公开(公告)号：US07560708B2

公开(公告)日：2009-07-14

申请号：US11995696

申请日：2006-07-07

申请人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder

IPC分类号： G01J1/58

CPC分类号： G01N21/76 ,  G01N21/648 ,  G01N33/54306 ,  G01N33/582

摘要： The present invention provides a luminescence sensor (2), such as e.g. a luminescence biosensor, comprising a multi-layer structure. The multi-layer structure comprises at least a first layer (2a) formed of a first material and a second layer (2b) formed of a second material. The first material has a first binding capacity towards luminophores and the second material has a second binding capacity towards luminophores, the first binding capacity being different from the second binding capacity. The luminescence sensor (2) according to the present invention shows a high sensitivity because it provides preferred binding sites for luminophores at locations where the combined excitation and detection efficiency is the highest.

摘要翻译： 本发明提供一种发光传感器（2），例如， 发光生物传感器，包括多层结构。 多层结构至少包括由第一材料形成的第一层（2a）和由第二材料形成的第二层（2b）。 第一材料具有朝向发光体的第一结合能力，第二材料具有朝向发光体的第二结合能力，第一结合能力不同于第二结合能力。 根据本发明的发光传感器（2）显示出高灵敏度，因为它在组合的激发和检测效率最高的位置处为发光体提供优选的结合位点。

公开(公告)号：US07541603B2

公开(公告)日：2009-06-02

申请号：US11527731

申请日：2006-09-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G21K5/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US20080316595A1

公开(公告)日：2008-12-25

申请号：US12230384

申请日：2008-08-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G02B5/28 ,  G02B5/26 ,  G02B5/22

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20080300146A1

公开(公告)日：2008-12-04

申请号：US12095145

申请日：2006-11-23

申请人： Marc Wilhelmus Gijsbert Ponjee ,  Mark Thomas Johnson ,  Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

发明人： Marc Wilhelmus Gijsbert Ponjee ,  Mark Thomas Johnson ,  Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

IPC分类号： C40B60/12 ,  C40B30/10

CPC分类号： G01N21/6454

摘要： The invention provides a bio chip device comprising at least one sample compartment and at least one light sensitive element, the at least one sample compartment being provided on a first side of the at least one light sensitive element, wherein incident light is provided incident from a second side opposite of the first side of the at least one light sensitive element. Further, the invention provides a method for the detection of fluorescent particles within at least one sample compartment of a bio chip device.

摘要翻译： 本发明提供一种包括至少一个样品室和至少一个光敏元件的生物芯片装置，所述至少一个样品室设置在所述至少一个光敏元件的第一侧上，其中入射光从 第二侧与所述至少一个光敏元件的第一侧相对。 此外，本发明提供了一种用于检测生物芯片器件的至少一个样品室内的荧光颗粒的方法。

公开(公告)号：US20080272313A1

公开(公告)日：2008-11-06

申请号：US12158451

申请日：2006-12-19

申请人： Maarten Marinus Johannes Wilhemus Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

发明人： Maarten Marinus Johannes Wilhemus Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

IPC分类号： G01N21/64

CPC分类号： G01N21/648 ,  G01N21/6428

摘要： The present invention relates to a luminescence sensor (10), such as a luminescence biosensor or a luminescence chemical sensor, comprising at least one aperture (1) having a first lateral dimension larger than the diffraction limit of excitation radiation (3) in a medium the at least one aperture (1) is filled with and a second lateral dimension below the diffraction limit of excitation radiation (3) in a medium the at least one aperture (1) is filled with. The invention furthermore relates to a method for the detection of luminescence radiation (5), e.g. fluorescence radiation, generated by at least one optically variable molecule (2), e.g. fluorophore, in the at least one aperture (1). The excitation radiation (3) is preferably polarised to suppress the excitation radiation (3) in the apertures (1). The luminescence sensor (10) according to the present invention is able to detect relatively low concentrations of optically variable molecules (2), e.g. fluorophores.

摘要翻译： 本发明涉及一种发光传感器（10），例如发光生物传感器或发光化学传感器，其包括至少一个孔（1），其具有比介质中的激发辐射（3）的衍射极限大的第一横向尺寸 所述至少一个孔（1）在所述至少一个孔（1）填充的介质中填充有低于激发辐射（3）的衍射极限的第二横向尺寸。 本发明还涉及用于检测发光辐射（5）的方法，例如， 由至少一个光学可变分子（2）产生的荧光辐射，例如。 在所述至少一个孔（1）中的荧光团。 激发辐射（3）优选地被极化以抑制孔（1）中的激发辐射（3）。 根据本发明的发光传感器（10）能够检测相对低浓度的光学可变分子（2），例如， 荧光团

公开(公告)号：US07397538B2

公开(公告)日：2008-07-08

申请号：US11602475

申请日：2006-11-21

申请人： Wilhelmus Josephus Box ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Hendrikus Gijsbertus Schimmel

发明人： Wilhelmus Josephus Box ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Hendrikus Gijsbertus Schimmel

IPC分类号： G03B27/54 ,  G03B27/42 ,  G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/70858

摘要： The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.

摘要翻译： 本发明涉及一种用于产生辐射束的辐射系统。 辐射系统包括构造和布置成产生极紫外辐射的极紫外光源，被构造和布置以捕获来自辐射源的污染物的污染屏障，以及构造和布置成感测污染屏障的温度的温度传感器。

公开(公告)号：US07332731B2

公开(公告)日：2008-02-19

申请号：US11294347

申请日：2005-12-06

申请人： Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： A61N5/06

CPC分类号： G03F7/70916 ,  G03F7/70008

摘要： A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plates for trapping contaminant material coming from the radiation source. The contamination barrier encloses the extreme ultraviolet radiation source.

摘要翻译： 公开了一种用于提供投影辐射束的辐射系统。 辐射系统包括用于提供极端紫外辐射的极紫外光源，以及包括多个紧密堆积的箔片的污染屏障，用于捕获来自辐射源的污染物质。 污染屏障包围着极紫外线辐射源。

公开(公告)号：US07106832B2

公开(公告)日：2006-09-12

申请号：US11031535

申请日：2005-01-10

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21K3/00

CPC分类号： G03F7/70916

摘要： Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a filter system. The filter system includes a plurality of foils and a transporter for transporting the foils along a trajectory which extends within the beam so that the foils intercept the particles within the beam. The transporter is arranged to transport the foils by a substantially translatory movement of the foils along at least a part of the trajectory.

摘要翻译： 由辐射源发射并从辐射源朝向用于处理来自辐射源的辐射的处理系统移动的颗粒被从辐射源通过辐射源发射的预定横截面传播的辐射滤出，该辐射源由过滤系统 。 过滤器系统包括多个箔片和运送器，用于沿着在光束内延伸的轨迹传送箔片，使得箔片截取光束内的颗粒。 输送器布置成通过沿着轨迹的至少一部分的箔片的基本上平移的运动来运输箔片。

公开(公告)号：US10101321B2

公开(公告)日：2018-10-16

申请号：US12446461

申请日：2007-10-19

申请人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

发明人： Maarten Marinus Johannes Wilhelm Van Herpen ,  Derk Jan Wilfred Klunder ,  Hendrik Roelof Stapert

IPC分类号： C40B30/10 ,  G01N33/53 ,  G01N21/64

摘要： The invention relates to detection the presence of a target molecule in a sample, wherein the sample is contacted with a substrate, the substrate subsequently being washed in a wash step. In particular, the invention relates to a method of detecting the presence of a target molecule in a sample, the method comprising: (a) contacting the sample (37) with a substrate having immobilized thereon probe molecules that specifically binds to the target molecule; (b) washing the substrate (38) in a wash step by a wash fluid in order to remove or dilute unbound target molecules; (c) detect the presence of resultant binding complexes (39) on the substrate to determine whether the target molecule is present in the sample. The wash fluid being substantially refractive index matched to the substrate.