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公开(公告)号：US07724348B2
公开(公告)日：2010-05-25
申请号：US11614416
申请日：2006-12-21
Applicant: Yoshio Gomei , Hiromitsu Takase , Shigeru Terashima
Inventor： Yoshio Gomei , Hiromitsu Takase , Shigeru Terashima
CPC classification number: G03F7/70958 , G03F7/70916 , G03F7/70925 , G03F7/70933
Abstract: An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.
Abstract translation: 一种曝光装置，用于经由原稿将基板曝光于曝光光。 该装置包括反射器，其包括多层膜和钌膜，并反射曝光光。 多层膜反射曝光光，钌膜配置在多层膜上。 真空容器包含反射器，排气器排出真空容器中的废气，调节器将真空容器中的水蒸汽提供到真空容器中，并根据真空中含碳气体的量来调节一定量的水蒸气 以延缓钌膜的氧化。
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公开(公告)号：US07050152B2
公开(公告)日：2006-05-23
申请号：US10912926
申请日：2004-08-05
Applicant: Shigeru Terashima , Noriyasu Hasegawa
Inventor： Shigeru Terashima , Noriyasu Hasegawa
CPC classification number: G03F7/70808 , G03B27/42 , G03F7/70841
Abstract: An exposure apparatus for exposing an object put on a first stage by irradiating light from a light source onto the object through an exposure optical system includes a partition for isolating a first space where the first stage is arranged and isolating a second space where the exposure optical system is arranged, a first management part that manages a degree of vacuum of the first space, and a second management part that manages a degree of vacuum of the second space.
Abstract translation: 一种曝光装置，用于通过曝光光学系统将来自光源的光照射到物体上而使放置在第一平台上的物体曝光，包括用于隔离第一级被布置的第一空间的隔离物，并隔离第二空间，其中曝光光学 系统，管理第一空间的真空度的第一管理部件和管理第二空间的真空度的第二管理部。
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公开(公告)号：US07027131B2
公开(公告)日：2006-04-11
申请号：US10798800
申请日：2004-03-10
Applicant: Shigeru Terashima
Inventor： Shigeru Terashima
CPC classification number: G03F7/70716 , G03F7/70775
Abstract: An exposure apparatus includes an optical system for guiding light from a light source to an object, a holding member for holding the object, and a measuring device for measuring position of the holding member by using a reference surface provided in the holding member, wherein the reference surface is located in an area corresponding to the object which is held by the holding member.
Abstract translation: 曝光装置包括：用于将来自光源的光引导到物体的光学系统，用于保持物体的保持部件;以及用于通过使用设置在保持部件中的基准面来测量保持部件的位置的测量装置，其中， 参考表面位于与由保持构件保持的物体相对应的区域中。
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Patent Agency Ranking
34.发明授权公开(公告)号：US06984362B2
公开(公告)日：2006-01-10
申请号：US10619506
申请日：2003-07-16
Applicant: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
Inventor： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
CPC classification number: G05D16/2013
Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
Abstract translation: 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。
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35.发明申请公开(公告)号：US20050271558A1
公开(公告)日：2005-12-08
申请号：US11201142
申请日：2005-08-11
Applicant: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
Inventor： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC: H01L21/027 , G03F7/20 , G05D16/00 , G05D16/20
CPC classification number: G05D16/2013
Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
Abstract translation: 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。
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36.发明授权公开(公告)号：US06616898B2
公开(公告)日：2003-09-09
申请号：US09257258
申请日：1999-02-25
Applicant: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
Inventor： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC: G05D1600
CPC classification number: G05D16/2013
Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
Abstract translation: 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境气体被吹送到密封真空室中，使得沿着处理部分沿预定方向产生气流。
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37.发明授权Exposure method, exposure device and semiconductor device manufacturing method 失效曝光方法，曝光装置及半导体装置制造方法公开(公告)号：US06453000B1
公开(公告)日：2002-09-17
申请号：US09590184
申请日：2000-06-09
Applicant: Shigeru Terashima , Hideki Ina
Inventor： Shigeru Terashima , Hideki Ina
IPC: G21K500
CPC classification number: G03F7/70066 , G03F9/7084
Abstract: An exposure apparatus for exposing a photosensitive substrate to a pattern within an exposure view angle on a mask using X-rays to transfer the pattern onto the photosensitive substrate, wherein the exposure view angle is limited by a light blocking plate for blocking the X-rays, and the alignment mark is disposed on a scribe line, thus effectively manufacturing semiconductor devices.
Abstract translation: 一种曝光装置，用于使用X射线将感光基板曝光于曝光视角的图案，以将图案转印到感光基板上，其中曝光视角由遮光板限制X射线 并且对准标记设置在划线上，从而有效地制造半导体器件。
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公开(公告)号：US5790630A
公开(公告)日：1998-08-04
申请号：US697863
申请日：1996-08-30
Applicant: Yutaka Watanabe , Shigeru Terashima
Inventor： Yutaka Watanabe , Shigeru Terashima
Abstract: A radiation window includes a radiation transmitting window material, a supporting frame for gas-tightly supporting an outer periphery of the radiation transmitting window material, a flange for gas-tightly supporting an outer periphery of the supporting frame, and a structure for reducing a stress related to mounting the supporting frame onto the flange.
Abstract translation: 辐射窗包括辐射透射窗材料，用于气密地支撑辐射透射窗材料的外周的支撑框架，用于气密地支撑支撑框架的外周的凸缘和用于降低应力的结构 涉及将支撑框架安装到凸缘上。
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