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16 条记录 (耗时 0.033 秒)

    Radiation source
    3.
    发明授权
    Radiation source 有权
    辐射源

    公开(公告)号：US09113539B2

    公开(公告)日：2015-08-18

    申请号：US13597754

    申请日：2012-08-29

    申请人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

    发明人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

    IPC分类号： G01N21/01 ,  G03B27/52 ,  G03B27/54 ,  H05B31/02 ,  H05G2/00 ,  G03F7/20

    CPC分类号： H05G2/005 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70916 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.

    摘要翻译： 辐射源包括储存器，喷嘴，激光器和正透镜。 储存器构造成保持一定体积的燃料。 与储存器流体连接的喷嘴被配置成将沿着轨迹的燃料流引导到等离子体形成位置。 激光器被配置为在等离子体形成位置处的流处引导激光辐射，以在使用中产生辐射产生等离子体。 正透镜装置被配置为将燃料流的轨迹的至少势能扩散聚焦到等离子体形成位置，该透镜包括电场产生元件和/或磁场产生元件。

    RADIATION SOURCES AND METHODS OF GENERATING RADIATION
    4.
    发明申请
    RADIATION SOURCES AND METHODS OF GENERATING RADIATION 有权
    辐射源和辐射发生方法

    公开(公告)号：US20100039631A1

    公开(公告)日：2010-02-18

    申请号：US12540596

    申请日：2009-08-13

    申请人： Erik Roelof LOOPSTRA ,  Hendrikus Gijsbertus Schimmel

    发明人： Erik Roelof LOOPSTRA ,  Hendrikus Gijsbertus Schimmel

    IPC分类号： G21K5/00 ,  G21K1/00 ,  G03B27/52

    CPC分类号： G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

    摘要翻译： 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

    Radiation source and lithographic apparatus
    5.
    发明授权
    Radiation source and lithographic apparatus 有权
    辐射源和光刻设备

    公开(公告)号：US09310689B2

    公开(公告)日：2016-04-12

    申请号：US14241378

    申请日：2012-07-31

    申请人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

    发明人： Hendrikus Gijsbertus Schimmel ,  Johan Frederik Dijksman ,  Dzmitry Labetski

    IPC分类号： G03F7/20 ,  H05G2/00

    CPC分类号： G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

    摘要： Methods and apparatus are provided for promoting the coalescence of fuel droplets in a stream generated by a radiation source droplet stream generator for use in lithographic apparatus. Various examples are described in which a modulating voltage source is applied to the emitter so that the electrical characteristics of the droplets may be controlled. This results in acceleration and deceleration of droplets in the stream which causes them to merge and promotes coalescence.

    摘要翻译： 提供了用于促进由用于光刻设备的辐射源液滴发生器产生的流中的燃料液滴聚结的方法和装置。 描述了各种示例，其中将调制电压源施加到发射器，使得可以控制液滴的电特性。 这导致流中液滴的加速和减速，这导致它们合并并促进聚结。

    Radiation source, lithographic apparatus and device manufacturing method
    7.
    发明授权
    Radiation source, lithographic apparatus and device manufacturing method 失效
    辐射源，光刻设备和器件制造方法

    公开(公告)号：US08232537B2

    公开(公告)日：2012-07-31

    申请号：US12540542

    申请日：2009-08-13

    申请人： Hendrikus Gijsbertus Schimmel ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

    发明人： Hendrikus Gijsbertus Schimmel ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

    IPC分类号： H05G2/00

    CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/003

    摘要： A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards a second focus. A contamination barrier is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime.

    摘要翻译： 用于产生极紫外辐射或用于高分辨率光刻的辐射源包括等离子体形成位置，其中燃料通过辐射束接触以形成等离子体产生的EUV辐射。 镜像收集器收集并反射在第一焦点处产生的EUV辐射朝向第二焦点。 定位污染屏障，污染屏障的周边不会堵塞在第二焦点处由反射镜对着的立体角的50％以上，使得由集光镜反射的EUV辐射不会通过污染物过度衰减 屏障。 污染屏障用于从等离子体中捕获诸如离子，原子，分子或纳米液体的燃料，以防止它们沉积到收集器反射镜上，从而减少镜的有效寿命。