公开(公告)号：US06714302B2

公开(公告)日：2004-03-30

申请号：US09330157

申请日：1999-06-11

申请人： Akiyoshi Suzuki ,  Minoru Yoshii

发明人： Akiyoshi Suzuki ,  Minoru Yoshii

IPC分类号： G03B2752

CPC分类号： G03F7/70466

摘要： A wafer having a plurality of areas is subjected to multiple exposures or a stitching exposure with a plurality of mask patterns being interchanged. A plurality of wafers are sequentially exposed to the plurality of mask patterns, with one wafer being replaced with a next wafer. When the one wafer is replaced with the next wafer, the next wafer is exposed to the mask pattern last used, prior to the replacement. When one mask pattern is interchanged with a next mask pattern, an area of the one wafer, last exposed to the one mask pattern, is first exposed to the next mask pattern.

摘要翻译： 具有多个区域的晶片经受多次曝光或缝合曝光，多个掩模图案被互换。 多个晶片顺序地暴露于多个掩模图案，其中一个晶片被替换为下一个晶片。 当一个晶片被下一个晶片替代时，在更换之前，下一个晶片暴露于最后使用的掩模图案。 当一个掩模图案与下一个掩模图案交换时，首先暴露于一个掩模图案的一个晶片的区域暴露于下一个掩模图案。

公开(公告)号：US06564572B1

公开(公告)日：2003-05-20

申请号：US10129964

申请日：2002-05-21

申请人： Tomoyuki Uchimura ,  Toshio Matsubara ,  Akiyoshi Suzuki ,  Tomoyoshi Irie

发明人： Tomoyuki Uchimura ,  Toshio Matsubara ,  Akiyoshi Suzuki ,  Tomoyoshi Irie

IPC分类号： F25B1500

CPC分类号： F25B33/00 ,  F25B15/02 ,  F25B37/00 ,  F25B39/026 ,  Y02A30/277 ,  Y02B30/62

摘要： There is provided an absorption refrigerator comprising a liquid-film type plate heat exchanger structure,. which is improved in terms of installation while maintaining the height of the refrigerator at a practical level. In an absorption refrigerator utilizing a liquid-film type plate heat exchanger for an absorber (A), an evaporator (E), a regenerator (G) and a condenser (C), all the absorber, the evaporator, the regenerator and the condenser, each comprising the liquid-film type plate heat exchanger, are arranged in a horizontal direction. The evaporator, the absorber, the regenerator and the condenser are accommodated in a single can body (1), and the evaporator and the absorber, and the regenerator and the condenser are, respectively, accommodated in different chambers arranged in a lateral direction, which are divided by a partition wall (16) provided in the can body. The evaporator and the absorber, and the regenerator and the condenser may be, respectively, accommodated in different can bodies arranged in the lateral direction.

摘要翻译： 提供了一种包括液膜式热交换器结构的吸收式制冷机。 在将冰箱的高度保持在实用水平方面，其安装性得到改善。在使用吸收器（A）的液膜式热交换器的吸收式制冷机中，蒸发器（E），再生器（G） 和冷凝器（C），均包括液膜式热交换器的所有吸收器，蒸发器，再生器和冷凝器沿水平方向布置。 蒸发器，吸收器，再生器和冷凝器容纳在单个罐体（1）中，并且蒸发器和吸收器以及再生器和冷凝器分别容纳在沿横向布置的不同的室中， 被设置在罐体中的分隔壁（16）分开。 蒸发器和吸收器以及再生器和冷凝器可以分别容纳在沿横向布置的不同罐体中。

公开(公告)号：USD406253S

公开(公告)日：1999-03-02

申请号：US71252

申请日：1997-05-27

申请人： Izumi Yamashita ,  Akiyoshi Suzuki

设计人： Izumi Yamashita ,  Akiyoshi Suzuki

公开(公告)号：US5309197A

公开(公告)日：1994-05-03

申请号：US868705

申请日：1992-04-15

申请人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

发明人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/00

摘要： A projection exposure apparatus includes a projection lens system for projecting an image of a pattern of an original on a substrate having a photosensitive layer, by using a sensitizing beam; a first detection optical system for detecting a mark of the substrate through the projection lens system and with a first non-sensitizing beam, the first detection optical system producing first information related to the position of the mark; a second detection optical system for detecting the mark of the substrate without the projection lens system and with a second nonsensitizing beam having a bandwidth broader than that of the first non-sensitizing beam, the second detection optical system producing second information related to the position of the mark; and a detector for detecting an error included in the first information, by using the first and second information.

摘要翻译： 投影曝光装置包括：投影透镜系统，用于通过使用敏化光束将原稿的图案的图像投影在具有感光层的基板上; 第一检测光学系统，用于通过投影透镜系统和第一非感光束检测基板的标记，第一检测光学系统产生与标记的位置相关的第一信息; 第二检测光学系统，用于在没有投影透镜系统的情况下检测基板的标记，并且具有比第一非敏感光束宽的带宽的第二非敏感光束，第二检测光学系统产生与位置相关的第二信息 标记; 以及用于通过使用第一和第二信息来检测包括在第一信息中的错误的检测器。

公开(公告)号：US5171965A

公开(公告)日：1992-12-15

申请号：US811915

申请日：1991-12-23

申请人： Akiyoshi Suzuki ,  Hiroshi Echizen

发明人： Akiyoshi Suzuki ,  Hiroshi Echizen

IPC分类号： B23Q7/14 ,  G03F7/20

CPC分类号： G03F7/70558 ,  G03F7/70225

摘要： A method and an apparatus for exposing an object with a pulsed laser beam. The exposure of one shot (one exposure area) is achieved by a plurality of pulse exposures with laser light in a corresponding number of pulses, as the result of which any fluctuations or errors in the outputs of the pulses are substantially compensated so that correct exposure of each shot is assured. In another aspect, the amounts of exposures by the plural pulses for the one shot exposure are integrated and the integrated amount of exposure is compared with a correct or desired amount of exposure. On the basis of the result of comparison, an additional pulse exposure is effected in accordance with the degree of under exposure.

摘要翻译： 一种用脉冲激光束曝光物体的方法和装置。 一次（一个曝光区域）的曝光通过多个脉冲曝光实现，激光以相应数量的脉冲，其结果是基本上补偿了脉冲输出中的任何波动或误差，使得正确曝光 每个镜头都是放心的。 在另一方面，将一次曝光的多个脉冲的曝光量积分起来，将曝光的积分量与正确或期望的曝光量进行比较。 根据比较结果，根据曝光程度进行附加的脉冲曝光。

公开(公告)号：US5140366A

公开(公告)日：1992-08-18

申请号：US742535

申请日：1991-08-08

申请人： Takahisa Shiozawa ,  Tsuneo Kanda ,  Akiyoshi Suzuki

发明人： Takahisa Shiozawa ,  Tsuneo Kanda ,  Akiyoshi Suzuki

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： Disclosed is an exposure apparatus for printing a pattern of a reticle on different shot areas of the wafer in a step-and-repeat manner. In the disclosed apparatus, an image of an alignment mark of the reticle is printed, by use of a projection lens system, on each of some shot areas of the wafer which are selected as the subject of detection. By this, a latent image of the reticle mark is formed on each of the selected shot areas. The latent image of the reticle mark is detected by a microscope which may be a phase contrast microscope and, from the results of detection concerning all the latent images of the reticle mark, a reference (correction) grid representing the coordinate positions of all the shot areas of the wafer is prepared and stored. In accordance with the stored reference grid, the stepwise movement of the wafer is controlled at the time of the step-and-repeat exposures of the wafer. This assures improved throughput of the apparatus. Further, use of the phase contrast microscope for the detection of the latent image of the reticle mark ensures further improvement in the alignment accuracy.

摘要翻译： 公开了一种用于以分步重复的方式在晶片的不同照射区域上印刷掩模版图案的曝光装置。 在所公开的装置中，通过使用投影透镜系统，在被选择为检测对象的晶片的一些照射区域中的每一个上打印标线的对准标记的图像。 由此，在每个所选择的拍摄区域上形成标线标记的潜像。 通过可以是相差显微镜的显微镜检测标线标记的潜像，并且根据关于标线标记的所有潜像的检测结果，表示所有拍摄的坐标位置的参考（校正）网格 准备并存储晶片的区域。 根据存储的参考栅格，晶片的分步重复曝光时控制晶片的逐步移动。 这确保了设备的生产能力的提高。 此外，使用相差显微镜来检测标线标记的潜像，确保了对准精度的进一步提高。

公开(公告)号：US5117254A

公开(公告)日：1992-05-26

申请号：US700060

申请日：1991-05-08

申请人： Haruna Kawashima ,  Akiyoshi Suzuki ,  Masato Muraki

发明人： Haruna Kawashima ,  Akiyoshi Suzuki ,  Masato Muraki

IPC分类号： G03F7/207 ,  G03F9/00

CPC分类号： G03F9/7026

摘要： A projection exposure apparatus including a mask stage for supporting a mask, a wafer stage for supporting a wafer, and a projection optical system for projecting, on the wafer, an image of a circuit pattern of the mask, is disclosed. There are provided a surface position detecting system for detecting position of a surface of the water with respect to a direction of an optical axis of the projection optical system, an adjusting device for adjusting an interval between the wafer and the projection optical system, to position the wafer surface at a focus position of the projection optical system, and an outputting portion operable to direct a light beam to a reflection surface, provided at a predetermined site on the wafer stage, and to receive reflection light coming from the reflection surface through the projection optical system, the outputting portion producing a signal corresponding to a positional relationship between the reflection surface and the focus position of the projection optical system. A focus position detecting system detects the focus position of the projecting optical system, on the basis of the signal from the outputting portion, and a control system controls to the adjusting device on the basis of an output of the focus position detecting system and an output of the surface position detecting system.

摘要翻译： 公开了一种投影曝光装置，其包括用于支撑掩模的掩模台，用于支撑晶片的晶片台，以及用于在晶片上投影掩模的电路图案的图像的投影光学系统。 提供了一种用于检测水面相对于投影光学系统的光轴方向的位置的表面位置检测系统，用于调节晶片与投影光学系统之间的间隔的调节装置， 在投影光学系统的聚焦位置处的晶片表面，以及可操作以将光束引导到设置在晶片台上的预定位置处的反射表面的输出部分，并且通过所述反射表面接收来自所述反射表面的反射光 投影光学系统，输出部分产生与投影光学系统的反射表面和焦点位置之间的位置关系相对应的信号。 焦点位置检测系统基于来自输出部分的信号来检测投影光学系统的聚焦位置，并且控制系统基于聚焦位置检测系统的输出和输出来控制调节装置 的表面位置检测系统。

公开(公告)号：US4886975A

公开(公告)日：1989-12-12

申请号：US348177

申请日：1989-05-02

申请人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

发明人： Eiichi Murakami ,  Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/956

CPC分类号： G01N21/94 ,  G01N2021/4719 ,  G01N2021/95676

摘要： An apparatus usable with an object having surfaces, for examining the states of the surfaces, includes on irradiating system for irradiating the surfaces of the object with a single light beam, and a plurality of light-receiving systems provided in association with the surfaces of the object, respectively, the plural light-receiving systems being arranged to receive light scatteringly reflected from the surfaces of the object, respectively, and to produce outputs corresponding to the states of the surfaces of the object, respectively.

摘要翻译： 可用于具有用于检查表面状态的表面的物体的装置包括用于用单个光束照射物体的表面的照射系统，以及与所述物体的表面相关联地设置的多个光接收系统 目的是分别将多个光接收系统分别接收从物体的表面散射地反射的光，并分别产生与物体的表面的状态相对应的输出。

公开(公告)号：US4688932A

公开(公告)日：1987-08-25

申请号：US827015

申请日：1986-02-07

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03B27/48 ,  G03B27/50 ,  G03B27/70

CPC分类号： G03F7/70075 ,  G03F7/703 ,  G03F7/70358 ,  G03F7/70366

摘要： An exposure apparatus for use in the manufacture of semiconductor devices, for transferring an integrated circuit pattern of a reticle onto a semiconductor wafer by use of a projection lens optical system. A portion of the pattern of the reticle is irradiated with a light beam, and the light beam is scanningly deflected so that the whole of the pattern of the reticle is scanned with the light beam, whereby the pattern of the reticle is transferred onto the wafer. For compensation of a curvature of field of the projection lens optical system, the wafer is displaced in the direction of an optical axis of the projection lens optical system in accordance with the position of scan, on the reticle, whereby a high resolving power is assured over the entire surface of the reticle pattern. This allows enlargement of the pattern area of the reticle.

摘要翻译： 一种用于制造半导体器件的曝光装置，用于通过使用投影透镜光学系统将掩模版的集成电路图案转印到半导体晶片上。 掩模版的图案的一部分用光束照射，并且光束被扫描偏转，从而以光束扫描掩模版的整体图案，由此将掩模版的图案转印到晶片上 。 为了补偿投影透镜光学系统的曲率，晶片根据扫描位置在投影透镜光学系统的光轴方向上位于光罩上，由此确保高分辨能力 在标线图案的整个表面上。 这样可以扩大掩模版的图案区域。

公开(公告)号：US4688904A

公开(公告)日：1987-08-25

申请号：US662601

申请日：1984-10-19

申请人： Ryusho Hirose ,  Akiyoshi Suzuki

发明人： Ryusho Hirose ,  Akiyoshi Suzuki

IPC分类号： G02B13/18 ,  G02B17/00 ,  G02B17/08 ,  G03F7/20

CPC分类号： G02B17/0892 ,  G02B17/008 ,  G02B17/0812 ,  G02B17/0852 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70308

摘要： A reflecting optical system including a concave mirror and a convex mirror having opposing reflecting surfaces and disposed coaxially with each other. The reflecting optical system is provided with aspherical lens portions disposed between an object field and the concave mirror and between the concave mirror and an image field, respectively, to achieve a wider superior imaging region of arcuate shape.

摘要翻译： 一种反射光学系统，包括凹面镜和具有相对反射表面并且彼此同轴设置的凸面镜。 反射光学系统设置有分别设置在物场和凹面镜之间以及凹面镜与图像场之间的非球面透镜部分，以实现更广泛的弓形形状的优异成像区域。