公开(公告)号：US06558867B2

公开(公告)日：2003-05-06

申请号：US09789837

申请日：2001-02-22

申请人： Kazumi Noda ,  Tomoyoshi Furihata ,  Hideto Kato

发明人： Kazumi Noda ,  Tomoyoshi Furihata ,  Hideto Kato

IPC分类号： G03F7023

CPC分类号： G03F7/0226

摘要： A single layer lift-off resist composition comprising a novolac resin, a quinonediazidosulfonate photosensitive agent, and an aromatic hydroxy compound having at least one phenolic hydroxyl group in which the phenolic hydroxyl group is partially acylated is improved in adhesion to a substrate.

摘要翻译： 包含酚醛清漆树脂，醌二叠氮基磺酸盐感光剂和具有酚羟基被部分酰化的至少一个酚羟基的芳族羟基化合物的单层剥离抗蚀剂组合物在与基材的粘附性方面提高。

公开(公告)号：US07745094B2

公开(公告)日：2010-06-29

申请号：US11702658

申请日：2007-02-06

申请人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda

发明人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/075

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  Y10S430/114

摘要： A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively. The resist composition has satisfactory resolution and overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.

摘要翻译： 提供了包含有机硅树脂，光酸产生剂，含氮有机化合物和溶剂的抗蚀剂组合物。 有机硅树脂通过含有氟化降冰片烷基的三种硅烷单体和具有酸不稳定基团保护的羧基的有机基团和含有内酯环的有机基团的混合物的共水解缩合而获得。 抗蚀剂组合物具有令人满意的分辨率，并且克服了在氧反应蚀刻期间抗蚀剂膜和有机膜之间的选择性蚀刻比低的问题。

公开(公告)号：US07550247B2

公开(公告)日：2009-06-23

申请号：US11205980

申请日：2005-08-18

申请人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda ,  Toshihiko Fujii

发明人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda ,  Toshihiko Fujii

IPC分类号： G03C1/73 ,  G03F7/039 ,  G03F7/20 ,  G03F7/36

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  Y10S430/108

摘要： A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing an organic group having a hydroxyl group and having at least 3 fluorine atoms, in total, on a proximate carbon atom, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively. The resist composition has satisfactory resolution and overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.

摘要翻译： 提供了包含有机硅树脂，光酸产生剂，含氮有机化合物和溶剂的抗蚀剂组合物。 有机硅树脂通过在近邻碳原子上含有具有羟基并且具有至少3个氟原子的有机基团的三种硅烷单体的混合物的共水解缩合获得，所述有机基团具有羧基被保护的有机基团 酸不稳定基团和含内酯环的有机基团。 抗蚀剂组合物具有令人满意的分辨率，并且克服了在氧反应蚀刻期间抗蚀剂膜和有机膜之间的选择性蚀刻比低的问题。

公开(公告)号：US20060073413A1

公开(公告)日：2006-04-06

申请号：US11242270

申请日：2005-10-04

申请人： Katsuya Takemura ,  Kazumi Noda ,  Youichi Ohsawa

发明人： Katsuya Takemura ,  Kazumi Noda ,  Youichi Ohsawa

IPC分类号： G03C1/76

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

摘要： A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution performance without the problem of a T-top profile and is suited for the bilayer resist process using ArF exposure.