公开(公告)号：US20110068260A1

公开(公告)日：2011-03-24

申请号：US12992608

申请日：2009-05-18

Applicant: Erik Martinus Hubertus Petrus Van Dijk ,  Cornelius Antonius Hezemans

Inventor： Erik Martinus Hubertus Petrus Van Dijk ,  Cornelius Antonius Hezemans

IPC: H01J40/14 ,  G01N21/64 ,  G02B21/00

CPC classification number: G01N21/6452 ,  G01N2021/6463 ,  G01N2201/1053 ,  G02B21/0032

Abstract: An optical system for detecting light from a 2D area of a sample (36) comprises a collection lens (34) for collecting light from a collection region of the sample. A light detector (44) is positionally fixed with respect to the sample, and a reflector arrangement (61) directs collected light to the detector. The reflector arrangement comprises movable components and the collection lens (34) is movable relative to the sample. The collection lens and the movable components are configurable to define different collection regions, and the movement of the components effects a direction of the light from the collection region to a substantially unchanged area of the light detector (44). This arrangement avoids the need for a bulky detector in order to detect signals from a 2D sample area formed by scanning across the sample.

Abstract translation: 用于检测来自样品（36）的2D区域的光的光学系统包括用于收集来自样品的收集区域的光的收集透镜（34）。 光检测器（44）相对于样品位置固定，反射器装置（61）将收集的光引导到检测器。 反射器装置包括可移动部件，并且收集透镜（34）可相对于样品移动。 收集透镜和可移动部件可配置为限定不同的收集区域，并且部件的移动影响来自光收集区域的光的方向到光检测器（44）的基本上不变的区域。 这种布置避免了对庞大检测器的需要，以便检测来自通过扫描样品形成的2D样品区域的信号。

公开(公告)号：US20070146685A1

公开(公告)日：2007-06-28

申请号：US11625778

申请日：2007-01-22

Applicant: Woo Yoo ,  Kitaek Kang

Inventor： Woo Yoo ,  Kitaek Kang

IPC: G01B11/16 ,  G01B11/24

CPC classification number: G01B11/306 ,  G01B11/2513 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/1053

Abstract: Systems and techniques for characterizing samples using optical techniques are described. Light may be incident on a sample in the form of a pre-defined pattern which impinges on a wafer surface, and a reflection of the pattern is detected at a detector. Information indicative of changes in the pattern after reflection may be used to determine one or more sample characteristics and/or one or more pattern characteristics, such as stress, warpage, and curvature. The light may be coherent light of a single wavelength, or may be light of multiple wavelengths, and the pattern may be generated by transmission of the light through a diffraction grating, or hologram. The light source may be incoherent or multi-wavelength, and the pattern may be generated by imaging a pattern disposed on a mask on the sample and re-imaging the pattern at the detector.

Abstract translation: 描述使用光学技术表征样品的系统和技术。 光可以以照射在晶片表面上的预定图案的形式入射到样品上，并且在检测器处检测图案的反射。 指示反射后图案变化的信息可用于确定一个或多个样品特性和/或一个或多个图案特征，例如应力，翘曲和曲率。 光可以是单个波长的相干光，或者可以是多个波长的光，并且可以通过衍射光栅或全息图的透射来产生图案。 光源可以是不相干的或多波长的，并且可以通过对设置在样品上的掩模上的图案进行成像并在检测器处重新成像图案来生成图案。

公开(公告)号：US20050088656A1

公开(公告)日：2005-04-28

申请号：US10970518

申请日：2004-10-21

Applicant: Noriaki Soga ,  Jun Koshoubu ,  Hiroshi Tsukada

Inventor： Noriaki Soga ,  Jun Koshoubu ,  Hiroshi Tsukada

IPC: G01N21/27 ,  G01N21/59 ,  G01N21/55

CPC classification number: G01N21/3563 ,  G01N21/55 ,  G01N21/59 ,  G01N2201/1053 ,  G01N2201/117

Abstract: A mapping-measurement apparatus for applying mapping measurement to a predetermined area on a surface of a sample, comprising: a light illumination unit for illuminating the sample with light; a photodetector for detecting, through an aperture, reflection light or transmission light coming from the sample; and a detection-side scanning mirror provided in the optical path from the sample to the aperture. The aperture restricts light to be detected by the photodetector only to light coming from a given measurement portion only on the surface of the sample. The detection-side scanning mirror is structured such that the direction of a reflection plane thereof can be changed. The direction of the reflection plane of the detection-side scanning mirror is changed with respect to the incident direction of the reflection light or the transmission light coming from the sample to change the measurement portion on the surface of the sample where measurement is performed by the photodetector.

Abstract translation: 一种用于将样本测量应用于样品表面上的预定区域的测绘装置，包括：用光照射样品的光照射单元; 光检测器，用于通过孔径检测来自样品的反射光或透射光; 以及设置在从样品到孔的光路中的检测侧扫描反射镜。 孔径仅将光检测器的光限制在仅在样品表面上的来自给定测量部分的光。 检测侧扫描镜的结构使得其反射面的方向可以改变。 检测侧扫描反射镜的反射面的方向相对于来自样品的反射光或透射光的入射方向发生变化，从而将被测定的样品的表面上的测定部变更为 光电探测器

公开(公告)号：US5173796A

公开(公告)日：1992-12-22

申请号：US703285

申请日：1991-05-20

Applicant: Steven G. Palm ,  Elwin M. Beaty

Inventor： Steven G. Palm ,  Elwin M. Beaty

IPC: G01B11/02 ,  G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G02B26/10 ,  H04N1/19

CPC classification number: G02B26/101 ,  G01B11/02 ,  G01N21/88 ,  G01N2021/8887 ,  G01N2021/95638 ,  G01N21/93 ,  G01N2201/102 ,  G01N2201/1053 ,  Y10S359/90

Abstract: A part scanning and part calibration apparatus and mechanism for the inspection of printed circuit boards and integrated circuits include a camera and two rotating mirrors to scan an image of a pattern mask retical upon which a precise pattern has been deposited. Small parts are placed upon the retical to be inspected. The third overhead mirror is provided to view the part under inspection from another perspective. The scene of the part is triangulated and the dimensions of the system can thus be calibrated. A precise retical mask is provided with dot patterns which provide an additional set of information needed for calibration. By scanning more then one dot pattern the missing state values can be resolved using an iterative trigonomic solution.

Abstract translation: 用于检查印刷电路板和集成电路的部件扫描和部件校准装置和机构包括相机和两个旋转镜，用于扫描已经沉积精确图案的图案掩模图案的图像。 小部件放置在被检查的retical上。 提供第三顶置反射镜以从另一个角度来观察被检查的部件。 该部件的场景是三角形的，因此可以校准系统的尺寸。 提供了精确的掩模掩模，其具有提供校准所需的另外一组信息的点图案。 通过扫描更多的一个点图案，可以使用迭代的三角解决方案来解决缺失的状态值。

公开(公告)号：US5118945A

公开(公告)日：1992-06-02

申请号：US513902

申请日：1990-04-24

Applicant: Erich Winschuh ,  Harald Petry

Inventor： Erich Winschuh ,  Harald Petry

IPC: G01B11/06 ,  G01B11/30 ,  G01J1/44 ,  G01N3/00 ,  G01N3/32 ,  G01N21/17 ,  G01N21/71 ,  G01N25/72 ,  H01L21/66 ,  H01S3/10

CPC classification number: G01N25/72 ,  G01N21/171 ,  G01J2001/4242 ,  G01N2021/1714 ,  G01N21/71 ,  G01N2201/1053

Abstract: A process, apparatus and heat microscope for testing the properties of materials by the photothermal effect includes generating a laser beam with a laser light source integrated into a portable measuring head, emitting the laser beam toward a region of a surface of a material sample to be tested, and focussing the laser beam to a desired measurement point diameter at a target light spot with optics at an end toward the laser beam, for absorbing a proportion of the amount of light energy with irradiated volume elements of the material sample and emitting infrared light signals from the surface of the volume elements and volume elements adjacent thereto. The emitted IR light signals are conducted to an optical decoupling element for conducting the emited IR light signals further and largely suppressing components of the laser beam reflected at the surface of the sample. Decoupled IR light signals are further conducted and focused onto receiving surface of at least one IR light detector inside the portable measuring head for converting received IR light signals into corresponding electrical signals for further signal processing. The laser beam is conducted from the laser light source to the optical element at the end of the laser beam with a first resulting degree of transmission and reflection of at least 60%, and the IR light signals emitted by the material sample are conducted to the at least one IR light detector with a second resulting degree of transmission and reflection of at least 60%.

Abstract translation: 用于通过光热效应测试材料性质的工艺，设备和热显微镜包括：将激光光源集成到便携式测量头中产生激光束，将激光束朝向材料样品表面的区域发射为 测试并且将激光束聚焦到目标光点处的期望的测量点直径，其中光学器件在朝向激光束的一端，用于吸收一定量的光能与照射的材料样品的体积元素并发射红外光 来自与其相邻的体积元件和体积元件的表面的信号。 发射的IR光信号被传导到光去耦元件，用于进一步传导发射的IR光信号并且在很大程度上抑制在样品表面反射的激光束的分量。 去耦合的IR光信号被进一步传导并聚焦到便携式测量头内的至少一个IR光检测器的接收表面上，用于将接收的IR光信号转换成相应的电信号以进一步的信号处理。 激光束在激光束的端部从激光源传导到光学元件，具有至少60％的第一个所得到的透射和反射度，并且由材料样品发射的IR光信号被传导到 至少一个IR光检测器，其具有至少60％的第二导致的透射和反射度。