公开(公告)号：US07033444B1

公开(公告)日：2006-04-25

申请号：US09667770

申请日：2000-09-22

申请人： Mitsuaki Komino ,  Yasuharu Sasaki ,  Kyo Tsuboi ,  Hideaki Amano

发明人： Mitsuaki Komino ,  Yasuharu Sasaki ,  Kyo Tsuboi ,  Hideaki Amano

IPC分类号： C23C16/509 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01L21/67109 ,  C23C16/46 ,  H01J2237/2002

摘要： An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (44) therein. A cooling block (40) having a cooling jacket (58) is joined to the electrode unit (38) so as to cool the electrode unit. A heat resistant metal seal member (66A, 66B) seals an electrode-side heat transfer space (62, 64) formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means (94) supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200° C. and, for example, a range from 350° C. to 500° C., and the heat transfer gas does not leak.

摘要翻译： 一种在等离子体处理装置中使用的电极结构，其对能够形成真空的处理室（26）中的等离子体对待处理的物体（W）进行预定的处理。 电极单元（38）中具有加热器单元（44）。 具有冷却套（58）的冷却块（40）与电极单元（38）接合，以冷却电极单元。 耐热金属密封构件（66A，66B）密封形成在电极单元和冷却块之间的电极侧传热空间（62,64）。 电极侧传热气体供给装置（94）向电极侧传热空间供给传热气体。 因此，即使在高于200℃的温度和例如350℃至500℃的温度的高温范围内，电极侧传热空间的密封特性也不会劣化， 并且传热气体不会泄漏。

公开(公告)号：US4560755A

公开(公告)日：1985-12-24

申请号：US572419

申请日：1984-01-20

申请人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

发明人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

IPC分类号： C07D217/02 ,  C07D401/12 ,  A61K31/495

CPC分类号： C07D217/02

摘要： A 5-isoquinolinesulfonyl derivative of Formula (I): ##STR1## wherein l is zero or one;m and n each is an integer of one to nine;m+n is an integer of at least one;R.sub.1 is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group or an aryl group; orR.sub.2 and R.sub.3 each is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group, an aryl group or an aralkyl group;R.sub.2 and R.sub.3 are C.sub.1-6 alkylene groups and linked directly or through an oxygen atom to form a 5- to 7-membered heterocyclic ring with the adjacent nitrogen atom; or the ##STR2## wherein R.sub.4 and R.sub.5 each is a hydrogen atom, a C.sub.1-10 alkyl group, an aryl group or an aralkyl group and R.sub.6 is a hydrogen atom, a C.sub.1-10 alkyl group, an aryl group, an aralkyl group, a benzoyl group, a cinnamyl group, a cinnamoyl group, a furoyl group or a ##STR3## wherein R.sub.7 is a C.sub.1-8 alkyl group; and the pharmaceutically acceptable salt thereof; and a process for the preparation thereof. The compounds of this invention have a relaxatory action for vascular smooth muscle and are useful as a vasodilator and a hypotensor.

公开(公告)号：US4525589A

公开(公告)日：1985-06-25

申请号：US572418

申请日：1984-01-20

申请人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

发明人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

IPC分类号： C07D217/02 ,  C07D413/12

CPC分类号： C07D217/02

摘要： A 5-isoquinolinesulfonyl derivative of Formula (I): ##STR1## wherein l is zero or one;m and n each is an integer of one to nine;m+n is an integer of at least oneR.sub.1 is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group or an aryl group; orR.sub.2 and R.sub.3 each is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group, an aryl group or an aralkyl group;R.sub.2 and R.sub.3 are C.sub.1-6 alkylene groups and linked directly or through an oxygen atom to form a 5- to 7-membered heterocyclic ring with the adjacent nitrogen atom; orthe ##STR2## group is a ##STR3## group wherein R.sub.4 and R.sub.5 each is a hydrogen atom, a C.sub.1-10 alkyl group, an aryl group or an aralkyl group and R.sub.6 is a hydrogen atom, a C.sub.1-10 alkyl group, an aryl group, an aralkyl group, a benzoyl group, a cinnamyl group, a cinnamoyl group, a furoyl group or a ##STR4## group wherein R.sub.7 is a C.sub.1-8 alkyl group; and the pharmaceutically acceptable salt thereof; and a process for the preparation thereof. The compounds of this invention have a relaxatory action for vascular smooth muscle and are useful as a vasodilator and a hypotensor.

公开(公告)号：US4456757A

公开(公告)日：1984-06-26

申请号：US357770

申请日：1982-03-12

申请人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

发明人： Hiroyoshi Hidaka ,  Takanori Sone ,  Yasuharu Sasaki ,  Taisuke Sugihara

IPC分类号： C07D217/02 ,  A61K31/47 ,  C07D401/12 ,  C07D413/12

CPC分类号： C07D217/02

摘要： A 5-isoquinolinesulfonyl derivative of Formula (I): ##STR1## wherein l is zero or one;m and n each is an integer of one to nine;m+n is an integer of at least one;R.sub.1 is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group or an aryl group; orR.sub.2 and R.sub.3 each is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.5-6 cycloalkyl group, an aryl group or an aralkyl group;R.sub.2 and R.sub.3 are C.sub.1-6 alkylene groups and linked directly or through an oxygen atom to form a 5- to 7-membered heterocyclic ring with the adjacent nitrogen atom; orthe ##STR2## group is a ##STR3## group wherein R.sub.4 and R.sub.5 each is a hydrogen atom, a C.sub.1-10 alkyl group, an aryl group or an aralkyl group and R.sub.6 is a hydrogen atom, a C.sub.1-10 alkyl group, and aryl group, an aralkyl group, a benzoyl group, a cinnamyl group, a cinnamoyl group, a furoyl group or a ##STR4## group wherein R.sub.7 is a C.sub.1-8 alkyl group; and the pharmaceutically acceptable salt thereof; and a process for the preparation thereof. The compounds of this invention have a relaxatory action for vascular smooth muscle and are useful as a vasodilator and a hypotensor.

摘要翻译： 式（I）的5-异喹啉磺酰基衍生物：其中I为0或1; m和n各自为1至9的整数; m + n是至少一个的整数; R1是氢原子，C1-10烷基，C5-6环烷基或芳基; 或R 2和R 3各自为氢原子，C 1-10烷基，C 5-6环烷基，芳基或芳烷基; R2和R3是C1-6亚烷基，直接或通过氧原子与相邻氮原子形成5至7元杂环; 或者组是一个基团，其中R4和R5各自为氢原子，C1-10烷基，芳基或芳烷基，R6为氢原子，C1-10烷基， 芳基，芳烷基，苯甲酰基，肉桂基，肉桂酰基，糠酰基或ⅩⅩⅧ基，其中R 7为C 1-8烷基; 及其药学上可接受的盐; 及其制备方法。 本发明的化合物对于血管平滑肌具有松弛作用，并且可用作血管扩张剂和低血压。

公开(公告)号：US08981263B2

公开(公告)日：2015-03-17

申请号：US13513380

申请日：2010-12-08

申请人： Yasuharu Sasaki ,  Kenji Masuzawa ,  Toshiyuki Makabe ,  Mamoru Kosakai ,  Takashi Satou ,  Kazunori Ishimura ,  Ryuuji Hayahara ,  Hitoshi Kouno

发明人： Yasuharu Sasaki ,  Kenji Masuzawa ,  Toshiyuki Makabe ,  Mamoru Kosakai ,  Takashi Satou ,  Kazunori Ishimura ,  Ryuuji Hayahara ,  Hitoshi Kouno

IPC分类号： H05B3/68 ,  C23C16/00 ,  H01L21/683 ,  H01L21/67

CPC分类号： H01L21/6831 ,  H01J37/32642 ,  H01J2237/332 ,  H01J2237/338 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67248

摘要： Disclosed is an electrostatic chuck apparatus which is configured of: an electrostatic chuck section; an annular focus ring section provided to surround the electrostatic chuck section; and a cooling base section which cools the electrostatic chuck section and the focus ring section. The focus ring section is provided with an annular focus ring, an annular heat conducting sheet, an annular ceramic ring, a nonmagnetic heater, and an electrode section that supplies power to the heater.

摘要翻译： 公开了一种静电卡盘装置，其包括：静电卡盘部; 设置成围绕静电吸盘部分的环形聚焦环部分; 以及冷却静电吸盘部和聚焦环部的冷却基部。 聚焦环部分设置有环形聚焦环，环形导热片，环形陶瓷环，非磁性加热器和向加热器供电的电极部分。

公开(公告)号：US08823404B2

公开(公告)日：2014-09-02

申请号：US13014290

申请日：2011-01-26

申请人： Yasuharu Sasaki

发明人： Yasuharu Sasaki

IPC分类号： G01R31/00 ,  G01R31/327 ,  G21K5/10 ,  G01J1/00

CPC分类号： H01L21/67248 ,  H01L21/67109

摘要： There are provided an evaluation device and an evaluation method for a substrate mounting apparatus capable of simply evaluating a temperature control function of the substrate mounting apparatus depending on evaluation conditions or circumstances and an evaluation substrate used for the same. The substrate mounting apparatus holds a target substrate mounted on a mounting surface and controls a temperature of the target substrate. The evaluation device includes an evacuable airtight chamber in which the substrate mounting apparatus is provided; an evaluation substrate which is mounted on the mounting surface instead of the target substrate and includes a self-heating resistance heater; and a temperature measurement unit which measures a temperature of the evaluation substrate.

摘要翻译： 提供了一种用于能够根据评估条件或环境简单地评价基板安装装置的温度控制功能的基板安装装置的评估装置和评估方法以及用于其的评估基板。 基板安装装置保持安装在安装面上的目标基板，并控制目标基板的温度。 评估装置包括可抽出的气密室，其中设置有基板安装装置; 评价基板，其安装在安装面上而不是目标基板，并且包括自加热电阻加热器; 以及测量评价基板的温度的温度测量单元。

公开(公告)号：US20100071850A1

公开(公告)日：2010-03-25

申请号：US12560924

申请日：2009-09-16

申请人： Shinji HIMORI ,  Yasuharu Sasaki

发明人： Shinji HIMORI ,  Yasuharu Sasaki

IPC分类号： H01L21/465

CPC分类号： H01L21/6833 ,  H01J37/32091

摘要： A mounting table for use in a plasma processing apparatus, on which a substrate is mounted, includes: a conductive member connected to a high frequency power supply and a high frequency power supply; a dielectric layer embedded in a central portion on an upper surface of the conductive member; and an electrostatic chuck mounted on the dielectric layer. Further, the electrostatic chuck is connected to a high voltage DC power supply and includes an electrode film satisfying following conditions: δ/z≧85 (where δ=(ρv/(μπf))1/2) and, a surface resistivity of the substrate>a surface resistivity of a central portion of the electrode film.

摘要翻译： 一种用于安装有基板的等离子体处理装置的安装台，包括：连接到高频电源和高频电源的导电构件; 介电层，其嵌入在所述导电部件的上表面的中央部; 以及安装在电介质层上的静电卡盘。 此外，静电卡盘连接到高压直流电源，并且包括满足以下条件的电极膜：δ/z≥85（其中δ=（＆rgr; v /（μ＆pgr; f））1/2），并且 基板的表面电阻率>电极膜的中心部分的表面电阻率。

公开(公告)号：US07582491B2

公开(公告)日：2009-09-01

申请号：US11925190

申请日：2007-10-26

申请人： Yasuharu Sasaki ,  Taketoshi Okajo

发明人： Yasuharu Sasaki ,  Taketoshi Okajo

IPC分类号： H01L21/66

CPC分类号： H01L21/67248 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/6831

摘要： A method for diagnosing temporal deterioration of temperature controlling performance of an electrostatic chuck includes the steps of performing vacuum processing on the substrate wherein the substrate is adsorbed by the electrostatic chuck while a temperature control gas for controlling a temperature of the substrate is supplied between the substrate and the electrostatic chuck, and exposing, during the above step, a substrate absorbed by the electrostatic chuck to an atmosphere generated by using a processing recipe for diagnosis, detecting a temperature of the substrate. A pressure of the temperature control gas is controlled such that the detected temperature becomes a specific temperature, and the controlled pressure is stored in a storage unit. The method further includes a step of diagnosing the deterioration of the temperature controlling performance of the electrostatic chuck based on the pressure of the temperature control gas stored in the storage unit.

摘要翻译： 用于诊断静电卡盘的温度控制性能的时间劣化的方法包括以下步骤：在衬底上进行真空处理，其中衬底被静电吸盘吸附，而用于控制衬底温度的温度控制气体被提供在衬底 和静电卡盘，并且在上述步骤期间，将由静电卡盘吸收的基板暴露于通过使用用于诊断的处理配方产生的气氛，检测基板的温度。 控制温度控制气体的压力，使得检测到的温度成为特定温度，并将受控压力存储在存储单元中。 该方法还包括基于存储在存储单元中的温度控制气体的压力来诊断静电卡盘的温度控制性能的劣化的步骤。

公开(公告)号：US20090199967A1

公开(公告)日：2009-08-13

申请号：US12365385

申请日：2009-02-04

申请人： Shinji Himori ,  Yasuharu Sasaki ,  Masakazu Higuma

发明人： Shinji Himori ,  Yasuharu Sasaki ,  Masakazu Higuma

IPC分类号： C23F1/08

CPC分类号： H01L21/6833 ,  H01J37/20 ,  H01J37/32091 ,  H01J2237/0209 ,  H02N13/00

摘要： A mounting stage for a plasma processing apparatus that can prevent degradation of an insulating film in a semiconductor device on a substrate. A conductor member is connected to a radio-frequency power source for producing plasma. A dielectric layer is buried in a central portion of an upper surface of the conductor member. An electrostatic chuck is mounted on the dielectric layer. The electrostatic chuck has an electrode film that satisfies the following condition: δ/z≧85 where δ=(ρv/(μπf))1/2 where z is the thickness of the electrode film, δ is the skin depth of the electrode film with respect to radio-frequency electrical power supplied from the radio-frequency power source, f is the frequency of the radio-frequency electrical power, π is the ratio of a circumference of a circle to its diameter, μ is the magnetic permeability of the electrode film, and ρv is the specific resistance of the electrode film.

摘要翻译： 一种等离子体处理装置的安装平台，其能够防止基板上的半导体装置中的绝缘膜的劣化。 导体构件连接到用于产生等离子体的射频电源。 电介质层埋在导体部件的上表面的中心部分。 静电卡盘安装在电介质层上。 静电吸盘具有满足以下条件的电极膜：<？in-line-formula description =“In-line formula”end =“lead”？> delta / z> = 85 <？in-line-formula description = “直线公式”end =“tail”？>其中delta =（rhov /（mupif））1/2其中z是电极膜的厚度，delta是电极膜相对于放射线的厚度， f是射频电力的频率，pi是圆周长与其直径的比率，μ是电极膜的导磁率，rhov 是电极膜的电阻率。

公开(公告)号：USD587222S1

公开(公告)日：2009-02-24

申请号：US29276663

申请日：2007-02-01

申请人： Yasuharu Sasaki ,  Mamoru Kosakai

设计人： Yasuharu Sasaki ,  Mamoru Kosakai