公开(公告)号：US07123343B2

公开(公告)日：2006-10-17

申请号：US11136687

申请日：2005-05-25

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03B27/52 ,  G03B27/62

CPC classification number: G03F7/70933 ,  G03F7/70883 ,  G03F7/70908

Abstract: An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.

Abstract translation: 使用曝光光将形成在掩模上的图案投影并传送到基板的曝光装置包括在包括空间的光路空间中形成惰性气体流的台，光学系统和气流形成机构， 位于舞台和光学系统之间，曝光光通过该系统。 此外，构件在光路空间与曝光装置的光路空间外的周边空间之间形成预定的空间，气体供给机构将惰性气体供给到规定的空间。

公开(公告)号：US06934003B2

公开(公告)日：2005-08-23

申请号：US10329816

申请日：2002-12-27

Applicant: Noriyasu Hasegawa ,  Eiji Sakamoto ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Eiji Sakamoto ,  Shigeru Terashima

IPC: G03F7/20 ,  G03B27/42 ,  G03B27/52 ,  G03B27/62

CPC classification number: G03F7/70933 ,  G03F7/70883 ,  G03F7/70908

Abstract: An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.

公开(公告)号：US5995582A

公开(公告)日：1999-11-30

申请号：US835721

申请日：1997-04-10

Applicant: Shigeru Terashima ,  Masami Tsukamoto

Inventor： Shigeru Terashima ,  Masami Tsukamoto

IPC: G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

CPC classification number: G03F7/70891 ,  G21K1/06

Abstract: A deflection mirror is disposed before an X-ray mask so as to reflect an X-ray beam and to project it to the X-ray mask. The X-ray mask is disposed opposed to a wafer with a distance D therebetween, and the X-ray beam reflected by the X-ray mask is projected onto the wafer through a reduction projection optical system. The deflecting mirror is disposed, in an example, at a position satisfying a relation D>L>d/(tan .delta.1+tan .delta.2) where L is the distance from the X-ray mask to an edge of the deflection mirror closer to the path of the X-ray beam reflected by the X-ray mask, d is the width of irradiation of the X-ray beam upon the X-ray mask, and .delta.1 and .delta.2 are incidence angles of the X-ray beam at upper and lower edges of the irradiation width d, respectively, upon the X-ray mask. This assures a compact structure wherein, even when a wafer of a large diameter is used, illumination light to the mask is not intercepted.

Abstract translation: 偏转镜设置在X射线掩模之前，以便反射X射线束并将其投影到X射线掩模。 X射线掩模与其间具有距离D的晶片相对设置，并且由X射线掩模反射的X射线束通过还原投影光学系统投影到晶片上。 偏转镜例如设置在满足关系D> L> d /（tanδ1 +tanδ2）的位置处，其中L是从X射线掩模到偏转镜的边缘的距离更近 到由X射线掩模反射的X射线束的路径，d是X射线掩模上的X射线束的照射宽度，δ1和δ2是X射线的入射角 在X射线掩模上分别照射宽度d的上边缘和下边缘。 这确保了紧凑的结构，其中即使当使用大直径的晶片时，不遮挡对掩模的照明光。

公开(公告)号：US20130040240A1

公开(公告)日：2013-02-14

申请号：US13550702

申请日：2012-07-17

Applicant: Shigeru Terashima

Inventor： Shigeru Terashima

IPC: G21K5/04 ,  G03F7/20 ,  G21K5/10

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/188

Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.

Abstract translation: 带电粒子束描绘装置包括具有电极部件的静电透镜，并配置成经由电极部件将多根带电粒子束投射到基板上。 在电极部件中形成有多个带电粒子束通过的多个第一开口以及与多个第一开口不同的多个第二开口，多个第二开口的总面积不小于总数 多个第一开口的区域。

公开(公告)号：US08004657B2

公开(公告)日：2011-08-23

申请号：US11677241

申请日：2007-02-21

Applicant: Masayuki Tanabe ,  Yutaka Watanabe ,  Shigeru Terashima ,  Mika Kanehira

Inventor： Masayuki Tanabe ,  Yutaka Watanabe ,  Shigeru Terashima ,  Mika Kanehira

IPC: F21V9/04 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/70925 ,  G21K1/062

Abstract: An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.

Abstract translation: 一种曝光装置，包括其中布置有包括封盖层的光学元件并且经由所述光学元件将基板暴露于曝光光的室。 该设备包括：供给单元，其被配置为将材料供应到所述室中;以及提供单元，被配置为向所述封盖层提供电磁波。 该设备被配置为使得由提供单元提供的电磁波引起材料的光化学反应，以在覆盖层上生长层中的至少一种，其中至少一种是通过供应单元供应材料的条件和条件 基于每个位置处的覆盖层的量的减少的信息，根据封盖层的每个位置来改变提供单元的电磁波的提供，以修复封盖层。

公开(公告)号：US20080304031A1

公开(公告)日：2008-12-11

申请号：US12047579

申请日：2008-03-13

Applicant: Mika Kanehira ,  Shigeru Terashima ,  Yutaka Watanabe

Inventor： Mika Kanehira ,  Shigeru Terashima ,  Yutaka Watanabe

IPC: G03B27/42

CPC classification number: G03F7/70916 ,  G03F7/70808 ,  G03F7/70841

Abstract: An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the light, plural vacuum chambers, each of which houses one or more of the plural optical elements, and a gas supplier configured to supply to each vacuum chamber independently a gas used to inhibit contaminations that could occur on the optical element housed in each vacuum chamber, wherein the gas supplier supplies different types of gases to the plural vacuum chambers according to an illuminance of an illumined region on the optical element housed in each vacuum chamber.

Abstract translation: 曝光装置使用来自具有20nm以下的波长的光源的光来曝光基板，并且包括多个用于反射光的光学元件，多个真空室容纳一个或多个 多个光学元件和气体供给器，被配置为独立地向每个真空室提供用于抑制容纳在每个真空室中的光学元件上可能发生的污染物的气体，其中，所述气体供应器根据 到容纳在每个真空室中的光学元件上的照明区域的照度。

公开(公告)号：US07212273B2

公开(公告)日：2007-05-01

申请号：US10785252

申请日：2004-02-23

Applicant: Shigeru Terashima

Inventor： Shigeru Terashima

IPC: G03B27/52 ,  G03B27/42 ,  G03B27/58

CPC classification number: G03F7/7095 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70983 ,  G03F7/70991

Abstract: To solve the problem, when the inside of an exposure apparatus is placed under vacuum, of a gas being emitted from a resin tube provided in the exposure apparatus, and a component of the gas adhering to and being deposited on the surface of an optical element, so that the optical performances of the optical element and the exposure apparatus are deteriorated, the exposure apparatus is provided with means for controlling the surface temperature of the resin tube in the exposure apparatus up to a predetermined temperature.

Abstract translation: 为了解决这个问题，当曝光装置的内部被放置在真空下时，从设置在曝光装置中的树脂管发射的气体和附着并沉积在光学元件的表面上的气体成分 ，使得光学元件和曝光装置的光学性能劣化，曝光装置设置有用于将曝光装置中的树脂管的表面温度控制到预定温度的装置。

公开(公告)号：US20050213063A1

公开(公告)日：2005-09-29

申请号：US11136687

申请日：2005-05-25

Applicant: Noriyasu Hasegawa ,  Eiji Sakamoto ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Eiji Sakamoto ,  Shigeru Terashima

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70883 ,  G03F7/70908

Abstract: An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.

Abstract translation: 使用曝光光将形成在掩模上的图案投影并传送到基板的曝光装置包括在包括空间的光路空间中形成惰性气体流的台，光学系统和气流形成机构， 位于舞台和光学系统之间，曝光光通过该系统。 此外，构件在光路空间与曝光装置的光路空间外的周边空间之间形成预定的空间，气体供给机构将惰性气体供给到规定的空间。

公开(公告)号：US20050030504A1

公开(公告)日：2005-02-10

申请号：US10912926

申请日：2004-08-05

Applicant: Shigeru Terashima ,  Noriyasu Hasegawa

Inventor： Shigeru Terashima ,  Noriyasu Hasegawa

IPC: G03B27/42 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G03B27/42 ,  G03F7/70841

Abstract: An exposure apparatus for exposing an object put on a first stage by irradiating light from a light source onto the object through an exposure optical system includes a partition for isolating a first space where the first stage is arranged and isolating a second space where the exposure optical system is arranged, a first management part that manages a degree of vacuum of the first space, and a second management part that manages a degree of vacuum of the second space.

Abstract translation: 一种曝光装置，用于通过曝光光学系统将来自光源的光照射到物体上而使放置在第一平台上的物体曝光，包括用于隔离第一级被布置的第一空间的隔离物，并隔离第二空间，其中曝光光学 系统，管理第一空间的真空度的第一管理部件和管理第二空间的真空度的第二管理部。

公开(公告)号：US06603833B2

公开(公告)日：2003-08-05

申请号：US10003100

申请日：2001-12-06

Applicant: Shigeru Terashima ,  Yutaka Watanabe

Inventor： Shigeru Terashima ,  Yutaka Watanabe

IPC: G03G1504

CPC classification number: G03F7/708 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/70808 ,  G21K5/04

Abstract: An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.