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公开(公告)号:US11948871B2
公开(公告)日:2024-04-02
申请号:US17325197
申请日:2021-05-19
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Benjamin Stassen Cook , Yogesh Kumar Ramadass , Salvatore Frank Pavone , Mahmud Halim Chowdhury
IPC: H01L23/495 , H01L23/00
CPC classification number: H01L23/49589 , H01L23/4951 , H01L23/49524 , H01L24/32 , H01L24/73 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/92 , H01L2224/11462 , H01L2224/13147 , H01L2224/13564 , H01L2224/1357 , H01L2224/16245 , H01L2224/32265 , H01L2224/73203 , H01L2224/73253 , H01L2224/9211 , H01L2924/19015 , H01L2924/19041 , H01L2924/19103 , H01L2924/19104
Abstract: Disclosed embodiments include an integrated circuit (IC) comprising a silicon wafer, first and second conductive lines on the silicon wafer. There are first, second and third insulation blocks with portions on the first and second conductive lines and the silicon wafer, a metal pillar on the surface of the first conductive line opposite the silicon wafer, and a conductive adhesive block on the surface of the second conductive line opposite the silicon wafer. The IC also has a lead frame having first and second leads, and a capacitor having first and second capacitor terminals in which the first capacitor terminal is connected to the second lead using conductive adhesive, the second capacitor terminal is connected to the second conductive line through the conductive adhesive block, and the first lead is coupled to the first conductive line.
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公开(公告)号:US11594504B2
公开(公告)日:2023-02-28
申请号:US17234429
申请日:2021-04-19
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
Abstract: A packaged semiconductor die includes a semiconductor die coupled to a die pad. The semiconductor die has a front side containing copper leads, a copper seed layer coupled to the copper leads, and a nickel alloy coating coupled to the copper seed layer. The nickel alloy includes tungsten and cerium (NiWCe). The packaged semiconductor die may also include wire bonds coupled between leads of a lead frame and the copper leads of the semiconductor die. In addition, the packaged semiconductor die may be encapsulated in molding compound. A method for fabricating a packaged semiconductor die. The method includes forming a copper seed layer over the copper leads of the semiconductor die. In addition, the method includes coating the copper seed layer with a nickel alloy. The method also includes singulating the semiconductor wafer to create individual semiconductor die and placing the semiconductor die onto a die pad of a lead frame.
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公开(公告)号:US20220375836A1
公开(公告)日:2022-11-24
申请号:US17325197
申请日:2021-05-19
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Benjamin Stassen Cook , Yogesh Kumar Ramadass , Salvatore Frank Pavone , Mahmud Halim Chowdhury
IPC: H01L23/495 , H01L23/00
Abstract: Disclosed embodiments include an integrated circuit (IC) comprising a silicon wafer, first and second conductive lines on the silicon wafer. There are first, second and third insulation blocks with portions on the first and second conductive lines and the silicon wafer, a metal pillar on the surface of the first conductive line opposite the silicon wafer, and a conductive adhesive block on the surface of the second conductive line opposite the silicon wafer. The IC also has a lead frame having first and second leads, and a capacitor having first and second capacitor terminals in which the first capacitor terminal is connected to the second lead using conductive adhesive, the second capacitor terminal is connected to the second conductive line through the conductive adhesive block, and the first lead is coupled to the first conductive line.
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公开(公告)号:US20220157698A1
公开(公告)日:2022-05-19
申请号:US17098930
申请日:2020-11-16
Applicant: Texas Instruments Incorporated
Inventor: Christopher Daniel Manack , Jonathan Andrew Montoya , Jovenic Romero Esquejo , Salvatore Frank Pavone
IPC: H01L23/495 , H01L23/498 , H01L23/00 , H01L23/31 , H01L21/50 , H01L21/768
Abstract: A semiconductor package includes an IC having circuitry configured for at least one function with some nodes connected to bond pads, with first metal posts on the bond pads, and dome support metal posts configured in a ring having a top rim defining an inner cavity with solder on the top rim and extending over an area of the inner cavity for providing a solder dome that covers the inner cavity to provide a covered air cavity over a portion of the circuitry. A leadframe includes a plurality of leads or lead terminals. The IC is flipchip attached with a solder connection to the leadframe so that the first metal posts are attached to the leads or the lead terminals. A mold compound provides encapsulation for the semiconductor package except on at least a bottom side of the leads or lead terminals.
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公开(公告)号:US11011488B2
公开(公告)日:2021-05-18
申请号:US16660187
申请日:2019-10-22
Applicant: Texas Instruments Incorporated
Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
IPC: H01L23/00 , H01L23/495 , B23K1/00 , C25D7/12 , C25D3/22 , B23K101/36 , C25D3/12
Abstract: A microelectronic device has bump bond structures on input/output (I/O) pads. The bump bond structures include copper-containing pillars, a barrier layer including cobalt and zinc on the copper-containing pillars, and tin-containing solder on the barrier layer. The barrier layer includes 0.1 weight percent to 50 weight percent cobalt and an amount of zinc equivalent to a layer of pure zinc 0.05 microns to 0.5 microns thick. A lead frame has a copper-containing member with a similar barrier layer in an area for a solder joint. Methods of forming the microelectronic device are disclosed.
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公开(公告)号:US11011483B2
公开(公告)日:2021-05-18
申请号:US15901631
申请日:2018-02-21
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
Abstract: A packaged semiconductor die includes a semiconductor die coupled to a die pad. The semiconductor die has a front side containing copper leads, a copper seed layer coupled to the copper leads, and a nickel alloy coating coupled to the copper seed layer. The nickel alloy includes tungsten and cerium (NiWCe). The packaged semiconductor die may also include wire bonds coupled between leads of a lead frame and the copper leads of the semiconductor die. In addition, the packaged semiconductor die may be encapsulated in molding compound. A method for fabricating a packaged semiconductor die. The method includes forming a copper seed layer over the copper leads of the semiconductor die. In addition, the method includes coating the copper seed layer with a nickel alloy. The method also includes singulating the semiconductor wafer to create individual semiconductor die and placing the semiconductor die onto a die pad of a lead frame. In addition the method includes wire bonding the leads of a lead frame to the copper leads of the semiconductor die and then encapsulating the die in molding compound.
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公开(公告)号:US20210028060A1
公开(公告)日:2021-01-28
申请号:US17038947
申请日:2020-09-30
Applicant: Texas Instruments Incorporated
Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
IPC: H01L21/768 , H01L23/00 , H01L23/532
Abstract: Described examples provide microelectronic devices and fabrication methods, including fabricating a contact structure by forming a titanium or titanium tungsten barrier layer on a conductive feature, forming a tin seed layer on the barrier layer, forming a copper structure on the seed layer above the conductive feature of the wafer or die, heating the seed layer and the copper structure to form a bronze material between the barrier layer and the copper structure, removing the seed layer using an etching process that selectively removes an exposed portion of the seed layer, and removing an exposed portion of the barrier layer.
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公开(公告)号:US20200251257A1
公开(公告)日:2020-08-06
申请号:US16854839
申请日:2020-04-21
Applicant: Texas Instruments Incorporated
Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
Abstract: A nanostructure barrier for copper wire bonding includes metal grains and inter-grain metal between the metal grains. The nanostructure barrier includes a first metal selected from nickel or cobalt, and a second metal selected from tungsten or molybdenum. A concentration of the second metal is higher in the inter-grain metal than in the metal grains. The nanostructure barrier may be on a copper core wire to provide a coated bond wire. The nanostructure barrier may be on a bond pad to form a coated bond pad. A method of plating the nanostructure barrier using reverse pulse plating is disclosed. A wire bonding method using the coated bond wire is disclosed.
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公开(公告)号:US10566267B2
公开(公告)日:2020-02-18
申请号:US15984343
申请日:2018-05-19
Applicant: Texas Instruments Incorporated
Inventor: Christopher Daniel Manack , Nazila Dadvand , Salvatore Frank Pavone
IPC: H01L23/495 , H01L23/49 , H01L23/492 , H01L23/532 , H01L23/00
Abstract: A microelectronic device is formed by thinning a substrate of the microelectronic device from a die attach surface of the substrate, and forming a copper-containing layer on the die attach surface of the substrate. A protective metal layer is formed on the copper-containing layer. Subsequently, the copper-containing layer is attached to a package member having a package die mount area. The protective metal layer may optionally be removed prior to attaching the copper-containing layer to the package member. Alternatively, the protective metal layer may be left on the copper-containing layer when the copper-containing layer is attached to the package member. A structure formed by the method is also disclosed.
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公开(公告)号:US20200020656A1
公开(公告)日:2020-01-16
申请号:US16580973
申请日:2019-09-24
Applicant: Texas Instruments Incorporated
Inventor: Nazila Dadvand , Salvatore Frank Pavone , Christopher Daniel Manack
Abstract: A microelectronic device includes a reflow structure. The reflow structure has a copper-containing member and a solder member, and a barrier layer between them. The barrier layer has metal grains, with a diffusion barrier filler between the metal grains. The metal grains include at least a first metal and a second metal, each selected from nickel, cobalt, lanthanum, and cerium, with each having a concentration in the metal grains of at least 10 weight percent. The diffusion barrier filler includes at least a third metal, selected from tungsten and molybdenum. A combined concentration of tungsten and molybdenum in the diffusion barrier filler is higher than in the metal grains to provide a desired resistance to diffusion of copper. The barrier layer includes 2 weight percent to 15 weight percent of the combined concentration of tungsten, and molybdenum. A bump bond structure and a lead frame package are disclosed.
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