公开(公告)号：US20100075500A1

公开(公告)日：2010-03-25

申请号：US12382461

申请日：2009-03-17

申请人： Masaru Yoshikawa ,  Tadashi Inaba ,  Hiroshi Inada ,  Takamitsu Tomiga

发明人： Masaru Yoshikawa ,  Tadashi Inaba ,  Hiroshi Inada ,  Takamitsu Tomiga

IPC分类号： H01L21/463 ,  H01L21/465 ,  C09K13/00 ,  C07D249/04 ,  C07D249/08

CPC分类号： C09G1/02 ,  B24B37/044 ,  H01L21/3212

摘要： The invention provides a metal polishing slurry containing a compound represented by the general formula (1): (X1)n-L wherein X1 represents a heterocycle containing at least one nitrogen atom, n represents an integer of 2 or more, and L represents a linking group having a valence of 2 or more, provided that X1s whose number is n may be the same or different, an oxidizer and an organic acid; and a method of chemical mechanical polishing using such slurry. The metal polishing slurry and the chemical mechanical polishing method are used in chemical mechanical polishing in the step of manufacturing semiconductor devices and enable a high polishing rate to be achieved while causing minimal dishing in polishing an object (wafer).

摘要翻译： 本发明提供含有通式（1）表示的化合物：（X1）nL的金属研磨浆料，其中，X1表示含有至少一个氮原子的杂环，n表示2以上的整数，L表示连结基 化合价为2以上，条件是其数为n的X1可以相同或不同，为氧化剂和有机酸; 以及使用这种浆料的化学机械抛光的方法。 在制造半导体器件的步骤中使用金属抛光浆料和化学机械抛光方法进行化学机械抛光，并且能够在抛光物体（晶片）的同时最小化凹陷时实现高抛光速率。

公开(公告)号：US20070266808A1

公开(公告)日：2007-11-22

申请号：US11662249

申请日：2005-09-29

申请人： Hiroshi Kanemitsu ,  Masaru Yoshikawa ,  Masaharu Hatta

发明人： Hiroshi Kanemitsu ,  Masaru Yoshikawa ,  Masaharu Hatta

IPC分类号： F16H23/00

CPC分类号： F04B27/1054 ,  F04B27/0886 ,  F05C2201/0475 ,  F05C2201/0487 ,  F05C2203/06 ,  F05C2251/10 ,  F05C2253/12 ,  F16H23/00 ,  Y10T74/18336 ,  Y10T428/12993

摘要： A sliding device 1 is constituted of a swash plate 3 including a first sliding surface 3A and a semispherical shoe 4 sliding with the swash plate 3. The swash plate 3 is constituted of a base material 3B of high strength brass containing Mn and Si, and very small granular Mn—Si compounds 6 are exposed on an inside of the base material 3B and on the first sliding surface 3A (surface of the base material 3B). The above described swash plate 3 increases in exposure amount of the Mn—Si compounds 6 exposed on the first sliding surface 3A being the surface by applying etching to the base material 3B after cutting the base material 3B. The sliding device 1 which is favorable in seizure resistance at low manufacturing cost as compared with the conventional sliding devices can be provided.

摘要翻译： 滑动装置1由包括第一滑动面3A和与斜盘3滑动的半球形鞋4的斜盘3构成。 斜盘3由含有Mn和Si的高强度黄铜的基材3B构成，非常小的粒状Mn-Si化合物6暴露在基材3B的内部和第一滑动面3A上（ 基材3B的表面）。 上述旋转斜盘3通过在切割基材3B之后对基材3B进行蚀刻而在暴露在作为表面的第一滑动面3A上的Mn-Si化合物6的曝光量增加。滑动装置1 与传统的滑动装置相比，可以在低制造成本下具有良好的抗咬合性。

公开(公告)号：US06586670B2

公开(公告)日：2003-07-01

申请号：US09928989

申请日：2001-08-15

申请人： Masaru Yoshikawa

发明人： Masaru Yoshikawa

IPC分类号： H01L3104

CPC分类号： H01G9/2009 ,  H01G9/2027 ,  H01G9/2031 ,  H01L51/005 ,  H01L51/0077 ,  H01L51/0078 ,  H01L51/0084 ,  Y02E10/542 ,  Y02P70/521

摘要： A method for producing a photoelectric conversion device comprising a conductive support and a photosensitive layer containing a semiconductor fine particle on which a dye is adsorbed, wherein the semiconductor fine particle is treated with a compound represented by the following general formula (I): wherein X represents an oxygen atom, a sulfur atom, a selenium atom or NY, in which Y represents a hydrogen atom, an aliphatic hydrocarbon group, a hydroxyl group or an alkoxy group; R1, R2, R3 and R4 independently represent a hydrogen atom, an aliphatic hydrocarbon group, an aryl group, a heterocyclic group, —N(R5)(R6), —C(═O)R7, —C(═S)R8, —SO2R9 or —OR10; R5 and R6 independently have the same meaning as the R1, R2, R3 and R4; R7, R8 and R9 independently represent a hydrogen atom, an aliphatic hydrocarbon group, an aryl group, a heterocyclic group, —N(R5)(R6), —OR10 or —SR11; and R10 and R11 independently represent a hydrogen atom or an aliphatic hydrocarbon group.

摘要翻译： 一种光电转换装置的制造方法，其特征在于，包括导电性支持体和含有吸附有染料的半导体微粒的感光层，其中，所述半导体微粒用下述通式（I）表示的化合物进行处理：其中X 表示氧原子，硫原子，硒原子或NY，其中Y表示氢原子，脂族烃基，羟基或烷氧基; R1，R2，R3和R4独立地表示氢原子，脂族烃基，芳基，杂环基，-N（R5）（R6），-C（= O）R7，-C（= S）R8 ，-SO 2 R 9或-OR 10; R5和R6独立地具有与R1，R2，R3和R4相同的含义; R7，R8和R9独立地表示氢原子，脂族烃基，芳基，杂环基，-N（R5）（R6），-OR10或-SR11; R 10和R 11独立地表示氢原子或脂肪族烃基。

公开(公告)号：US5922519A

公开(公告)日：1999-07-13

申请号：US653013

申请日：1996-05-24

申请人： Takatoshi Ishikawa ,  Masaru Yoshikawa ,  Tetsuro Kojima

发明人： Takatoshi Ishikawa ,  Masaru Yoshikawa ,  Tetsuro Kojima

IPC分类号： G03C7/00 ,  C09D5/23 ,  G03C1/00 ,  G03C1/74 ,  G03C7/42 ,  G03C7/44 ,  G11B5/633 ,  G11B5/73

CPC分类号： G03C7/42 ,  G03C7/421

摘要： A method for processing a silver halide color photographic photosensitive material comprises the steps of desilverizing a photosensitive silver halide material having at least one red-sensitive layer, green-sensitive layer and blue-sensitive layer respectively on one side of a transparent support and a magnetic recording layer containing magnetic grains on the other side after the color development and then washing it with water and/or stabilizing it, wherein a bath having fixing function used in the desilverization step contains the following compound or analogue thereof. ##STR1## This method does not impair the S/N ratio of the magnetically recorded information and excellent desilverization effect can be obtained.

摘要翻译： 一种用于处理卤化银彩色照相感光材料的方法包括以下步骤：将具有至少一个红色敏感层，感光层和蓝色敏感层的感光卤化银材料分别去除在透明支持体的一侧上， 在显色后在另一侧含有磁性颗粒的记录层，然后用水洗涤和/或使其稳定，其中在脱银步骤中使用的具有固定功能的浴含有以下化合物或其类似物。 该方法不损害磁记录信息的S / N比，可以获得优异的去银化效果。

公开(公告)号：US5814435A

公开(公告)日：1998-09-29

申请号：US692118

申请日：1996-08-05

申请人： Tetsuro Kojima ,  Masaru Yoshikawa ,  Yoshihiro Fujita

发明人： Tetsuro Kojima ,  Masaru Yoshikawa ,  Yoshihiro Fujita

IPC分类号： G03C5/38 ,  G03C7/30 ,  G03C7/42

CPC分类号： G03C7/421 ,  G03C7/3046 ,  G03C5/38

摘要： There is disclosed a photographic composition having fixing capacity and a method for processing a silver halide photographic material using the same. The photographic composition having fixing capacity comprises at least one compound represented by the following formula (I): RSO.sub.2 M formula (I) wherein R represents a lower alkyl group having 1 to 3 carbon atoms, and M represents a hydrogen atom or a cationic group.

摘要翻译： 公开了具有定影能力的照相组合物和使用其的卤化银照相材料的处理方法。 具有固定能力的照相组合物包含至少一种由下式（I）表示的化合物：其中R表示碳原子数1〜3的低级烷基，M表示氢原子或阳离子性基团的RSO 2式（I）。

公开(公告)号：US5543272A

公开(公告)日：1996-08-06

申请号：US194509

申请日：1994-02-10

申请人： Tetsuro Kojima ,  Masaru Yoshikawa ,  Yoshihiro Fujita

发明人： Tetsuro Kojima ,  Masaru Yoshikawa ,  Yoshihiro Fujita

IPC分类号： G03C5/38 ,  G03C7/42

CPC分类号： G03C5/38 ,  G03C7/421

摘要： There is disclosed a photographic composition having fixing capacity and a method for processing a silver halide photographic material using the same. The photographic composition having fixing capacity comprises a photographic composition having fixing capacity, which comprises at least one compound represented by the following formula (I) and at least one compound represented by the following formula (II):RSO.sub.2 SM formula (I)wherein R represents an aliphatic group, an aromatic group, or a heterocyclic group, and M represents a hydrogen atom or a cationic group,R.sup.1 SO.sub.2 M.sup.1 formula (II)wherein R.sup.1 represents an aliphatic group, an aromatic group, or a heterocyclic group, and M.sup.1 represents a hydrogen atom or a cationic group.

摘要翻译： 公开了具有定影能力的照相组合物和使用其的卤化银照相材料的处理方法。 具有固定能力的照相组合物包括具有固定能力的照相组合物，其包含至少一种由下式（I）表示的化合物和至少一种由下式（II）表示的化合物：其中R表示 脂肪族基团，芳香族基团或杂环基团，M表示氢原子或阳离子基团，其中R1表示脂肪族基团，芳香族基团或杂环基团的R1SO2M1型（Ⅱ），M1表示氢原子或 阳离子基团。