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    Method for producing metal thin film
    32.
    发明授权
    Method for producing metal thin film 有权
    金属薄膜的制造方法

    公开(公告)号：US08943968B2

    公开(公告)日：2015-02-03

    申请号：US13346051

    申请日：2012-01-09

    申请人： Masanobu Tanaka ,  Hirotsugu Ishihara ,  Toshiki Shimamura ,  Takahiro Kamei

    发明人： Masanobu Tanaka ,  Hirotsugu Ishihara ,  Toshiki Shimamura ,  Takahiro Kamei

    IPC分类号： B41F1/00 ,  B41F17/00

    CPC分类号： H05K3/207 ,  H05K3/046 ,  H05K3/182 ,  H05K2203/0108 ,  H05K2203/0709 ,  H05K2203/074

    摘要： A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate.

    摘要翻译： 在基板上制造金属薄膜的方法包括：将油墨涂敷到平铺毯上的步骤; 第一转印步骤，当平面冲裁和凸版相互相对地设置时，使第一层毯和具有预定图案的凸起的凸版通过压力压缩接触，以选择性地将平均毯上的一部分油墨对应 对凸版的预测; 第二转印步骤，其中使第一转印步骤后得到的平铺毯和基板通过压力压缩接触，同时平铺橡皮布和基板彼此相对地设置，以将残留在平板上的墨转移到基板上; 以及将在第二转印步骤之后获得的基板进行无电镀以在基板上沉积金属薄膜的步骤。

    Method for fabricating microbeads and microbeads
    35.
    发明授权
    Method for fabricating microbeads and microbeads 有权
    微珠和微珠的制备方法

    公开(公告)号：US08546068B2

    公开(公告)日：2013-10-01

    申请号：US13120967

    申请日：2009-09-04

    申请人： Mari Ichimura ,  Kenzo Machida ,  Noriyuki Kishii ,  Masanobu Tanaka

    发明人： Mari Ichimura ,  Kenzo Machida ,  Noriyuki Kishii ,  Masanobu Tanaka

    IPC分类号： G03F7/26

    CPC分类号： G01N33/54313 ,  B01J2219/00432 ,  B01J2219/005 ,  B01J2219/00502 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00637 ,  B01J2219/00677 ,  B01J2219/00722

    摘要： In one example embodiment, a method fabricates microbeads, which can supply a bead set containing a various types of microbeads and having distinct populations of the respective types of microbeads. In one example embodiment, the method includes forming a hydrophilic layer made of a hydrophilic organic material on a substrate. In one example embodiment, the method includes laminating on the hydrophilic layer a thin film capable of being peeled off in the form of microbeads. In one example embodiment, the method includes forming the thin film in a given configuration by photolithography. In one example embodiment, the method includes solid-phasing a given substance on the post-formed thin films. In one example embodiment, the method includes peeling off the post-formed thin films, which have been solid-phased with the substance, from the substrate along with at least a part of the hydrophilic layer to obtain microbeads.

    摘要翻译： 在一个示例性实施例中，一种制造微珠的方法，其可以提供包含各种类型的微珠并且具有各种类型的微珠的不同种群的珠粒组。 在一个示例性实施例中，该方法包括在基底上形成由亲水性有机材料制成的亲水层。 在一个示例性实施例中，该方法包括在亲水层上层叠能够以微珠形式剥离的薄膜。 在一个示例性实施例中，该方法包括通过光刻法以给定的配置形成薄膜。 在一个示例性实施例中，该方法包括将定影物质固定在后成形薄膜上。 在一个示例性实施例中，该方法包括将已经与物质固相化的后成形薄膜与至少一部分亲水层一起从衬底剥离以获得微珠。

    METHOD FOR FORMING REFLECTION ELECTRODE, DRIVE SUBSTRATE, AND DISPLAY DEVICE
    36.
    发明申请
    METHOD FOR FORMING REFLECTION ELECTRODE, DRIVE SUBSTRATE, AND DISPLAY DEVICE 审中-公开
    形成反射电极，驱动基板和显示装置的方法

    公开(公告)号：US20100220270A1

    公开(公告)日：2010-09-02

    申请号：US12707869

    申请日：2010-02-18

    申请人： Hirotsugu Ishihara ,  Masanobu Tanaka ,  Toshiki Shimamura ,  Takahiro Kamei

    发明人： Hirotsugu Ishihara ,  Masanobu Tanaka ,  Toshiki Shimamura ,  Takahiro Kamei

    IPC分类号： G02F1/1335 ,  H05K1/09 ,  H01M4/88

    CPC分类号： G02F1/133553 ,  G02F1/133504

    摘要： A method for forming a reflection electrode is provided which includes the steps of: forming a first catalytic layer in a first region of an electrode forming region of a substrate; forming a first plating layer on the first catalytic layer by performing a first electroless plating treatment; forming a second catalytic layer at least in a region (second region) of the electrode forming region other than the first region; and forming a second plating layer on the second catalytic layer by performing a second electroless plating treatment, so that the reflection electrode is formed to have a concave-convex surface.

    摘要翻译： 提供了形成反射电极的方法，其包括以下步骤：在基板的电极形成区域的第一区域中形成第一催化剂层; 通过进行第一次电镀处理，在所述第一催化剂层上形成第一镀层; 至少在除了第一区域之外的电极形成区域的区域（第二区域）中形成第二催化剂层; 以及通过进行第二无电镀处理在所述第二催化剂层上形成第二镀层，使得所述反射电极形成为具有凹凸表面。

    ELECTRODE AND METHOD FOR FORMING THE SAME AND SEMICONDUCTOR DEVICE
    37.
    发明申请
    ELECTRODE AND METHOD FOR FORMING THE SAME AND SEMICONDUCTOR DEVICE 审中-公开
    电极及其形成方法和半导体器件

    公开(公告)号：US20090305061A1

    公开(公告)日：2009-12-10

    申请号：US12476672

    申请日：2009-06-02

    申请人： Hirotsugu Ishihara ,  Masanobu Tanaka ,  Takahiro Kamei

    发明人： Hirotsugu Ishihara ,  Masanobu Tanaka ,  Takahiro Kamei

    IPC分类号： B32B15/04 ,  B05D5/12

    CPC分类号： C23C18/1642 ,  C23C18/1893

    摘要： An electrode includes a substrate, a contact layer, and a metal layer. The substrate has activated Si on the surface thereof. The contact layer includes a thin film (organic molecular film) made of an organic molecule having a first end with one of a CH group, a CH2 group, and a CH3 group and a second end with one of an amino group, a mercapto group, a phenyl group, and a carboxyl group. The thin film is formed on the surface of the substrate. A catalyst metal is applied to the surface of the organic molecular film. The metal layer is formed on the contact layer by an electroless plating process.

    摘要翻译： 电极包括基板，接触层和金属层。 基板在其表面上活化了Si。 接触层包括由有机分子构成的薄膜（有机分子膜），该有机分子的第一端为CH基，CH 2基和CH 3基，第二端为氨基，巯基之一 ，苯基和羧基。 薄膜形成在基板的表面上。 催化剂金属被施加到有机分子膜的表面上。 通过化学镀处理在接触层上形成金属层。

    Method for producing metal thin film
    39.
    发明申请
    Method for producing metal thin film 审中-公开
    金属薄膜的制造方法

    公开(公告)号：US20080307991A1

    公开(公告)日：2008-12-18

    申请号：US12157473

    申请日：2008-06-11

    申请人： Masanobu Tanaka ,  Hirotsugu Ishihara ,  Toshiki Shimamura ,  Takahiro Kamei

    发明人： Masanobu Tanaka ,  Hirotsugu Ishihara ,  Toshiki Shimamura ,  Takahiro Kamei

    IPC分类号： B41L17/08

    CPC分类号： H05K3/207 ,  H05K3/046 ,  H05K3/182 ,  H05K2203/0108 ,  H05K2203/0709 ,  H05K2203/074

    摘要： A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate.

    摘要翻译： 在基板上制造金属薄膜的方法包括：将油墨涂敷到平铺毯上的步骤; 第一转印步骤，当平面冲裁和凸版相互相对地设置时，使第一层毯和具有预定图案的凸起的凸版通过压力压缩接触，以选择性地将平均毯上的一部分油墨对应 对凸版的预测; 第二转印步骤，其中使第一转印步骤后得到的平铺毯和基板通过压力压缩接触，同时平铺橡皮布和基板彼此相对地设置，以将残留在平板上的墨转移到基板上; 以及将在第二转印步骤之后获得的基板进行无电镀以在基板上沉积金属薄膜的步骤。

    Image distortion correcting device and image distortion correcting method
    40.
    发明授权
    Image distortion correcting device and image distortion correcting method 失效

    公开(公告)号：US06989872B2

    公开(公告)日：2006-01-24

    申请号：US10088106

    申请日：2001-07-23

    申请人： Masanori Nakatsuji ,  Masanobu Tanaka ,  Hideyo Uwabata ,  Naoji Okumura ,  Kazunori Yamate

    发明人： Masanori Nakatsuji ,  Masanobu Tanaka ,  Hideyo Uwabata ,  Naoji Okumura ,  Kazunori Yamate

    IPC分类号： H04N3/23

    CPC分类号： H04N3/2335

    摘要： A write PLL circuit generates a write clock signal for writing a video signal into a line memory. A readout PLL circuit generates a read clock signal for reading out the video signal stored in the line memory. An inner pincushion distortion correction voltage generation circuit modulates a correction waveform in the horizontal scanning period of time by a correction waveform in the vertical scanning period of time, to generate an inner pincushion distortion correction waveform, and adds a DC correction pulse to the inner pincushion distortion correction waveform and outputs the inner pincushion distortion correction waveform as an inner pincushion distortion correction voltage. A capacitive coupling circuit superimposes the inner pincushion distortion correction voltage on an output voltage of a loop filter of the readout PLL circuit, and feeds the inner pincushion distortion correction voltage to a VCO as a control voltage.