公开(公告)号：US5140366A

公开(公告)日：1992-08-18

申请号：US742535

申请日：1991-08-08

申请人： Takahisa Shiozawa ,  Tsuneo Kanda ,  Akiyoshi Suzuki

发明人： Takahisa Shiozawa ,  Tsuneo Kanda ,  Akiyoshi Suzuki

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： Disclosed is an exposure apparatus for printing a pattern of a reticle on different shot areas of the wafer in a step-and-repeat manner. In the disclosed apparatus, an image of an alignment mark of the reticle is printed, by use of a projection lens system, on each of some shot areas of the wafer which are selected as the subject of detection. By this, a latent image of the reticle mark is formed on each of the selected shot areas. The latent image of the reticle mark is detected by a microscope which may be a phase contrast microscope and, from the results of detection concerning all the latent images of the reticle mark, a reference (correction) grid representing the coordinate positions of all the shot areas of the wafer is prepared and stored. In accordance with the stored reference grid, the stepwise movement of the wafer is controlled at the time of the step-and-repeat exposures of the wafer. This assures improved throughput of the apparatus. Further, use of the phase contrast microscope for the detection of the latent image of the reticle mark ensures further improvement in the alignment accuracy.

摘要翻译： 公开了一种用于以分步重复的方式在晶片的不同照射区域上印刷掩模版图案的曝光装置。 在所公开的装置中，通过使用投影透镜系统，在被选择为检测对象的晶片的一些照射区域中的每一个上打印标线的对准标记的图像。 由此，在每个所选择的拍摄区域上形成标线标记的潜像。 通过可以是相差显微镜的显微镜检测标线标记的潜像，并且根据关于标线标记的所有潜像的检测结果，表示所有拍摄的坐标位置的参考（校正）网格 准备并存储晶片的区域。 根据存储的参考栅格，晶片的分步重复曝光时控制晶片的逐步移动。 这确保了设备的生产能力的提高。 此外，使用相差显微镜来检测标线标记的潜像，确保了对准精度的进一步提高。

公开(公告)号：US07573563B2

公开(公告)日：2009-08-11

申请号：US11366356

申请日：2006-03-01

申请人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Seiji Takeuchi ,  Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7085 ,  G01J4/04 ,  G03F7/70058 ,  G03F7/70566 ,  G03F7/70591

摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.

摘要翻译： 曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元 与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测 通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

公开(公告)号：US20070252968A1

公开(公告)日：2007-11-01

申请号：US11742042

申请日：2007-04-30

申请人： Akinori Ohkubo ,  Akiyoshi Suzuki

发明人： Akinori Ohkubo ,  Akiyoshi Suzuki

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70141 ,  G03F7/70191

摘要： An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.

摘要翻译： 将原稿的图案曝光到基板上的曝光装置包括：聚光器系统，被配置为将来自光源的光分离成多根，将多根光线在原稿的不同位置进行冷凝，并且使各个 所述多个光线相对于所述原稿在所述傅里叶变换平面处照亮所述原件比所述周边更暗;以及投影光学系统，其被配置为将所述原稿的图案投影到所述基板上。

公开(公告)号：US07196773B2

公开(公告)日：2007-03-27

申请号：US10538230

申请日：2004-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G02B27/0961 ,  G02B5/32 ,  G02B27/0905 ,  G02B27/0927 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.

摘要翻译： 使用来自光源的光照射照明面的照明光学系统包括：来自光源的光入射的第一衍射光学元件和来自光源的光入射的第二衍射光学元件，其中， 来自第一衍射光学元件的光在与被照射面基本上具有傅立叶变换关系的预定表面上形成照明分布的第一部分，并且来自第二衍射光学元件的光形成照明分布的第二部分。

公开(公告)号：US06681844B1

公开(公告)日：2004-01-27

申请号：US09806503

申请日：2001-04-13

申请人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

发明人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

IPC分类号： F28D900

CPC分类号： F28F3/046 ,  F25B33/00 ,  F25B37/00 ,  F25B39/00 ,  F28D5/02 ,  F28D9/0043 ,  F28D2021/007 ,  F28D2021/0071 ,  F28F3/042 ,  F28F3/044 ,  F28F3/083 ,  F28F9/0275 ,  F28F2250/104

摘要： The present invention relates to a plate type heat exchanger having a heat exchange element composed of two plates for exchanging heat between a fluid flowing inside the heat exchange element and a fluid flowing outside the heat exchange element. In the plate type heat exchanger, the two plates (1) have a plurality of depressions (8), and the depressions are brought into contact with and bonded to each other. Peripheral portions of the plates are sealed to form a space in which a fluid flows and constitute a heat exchange element (2) having opening portions (5, 6) at both ends thereof. The heat exchange elements (2) are piled on and bonded to each other so that the opening portions (5, 6) communicate with each other.

摘要翻译： 本发明涉及一种板式热交换器，其具有热交换元件，该热交换元件由在热交换元件内部流动的流体与流过热交换元件的流体之间进行热交换的两个板构成。 在板式热交换器中，两个板（1）具有多个凹部（8），并且使凹部彼此接触并接合。 板的外围部分被密封以形成流体流动的空间，并且构成在其两端具有开口部分（5,6）的热交换元件（2）。 热交换元件（2）彼此堆叠并彼此结合，使得开口部（5,6）彼此连通。

公开(公告)号：US06534242B2

公开(公告)日：2003-03-18

申请号：US09783600

申请日：2001-02-15

申请人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

发明人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

IPC分类号： G03C500

CPC分类号： G03F7/2022 ,  G03F7/7045 ,  G03F7/70466

摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.

摘要翻译： 一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。 该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与 与第一和第二元素相关的光图案。 与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为 与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。

公开(公告)号：US06441886B2

公开(公告)日：2002-08-27

申请号：US09414437

申请日：1999-10-07

申请人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

发明人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

IPC分类号： G03B2772

CPC分类号： G03F7/70091 ,  G03B27/54

摘要： An illumination optical system for use in an exposure apparatus for projecting a pattern of a mask onto a substrate. The illumination system includes a first beam shape changing optical system for transforming a light, supplied from a light source, into a slit-like light of an oblong shape, and a second beam shape changing optical system for transforming the slit-like light of oblong shape into a slit-like light of an arcuate shape, the second beam shape changing optical system having a prism element. The mask is illuminated with the slit-like light of arcuate shape.

摘要翻译： 一种用于曝光装置的照明光学系统，用于将掩模的图案投影到基底上。 照明系统包括用于将从光源提供的光转换成长方形的狭缝状光的第一光束形状变化光学系统和用于变换长方形狭缝状光的第二光束形状变化光学系统 形成为弧形的狭缝状的光，第二光束形状变化光学系统具有棱镜元件。 面罩用弧形的狭缝状光照亮。

公开(公告)号：US06377337B1

公开(公告)日：2002-04-23

申请号：US09299558

申请日：1999-04-27

申请人： Mitsuro Sugita ,  Akiyoshi Suzuki

发明人： Mitsuro Sugita ,  Akiyoshi Suzuki

IPC分类号： G03B2754

CPC分类号： G03F7/70216 ,  G03B27/54 ,  G03F7/7045

摘要： A projection exposure apparatus, having a multiple exposure mode, for projecting a pattern of a mask onto a wafer. In the apparatus, an illumination system illuminates the mask and a projection system supplies into an optical path a filter which blocks a zero-order light beam of diffracted light projected from the mask. An exposure step in the mode of multiple exposure is performed in a state in which the filter has been supplied into the optical path.

摘要翻译： 一种具有多重曝光模式的投影曝光装置，用于将掩模的图案投影到晶片上。 在该装置中，照明系统照亮掩模，并且投影系统向光路提供阻挡从掩模投影的衍射光的零级光束的滤光器。 在将滤光器提供到光路中的状态下进行多次曝光模式的曝光步骤。

公开(公告)号：US5361122A

公开(公告)日：1994-11-01

申请号：US11097

申请日：1993-01-29

申请人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

发明人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

IPC分类号： G03F7/207 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7026

摘要： A focusing method is disclosed wherein a substrate is moved substantially along a focal plane of a projection optical system up to a predetermined station adjacent to the focal plane of the projection optical system and then, at the predetermined station, the surface of the substrate is brought into substantial coincidence with the focal plane of the projection optical system. The method includes the steps of detecting a deviation of the surface of the substrate with respect to the focal plane of the projection optical system, before the substrate, being moved substantially along the focal plane of the projection optical system, is moved up to the predetermined station; and substantially correcting the deviation on the basis of the detection.

摘要翻译： 公开了一种聚焦方法，其中基板沿着投影光学系统的焦平面移动直到与投影光学系统的焦平面相邻的预定台，然后在预定的位置，使基板的表面 与投影光学系统的焦平面大致一致。 该方法包括以下步骤：在基板沿着投影光学系统的焦平面移动之前，检测基板相对于投影光学系统的焦平面的表面的偏差， 站; 并且基于检测基本上校正偏差。

公开(公告)号：US5359407A

公开(公告)日：1994-10-25

申请号：US177189

申请日：1994-01-03

申请人： Akiyoshi Suzuki ,  Michio Kohno

发明人： Akiyoshi Suzuki ,  Michio Kohno

IPC分类号： G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G02B26/12 ,  G03F1/84 ,  G03F7/20 ,  H01L21/66

CPC分类号： G01N21/8806 ,  G02B26/123 ,  G03F7/70483 ,  G01N2201/0636

摘要： An optical system is arranged so that a scanning light beam for scanning a first region to be inspected and a scanning light beam for scanning a second region to be inspected are not simultaneously incident upon an object to be inspected. This prevents an adverse influence on the inspection caused by flare light generated when one scanning light beam is incident upon an edge of the object and is received by a light-receiving optical system for the region to be inspected scanned by another scanning light beam. The system includes two polygon mirrors provided as one body in an optical system at a position for projecting the light beams so that the distance between a focus point of the light beam projected on the lower surface of the object and a focus point of the light beam projected on the upper surface of the object in the beam scanning direction is greater than the width of the object in the beam scanning direction. As a result, the two light beams are alternately incident upon the object.

摘要翻译： 光学系统被布置成使得用于扫描待检查的第一区域的扫描光束和用于扫描待检查的第二区域的扫描光束不会同时入射到待检查对象上。 这防止了当一个扫描光束入射到物体的边缘上并且被受光光学系统接收的由另一个扫描光束进行检查的区域的光束所产生的火炬光引起的检查的不利影响。 该系统包括在用于投射光束的位置处的光学系统中作为一体设置的两个多面镜，使得投射在物体的下表面上的光束的焦点与光束的焦点之间的距离 投影在物体的上表面上的光束扫描方向大于物体在光束扫描方向上的宽度。 结果，两个光束交替地入射到物体上。