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公开(公告)号：US20080245965A1
公开(公告)日：2008-10-09
申请号：US12098127
申请日：2008-04-04
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3174 , H01J2237/22 , H01J2237/2817 , H01J2237/31745
摘要： To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.
摘要翻译： 为了提供一种带电粒子系统，其能够利用不仅二维CAD数据而且还可以利用三维CAD数据来实现实际图案与理想图案之间的比较。 根据本发明，使用带有带电粒子束的样本的照射角度的信息，将理想图案（例如，CAD数据等设计数据）的二维显示转换成三维 显示，并且用观察图像显示三维理想图案。 如果将三维理想图案叠加在观察图像上，则可以容易地进行比较。 理想图案的实例包括基于半导体设计信息的电路图案（CAD数据），基于用于半导体晶片曝光的曝光掩模的曝光掩模图案和基于曝光掩模的曝光模拟的曝光模拟图案 并且可以使用曝光条件，并且这些图案中的至少一个被三维地显示。
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公开(公告)号：US08788242B2
公开(公告)日：2014-07-22
申请号：US13202504
申请日：2010-02-03
IPC分类号： G01B15/00 , G06F15/00 , G03F7/20 , G03F1/20 , H01J37/317
CPC分类号： G03F7/70625 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/70633 , H01J37/3174 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809
摘要： It is the object of the present invention to provide a pattern measurement apparatus which suitably evaluates a pattern formed by a double patterning method prior to a transfer using masks or which suitably evaluates a deviation of patterns formed by the double patterning method. To achieve the object, a pattern measurement apparatus is proposed which performs an exposure simulation on data about contour lines obtained by converting the pattern edges of first and mask images formed based on charged-particle beam irradiation of the two masks used for subsequent double exposure and which overlaps two exposure-simulated contour lines based on the coordinate information of design data about the masks. Furthermore, a pattern dimension measuring apparatus is proposed which sets measurement conditions using a charged-particle beam based on the positional information about parts or portions separated for double exposure.
摘要翻译： 本发明的目的是提供一种图案测量装置，其适当地评估在使用掩模的转印之前通过双重图案化方法形成的图案，或适当地评估通过双重图案形成方法形成的图案的偏差。 为了实现该目的，提出了一种图案测量装置，其对通过转换基于用于后续双曝光的两个掩模的带电粒子束照射形成的第一和掩模图像的图案边缘而获得的关于轮廓线的数据进行曝光模拟， 其基于关于掩模的设计数据的坐标信息与两个曝光模拟轮廓线重叠。 此外，提出了一种图案尺寸测量装置，其基于关于双重曝光分开的部分的位置信息，使用带电粒子束来设定测量条件。
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公开(公告)号：US08355562B2
公开(公告)日：2013-01-15
申请号：US12192317
申请日：2008-08-15
IPC分类号： G06K9/00
CPC分类号： G06F17/5081 , G06K9/00 , G06K2209/19 , G06T7/0004
摘要： A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.
摘要翻译： 一种图案形状评估方法和半导体检查系统，具有从通过拍摄半导体图案获得的图像中提取图案的轮廓数据的单元，用于从半导体图案的设计数据生成图案方向数据的单元和用于检测半导体图案的单元 通过比较从轮廓数据获得的图案方向数据和从对应于轮廓数据的图案位置的设计数据生成的图案方向数据，来对图案的缺陷进行比较。
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公开(公告)号：US08311314B2
公开(公告)日：2012-11-13
申请号：US12392533
申请日：2009-02-25
申请人： Ryoichi Matsuoka , Akiyuki Sugiyama
发明人： Ryoichi Matsuoka , Akiyuki Sugiyama
IPC分类号： G06K9/00
CPC分类号： G06K9/4609 , G06T7/001 , G06T7/12 , G06T2207/10061 , G06T2207/20192 , G06T2207/30148
摘要： An object of the present invention is to provide a sample measuring method and a sample measuring device suitable for evaluation of inclination of a pattern edge. To achieve the object, a method and a device for forming a plurality of contours of a pattern edge and evaluating the dimension between the contours are proposed below. Forming a plurality of contours allows evaluation of the degree of inclination of an edge portion of a pattern. Further, displaying evaluation values indicative of the degree of the inclination of the edge portion in an in-plane distribution form makes identifying the cause of taper formation easier.
摘要翻译： 本发明的目的是提供一种适于评估图案边缘的倾斜度的样品测量方法和样品测量装置。 为了实现该目的，下面提出了用于形成图案边缘的多个轮廓并评估轮廓之间的尺寸的方法和装置。 形成多个轮廓允许评估图案的边缘部分的倾斜度。 此外，以平面内分布形式显示表示边缘部分的倾斜度的评估值使得识别锥形形成的原因更容易。
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公开(公告)号：US20090232385A1
公开(公告)日：2009-09-17
申请号：US12392533
申请日：2009-02-25
申请人： Ryoichi MATSUOKA , Akiyuki Sugiyama
发明人： Ryoichi MATSUOKA , Akiyuki Sugiyama
CPC分类号： G06K9/4609 , G06T7/001 , G06T7/12 , G06T2207/10061 , G06T2207/20192 , G06T2207/30148
摘要： An object of the present invention is to provide a sample measuring method and a sample measuring device suitable for evaluation of inclination of a pattern edge. To achieve the object, a method and a device for forming a plurality of contours of a pattern edge and evaluating the dimension between the contours are proposed below. Forming a plurality of contours allows evaluation of the degree of inclination of an edge portion of a pattern. Further, displaying evaluation values indicative of the degree of the inclination of the edge portion in an in-plane distribution form makes identifying the cause of taper formation easier.
摘要翻译： 本发明的目的是提供一种适于评估图案边缘的倾斜度的样品测量方法和样品测量装置。 为了实现该目的，下面提出了用于形成图案边缘的多个轮廓并评估轮廓之间的尺寸的方法和装置。 形成多个轮廓允许评估图案的边缘部分的倾斜度。 此外，以平面内分布形式显示表示边缘部分的倾斜度的评估值使得识别锥形形成的原因更容易。
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36.发明申请METHOD OF CREATING TEMPLATE FOR MATCHING, AS WELL AS DEVICE FOR CREATING TEMPLATE 有权创建模板的方法，作为创建模板的设备公开(公告)号：US20120121160A1
公开(公告)日：2012-05-17
申请号：US13387382
申请日：2010-07-15
IPC分类号： G06K9/50
CPC分类号： H01J37/28 , G01N23/225 , G06K9/6255 , G06T7/001 , G06T2207/30148 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers in a semiconductor device is stored in a library. On the basis of the designation of the position and the layer, pattern information regarding the designated position and layer is extracted from the pattern information stored in the library. A template is created on the basis of the extracted pattern information.
摘要翻译： 公开了一种以高精度和高效率创建用于模板匹配的模板的方法。 对于构成基本电路的每个单独图案，关于半导体器件中的多个层的图案信息被存储在库中。 基于位置和层的指定，从存储在库中的图案信息中提取关于指定位置和层的图案信息。 基于提取的模式信息创建模板。
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公开(公告)号：US20120053892A1
公开(公告)日：2012-03-01
申请号：US13202504
申请日：2010-02-03
CPC分类号： G03F7/70625 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/70633 , H01J37/3174 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809
摘要： It is the object of the present invention to provide a pattern measurement apparatus which suitably evaluates a pattern formed by a double patterning method prior to a transfer using masks or which suitably evaluates a deviation of patterns formed by the double patterning method. To achieve the object, a pattern measurement apparatus is proposed which performs an exposure simulation on data about contour lines obtained by converting the pattern edges of first and mask images formed based on charged-particle beam irradiation of the two masks used for subsequent double exposure and which overlaps two exposure-simulated contour lines based on the coordinate information of design data about the masks. Furthermore, a pattern dimension measuring apparatus is proposed which sets measurement conditions using a charged-particle beam based on the positional information about parts or portions separated for double exposure.
摘要翻译： 本发明的目的是提供一种图案测量装置，其适当地评估在使用掩模的转印之前通过双重图案化方法形成的图案，或适当地评估通过双重图案形成方法形成的图案的偏差。 为了实现该目的，提出了一种图案测量装置，其对通过转换基于用于后续双曝光的两个掩模的带电粒子束照射形成的第一和掩模图像的图案边缘而获得的关于轮廓线的数据进行曝光模拟， 其基于关于掩模的设计数据的坐标信息，与两个曝光模拟轮廓线重叠。 此外，提出了一种图案尺寸测量装置，其基于关于双重曝光分开的部分的位置信息，使用带电粒子束来设定测量条件。
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38.发明授权Method of creating template for matching, as well as device for creating template 有权创建匹配模板的方法，以及创建模板的设备公开(公告)号：US08867818B2
公开(公告)日：2014-10-21
申请号：US13387382
申请日：2010-07-15
CPC分类号： H01J37/28 , G01N23/225 , G06K9/6255 , G06T7/001 , G06T2207/30148 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers in a semiconductor device is stored in a library. On the basis of the designation of the position and the layer, pattern information regarding the designated position and layer is extracted from the pattern information stored in the library. A template is created on the basis of the extracted pattern information.
摘要翻译： 公开了一种以高精度和高效率创建用于模板匹配的模板的方法。 对于构成基本电路的每个单独图案，关于半导体器件中的多个层的图案信息被存储在库中。 基于位置和层的指定，从存储在库中的图案信息中提取关于指定位置和层的图案信息。 基于提取的模式信息创建模板。
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公开(公告)号：US20140219545A1
公开(公告)日：2014-08-07
申请号：US14234977
申请日：2012-07-20
申请人： Akiyuki Sugiyama , Yuichi Abe
发明人： Akiyuki Sugiyama , Yuichi Abe
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G01B15/08 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： When the lengths of FEM wafers are automatically measured, not only the sizes of targets, the lengths of which are to be measured, are often varied from those in registration, but also the patterns of the targets are often deformed. Therefore, it is difficult to automatically determine whether the length measurement is possible or not. Therefore, the following are executed with a semiconductor inspection system: (1) a process of identifying the position of the contour line of an inspected image using a distance image calculated from a reference image, (2) a process of calculating a defect size image based on the position of the contour line with respect to the identified distance image, and detecting a defect candidate from the defect size image, and (3-1) a process of, upon detection of the defect candidate, calculating the size of the detected defect candidate, or (3-2) a process of detecting a portion different between the first and second contour lines as the defect candidate.
摘要翻译： 当自动测量有限元晶片的长度时，不仅要测量其长度的目标的尺寸通常与注册的尺寸不同，而且目标的图案也经常变形。 因此，难以自动确定长度测量是否可行。 因此，使用半导体检查系统执行以下操作：（1）使用从参考图像计算的距离图像来识别被检查图像的轮廓线的位置的处理，（2）计算缺陷尺寸图像的处理 基于所述轮廓线相对于所识别的距离图像的位置，以及从所述缺陷尺寸图像检测缺陷候选，以及（3-1）在检测到所述缺陷候选时，计算所检测到的所述缺陷候选的大小的处理 缺陷候选者，或（3-2）检测第一和第二轮廓线之间的部分的缺陷候选的处理。
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公开(公告)号：US08285056B2
公开(公告)日：2012-10-09
申请号：US12401848
申请日：2009-03-11
申请人： Junichi Taguchi , Mitsuji Ikeda , Osamu Komuro , Akiyuki Sugiyama
发明人： Junichi Taguchi , Mitsuji Ikeda , Osamu Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/46
CPC分类号： G06T7/001 , G06K9/6206 , G06T2207/10061 , G06T2207/30148
摘要： A matching degree computing apparatus is provided for comparing an input image and an object template image and computing a matching degree between an input image and an object template image based on the compared result. The computing apparatus includes a transforming unit for transforming the input image so as to be matched to the template object region and a computing unit for computing a matching degree between the transformed input image and the template image. The transforming unit provides a shaping unit for shaping a non-background region to the form of the template object region in the object corresponding region of the input image and a processing unit for arranging the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image.
摘要翻译： 提供了一种匹配度计算装置，用于比较输入图像和对象模板图像，并且基于比较结果计算输入图像和对象模板图像之间的匹配度。 计算装置包括：变换单元，用于变换输入图像以与模板对象区域匹配;以及计算单元，用于计算变换后的输入图像与模板图像之间的匹配度。 变换单元提供一个成形单元，用于将非背景区域形成为输入图像的对象对应区域中的模板对象区域的形式;以及处理单元，用于布置与模板对象对应区域接触的非背景区域 非背景区域对输入图像的对象非对应区域中的匹配度没有实质影响。
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