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公开(公告)号:US11148230B2
公开(公告)日:2021-10-19
申请号:US16166170
申请日:2018-10-22
Applicant: Samsung Display Co., Ltd.
Inventor: Taras Litoshenko , Voronov Alexander , Gyoowan Han
IPC: B23K26/382 , B23K26/082 , B23K26/067 , B23K26/0622 , C23C14/04 , C23C16/04 , B23K26/06 , H01L51/00
Abstract: A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.
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公开(公告)号:US10991580B2
公开(公告)日:2021-04-27
申请号:US16204850
申请日:2018-11-29
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Akifumi Sangu , Gyoowan Han , Jekil Ryu , Kyungjae Lee
IPC: B23K26/064 , H01L21/02 , G02B27/28 , G01J1/42 , G02B27/10 , H01L27/12 , B23K26/067 , H01L21/67 , B23K26/03 , B23K26/08 , B23K26/70 , B23K26/352 , B23K26/06 , B23K26/354 , B23K26/00 , B23K101/40 , B23K103/00
Abstract: A laser crystallizing apparatus includes a first light source unit configured to emit a first input light having a linearly polarized laser beam shape. A second light source unit is configured to emit a second input light having a linearly polarized laser beam shape. A polarization optical system is configured to rotate the first input light and/or the second input light at a predetermined rotation angle. An optical system is configured to convert the first input light and the second input light, which pass through the polarization optical system, into an output light. A target substrate is seated on a stage and output light is directed onto the target substrate. A monitoring unit is configured to receive the first input light or the second input light from the polarization optical system and measure a laser beam quality thereof.
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公开(公告)号:US10751838B2
公开(公告)日:2020-08-25
申请号:US15814231
申请日:2017-11-15
Applicant: Samsung Display Co., Ltd.
Inventor: Ilyoung Jeong , Gyoowan Han , Jaeil Kim , Kuhyun Kang , Soobum Park
IPC: B23K26/38 , B23K26/082 , B23K26/03 , B23K26/08 , B23K26/402 , C03B33/04 , C03B33/09 , B23K26/0622 , B23K26/04 , B23K103/00
Abstract: A laser cutting apparatus and a laser cutting method are provided. A laser cutting method includes: preparing an object on a stage; cutting the object into a set shape by relatively moving and irradiating a laser beam along the set shape with respect to the object; and performing uniform heating compensation to reduce accumulation of thermal energy of the laser beam resulting from a change of speed at a shift point where a travelling direction of the laser beam with respect to the object changes.
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公开(公告)号:US10646957B2
公开(公告)日:2020-05-12
申请号:US15435523
申请日:2017-02-17
Applicant: Samsung Display Co., Ltd.
Inventor: Yoongyeong Bae , Ilseob Yoon , Seongchae Jeong , Inae Han , Gyoowan Han
IPC: H01L51/00 , B23K26/082 , H01L25/16 , B32B3/30 , B32B7/12 , B23K26/364 , H01L27/32
Abstract: A method of manufacturing a flexible display panel includes forming a groove in a first area of a layered structure of the flexible display panel, and bending a portion of the first area including the groove from a plane of a second area of the layered structure. The second area extends from the first area. Forming the groove includes radiating a pulsating laser beam along an imaginary line corresponding to the groove such that an overlap ratio between consecutive pulse spots of the pulsating laser beam is greater than or equal to 0.80 and less than or equal to 0.90.
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公开(公告)号:US10403499B2
公开(公告)日:2019-09-03
申请号:US15848086
申请日:2017-12-20
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Emil Aslanov , Jekil Ryu , Haesook Lee , Gyoowan Han
IPC: H01L21/02 , H01L21/268 , H01L29/66 , H01L29/786 , B23K26/06 , H01L27/12 , H01S5/00 , H01J29/46 , H01J9/24 , H01S5/40 , B23K26/067 , B23K103/00
Abstract: A laser polycrystallization apparatus including: a light source for emitting a laser beam; a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam; a light split portion for splitting the laser beam received from the diffraction grating; and a light superposition portion for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate. An angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle.
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公开(公告)号:US20190148641A1
公开(公告)日:2019-05-16
申请号:US16138710
申请日:2018-09-21
Applicant: Samsung Display Co., Ltd.
Inventor: Wonyong Kim , Gyoowan Han , Taekkyo Kang , Seungho Myoung , Taekil Oh
IPC: H01L51/00 , H01L51/56 , C23C16/04 , B23K26/364
Abstract: An apparatus for manufacturing a mask is provided. The apparatus includes a stage on which a pre-mask is disposed, and a laser irradiation device including a laser generation member, an optical system for controlling a shape of a laser beam, and a scanner for adjusting a path of a laser beam that has the shape controlled by the optical system. The pre-mask includes a first pattern groove defined on a front surface and a second pattern groove defined on a rear surface that corresponds to the front surface. A first portion and a second portion are defined in a first direction that is a thickness direction of the pre-mask. The laser beam with the controlled shape is irradiated to the second portion of the pre-mask in a second direction crossing the first direction, a mask having an opening, in which the second portion is removed, is provided.
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公开(公告)号:US20190126405A1
公开(公告)日:2019-05-02
申请号:US16177049
申请日:2018-10-31
Applicant: Samsung Display Co., Ltd.
Inventor: Do-sun Kim , Taekkyo Kang , Seungho Myoung , Minkyu Choi , Gyoowan Han
IPC: B23K26/38 , B23K26/14 , B23K26/142 , B08B15/04
Abstract: A laser processing apparatus may include: a laser generator configured to generate a laser beam; a stage configured to support a target object; at least one supply nozzle on the stage to eject an air toward the stage; a suction unit configured to inhale external air; and a suction structure on the stage and adjacent to the at least one supply nozzle. The suction structure may include a suction hole connected to the suction unit to inhale the external air. The suction structure may include an inclined surface in which the suction hole is defined. The suction structure may include a first surface adjacent to the supply nozzle, and an opening may be defined in a region of the first surface adjacent to a bottom surface. A distance between the inclined surface and the target object may be less than or equal to a height of the opening.
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