公开(公告)号：US06956633B2

公开(公告)日：2005-10-18

申请号：US10624935

申请日：2003-07-21

申请人： Yoshihiro Okada ,  Atsushi Ban

发明人： Yoshihiro Okada ,  Atsushi Ban

IPC分类号： G02F1/1343 ,  G02F1/1362

CPC分类号： G02F1/136227 ,  G02F1/134309 ,  G02F2001/13625

摘要： In an active matrix type liquid crystal display apparatus, each of pixel electrodes has overhanging portions at its opposite side edges. These overhanging portions of the pixel electrode cover two signal lines placed on opposite sides of the pixel electrode, respectively.

摘要翻译： 在有源矩阵型液晶显示装置中，像素电极的相对侧边缘具有突出部。 像素电极的这些突出部分分别覆盖放置在像素电极的相对侧上的两条信号线。

公开(公告)号：US20050136578A1

公开(公告)日：2005-06-23

申请号：US11051005

申请日：2005-02-04

申请人： Hisashi Ohtani

发明人： Hisashi Ohtani

IPC分类号： G02B5/30 ,  G02B27/01 ,  H01L21/336 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12 ,  H01L29/49 ,  H01L29/786 ,  H01L21/338

CPC分类号： H01L33/16 ,  G02B5/30 ,  G02B27/017 ,  G02B27/0172 ,  G02B2027/0178 ,  G02F2001/13625 ,  G09G3/3225 ,  H01L27/12 ,  H01L27/124 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78627

摘要： The object of the present invention is to form a low-concentration impurity region with good accuracy in a top gate type TFT. Phosphorus is added to a semiconductor layer by using a pattern made of a conductive film as a mask to form an N-type impurity region in a self-alignment manner. A positive photoresist is applied to a substrate so as to cover the pattern and then is exposed to light applied to the back of the substrate and then is developed, whereby a photoresist 110 is formed. The pattern is etched by using the photoresist pattern as an etching mask to form a gate electrode. A channel forming region, a source region, a drain region, and low-concentration impurity regions, are formed in the semiconductor layer in a self-alignment manner by using the gate electrode as a doping mask.

摘要翻译： 本发明的目的是在顶栅型TFT中形成具有高精度的低浓度杂质区。 通过使用由导电膜形成的图案作为掩模将磷添加到半导体层中，以自对准方式形成N型杂质区。 将正性光致抗蚀剂施加到基板上以覆盖图案，然后暴露于施加到基板背面的光，然后显影，由此形成光致抗蚀剂110。 通过使用光致抗蚀剂图案作为蚀刻掩模来蚀刻图案以形成栅电极。 通过使用栅极作为掺杂掩模，以自对准的方式在半导体层中形成沟道形成区域，源极区域，漏极区域和低浓度杂质区域。

公开(公告)号：US06743555B2

公开(公告)日：2004-06-01

申请号：US10291769

申请日：2002-11-12

申请人： Hun Jeong ,  Soon Kwang Hong

发明人： Hun Jeong ,  Soon Kwang Hong

IPC分类号： G03F900

CPC分类号： G03F1/50 ,  G02F1/13454 ,  G02F2001/13625

摘要： An exposure mask for a liquid crystal display device includes a central exposure area for exposing a first pattern for a liquid crystal display panel area of a substrate and a top exposure area for exposing a second pattern on a top peripheral portion of the substrate, wherein the top exposure area is interconnected to the central exposure area.

摘要翻译： 液晶显示装置的曝光掩模包括用于暴露基板的液晶显示面板区域的第一图案的中央曝光区域和用于在基板的顶部周边部分露出第二图案的顶部曝光区域，其中， 顶部曝光区域与中央曝光区域互连。

公开(公告)号：US20040095518A1

公开(公告)日：2004-05-20

申请号：US10469495

申请日：2003-11-28

发明人： Young-Mi Tak ,  Woon-Yong Park ,  Jung-Ho Lee ,  Mun-Pyo Hong ,  Kyuha Chung

IPC分类号： G02F001/136

CPC分类号： G03F7/0007 ,  G02F1/1362 ,  G02F2001/13625 ,  G03F7/0035 ,  Y10S438/946

摘要： The present invention relates to a method of forming a pattern on a substrate and a method of manufacturing a liquid crystal display panel using the same. In order to decrease stitch defect, the shot boundary lines for respective layers of patterns do not overlap each other to be dispersed. Specifically, according to a method of forming patterns of the present invention, after a first material layer is first formed on a substrate, a first pattern is formed by performing a first photo etching including divisional light exposure with at least two areas across at least one shot boundary line on the first material layer. Subsequently, after a second material layer is formed on the first pattern, a second pattern is formed by performing a second photo etching including divisional light exposure with at least two areas across at least one shot boundary line on the second material layer. The shot boundary line in the second photo etching is spaced apart from the shot boundary line in the first photo etching. A liquid crystal display panel is manufactured by using this forming method.

摘要翻译： 本发明涉及在基板上形成图案的方法以及使用该图案的液晶显示面板的制造方法。 为了减少针迹缺陷，各层图案的拍摄边界线彼此不重叠以分散。 具体而言，根据本发明的图案的形成方法，首先在基板上形成第一材料层后，通过进行第一光蚀刻而形成第一图案，所述第一图案蚀刻包括具有至少两个区域的分光曝光 在第一材料层上拍摄边界线。 随后，在第一图案上形成第二材料层之后，通过在第二材料层上进行至少两个区域的至少两个区域的至少两个区域进行包括分光照射的第二光蚀刻来形成第二图案。 在第一光刻蚀中，第二光蚀刻中的照射边界线与第一光蚀刻中的照射边界线隔开。 通过使用该形成方法制造液晶显示面板。

公开(公告)号：US20040021801A1

公开(公告)日：2004-02-05

申请号：US10399799

申请日：2003-04-22

发明人： Young-Mi Tak ,  Woon-Yong Park ,  Mun-Pyo Hong ,  Jung-Ho Lee

IPC分类号： G02F001/13

CPC分类号： G03F9/7084 ,  G02F2001/13625 ,  G03F1/50 ,  G03F7/70475 ,  G03F7/70791

摘要： A mask for fabricating a liquid crystal display with a substrate includes a first mask pattern placed at the center of the substrate with the center line to expose the center of the substrate to light. A second mask pattern is placed to the left of the first mask pattern to expose the left side of the substrate to light. The second mask pattern is spaced apart from the first mask pattern with a first distance. A third mask pattern is placed to the right of the first mask pattern to expose the right side of the substrate to light. The third mask pattern is spaced apart from the first mask pattern with a second distance.

公开(公告)号：US20040017521A1

公开(公告)日：2004-01-29

申请号：US10624935

申请日：2003-07-21

发明人： Yoshihiro Okada ,  Atsushi Ban

IPC分类号： G02F001/136

CPC分类号： G02F1/136227 ,  G02F1/134309 ,  G02F2001/13625

摘要： In an active matrix type liquid crystal display apparatus, each of pixel electrodes has overhanging portions at its opposite side edges. These overhanging portions of the pixel electrode cover two signal lines placed on opposite sides of the pixel electrode, respectively.

摘要翻译： 在有源矩阵型液晶显示装置中，像素电极的相对侧边缘具有突出部。 像素电极的这些突出部分分别覆盖放置在像素电极的相对侧上的两条信号线。

公开(公告)号：US06633360B2

公开(公告)日：2003-10-14

申请号：US09821717

申请日：2001-03-29

申请人： Yoshihiro Okada ,  Atsushi Ban

发明人： Yoshihiro Okada ,  Atsushi Ban

IPC分类号： G02F11343

CPC分类号： G02F1/136227 ,  G02F1/134309 ,  G02F2001/13625

摘要： In an active matrix type liquid crystal display apparatus, each of pixel electrodes has overhanging portions at its opposite side edges. These overhanging portions of the pixel electrode cover two signal lines placed on opposite sides of the pixel electrode, respectively.

摘要翻译： 在有源矩阵型液晶显示装置中，像素电极的相对侧边缘具有突出部。 像素电极的这些突出部分分别覆盖放置在像素电极的相对侧上的两条信号线。

公开(公告)号：US5784135A

公开(公告)日：1998-07-21

申请号：US724884

申请日：1996-10-03

申请人： Katsuhiko Inada ,  Osamu Shimada ,  Masahiro Seiki ,  Ryuji Tada ,  Atsushi Sugahara

发明人： Katsuhiko Inada ,  Osamu Shimada ,  Masahiro Seiki ,  Ryuji Tada ,  Atsushi Sugahara

IPC分类号： G02F1/1362 ,  G03F7/20 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12 ,  G02F1/1333 ,  G09G3/36

CPC分类号： G03F7/70283 ,  G02F1/1362 ,  G03F7/2022 ,  G03F7/70291 ,  G03F7/70475 ,  H01L27/124 ,  G02F2001/13625 ,  Y10S438/946

摘要： An object of the technology of our invention is to solve a luminance defect viewed as a "seam" or the like and to provide a liquid crystal display device having a screen for equally displaying an image. For example, when an exposing process is performed for one conductor layer or a dielectric layer, a total of four photomasks are used corresponding to four shot areas. A light insulation layer of a photomask used for the exposing process for patterning for example a signal line is formed so that it becomes a projection pattern of the signal line. The photomasks corresponding to adjacent shot areas are formed so that patterns of the light insulation layers of the boundary portion are engaged with each other on the plane.

摘要翻译： 本发明的技术的目的在于解决作为“接缝”等看到的亮度缺陷，并且提供具有用于均匀地显示图像的屏幕的液晶显示装置。 例如，当对一个导体层或电介质层进行曝光处理时，对应于四个照射区域使用总共四个光掩模。 形成用于例如信号线图案化的曝光处理的光掩模的光绝缘层，使其成为信号线的投影图案。 对应于相邻拍摄区域的光掩模形成为使得边界部分的光绝缘层的图案在平面上彼此接合。

公开(公告)号：US5668650A

公开(公告)日：1997-09-16

申请号：US755200

申请日：1996-11-25

申请人： Hisatoshi Mori ,  Hiroyuki Okimoto

发明人： Hisatoshi Mori ,  Hiroyuki Okimoto

IPC分类号： G02F1/1362 ,  G02F1/1368 ,  H01L29/786 ,  G02F1/1343

CPC分类号： H01L29/78696 ,  G02F1/1368 ,  H01L27/1222 ,  H01L29/41733 ,  G02F2001/13625

摘要： A thin film transistor panel comprises a substrate, pixel electrodes arranged on the substrate in a matrix form, TFTs each having a source electrode connected to the associated pixel electrode, gate lines and data lines, both connected to the associated TFTs. An auxiliary electrode connected to the associated gate line and a capacitance compensation electrode are provided in such a manner as to cancel a change in gate-source capacitance caused by an alignment error in the manufacturing process. The capacitance compensation electrode is shifted by the same amount as the shift of the source electrode. When the facing area between the gate electrode and source electrode increases (or decreases) due to an alignment error in the manufacturing process, the facing area between the auxiliary electrode and capacitance compensation electrode decreases (or increases). Therefore, the total gate-source capacitance or the sum of the capacitance between the facing portions of the gate electrode and source electrode and the capacitance between the facing portions of the auxiliary electrode and capacitance compensation electrode is constant regardless of a variation in the position of the source electrode.

摘要翻译： 薄膜晶体管面板包括衬底，以矩阵形式布置在衬底上的像素电极，每个具有连接到相关联的像素电极的源极电极，栅极线和数据线两者的TFT都连接到相关联的TFT。 连接到相关栅极线的辅助电极和电容补偿电极被提供以消除由制造过程中的对准误差引起的栅极 - 源极电容的变化。 电容补偿电极的偏移量与源电极的偏移量相同。 当由于制造过程中的对准误差而导致栅电极和源电极之间的面对面增加（或减小）时，辅助电极与电容补偿电极之间的面对面积减小（或增大）。 因此，栅极电极和源电极的相对部分之间的总栅极 - 源极电容或电容的总和以及辅助电极和电容补偿电极的相对部分之间的电容是恒定的，而与位置的变化无关 源电极。

公开(公告)号：US5437946A

公开(公告)日：1995-08-01

申请号：US205865

申请日：1994-03-03

申请人： John H. McCoy

发明人： John H. McCoy

IPC分类号： G03F9/00 ,  G02F1/1362 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70075 ,  G03F7/70358 ,  G03F7/70475 ,  G02F2001/13625

摘要： An improved method for stitching together reticle patterns on a substrate is described. One or more reticles, whose reticle border patterns are to be blended together on the substrate, are provided on an X-Y movable stage in a scanning type exposure system. Each of the reticles has a border pattern which is identical to the border pattern of at least one of the other reticles so that, when the images of these reticles border patterns overlap on the substrate, the overlapping border patterns effectively form a single image on the substrate. To prevent the double exposure of the overlapping border patterns from overexposing the photoresist and to reduce any detrimental effects resulting from misalignment between the overlapping patterns, either a triangular end portion of the scanning source, a filter, or a movable blind is used to partially shade the overlapping border pattern as the UV source is scanned over the border pattern. The graded exposures of the photoresist by the overlapping border patterns combine to fully expose the overlapping border patterns on the substrate. This procedure is continued so as to provide repeated reticle patterns in two dimensions which blend together.

摘要翻译： 描述了将基板上的标线图案拼接在一起的改进方法。 在扫描型曝光系统中的X-Y可移动台上设置一个或多个标线片边界图案在衬底上混合在一起的一个或多个掩模版。 每个掩模版具有与至少一个其它掩模版的边界图案相同的边框图案，使得当这些掩模版边界图案的图像在基板上重叠时，重叠的边框图案在该图案上有效地形成单个图像 基质。 为了防止重叠的边界图案的双重曝光过度曝光光致抗蚀剂，并且减少由于重叠图案之间的未对准而引起的任何有害影响，扫描源的三角形端部，过滤器或可移动遮光板被用于部分遮蔽 作为UV源的重叠边框图案被扫描在边框图案上。 通过重叠的边界图案对光致抗蚀剂的分级曝光结合在一起，以完全暴露衬底上的重叠边界图案。 这个过程是继续的，以便在两个维度上提供重复的掩模版图案，它们融合在一起。