Abstract:
An internal permanent magnet machine (“IPM machine”) of the type used, for example, with traction motors and hybrid electric vehicles, includes a rotor having a plurality of equal-sized (e.g., rectilinear) segmented ferrite magnets arranged in one or more layers. The magnets are inserted within rotor slots that are larger than the magnets themselves, such that one or more air gaps are formed adjacent to the magnets in each layer.
Abstract:
A semiconductor structure. A hard mask layer is on a top substrate surface of a semiconductor substrate. The hard mask layer includes a hard mask layer opening through which a portion of the top substrate surface is exposed to a surrounding ambient. The hard mask layer includes a pad oxide layer on the top substrate surface, a nitride layer on the pad oxide layer, a BSG (borosilicate glass) layer on top of the nitride layer, and an ARC (anti-reflective coating) layer on top of the BSG layer. A BSG side wall surface of the BSG layer is exposed to the surrounding ambient through the hard mask layer opening.
Abstract:
A stator includes a stator core, a plurality of slots, and a conductor. The plurality of slots are formed within the stator core. The conductor is disposed continuously within at least two of the plurality of openings.
Abstract:
A stator assembly for use with an electric motor includes, but is not limited to, a stator core having an inner surface and a plurality of open slots defined in the inner surface. The stator assembly also includes a winding having multiple conductors. The winding is coupled to the stator core such that a predetermined quantity of conductors is disposed within each open slot. The winding is configured to control a magnitude of a torque ripple produced by operation of the electric motor.
Abstract:
A low resistance contact structure and method of making the structure. The structure includes a polysilicon contact through an upper silicon layer and buried oxide layer to a lower silicon layer of a silicon-on-insulation substrate. A region of the upper silicon layer surrounds the polysilicon contact and top surface of the polysilicon contact and surrounding region of upper silicon layer are metal silicided providing an extended contact area greater than the area of the top surface of polysilicon contact.
Abstract:
The present invention is directed to promoter sequences and promoter control elements, polynucleotide constructs comprising the promoters and control elements, and methods of identifying the promoters, control elements, or fragments thereof. The invention further relates to the use of the present promoters or promoter control elements to modulate transcript levels.