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公开(公告)号：US07619870B2
公开(公告)日：2009-11-17
申请号：US11834994
申请日：2007-08-07
申请人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
发明人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
IPC分类号： H01T23/00
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes an electrostatic chuck section including a substrate and a power supply terminal for applying a DC voltage to an electrostatic-adsorption inner electrode; and a metal base section fixed to the other main surface of the electrostatic chuck section. Here, a concave portion is formed in the main surface of the metal base section facing the electrostatic chuck section and a dielectric plate is fixed to the concave portion. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric constant of the insulating adhesive bonding layer is smaller than that of any one of the dielectric plate and the substrate.
摘要翻译： 静电吸盘装置包括：静电吸盘部，其包括基板和用于向静电吸附内部电极施加直流电压的电源端子; 以及固定在静电吸盘部的另一个主面上的金属基部。 这里，在面向静电卡盘部的金属基部的主面上形成有凹部，电介质板固定在凹部。 电介质板和静电卡盘部分之间插入绝缘粘合剂粘合层彼此粘合。 电介质板和凹部通过绝缘性粘合剂层粘合而彼此接合。 绝缘粘合剂接合层的介电常数小于介质板和基板中的任何一种的介电常数。
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公开(公告)号：US20080156956A1
公开(公告)日：2008-07-03
申请号：US12002214
申请日：2007-12-14
CPC分类号： G02B26/026 , G02B7/182 , G02B17/0663 , H04N5/7408 , H04N9/3141
摘要： Pressure spring pieces elastically bias a free-form curved mirror such that the free-form curved mirror is pressed against positioning sections and positioned thereby. Displacement restricting sections are disposed opposite to the pressure spring pieces with respect to the free-form curved mirror in biasing directions of the pressure spring pieces with gaps. The gaps are set such that deformation of the pressure spring pieces remain within an elastic range when the free-form curved mirror moves against biasing forces of the pressure spring pieces to come into contact with the displacement restricting sections.
摘要翻译： 压力弹簧件弹性地偏置自由曲面镜，使得自由曲面镜被压靠在定位部分上并由此定位。 位移限制部分相对于自由曲面镜在压力弹簧片的间隙的偏压方向上与压力弹簧片相对设置。 设定间隙，使得当自由曲面镜抵抗压力弹簧片的偏置力抵抗与位移限制部分接触时，压力弹簧片的变形保持在弹性范围内。
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33.发明授权公开(公告)号：US07360906B2
公开(公告)日：2008-04-22
申请号：US11244546
申请日：2005-10-06
申请人： Satoshi Onishi , Atsushi Matsuura , Kohei Wataru
发明人： Satoshi Onishi , Atsushi Matsuura , Kohei Wataru
IPC分类号： G03B21/14 , G03B21/22 , G03B21/28 , G03B21/18 , G03B21/26 , G03B21/56 , G02B27/14 , G02B5/10
CPC分类号： G03B21/10 , G03B21/145 , G03B21/28 , H04N9/3141
摘要： A projection optical system unit has a lower pedestal. The lower pedestal has first and second tubular portions opened to each other. An image formation device holding plate for a DMD is mounted on the first tubular portion at a side where one opening is formed. A mirror holder for a convex mirror is fixed on the second tubular portion at a side where the other opening is formed. A linear heat expansion coefficient in a specific direction of the lower pedestal component is set between 0.8×10−5 (1/K) and 3.0×10−5 (1/K).
摘要翻译： 投影光学系统单元具有下基座。 下基座具有彼此敞开的第一和第二管状部分。 用于DMD的图像形成装置保持板安装在形成有一个开口的一侧的第一管状部分上。 用于凸面镜的反射镜保持器固定在形成另一个开口的一侧的第二管状部分上。 在下基座部件的特定方向上的线性热膨胀系数设定在0.8×10 -5（1 / K）至3.0×10 -5（1 / K） 。
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34.发明申请公开(公告)号：US20080041312A1
公开(公告)日：2008-02-21
申请号：US11889339
申请日：2007-08-10
IPC分类号： C23C16/458
CPC分类号： C23C16/4586 , H01J37/20 , H01J37/32091 , H01J37/32706 , H01J2237/2002 , H01L21/6833 , H01L21/68757
摘要： [Object]To provide a stage for plasma processing apparatus, the stage being capable of improving uniformity of electric field strength in a plasma so as to enhance an in-plane uniformity of a plasma process to a substrate, and to provide a plasma processing apparatus provided with this stage. [Means for Solving the Problem]A stage 3 for a plasma processing apparatus 2 comprises: a conductive member 31 connected to a radiofrequency power source, the conductive member serving as an electrode for generating a plasma and/or an electrode for drawing ions from a plasma; a dielectric layer 32 covering a central part of an upper surface of the conductive member, for making uniform a radiofrequency electric field applied to a plasma through a substrate to be processed wafer W) placed on the placing surface; and an electrostatic chuck 33 laminated on the dielectric layer 35, the electrostatic chuck having an electrode film embedded therein. The electrode film satisfies δ/z≧1,000 (z; a thickness of the electrode film 35, 6; a skin depth of the electrode film for the electrostatic chuck as to a radiofrequency power supplied from the radiofrequency power source).
摘要翻译： 为了提供等离子体处理装置的载物台，能够提高等离子体的电场强度的均匀性，从而提高等离子体处理对基板的面内均匀性，并且提供等离子体处理装置 提供这个阶段。 解决问题的手段等离子体处理装置2的阶段3包括：连接到射频电源的导电构件31，用作产生等离子体的电极的导电构件和/或用于从 等离子体; 覆盖导电部件的上表面的中心部分的电介质层32，用于使放置在放置面上的待处理晶片W的等离子体的射频电场均匀化; 以及层压在电介质层35上的静电卡盘33，其中嵌有电极膜的静电卡盘。 电极膜满足delta / z> = 1,000（z;电极膜35,6的厚度;静电卡盘的电极膜的表皮深度，从射频电源提供的射频电力）。
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公开(公告)号：US20070297066A1
公开(公告)日：2007-12-27
申请号：US11809808
申请日：2007-06-01
申请人： Satoshi Onishi , Minoru Fujita , Atsushi Matsuura
发明人： Satoshi Onishi , Minoru Fujita , Atsushi Matsuura
CPC分类号： G02B17/0848 , G02B27/64 , G03B21/14 , G03B21/28 , G09G3/002 , G09G3/007 , G09G2320/041
摘要： An optical device vibrator has a driving mechanism and a controller. The driving mechanism repeatedly changes position or angle of an optical device in predetermined cycles in order to vibrate the optical device. The controller controls driving of the driving mechanism and changes a setting for the position or angle serving as a reference for the repeated change based on predetermined correction information.
摘要翻译： 光学装置振动器具有驱动机构和控制器。 驱动机构以预定的周期重复地改变光学装置的位置或角度，以使光学装置振动。 控制器控制驱动机构的驱动，并且基于预定的校正信息改变用于重复改变的参考的位置或角度的设置。
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公开(公告)号：US20060221309A1
公开(公告)日：2006-10-05
申请号：US11392178
申请日：2006-03-29
CPC分类号： G03B21/10 , G03B21/14 , G03B21/16 , G03B21/2053 , G03B21/28 , H04N5/7458
摘要： A projection type of image displaying apparatus, comprising: a projection optical system for projecting an image light from an image forming element on a screen, the projection optical system having at least three curved mirrors; and a variable aperture mechanism disposed between a first curved mirror from the image forming element and a second curved mirror in the projection optical system, the variable mechanism entering and retreating a light shielding plate with respect to a projection light path to vary the light intensity of the image light.
摘要翻译： 一种投影型图像显示装置，包括：投影光学系统，用于将来自图像形成元件的图像光投影在屏幕上，所述投影光学系统具有至少三个弯曲镜; 以及设置在来自图像形成元件的第一曲面镜和投影光学系统中的第二曲面镜之间的可变光阑机构，所述可变机构相对于投影光路进入和退回遮光板，以改变光强度 图像灯。
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公开(公告)号：US5305916A
公开(公告)日：1994-04-26
申请号：US986276
申请日：1992-12-07
CPC分类号： A47K5/1217 , B65B39/004
摘要： In a pump, a piston rod is mounted for lost motion on a piston head so that when the piston rod 31 is advanced by a full stroke in a forward direction from a fully retracted position, only the piston rod moves for an initial stroke portion S2, then a piston head is also advanced with the piston rod for a final stroke portion which is equivalent to a difference between the full stroke S1 and initial stroke portion S2 (S3=S1-S2), and a liquid inside said cylinder is expelled from the exhaust port by a quantity corresponding the final stroke portion S3. When the piston rod is being withdrawn in the return direction, only the piston rod is moved during the initial stroke portion causing residual liquid in a passageway from the cylinder to the exhaust port to be sucked back to the cylinder.
摘要翻译： 在泵中，活塞杆安装成活塞头上的空动作，使得当活塞杆31从完全缩回位置沿向前方向前进一整行程时，只有活塞杆移动用于初始行程部分S2 然后，活塞头也随着活塞杆前进，最终行程部分等于全行程S1和初始冲程部分S2之间的差值（S3 = S1-S2），并且所述气缸内的液体被排出 排气口与最终冲程部分S3对应的量。 当活塞杆在返回方向上被拉出时，只有活塞杆在初始冲程部分移动，导致从气缸到排气口的通道中的残留液体被吸回到气缸。
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公开(公告)号：US07798655B2
公开(公告)日：2010-09-21
申请号：US11823244
申请日：2007-06-27
申请人： Atsushi Matsuura , Shinichi Suzuki
发明人： Atsushi Matsuura , Shinichi Suzuki
IPC分类号： G03B21/28
摘要： A projection unit 17 effectively corrects out of focus due to a temperature rise. A mirror holding mechanism of a concave mirror 25 has a mirror holder 41 and a mirror holder base 42. The concave mirror 25 is slidably housed in the mirror holder 41. A focus correction member 57, which expands by heat, is disposed between a back face of the concave mirror 25 and reference plane S formed in the mirror holder. The concave mirror 25 and the focus correction element 57 are urged to the reference plane S by a mirror retainer spring 59.
摘要翻译： 投影单元17由于温度上升而有效地校正了焦点偏离。 凹面镜25的反射镜保持机构具有镜支架41和镜保持器基座42.凹面镜25可滑动地容纳在反射镜保持器41中。通过热量膨胀的聚焦校正部件57设置在背面 凹面镜25的表面和形成在镜保持器中的基准面S。 凹面镜25和聚焦校正元件57被反射镜保持弹簧59推压到基准面S。
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39.发明申请公开(公告)号：US20070284085A1
公开(公告)日：2007-12-13
申请号：US11797626
申请日：2007-05-04
IPC分类号： F28F7/00
CPC分类号： H01J37/32009 , H01J37/32082 , H01J37/32532
摘要： Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion communicates with atmospheric air outside the processing container.
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40.发明申请Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod 有权等离子体处理装置，电极单元，馈线构件和射频馈线棒公开(公告)号：US20050023254A1
公开(公告)日：2005-02-03
申请号：US10927587
申请日：2004-08-27
CPC分类号： H01J37/32009 , H01J37/32082 , H01J37/32532
摘要： The present invention relates to a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus of the present invention includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion is communicated with an atmospheric air outside the processing container.
摘要翻译： 等离子体处理装置技术领域本发明涉及一种等离子体处理装置，其将处理气体引入到气密处理容器中，该处理容器应用射频功率以产生等离子体，并且将等离子体处理传送到处理容器中布置的被处理物体。 本发明的等离子体处理装置包括：布置在处理容器中的电极单元，具有用于施加射频功率的电极的电极单元和布置在电极单元中的空间部分，绝缘电极和 处理容器彼此。 空间部分与处理容器外部的大气连通。
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