摘要:
A method of processing a silver halide color photographic material comprises the steps of color-developing an image-wise exposed silver halide color photographic material and subjecting the developed material to desilvering in a processing bath having a fixing function and containing a thiosulfate compound and the following compound or analogue thereof in a molar ratio of 1/0.05 to 1/0.30. In this process, the fixing speed is extremely high even when the replenishing rate is low and the processed photosensitive material has an excellent resistance to fading by light.
摘要:
A method for processing a silver halide color photographic photosensitive material comprises the steps of desilverizing a photosensitive silver halide material having at least one red-sensitive layer, green-sensitive layer and blue-sensitive layer respectively on one side of a transparent support and a magnetic recording layer containing magnetic grains on the other side after the color development and then washing it with water and/or stabilizing it, wherein a bath having fixing function used in the desilverization step contains the following compound or analogue thereof. ##STR1## This method does not impair the S/N ratio of the magnetically recorded information and excellent desilverization effect can be obtained.
摘要:
There is disclosed a photographic composition having fixing capacity and a method for processing a silver halide photographic material using the same. The photographic composition having fixing capacity comprises at least one compound represented by the following formula (I): RSO.sub.2 M formula (I) wherein R represents a lower alkyl group having 1 to 3 carbon atoms, and M represents a hydrogen atom or a cationic group.
摘要:
There is disclosed a photographic composition having fixing capacity and a method for processing a silver halide photographic material using the same. The photographic composition having fixing capacity comprises a photographic composition having fixing capacity, which comprises at least one compound represented by the following formula (I) and at least one compound represented by the following formula (II):RSO.sub.2 SM formula (I)wherein R represents an aliphatic group, an aromatic group, or a heterocyclic group, and M represents a hydrogen atom or a cationic group,R.sup.1 SO.sub.2 M.sup.1 formula (II)wherein R.sup.1 represents an aliphatic group, an aromatic group, or a heterocyclic group, and M.sup.1 represents a hydrogen atom or a cationic group.
摘要:
A method of producing a dispersion composition containing titanium black, a solvent and a dispersant including at least a first dispersant and a second dispersant, and the method includes dispersing a mixed liquid containing the titanium black, the first dispersant and the solvent, and adding the second dispersant to the dispersed mixed liquid and dispersing the same, wherein at least a part of the dispersant has an acid value of 50 mgKOH/g or more.
摘要:
A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.
摘要:
A metal polishing slurry which is capable of simultaneously realizing a high polishing speed and reduced dishing in the polishing of a subject to be polished is provided. The metal polishing slurry includes, an oxidizing agent; and an organic acid; and a compound represented by the following general formula (1):
摘要:
A hemispherical shoe 4 is equipped with a sliding surface 4A which slides with a swash plate 3, and a hemispherical convex 4B. Hardening is performed by radiating a laser so that a lot of minute circles 6 may be drawn on the sliding surface 4A. Then, lapping is given to the sliding surface 4A and, finally buffing is given. Thereby, the lot of annular swelling portions 7′ and concavities 8′ are formed in positions of the circles 6, and further, lubricating oil passages 10′ which include net-like concavities are formed in the sliding surface 4A. A hardening part is formed of the lot of above-mentioned annular swelling portions 7′. The above-mentioned annular swelling portions 7′ are formed so that a ratio of an area of a total of all the above-described annular swelling portions 7′ occupies in an area of the sliding surface 4A which is a hardening object domain may become 0.3 to 0.8. It is possible to provide the shoe 4 which is good in seize resistance in comparison with the past.
摘要:
The invention provides a polishing liquid for polishing a barrier layer of a semiconductor integrated circuit, the polishing liquid comprising: a diquaternary ammonium cation; a corrosion inhibiting agent; and a colloidal silica, wherein the pH of the polishing liquid is in the range of 2.5 to 5.0. According to the invention, a polishing liquid capable of achieving a superior barrier layer polishing rate, as well as suppressing the occurrence of scratching due to the agglomeration of solid abrasive grains can be provided.
摘要:
The invention provides a dispersed composition including: (A) titanium black; (B) a polymer compound including a constituent component having a side chain structure to which an acidic group is linked via a linking group; and (C) a solvent. The (B) polymer compound is a polymer having a structure in which an acidic group is linked to a main chain part via a linking group.