)日：2013-10-08

    申请号：US12973248

    申请日：2010-12-20

    申请人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    发明人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    IPC分类号： G01N21/00

    CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

    摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

    摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

    Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD
    39.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 有权
    利用FPD的多字典压缩方法的平版印刷设备和器件制造方法

    公开(公告)号：US07606430B2

    公开(公告)日：2009-10-20

    申请号：US11214055

    申请日：2005-08-30

    申请人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    发明人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    IPC分类号： G06K9/46 ,  H04N1/32 ,  H03M7/00

    CPC分类号： G03F7/70291 ,  G03F7/70508

    摘要： A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation. The dictionary decompressor comprises an external dictionary memory, a first dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to references to the external dictionary memory contained in the compressed representation, and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to references to the internal dictionary memory contained in compressed representation.

    摘要翻译： 光刻设备包括调制辐射束的单独可控元件的阵列，压缩图案存储器，其通过调制束存储要在衬底上形成的所请求的剂量图案的压缩表示;以及字典解压缩器，至少 部分解压缩压缩表示。 字典解压缩器包括外部字典存储器，第一字典解码器，其通过从外部字典存储器提取对应于对包含在所述外部字典存储器中的外部字典存储器的引用的图案数据的至少部分来解压缩压缩表示的至少一部分 压缩表示和具有内部字典存储器的第二字典解码器，所述第二字典解码器通过从内部字典存储器提取对应于对内部的引用的模式数据的部分来至少部分地解压缩压缩表示的至少一部分 包含在压缩表示中的字典存储器。