公开(公告)号：US5784797A

公开(公告)日：1998-07-28

申请号：US622349

申请日：1996-03-26

申请人： Gary L. Curtis ,  Raymon F. Thompson ,  Robert W. Berner ,  Ed Fix

发明人： Gary L. Curtis ,  Raymon F. Thompson ,  Robert W. Berner ,  Ed Fix

IPC分类号： H01L21/00 ,  H01L21/673 ,  H01L21/677 ,  F26B17/24

CPC分类号： H01L21/67754 ,  H01L21/67173 ,  H01L21/67313 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781

摘要： A centrifugal semiconductor processing system having a rotor which holds articles for centrifugal processing. The rotor includes a rotor frame with a receiver for holding the wafers or other articles in a spaced array without a wafer carrier to improve fluid access to the wafers. The rotor also has one or more retainers which are pivoted relative to the rotor to controllably urge the wafers into their desired processing positions. The retainers are preferably constructed to provide initial spring biasing with added restraining forces being generated during rotation. The processing system also preferably includes an implement mounted on a robot for loading the rotor, and a vision system to aid in the loading operation.

摘要翻译： 一种离心半导体处理系统，具有保持用于离心处理的物品的转子。 转子包括具有接收器的转子框架，用于将晶片或其它制品保持为间隔开的阵列而不具有晶片载体，以改善对晶片的流体通路。 转子还具有一个或多个保持器，其相对于转子枢转以可控地将晶片推入其期望的加工位置。 保持器优选地构造成提供初始弹簧偏置，并且在旋转期间产生附加的约束力。 处理系统还优选地包括安装在机器人上用于装载转子的工具和用于辅助装载操作的视觉系统。

公开(公告)号：US5738128A

公开(公告)日：1998-04-14

申请号：US727271

申请日：1996-10-08

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/67017 ,  B08B3/02 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S134/902

摘要： Apparatus (20) for cleaning carriers used to hold semiconductor wafers, substrates, data disks, flat panel displays and similar containers used in applications highly sensitive to contamination. The apparatus has a processing bowl (21) with entrance and exit ports (34, 36) through which carriers are installed and removed from processing chamber (21). Rotor (70) rotates within the processing chamber. Rotor (70) includes a rotor cage (71) which mounts detachable wafer carrier supports (214). Filtered, heated air is passed through the process chamber for drying. Cleaning liquid and additional drying gas can be supplied through manifolds (120, 110) positioned inside and outside rotor cage (71).

摘要翻译： 用于清洁用于保存半导体晶片，基板，数据盘，平板显示器和用于对污染高度敏感的应用中的类似容器的载体的装置（20）。 该装置具有一个具有入口和出口（34,36）的处理碗（21），载物从该处理室中被安装并从处理室（21）中移出。 转子（70）在处理室内旋转。 转子（70）包括安装可拆卸晶片载体支撑件（214）的转子笼（71）。 过滤的加热空气通过处理室进行干燥。 可以通过位于转子笼（71）内部和外部的歧管（120,110）供应清洁液体和附加的干燥气体。

公开(公告)号：US5573023A

公开(公告)日：1996-11-12

申请号：US489142

申请日：1995-06-08

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687 ,  B08B3/10

CPC分类号： H01L21/68728 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  G11B7/26 ,  Y10S134/902

摘要： A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

摘要翻译： 单个晶片处理装置包括便携式处理头，其可以是安装到支撑机架的便携式模块或可移动单元。 处理头具有适于夹紧晶片的活动指状物。 指状物从保护性晶片板突出。 提供分度和旋转监测组件用于晶片处理步骤的自动化。 补充处理基座包括接收由便携式处理头保持的晶片的向上开口的碗。 它具有用于快速排水的全直径可移动底壁。 液体和/或气体喷嘴和喷嘴提供碗内所需的流体用于处理晶片。

公开(公告)号：US5562113A

公开(公告)日：1996-10-08

申请号：US360724

申请日：1995-02-21

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/67017 ,  B08B3/02 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S134/902

摘要： Apparatus (20) for cleaning carriers used to hold semiconductor wafers, substrates, data disks, flat panel displays and similar containers used in applications highly sensitive to contamination. The apparatus has a processing bowl (21) with entrance and exit ports (34, 36) through which carriers are installed and removed from processing chamber (21). Rotor (70) rotates within the processing chamber. Rotor (70) includes a rotor cage (71) which mounts detachable wafer carrier supports (214). Filtered, heated air is passed through the process chamber for drying. Cleaning liquid and additional drying gas can be supplied through manifolds (120, 110) positioned inside and outside rotor cage (71).

摘要翻译： PCT No.PCT / US93 / 05329 Sec。 371日期1995年2月21日 102（e）1995年2月21日PCT PCT 1993年6月3日PCT公布。 出版物WO93 / 26035 日期1993年12月23日用于清洁用于保存半导体晶片，基板，数据盘，平板显示器和用于对污染敏感的应用中使用的类似容器的载体的装置（20）。 该装置具有一个具有入口和出口（34,36）的处理碗（21），载物从该处理室中被安装并从处理室（21）中移出。 转子（70）在处理室内旋转。 转子（70）包括安装可拆卸晶片载体支撑件（214）的转子笼（71）。 过滤的加热空气通过处理室进行干燥。 可以通过位于转子笼（71）内部和外部的歧管（120,110）供应清洁液体和附加的干燥气体。

公开(公告)号：US5544421A

公开(公告)日：1996-08-13

申请号：US236424

申请日：1994-04-28

申请人： Raymon F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright

发明人： Raymon F. Thompson ,  Robert W. Berner ,  Gary L. Curtis ,  Stephen P. Culliton ,  Blaine G. Wright

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/673 ,  H01L21/677 ,  F26B17/24

CPC分类号： H01L21/67781 ,  H01L21/67173 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  Y10S134/902 ,  Y10S414/138 ,  Y10S414/14 ,  Y10S414/141

摘要： A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto trays for processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

摘要翻译： 用于处理集成电路晶片，半导体衬底，数据盘以及需要非常低的污染水平的类似单元的处理器。 处理器具有在标准晶片载体中接收晶片的接口部分。 接口部分将晶片从载体转移到托盘上用于处理。 接口单元可以容纳多组多个托盘。 具有自动臂组件的输送机移动支撑在托盘上的晶片。 输送机将托盘从接口沿轨道移动到多个处理站。 处理站从与接口部分相邻的封闭区域进行访问。

公开(公告)号：US5431421A

公开(公告)日：1995-07-11

申请号：US855767

申请日：1992-03-18

申请人： Raymon F. Thompson ,  Timothy J. Reardon ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Timothy J. Reardon ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687 ,  B23B31/32 ,  F23M9/10

CPC分类号： H01L21/68728 ,  H01L21/67023 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  G11B7/26 ,  Y10T279/31

摘要： A wafer processor including a wafer support for holding semiconductor wafers. The wafer support member includes wafer gripping fingers mounted in receptacles formed through a wafer support plate. The fingers are angularly displaced to spread the fingers and allow loading of wafers therebetween. The fingers have central cores which are flexibly mounted within a mounting flange by a thin diaphragm. A pivot control supports the cores and carries axial loading. The pivot control members preferably are U-shaped and can serve as connections to an actuator. A locking mechanism is also shown to secure the actuator connection.

摘要翻译： 一种晶片处理器，包括用于保持半导体晶片的晶片支架。 晶片支撑构件包括安装在通过晶片支撑板形成的插座中的晶片夹持指状物。 手指有角度位移以扩展指状物并允许在其间装载晶片。 手指具有中心芯，其通过薄隔膜灵活地安装在安装凸缘内。 枢轴控制支撑轴芯并承载轴向载荷。 枢轴控制构件优选为U形，并且可用作与致动器的连接。 还示出了锁定机构以固定致动器连接。

公开(公告)号：US5224504A

公开(公告)日：1993-07-06

申请号：US922578

申请日：1992-07-30

申请人： Raymon F. Thompson ,  Robert W. Gordon ,  Daniel Durado

发明人： Raymon F. Thompson ,  Robert W. Gordon ,  Daniel Durado

IPC分类号： H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68785 ,  H01L21/67023 ,  Y10S134/902

摘要： A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

摘要翻译： 单个晶片处理器支持具有至少一个要与流体接触的表面的半导体晶片。 该设备包括便携式模块，其包括能够围绕便携式壳体的轴线旋转的夹持器组件，并且能够机械地接合或脱离单个晶片的边缘。 便携式模块与接收基座互补，该接收基座具有设置有液体射流的开口碗，用于排出指向旋转晶片的外表面的平行流中的处理液体或试剂。 碗也可以填充用于浸没处理晶片的液体，其可以保持静止或以低速旋转。 便携式单元通过机器臂在基座单元之间移动。 与保持晶片相关联的所有元件被物理屏蔽以最小化来自环境接触的晶片污染。

公开(公告)号：US5222310A

公开(公告)日：1993-06-29

申请号：US640204

申请日：1991-01-11

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68707 ,  H01L21/68785 ,  G11B7/26 ,  Y10S134/902

摘要： A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

摘要翻译： 单个晶片处理装置包括便携式处理头，其可以是安装到支撑机架的便携式模块或可移动单元。 处理头具有适于夹紧晶片的活动指状物。 指状物从保护性晶片板突出。 提供分度和旋转监测组件用于晶片处理步骤的自动化。 补充处理基座包括接收由便携式处理头保持的晶片的向上开口的碗。 它具有用于快速排水的全直径可移动底壁。 液体和/或气体喷嘴和喷嘴提供碗内所需的流体用于处理晶片。

公开(公告)号：US5156174A

公开(公告)日：1992-10-20

申请号：US640205

申请日：1991-01-11

申请人： Raymon F. Thompson ,  Aleksander Owczarz

发明人： Raymon F. Thompson ,  Aleksander Owczarz

IPC分类号： G11B7/26 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/68785 ,  G11B7/26 ,  Y10S134/902

摘要： A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

摘要翻译： 单个晶片处理装置包括便携式处理头，其可以是安装到支撑机架的便携式模块或可移动单元。 处理头具有适于夹紧晶片的活动指状物。 指状物从保护性晶片板突出。 提供分度和旋转监测组件用于晶片处理步骤的自动化。 补充处理基座包括接收由便携式处理头保持的晶片的向上开口的碗。 它具有用于快速排水的全直径可移动底壁。 液体和/或气体喷嘴和喷嘴提供碗内所需的流体用于处理晶片。

公开(公告)号：US20150017805A1

公开(公告)日：2015-01-15

申请号：US13937816

申请日：2013-07-09

申请人： Raymon F. Thompson

发明人： Raymon F. Thompson

IPC分类号： H01L21/67 ,  H01L21/306

CPC分类号： H01L21/67115 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6719

摘要： An apparatus for processing a wafer is disclosed that includes a wafer support and a processing base. The wafer support is configured to support a wafer in a processing position, and to rotate the wafer about a first substantially vertical axis while in the processing position. The processing base includes a shallow dish configured to receive processing chemistry. The wafer support places the wafer in contact with the processing chemistry while in the processing position. The shallow dish is rotatable about a second substantially vertical axis when the wafer support is in the processing position. The rotation of the wafer is independent of the rotation of the shallow dish. Further, the processing base may include a heating element, such as an infrared heating element, that is disposed to locally elevate the temperature of of the shallow dish and chemistry contained in it.

摘要翻译： 公开了一种用于处理晶片的装置，其包括晶片支撑件和处理基座。 晶片支撑件被配置为支撑处于处理位置的晶片，并且在处于处理位置时使晶片围绕第一基本垂直的轴线旋转。 处理基座包括配置成接收处理化学物质的浅盘。 晶片支撑件在处理位置时将晶片与处理化学物质接触。 当晶片支撑件处于加工位置时，浅盘可绕第二基本垂直的轴线旋转。 晶圆的旋转与浅盘的旋转无关。 此外，处理基底可以包括诸如红外线加热元件的加热元件，其被设置成局部地提高浅盘的温度和包含在其中的化学物质。