SEMICONDUCTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME
    32.
    发明申请
    SEMICONDUCTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME 有权
    半导体基板及其制造方法

    公开(公告)号:US20140021617A1

    公开(公告)日:2014-01-23

    申请号:US13677939

    申请日:2012-11-15

    Abstract: A semiconductor substrate is provided, including: a substrate; a plurality of conductive through vias embedded in the substrate; a first dielectric layer formed on the substrate; a metal layer formed on the first dielectric layer; and a second dielectric layer formed on the metal layer. As such, when a packaging substrate is disposed on the second dielectric layer, the metal layer provides a reverse stress to balance thermal stresses caused by the first and second dielectric layers, thereby preventing warpage of the semiconductor substrate.

    Abstract translation: 提供一种半导体衬底,包括:衬底; 多个导电通孔嵌入基板中; 形成在所述基板上的第一电介质层; 形成在所述第一电介质层上的金属层; 以及形成在所述金属层上的第二电介质层。 因此,当包装基板设置在第二电介质层上时,金属层提供反向应力以平衡由第一和第二电介质层引起的热应力,从而防止半导体衬底翘曲。

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