公开(公告)号：US5309197A

公开(公告)日：1994-05-03

申请号：US868705

申请日：1992-04-15

申请人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

发明人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/00

摘要： A projection exposure apparatus includes a projection lens system for projecting an image of a pattern of an original on a substrate having a photosensitive layer, by using a sensitizing beam; a first detection optical system for detecting a mark of the substrate through the projection lens system and with a first non-sensitizing beam, the first detection optical system producing first information related to the position of the mark; a second detection optical system for detecting the mark of the substrate without the projection lens system and with a second nonsensitizing beam having a bandwidth broader than that of the first non-sensitizing beam, the second detection optical system producing second information related to the position of the mark; and a detector for detecting an error included in the first information, by using the first and second information.

摘要翻译： 投影曝光装置包括：投影透镜系统，用于通过使用敏化光束将原稿的图案的图像投影在具有感光层的基板上; 第一检测光学系统，用于通过投影透镜系统和第一非感光束检测基板的标记，第一检测光学系统产生与标记的位置相关的第一信息; 第二检测光学系统，用于在没有投影透镜系统的情况下检测基板的标记，并且具有比第一非敏感光束宽的带宽的第二非敏感光束，第二检测光学系统产生与位置相关的第二信息 标记; 以及用于通过使用第一和第二信息来检测包括在第一信息中的错误的检测器。

公开(公告)号：US4883359A

公开(公告)日：1989-11-28

申请号：US186773

申请日：1988-04-25

申请人： Hideki Ina ,  Akiyoshi Suzuki

发明人： Hideki Ina ,  Akiyoshi Suzuki

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F9/00

摘要： An alignment method and a pattern forming method using the same, wherein a substrate onto which a complete pattern is to be transferred is held by a holder having formed thereon at least two alignment marks disposed in a predetermined positional relation with each other. Separate masks having relatively complementing pattern segments are used. Each of the masks is aligned with corresponding portion of the holder through an associated one of the alignment marks. As the result, the pattern segments transferred onto the substrate is aligned with each other and the continuity of the pattern is assured on the substrate. Also provided is an alignment mark forming method and a pattern forming method using the same, wherein the region on a substrate in which a continuous pattern is to be formed is divided into at least two sections and alignment marks for these sections are simultaneously formed on the substrate by means of one single mask, so that the segments of the pattern which are first to be transferred onto the sections of the substrate can be aligned with each other when they are transferred onto the substrate.

摘要翻译： 使用该方法的定位方法和图案形成方法，其中，要在其上形成完整图案的基板由其上形成有至少两个彼此以预定位置关系的对准标记的保持器保持。 使用具有相对互补图案片段的分离掩模。 每个掩模通过相关联的一个对准标记与保持器的相应部分对齐。 结果，转移到衬底上的图案片段彼此对准，并且在衬底上确保图案的连续性。 还提供了一种对准标记形成方法和使用其的图案形成方法，其中将要形成连续图案的基板上的区域划分为至少两个部分，并且在这些部分上同时形成用于这些部分的对准标记 通过一个单一的掩模进行衬底，使得当衬底转移到衬底上时，首先要转移到衬底的部分上的图案的段可以彼此对准。

公开(公告)号：US4830499A

公开(公告)日：1989-05-16

申请号：US94086

申请日：1987-09-04

申请人： Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Hideki Ina ,  Akiyoshi Suzuki

IPC分类号： G03B27/32 ,  G01B11/00 ,  G02B17/02 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70 ,  G02B17/02 ,  H01L21/30

摘要： An optical device includes an objective lens, a relay lens group for relaying the beam from the objective lens, and a compensator for compensating the variation in the optical path length, which occurs when the relative position between said objective lens and said relay lens group changes, by expanding or contracting the optical path.

摘要翻译： 光学装置包括物镜，用于中继来自物镜的光束的中继透镜组以及用于补偿光路长度变化的补偿器，当所述物镜和所述中继透镜组之间的相对位置发生变化时 ，通过扩大或缩小光路。

公开(公告)号：US4641035A

公开(公告)日：1987-02-03

申请号：US642760

申请日：1984-08-21

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86 ,  G01V9/04

CPC分类号： G03F9/70 ,  H01L21/30

摘要： An apparatus and method for position detection for an object having a detection pattern formed by a concavity or convexity. The position detecting apparatus includes a scanning system for scanning the object with a light beam, a photoelectric transducer for receiving the information light reflected from the detection pattern to produce an electric signal, and a processing unit for computing, on the basis of the electric signal, the position of the detection pattern. Unwanted components included in the information light are prevented from being received by the photoelectric transducer, or electric signals corresponding to the unwanted components are excluded, so that the accuracy of signal processing and the accuracy of position detection are improved.

摘要翻译： 一种用于具有通过凹凸形成的检测图案的物体的位置检测的装置和方法。 该位置检测装置包括用光束扫描物体的扫描系统，用于接收从检测图案反射的信息光以产生电信号的光电传感器，以及用于根据电信号计算的处理单元 ，检测模式的位置。 信息光中包含的不需要的组件被光电传感器阻止，或排除与不需要的部件相对应的电信号，从而提高了信号处理的精度和位置检测的精度。

公开(公告)号：US5137363A

公开(公告)日：1992-08-11

申请号：US532229

申请日：1990-06-05

申请人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

发明人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： A projection exposure apparatus for projecting a pattern formed on a first object such as a reticle upon a second object such as a semiconductor wafer by use of a projection lens system, is disclosed. In the apparatus, a light of a predetermined wavelength is used for the pattern projection, and a light having a different wavelength is used to align the first and second objects by way of the projection lens system. A dichroic mirror film is disposed inclinedly between the first object and the projection lens system so as to reflect one of the light of the predetermined wavelength and the light of the different wavelength, and also to transmit the other. By this dichroic mirror film, the light used for the alignment and reflected back from the second object is extracted out of a light path between the first and second objects. After correcting effects of chromatic aberrations of the projection lens system with respect to the different wavelength, the light for the alignment is passed through the first object. By this, accurate alignment using the light of a wavelength different from that to be used for the pattern projection, is made practically attainable. Also, use of lights of different wavelengths, other than the wavelength to be used for the pattern projection, is made practically attainable. Thus, accurate and stable alignment is attainable regardless of the configuration of the mark provided on the second object.

摘要翻译： 公开了一种投影曝光装置，用于通过使用投影透镜系统将形成在第一物体（例如掩模版）上的图案投射到诸如半导体晶片的第二物体上的投影曝光装置。 在该装置中，对于图案投影使用预定波长的光，并且使用具有不同波长的光来通过投影透镜系统对准第一和第二物体。 二分色镜膜倾斜地设置在第一物体和投影透镜系统之间，以便反射预定波长的光和不同波长的光之一，并且还传送另一个。 通过这种二向色镜膜，从第二物体的对准和反射回来的光从第一和第二物体之间的光路中提取出来。 在校正投影透镜系统的色差相对于不同波长的效果之后，用于对准的光通过第一物体。 由此，实际上可以实现使用与用于图案投影的波长不同的波长的光的精确对准。 此外，实际上可以使用除了用于图案投影的波长之外的不同波长的光。 因此，无论设置在第二物体上的标记的构造如何，均可实现准确和稳定的对准。

公开(公告)号：US5048967A

公开(公告)日：1991-09-17

申请号：US579252

申请日：1990-09-05

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC分类号： G03F9/7069

摘要： A detection optical system for detecting a pattern on the surface of an object includes an illumination device for illuminating the surface of the object with a light beam, a scanning system cooperable with the illumination device to scan the surface of the object with the light beam, and an optical arrangement for receiving light from each point on the surface of the object scanningly illuminated with the light beam by the cooperation of the illumination device and the scanning system. The optical arrangement is effective to form an image of a light spot, formed by the light beam upon the surface of the object. The optical arrangement includes a stop member disposed at a position whereat the image of the light spot is formed. The stop member has an aperture of a size substantially the same as, or not greater than, that of the image of the light spot, wherein the pattern on the surface of the object is detected on the basis of light passed through the stop member.

摘要翻译： 用于检测物体表面上的图案的检测光学系统包括用光束照射物体的表面的照明装置，与照明装置配合的扫描系统，用光束扫描物体的表面， 以及光学装置，用于通过照明装置和扫描系统的协作从光束的扫描照射的物体的表面上的每个点接收光。 光学布置有效地形成由物体表面上的光束形成的光点的图像。 光学装置包括设置在形成光点的图像的位置处的止挡构件。 止挡构件具有与光斑图像基本相同或不大于的光圈，其中基于通过阻挡构件的光检测物体表面上的图案。

公开(公告)号：US4888614A

公开(公告)日：1989-12-19

申请号：US333727

申请日：1989-04-03

申请人： Akiyoshi Suzuki ,  Hideki Ina ,  Masao Kosugi

发明人： Akiyoshi Suzuki ,  Hideki Ina ,  Masao Kosugi

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： An observation system, usable with a projection optical system for optically projecting a first object upon a second object by use of a light of a first wavelength, for observing the second object by way of the projection optical system and by use of a light of a second wavelength different from the first wavelength. The observation system includes an observation optical system having a lens element and a parallel-surface plate which is inclined with respect to an optical axis of the observation optical system, wherein the observation optical system is arranged to form an image of the second object on a predetermined image surface and wherein the parallel-surface plate is arranged to substantially correct coma caused by the projection optical system.

摘要翻译： 一种观察系统，可用于投影光学系统，用于通过使用第一波长的光将第一物体光学投射到第二物体上，用于通过投影光学系统观察第二物体，并且通过使用 第二波长不同于第一波长。 观察系统包括具有透镜元件和相对于观察光学系统的光轴倾斜的平行面板的观察光学系统，其中观察光学系统被布置成在第一对象的形状上形成第二物体的图像 预定的图像表面，并且其中平行表面板被布置成基本上校正由投影光学系统引起的彗差。

公开(公告)号：US4634240A

公开(公告)日：1987-01-06

申请号：US574351

申请日：1984-01-27

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： H01L21/30 ,  G02B27/28 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/66 ,  G02B7/11

CPC分类号： G03F9/7065 ,  G02B27/28

摘要： An optical apparatus includes an illumination system for illuminating an object with a polarized beam in the desired state of polarization and an imaging system having a polarizing plate adapted to select a desired state of polarization of the beam and a variable magnification zoom erector, the state of polarization of the beam in the illuminating or imaging system being variable in accordance with the change of image magnification in the zoom erector, whereby the quantity of light for observation can effectively be controlled in accordance with the variations of image magnification in the imaging system.

摘要翻译： 一种光学装置包括用于以期望的偏振状态以偏振光束照射物体的照明系统和具有适于选择所需光束的期望偏振状态的偏振片的成像系统和可变放大缩放放大器的状态 照明或成像系统中的光束的偏振根据变焦放大器中的图像放大率的变化而变化，由此可以根据成像系统中的图像放大率的变化来有效地控制用于观察的光量。

公开(公告)号：US4621890A

公开(公告)日：1986-11-11

申请号：US555526

申请日：1983-11-28

申请人： Akiyoshi Suzuki ,  Hideki Ina ,  Kazuo Takahashi

发明人： Akiyoshi Suzuki ,  Hideki Ina ,  Kazuo Takahashi

IPC分类号： G02B27/00 ,  G02B27/09 ,  G02B27/64 ,  G02B26/08

CPC分类号： G02B27/0927 ,  G02B27/09 ,  G02B27/0988

摘要： An optical apparatus for imaging light from a laser device into a spot shape includes an objective lens for converting parallel rays into a spot-like light, the pupil plane of the objective lens being located at a position conjugate with the emitting plane of the laser device so that the amount of light at the spot will less be changed under variations of emitting angle in the laser device.

摘要翻译： 用于将来自激光装置的光成像为光斑形状的光学装置包括用于将平行光转换为点状光的物镜，物镜的光瞳面位于与激光装置的发射平面共轭的位置 使得在激光装置中的发射角度的变化下，在点处的光量将不会改变。

公开(公告)号：US5160957A

公开(公告)日：1992-11-03

申请号：US795252

申请日：1991-11-19

申请人： Hideki Ina ,  Masao Kosugi ,  Akiyoshi Suzuki

发明人： Hideki Ina ,  Masao Kosugi ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68

CPC分类号： G03F9/70 ,  G03F7/2002

摘要： A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device including a portion for forming a photoprint of the alignment mark of the mask on the resist layer provided on the surface of the wafer, a portion for removing at least a portion of the resist layer adjacent to the alignment mark of the wafer, and a portion for detecting the alignment mark of the wafer and the photoprint of the alignment mark of the mask.

摘要翻译： 一种可用于对准和曝光装置的标记检测装置，用于将掩模的对准标记与晶片的对准标记对准，并且用于将设置在晶片表面上的抗蚀剂层暴露于具有辐射的掩模图案。 该装置包括用于在设置在晶片表面上的抗蚀剂层上形成掩模的对准标记的照相印刷部分，用于去除与晶片的对准标记相邻的抗蚀剂层的至少一部分的部分，以及 用于检测晶片的对准标记的部分和掩模的对准标记的照相印刷。