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31.发明申请公开(公告)号：US20110141484A1
公开(公告)日：2011-06-16
申请号：US13030748
申请日：2011-02-18
申请人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
发明人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
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32.发明授权Concentrate of a factor VIII:C-containing von Willebrand factor and the process relating thereto 有权浓缩因子VIII：含有冯维勒布兰德因子及其相关过程公开(公告)号：US07625866B2
公开(公告)日：2009-12-01
申请号：US10670563
申请日：2003-09-26
IPC分类号： A61K38/37
CPC分类号： C07K14/755 , A61K38/00
摘要： The invention relates to a concentrate and a process for producing a factor VIII:C-containing von Willebrand factor by fractional precipitation from a liquid comprising factor VIII:C and von Willebrand factor, resulting in an increased content of high molecular weight multimers of von Willebrand factor and a ratio of the vWF:RCoF activity to vWF:Ag of greater than 1.
摘要翻译： 本发明涉及一种浓缩物和通过从包含因子VIII：C和von Willebrand因子的液体中分级沉淀来生成因子VIII：含C的血管性血友病因子的方法，导致von Willebrand的高分子量多聚体的含量增加 因子和vWF：RCoF活性与vWF的比例：Ag大于1。
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33.发明申请OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE 有权光学元件和校准包含波形结构的测量装置的方法公开(公告)号：US20100177321A1
公开(公告)日：2010-07-15
申请号：US12684632
申请日：2010-01-08
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。
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34.发明授权Interferometer system and method for recording an interferogram using weighted averaging over multiple frequencies, and method for providing and manufacturing an object having a target surface 失效使用多个频率上的加权平均来记录干涉图的干涉仪系统和方法以及用于提供和制造具有目标表面的物体的方法公开(公告)号：US07002694B2
公开(公告)日：2006-02-21
申请号：US10743792
申请日：2003-12-24
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02004 , G01B9/02039 , G01B9/02059 , G01B9/02069 , G01B9/02072 , G01B11/2441 , G01B11/306
摘要： An interferometer system comprises a reference surface, a support for an object providing an object surface, a radiation source for emitting radiation of an adjustable frequency onto the reference surface and the object surface, a position-sensitive radiation detector, a controller for adjusting a plurality of different frequencies of the radiation emitted by the radiation source, and an integrator for averaging the interference patterns superposed on the radiation detector at different frequencies. Moreover, there is provided a method for recording an interferogram, a method for providing an object with a target surface as well as a method for manufacturing an object with a target surface.
摘要翻译： 干涉仪系统包括参考表面，用于提供物体表面的物体的支撑件，用于将可调节频率的辐射发射到参考表面和物体表面上的辐射源，位置敏感放射线检测器，用于调整多个 由辐射源发射的辐射的不同频率，以及用于平均叠加在不同频率上的辐射检测器上的干涉图案的积分器。 此外，提供了一种用于记录干涉图的方法，用于向对象提供目标表面的方法以及用于制造具有目标表面的物体的方法。
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公开(公告)号：US09695577B2
公开(公告)日：2017-07-04
申请号：US13414990
申请日：2012-03-08
CPC分类号： E03B7/006 , B08B9/0325 , E03B7/08 , F24D17/0073 , Y10T137/0424
摘要： The invention relates to a method for automatic flushing of fluid lines, in particular potable water lines. The invention further relates to a device for automatic flushing of fluid lines, in particular potable water lines. The invention is based on the technical problem to provide a method and a device for automatic flushing which allows a flushing behaviour that is better-suited to the circumstances and more reliable. The technical problem is solved by a method for automatic flushing of at least one fluid line, in particular a potable water line, in which a temperature profile of the fluid is measured, in which the measured data are evaluated and in which the automatic flushing of the at least one fluid line is influenced by an outcome of the evaluation.
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公开(公告)号：US20120234398A1
公开(公告)日：2012-09-20
申请号：US13414990
申请日：2012-03-08
IPC分类号： B08B9/032
CPC分类号： E03B7/006 , B08B9/0325 , E03B7/08 , F24D17/0073 , Y10T137/0424
摘要： The invention relates to a method for automatic flushing of fluid lines, in particular potable water lines. The invention further relates to a device for automatic flushing of fluid lines, in particular potable water lines. The invention is based on the technical problem to provide a method and a device for automatic flushing which allows a flushing behaviour that is better-suited to the circumstances and more reliable. The technical problem is solved by a method for automatic flushing of at least one fluid line, in particular a potable water line, in which a temperature profile of the fluid is measured, in which the measured data are evaluated and in which the automatic flushing of the at least one fluid line is influenced by an outcome of the evaluation.
摘要翻译： 本发明涉及一种用于自动冲洗流体管线，特别是饮用水管线的方法。 本发明还涉及一种用于自动冲洗流体管线，特别是饮用水管线的装置。 本发明基于技术问题，提供一种自动冲洗的方法和装置，其允许更适合于环境和更可靠的冲洗行为。 技术问题通过一种用于自动冲洗至少一条流体管线，特别是饮用水管线的方法来解决，其中测量流体的温度分布，其中评估测量数据，并且其中自动冲洗 至少一条流体管线受到评估结果的影响。
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37.发明授权公开(公告)号：US08264695B2
公开(公告)日：2012-09-11
申请号：US13030748
申请日：2011-02-18
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
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38.发明授权公开(公告)号：US07936521B2
公开(公告)日：2011-05-03
申请号：US12684600
申请日：2010-01-08
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G02B13/18
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译： 对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波 具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形 元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
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公开(公告)号：US20080316500A1
公开(公告)日：2008-12-25
申请号：US12216106
申请日：2008-06-30
申请人： Stefan Schulte , Ulrich Andiel
发明人： Stefan Schulte , Ulrich Andiel
CPC分类号： G01B9/02039 , G01B9/02057 , G01B11/2441 , G01B2290/20 , G01M11/0264 , G01M11/0271
摘要： A method of manufacturing an optical element having an optical surface of a non-rotationally symmetric shape is described. Measuring light is generated using an interferometer optics, wherein the interferometer optics has at least one diffractive component having a grating. The optical surface is positioned at a first position relative to the diffractive component, wherein first measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one first interference pattern generated from first measuring light reflected from the optical surface is detected. The optical surface is positioned at a second position relative to the at least one diffractive component, wherein second measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one second interference pattern generated from second measuring light reflected from the optical surface is detected.
摘要翻译： 描述了具有非旋转对称形状的光学表面的光学元件的制造方法。 使用干涉仪光学器件生成测量光，其中干涉仪光学器件具有至少一个具有光栅的衍射元件。 光学表面位于相对于衍射部件的第一位置处，其中在衍射部件处衍射的第一测量光在其多个位置处入射到光学表面上，并且从第一测量光产生的至少一个第一干涉图案从 检测光学表面。 光学表面位于相对于至少一个衍射部件的第二位置，其中在衍射部件处衍射的第二测量光在其多个位置处入射到光学表面上，并且从第二测量光产生的至少一个第二干涉图案 检测从光学表面反射的光。
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40.发明授权公开(公告)号：US07274467B2
公开(公告)日：2007-09-25
申请号：US11027989
申请日：2005-01-04
申请人： Bernd Doerband , Stefan Schulte
发明人： Bernd Doerband , Stefan Schulte
IPC分类号： G01B11/02
CPC分类号： G03F7/706 , G01B9/02005 , G01B9/02038 , G01B9/02057 , G01B11/2441 , G01B2290/35 , G01M11/005 , G01M11/025 , G01M11/0271 , G03F1/26 , G03F1/84
摘要： A phase shifting interferometric method and apparatus comprises generating at least four different phase shifts and recording interferograms corresponding to the different phase settings and recording interferograms corresponding to the different phase settings. In the analysis of the recorded interferograms the generated phase shifts between the at least four different phase settings are determined from the measurement, i.e. from the recorded interferograms. A model simulating the interferogram intensities may be used for determining the phase shifts. The phase shifts are free adaptable parameters of the model.
摘要翻译： 相移干涉测量方法和装置包括产生至少四个不同的相移和记录对应于不同相位设置的干涉图并记录对应于不同相位设置的干涉图。 在记录的干涉图的分析中，从测量确定至少四个不同相位设置之间的所产生的相移，即从所记录的干涉图中确定。 可以使用模拟干涉图强度的模型来确定相移。 相移是模型的自由适应参数。
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