公开(公告)号：US5443646A

公开(公告)日：1995-08-22

申请号：US322106

申请日：1994-10-12

申请人： Yuka Yamada ,  Katsuhiko Mutoh

发明人： Yuka Yamada ,  Katsuhiko Mutoh

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/48 ,  C23C16/52 ,  H01L21/205 ,  H01L21/31

CPC分类号： C23C16/487 ,  C23C16/483 ,  C23C16/488 ,  C23C16/52

摘要： A thin film is formed on a substrate in a reaction chamber using a photo CVD technique by decomposing a reactive gas supplied to the reaction chamber by means of light irradiated through a light introducing window. The reduction in film deposition rate due to clouding of the light introducing window is corrected in order to form a thin film of a desired film thickness.

摘要翻译： 使用光CVD技术在反应室中的基板上形成薄膜，通过用通过光导入窗照射的光分解提供给反应室的反应气体。 校正由于光引入窗口的混浊引起的成膜速度的降低，以便形成所需膜厚度的薄膜。

公开(公告)号：US08119242B2

公开(公告)日：2012-02-21

申请号：US12300179

申请日：2007-05-22

申请人： Takashi Iseki ,  Yuka Yamada ,  Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hiroyuki Mori ,  Toshio Horie ,  Ken-ichi Suzuki ,  Gaku Kitahara

发明人： Takashi Iseki ,  Yuka Yamada ,  Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hiroyuki Mori ,  Toshio Horie ,  Ken-ichi Suzuki ,  Gaku Kitahara

IPC分类号： B32B9/00

CPC分类号： C23C16/26 ,  H01M8/0206 ,  H01M8/0213 ,  H01M8/0228 ,  Y02P70/56 ,  Y10T428/30 ,  Y10T428/31504 ,  Y10T428/31678

摘要： The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.

摘要翻译： 本发明的无定形碳膜是含有碳和氢的无定形碳膜，其中无定形碳膜含有不超过30原子％（不包括0％）的氢，当碳的总量为100时 原子％，具有sp2混合轨道的碳以不小于70原子％且小于100原子％的量存在。 通过控制氢，Csp3等的含量来增加包含Csp2的结构，赋予无定形碳膜的电导率。 该无定形碳膜可以通过使用含有一种或多种气体的反应气体等离子体CVD形成，所述气体选自含有sp2混合轨道的碳的碳环化合物气体和含有sp2混合轨道和硅的碳的杂环化合物气体和/或 氮。 通过在基板的表面上形成非晶碳膜，可以获得导电部件。

公开(公告)号：US07145320B2

公开(公告)日：2006-12-05

申请号：US10762308

申请日：2004-01-23

申请人： Takehito Yoshida ,  Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada

发明人： Takehito Yoshida ,  Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada

IPC分类号： G01N27/00 ,  G01N27/62

CPC分类号： G01N15/0656

摘要： A particle counter counts particles in aerosol having a particle size of from 2 nm to 50 nm in an operating pressure range from an atmospheric pressure through a reduced pressure to a low vacuum and calculate a particle size distribution. The particle counter charges particles in the aerosol and applies an electrostatic field thereto, and mixes the aerosol with a non-charged sheath gas flow shaped like a laminar flow whereby the respective particles separate into traces depending on their particle size where they can be counted. Further, by using an electron multiplier for exciting cluster ions to detect the charged particles and operating it as a high-pass filter, even if the number density of the particles is small, it is possible to effectively count the particles.

摘要翻译： 颗粒计数器在从大气压至减压至低真空的操作压力范围内，计算粒径为2nm至50nm的气溶胶中的颗粒，并计算出粒度分布。 颗粒计数器对气溶胶中的颗粒进行充电并对其施加静电场，并将气溶胶与形成为层流的非充电鞘气流混合，由此各个颗粒根据颗粒尺寸分离成痕迹，在那里它们可以被计数。 此外，通过使用电子倍增器激发簇离子来检测带电粒子并将其作为高通滤波器进行操作，即使粒子的数量密度小，也可以有效地计数粒子。

公开(公告)号：US20050000792A1

公开(公告)日：2005-01-06

申请号：US10898967

申请日：2004-07-27

申请人： Yuka Yamada ,  Masa-aki Suzuki ,  Nobuyasu Suzuki ,  Hidehiro Sasaki ,  Yasunori Morinaga

发明人： Yuka Yamada ,  Masa-aki Suzuki ,  Nobuyasu Suzuki ,  Hidehiro Sasaki ,  Yasunori Morinaga

IPC分类号： B01J19/12 ,  B01J21/06 ,  B01J23/46 ,  B01J35/00 ,  B01J35/02 ,  B01J37/02 ,  C01B3/04 ,  C01B13/02 ,  C02F1/30 ,  B01J19/08 ,  C07C5/00 ,  C07C6/00

CPC分类号： B01J21/063 ,  B01J19/127 ,  B01J23/462 ,  B01J35/004 ,  B01J35/023 ,  B01J37/0248 ,  B01J2219/0877 ,  B01J2219/0892 ,  B01J2219/1203 ,  C01B3/042 ,  C01B13/0207 ,  C02F1/30 ,  C02F2103/42 ,  C02F2305/10 ,  Y02E60/364 ,  Y02E60/366 ,  Y02P20/134

摘要： The present invention provides a water photolysis system comprising: a casing 1 into which incident sunlight L can enter from the outside and a photolytic layer 5 which is disposed inside the casing 1; wherein the photolytic layer 5 has a light-transmissive porous material 51 and photocatalyst particles 52 supported thereon; a water layer 4 containing water in its liquid state is disposed below the photolytic layer 5 with a first space 6 disposed between the water layer and the photolytic layer; a sealed second space 7 is formed above the photolytic layer 5 in the casing 1; vapor generated from the water layer 4 is introduced into the photolytic layer 5 via the first space 6; and the vapor is decomposed into hydrogen and oxygen by the photocatalyst particles 52, which are excited by the sunlight L.

摘要翻译： 本发明提供了一种水分解系统，包括：入射太阳光L可以从外部进入的壳体1和设置在壳体1内部的光解层5; 其中，所述光分解层5具有透光性多孔质材料51和支撑在其上的光催化剂粒子52。 将含有液态水的水层4设置在光解层5下方，第一空间6设置在水层和光解层之间; 密封的第二空间7形成在壳体1中的光解层5的上方; 从水层4产生的蒸汽经由第一空间6被引入光解层5; 并且通过由太阳光L激发的光催化剂颗粒52将蒸汽分解成氢和氧。

公开(公告)号：US06814239B2

公开(公告)日：2004-11-09

申请号：US10076070

申请日：2002-02-15

申请人： Nobuyasu Suzuki ,  Takehito Yoshida ,  Toshiharu Makino ,  Yuka Yamada

发明人： Nobuyasu Suzuki ,  Takehito Yoshida ,  Toshiharu Makino ,  Yuka Yamada

IPC分类号： B07B100

CPC分类号： C23C14/228 ,  C23C14/28 ,  G01N15/06 ,  G01N15/065 ,  G01N15/0656

摘要： An apparatus for producing high-purity standard particles produces nanometer-sized high-purity standard particles of monodispersive uniform structure efficiently, with the abatement of contamination and damage. The apparatus includes a particle generation chamber, a particle classification chamber and a particle collecting chamber. The particle generation chamber excites a semiconductor target with pulse laser beam under a low-pressure rare gas ambient so as to detach and eject materials from the target into the ambient gas, in which those materials are condensed and grow into high-purity particles. The particle classification chamber subjects the high-purity particles as generated to classification, and the particles collecting chamber collects high-purity standard particles as classified onto a substrate.

公开(公告)号：US06730934B2

公开(公告)日：2004-05-04

申请号：US09725486

申请日：2000-11-30

申请人： Yuka Yamada ,  Takehito Yoshida ,  Shigeru Takeyama ,  Yuji Matsuda ,  Katsuhiko Mutoh

发明人： Yuka Yamada ,  Takehito Yoshida ,  Shigeru Takeyama ,  Yuji Matsuda ,  Katsuhiko Mutoh

IPC分类号： H01L2715

CPC分类号： H01L33/26 ,  H01L31/1804 ,  H01L33/0054 ,  H01L33/18 ,  Y02E10/547 ,  Y02P70/521 ,  Y10T428/25 ,  Y10T428/258

摘要： This invention relates an optoelectronic material comprising a uniform medium with a controllable electric characteristic; and semiconductor ultrafine particles dispersed in the medium and having a mean particle size of 100 nm or less, and an application device using the same. This invention also relates to a method of manufacturing an optoelectronic material by irradiating a laser beam onto a first target of a semiconductor material, placed in a reaction chamber in low pressure rare gas ambient, and a second target of a medium material with a controllable electric characteristic, placed in the reaction chamber, condensing/growing a semiconductor material ablated from the first target to be collected as ultrafine particles having a mean particle size of 100 nm or smaller on a substrate placed in the reaction chamber, and condensing/growing a medium material ablated from the second target to be collected on the substrate placed in the reaction chamber, thus forming an ultrafine-particles dispersed layer having semiconductor ultrafine particles dispersed in the medium on the substrate.

摘要翻译： 本发明涉及包含具有可控电特性的均匀介质的光电子材料; 和分散在介质中并且具有100nm以下的平均粒径的半导体超细颗粒，以及使用其的涂布装置。 本发明还涉及一种通过将激光束照射到放置在低压稀有气体环境中的反应室中的半导体材料的第一靶上，以及具有可控电的介质材料的第二靶材来制造光电子材料的方法 特性，放置在反应室中，冷凝/生长从放置在反应室中的基板上平均粒度为100nm以下的超微粒子作为被收集的第一靶材烧蚀的半导体材料，并冷凝/生长介质 从放置在反应室内的基板上收集的第二靶材烧蚀掉的材料，由此形成分散在基板上的介质中的具有半导体超微粒子的超微粒子分散层。

公开(公告)号：US06562417B2

公开(公告)日：2003-05-13

申请号：US10180054

申请日：2002-06-27

申请人： Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada ,  Takehito Yoshida

发明人： Nobuyasu Suzuki ,  Toshiharu Makino ,  Yuka Yamada ,  Takehito Yoshida

IPC分类号： B05D306

CPC分类号： C23C14/5813 ,  B05D1/12 ,  B05D3/061 ,  C23C4/12 ,  C23C14/5846

摘要： A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.

摘要翻译： 一种通过在含有纳米颗粒的第一气体物流中的电荷束照射电子束以有效地沉积纳米颗粒的气流中沉积纳米颗粒的方法，以及改变表面的方法 通过将其与气体混合室中的第一气体物质混合，从而激活第二气体物质，旨在提供沉积纳米颗粒的方法和在气体中改性其表面的方法，将气体流中的纳米颗粒 流，能够在气流中有效地将纳米颗粒沉积为带电状态，并且改变对由良好的气流中的表面原子的大的暴露比导致的缺陷和杂质极度敏感的纳米颗粒的表面 可控性。

公开(公告)号：US06239453B1

公开(公告)日：2001-05-29

申请号：US09011471

申请日：1998-02-18

申请人： Yuka Yamada ,  Takehito Yoshida ,  Shigeru Takeyama ,  Yuji Matsuda ,  Katsuhiko Mutoh

发明人： Yuka Yamada ,  Takehito Yoshida ,  Shigeru Takeyama ,  Yuji Matsuda ,  Katsuhiko Mutoh

IPC分类号： H01L21203

CPC分类号： H01L33/26 ,  H01L31/1804 ,  H01L33/0054 ,  H01L33/18 ,  Y02E10/547 ,  Y02P70/521 ,  Y10T428/25 ,  Y10T428/258

摘要： This invention relates an optoelectronic material comprising a uniform medium with a controllable electric characteristic; and semiconductor ultrafine particles dispersed in the medium and having a mean particle size of 100 nm or less, and an application device using the same. This invention also relates to a method of manufacturing an optoelectronic material by irradiating a laser beam onto a first target of a semiconductor material, placed in a reaction chamber in low pressure rare gas ambient, and a second target of a medium material with a controllable electric characteristic, placed in the reaction chamber, condensing/growing a semiconductor material ablated from the first target to be collected as ultrafine particles having a mean particle size of 100 nm or smaller on a substrate placed in the reaction chamber, and condensing/growing a medium material ablated from the second target to be collected on the substrate placed in the reaction chamber, thus forming an ultrafine-particles dispersed layer having semiconductor ultrafine particles dispersed in the medium on the substrate.

摘要翻译： 本发明涉及包含具有可控电特性的均匀介质的光电子材料; 和分散在介质中并且具有100nm以下的平均粒径的半导体超细颗粒，以及使用其的涂布装置。 本发明还涉及一种通过将激光束照射到放置在低压稀有气体环境中的反应室中的半导体材料的第一靶上，以及具有可控电的介质材料的第二靶材来制造光电子材料的方法 特性，放置在反应室中，冷凝/生长从放置在反应室中的基板上平均粒度为100nm以下的超微粒子作为被收集的第一靶材烧蚀的半导体材料，并冷凝/生长介质 从放置在反应室内的基板上收集的第二靶材烧蚀掉的材料，由此形成分散在基板上的介质中的具有半导体超微粒子的超微粒子分散层。

公开(公告)号：US5814368A

公开(公告)日：1998-09-29

申请号：US806637

申请日：1997-02-26

申请人： Yuka Yamada ,  Ikuo Hiruta

发明人： Yuka Yamada ,  Ikuo Hiruta

IPC分类号： B05B5/00 ,  B05B5/08 ,  B05B13/04 ,  B05D1/12 ,  B22F3/00 ,  G02F1/1339 ,  B05D5/00

CPC分类号： B05B13/0473 ,  B05B13/0468 ,  B05B5/002 ,  B05D1/12 ,  B22F3/004 ,  G02F1/13392 ,  B05B5/08 ,  B22F2999/00

摘要： The present invention is a method for spreading spacing particles on a surface of a substrate used to form a liquid crystal display panel. The method comprises the steps of relatively moving the substrate and a spreading nozzle with respect to one another as the spreading nozzle spread the spacing particles such that the spacing particles spread from the spreading nozzle trace a predetermined trace on the surface of the substrate. Electric charge on the substrate is discharged while relatively moving the substrate and the spreading nozzle such that the spreading nozzle spreads the spacing particles on a discharged portion of the surface of the substrate.

摘要翻译： 本发明是用于在用于形成液晶显示面板的基板的表面上扩展间隔颗粒的方法。 该方法包括以下步骤：当扩散喷嘴扩展间隔颗粒使得从扩散喷嘴扩散的间隔颗粒在基板的表面上追踪预定的迹线时，相对于彼此相对移动基板和扩展喷嘴。 在使基板和扩散喷嘴相对移动的同时排出基板上的电荷，使得扩展喷嘴将间隔颗粒扩散到基板的表面的排出部分上。

公开(公告)号：US08652587B2

公开(公告)日：2014-02-18

申请号：US13046208

申请日：2011-03-11

申请人： Kazuyuki Nakanishi ,  Takashi Iseki ,  Yasuhiro Ozawa ,  Yuka Yamada ,  Seiji Mizuno ,  Katsumi Sato ,  Masafumi Koizumi ,  Yoshiyuki Funaki ,  Kyouji Kondo ,  Takayuki Kikuchi

发明人： Kazuyuki Nakanishi ,  Takashi Iseki ,  Yasuhiro Ozawa ,  Yuka Yamada ,  Seiji Mizuno ,  Katsumi Sato ,  Masafumi Koizumi ,  Yoshiyuki Funaki ,  Kyouji Kondo ,  Takayuki Kikuchi

IPC分类号： H05H1/24

CPC分类号： C23C16/26 ,  C23C16/503 ,  C23C16/545

摘要： This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a negative voltage applied to the rotary electrode reels from the plasma source while a conductive substrate is fed-out from the feed-out reel and is wound on the take-up reel so that the entire surface of the substrate portion between reels contacts the material gas, whereby plasma sheath is formed along the surface of the substrate portion between reels, and the material gas is activated in the plasma sheath and thus contacts the surface of the substrate, thus forming the film on the surface of the substrate.

摘要翻译： 本发明采用等离子体增强化学气相沉积法，该装置包括一个室，一对旋转电极卷轴，包括一个送出卷轴和一个卷取卷轴，等离子体源，原料气体供应器和排气单元，以及 包括在从所述送出卷轴送出导电性基板并卷绕在所述卷取卷轴上时，施加从所述等离子体源施加到所述旋转电极卷轴上的负电压，使得所述基板部分在卷盘接触之间的整个表面 材料气体，由此在卷轴之间沿着基板部分的表面形成等离子体护套，并且材料气体在等离子体护套中被激活，并且因此接触基板的表面，从而在基板的表面上形成膜。