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    CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE
    1.
    发明申请
    CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE 有权
    充电粒子束光刻设备及其制造方法

    公开(公告)号：US20120288799A1

    公开(公告)日：2012-11-15

    申请号：US13462013

    申请日：2012-05-02

    申请人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

    发明人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

    IPC分类号： G03F7/20 ,  G21K5/08

    CPC分类号： H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

    摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

    摘要翻译： 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

    DNA MICRO-ARRAY HAVING STANDARD PROBE AND KIT INCLUDING THE ARRAY
    2.
    发明申请
    DNA MICRO-ARRAY HAVING STANDARD PROBE AND KIT INCLUDING THE ARRAY 审中-公开
    具有标准探针和包装阵列的DNA微阵列

    公开(公告)号：US20090093373A1

    公开(公告)日：2009-04-09

    申请号：US12264241

    申请日：2008-11-03

    申请人： Masahiro Kawaguchi ,  Tadashi Okamoto ,  Hiromitsu Takase ,  Hiroyuki Hashimoto

    发明人： Masahiro Kawaguchi ,  Tadashi Okamoto ,  Hiromitsu Takase ,  Hiroyuki Hashimoto

    IPC分类号： C40B30/04 ,  C40B30/10

    CPC分类号： C12Q1/6837

    摘要： To provide a DNA micro-array having a nucleic acid probe immobilized on a substrate, which is used to detect a molecule of a target nucleic acid contained in a sample and has a substantially complementary base sequence to the target base sequence of the nucleic acid molecule, including at least one probe selected from the group consisting of: at least one internal standard probe for assay of PCR of the target nucleic acid; at least one external standard probe for a detection operation and assay of an amount of the probe; and a probe for measurement of the amount or density of the nucleic acid probe, formed by the same method as the nucleic acid probe.

    摘要翻译： 提供具有固定在底物上的核酸探针的DNA微阵列，其用于检测样品中所含的靶核酸的分子，并且与核酸分子的靶碱基序列具有基本上互补的碱基序列 包括至少一种选自以下的探针：用于测定靶核酸的PCR的至少一个内标物探针; 用于检测操作的至少一个外部标准探针和探针的量的测定; 以及通过与核酸探针相同的方法形成的用于测量核酸探针的量或密度的探针。

    Charged particle beam drawing apparatus and article manufacturing method
    3.
    发明授权
    Charged particle beam drawing apparatus and article manufacturing method 失效
    带电粒子束拉制装置及制品的制造方法

    公开(公告)号：US08698095B2

    公开(公告)日：2014-04-15

    申请号：US13343752

    申请日：2012-01-05

    申请人： Ichiro Tanaka ,  Akira Miyake ,  Hiromitsu Takase

    发明人： Ichiro Tanaka ,  Akira Miyake ,  Hiromitsu Takase

    IPC分类号： G21K5/04

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/04924

    摘要： The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.

    摘要翻译： 本发明的带电粒子束描绘装置利用多个带电粒子束对基片进行拉伸。 拉伸装置包括位于与基板相对的位置的电子透镜，并且包括多个孔，带电粒子束穿过该孔; 以及清洁单元，其被配置为将活性物质释放到已经附着到电子透镜上的分解产物，并且通过活性种类和分解产物的反应来减少分解产物，从而将分解产物改变为挥发性气体。 这里，清洁单元具有形成为使得活性物质朝向电子透镜的多个孔释放的多个开口。

    Exposure apparatus and method, and device manufacturing method
    4.
    发明授权
    Exposure apparatus and method, and device manufacturing method 失效
    曝光装置及方法及装置制造方法

    公开(公告)号：US07724348B2

    公开(公告)日：2010-05-25

    申请号：US11614416

    申请日：2006-12-21

    申请人： Yoshio Gomei ,  Hiromitsu Takase ,  Shigeru Terashima

    发明人： Yoshio Gomei ,  Hiromitsu Takase ,  Shigeru Terashima

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70958 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70933

    摘要： An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.

    摘要翻译： 一种曝光装置，用于经由原稿将基板曝光于曝光光。 该装置包括反射器，其包括多层膜和钌膜，并反射曝光光。 多层膜反射曝光光，钌膜配置在多层膜上。 真空容器包含反射器，排气器排出真空容器中的废气，调节器将真空容器中的水蒸汽提供到真空容器中，并根据真空中含碳气体的量来调节一定量的水蒸气 以延缓钌膜的氧化。

    In situ cleaning device for lithographic apparatus
    8.
    发明授权
    In situ cleaning device for lithographic apparatus 有权
    光刻设备原位清洁装置

    公开(公告)号：US08921807B2

    公开(公告)日：2014-12-30

    申请号：US13462013

    申请日：2012-05-02

    申请人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

    发明人： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

    IPC分类号： H01J37/30 ,  B08B5/00 ,  H01J37/317

    CPC分类号： H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

    摘要： A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

    摘要翻译： 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

    CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD
    9.
    发明申请
    CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD 失效
    充电颗粒光束绘图设备和制品制造方法

    公开(公告)号：US20120178025A1

    公开(公告)日：2012-07-12

    申请号：US13343752

    申请日：2012-01-05

    申请人： Ichiro TANAKA ,  Akira MIYAKE ,  Hiromitsu TAKASE

    发明人： Ichiro TANAKA ,  Akira MIYAKE ,  Hiromitsu TAKASE

    IPC分类号： G03F7/20 ,  H01J3/14

    CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/04924

    摘要： The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.

    摘要翻译： 本发明的带电粒子束描绘装置利用多个带电粒子束对基片进行拉伸。 拉伸装置包括位于与基板相对的位置的电子透镜，并且包括多个孔，带电粒子束穿过该孔; 以及清洁单元，其被配置为将活性物质释放到已经附着到电子透镜上的分解产物，并且通过活性种类和分解产物的反应来减少分解产物，从而将分解产物改变为挥发性气体。 这里，清洁单元具有形成为使得活性物质朝向电子透镜的多个孔释放的多个开口。