公开(公告)号：US20090180045A1

公开(公告)日：2009-07-16

申请号：US12353152

申请日：2009-01-13

Applicant: Kap-Soo Yoon ,  Sung-Hoon Yang ,  Sung-Ryul Kim ,  Hwa-Yeul Oh ,  Jae-Ho Choi ,  Yong-Mo Choi

Inventor： Kap-Soo Yoon ,  Sung-Hoon Yang ,  Sung-Ryul Kim ,  Hwa-Yeul Oh ,  Jae-Ho Choi ,  Yong-Mo Choi

IPC: G02F1/1368 ,  H01L27/08 ,  H01L29/02

CPC classification number: G02F1/1368 ,  G02F2202/108 ,  H01L27/1225 ,  H01L27/1255 ,  H01L29/7869

Abstract: Provided are a display substrate and a display device including the same. The display substrate includes: gate wiring; a first semiconductor pattern formed on the gate wiring and having a first energy bandgap; a second semiconductor pattern formed on the first semiconductor pattern and having a second energy bandgap which is greater than the first energy bandgap; data wiring formed on the first semiconductor pattern; and a pixel electrode electrically connected to the data wiring. Because the second energy bandgap is larger than the first energy bandgap, a quantum well is formed in the first semiconductor pattern, enhancing electron mobility therein.

Abstract translation: 提供了一种显示基板和包括该基板的显示装置。 显示基板包括：栅极布线; 形成在所述栅极布线上并具有第一能量带隙的第一半导体图案; 形成在所述第一半导体图案上并具有大于所述第一能带隙的第二能带隙的第二半导体图案; 形成在第一半导体图案上的数据布线; 以及与数据配线电连接的像素电极。 由于第二能量带隙大于第一能带隙，所以在第一半导体图案中形成量子阱，增强其中的电子迁移率。

公开(公告)号：US20090167974A1

公开(公告)日：2009-07-02

申请号：US12261470

申请日：2008-10-30

Applicant: Jae-ho CHOI ,  Sung-hoon YANG ,  Kap-soo YOON ,  Sung-ryul KIM ,  Hwa-yeul OH ,  Yong-mo CHOI

Inventor： Jae-ho CHOI ,  Sung-hoon YANG ,  Kap-soo YOON ,  Sung-ryul KIM ,  Hwa-yeul OH ,  Yong-mo CHOI

IPC: G02F1/136 ,  H01L29/22 ,  H01L21/34

CPC classification number: H01L29/7869 ,  H01L21/02554 ,  H01L21/02565 ,  H01L27/1225

Abstract: A display substrate, a display device including the display substrate, and a method of fabricating the display substrate are provided. The display substrate includes a gate electrode; a gate-insulating layer disposed on the gate electrode; an oxide semiconductor pattern disposed on the gate-insulating layer; a source electrode disposed on the oxide semiconductor pattern; and a drain electrode disposed on the oxide semiconductor pattern and separated from the source electrode, wherein at least one portion of at least one of the gate-insulating layer or the oxide semiconductor pattern is plasma-processed.

Abstract translation: 提供了显示基板，包括显示基板的显示装置和制造显示基板的方法。 显示基板包括栅电极; 设置在所述栅电极上的栅极绝缘层; 设置在所述栅极绝缘层上的氧化物半导体图案; 设置在所述氧化物半导体图案上的源电极; 以及设置在所述氧化物半导体图案上并与所述源电极分离的漏电极，其中所述栅极绝缘层或所述氧化物半导体图案中的至少一个的至少一部分被等离子体处理。

公开(公告)号：US20080258143A1

公开(公告)日：2008-10-23

申请号：US12100436

申请日：2008-04-10

Applicant: Sung-Ryul KIM ,  Sung-Hoon YANG ,  Byoung-June KIM ,  Czang-Ho LEE ,  Jae-Ho CHOI ,  Hwa-Yeul OH ,  Yong-Mo CHOI

Inventor： Sung-Ryul KIM ,  Sung-Hoon YANG ,  Byoung-June KIM ,  Czang-Ho LEE ,  Jae-Ho CHOI ,  Hwa-Yeul OH ,  Yong-Mo CHOI

IPC: H01L29/786 ,  H01L21/36

CPC classification number: H01L29/78618 ,  H01L29/458 ,  H01L29/66765 ,  H01L29/7869

Abstract: A method of manufacturing a thin film transistor (“TFT”) substrate includes forming a first conductive pattern group including a gate electrode on a substrate, forming a gate insulating layer on the first conductive pattern group, forming a semiconductor layer and an ohmic contact layer on the gate insulating layer by patterning an amorphous silicon layer and an oxide semiconductor layer, forming a second conductive pattern group including a source electrode and a drain electrode on the ohmic contact layer by patterning a data metal layer, forming a protection layer including a contact hole on the second conductive pattern group, and forming a pixel electrode on the contact hole of the protection layer. The TFT substrate including the ohmic contact layer formed of an oxide semiconductor is further provided.

Abstract translation: 制造薄膜晶体管（“TFT”）基板的方法包括在基板上形成包括栅电极的第一导电图案组，在第一导电图案组上形成栅极绝缘层，形成半导体层和欧姆接触层 通过图案化非晶硅层和氧化物半导体层，在栅极绝缘层上，通过图案化数据金属层，在欧姆接触层上形成包括源电极和漏电极的第二导电图案组，形成包括接触的保护层 并且在保护层的接触孔上形成像素电极。 还提供了包括由氧化物半导体形成的欧姆接触层的TFT基板。

公开(公告)号：US20070291217A1

公开(公告)日：2007-12-20

申请号：US11744624

申请日：2007-05-04

Applicant: Min Kang ,  Byoung-Joo Kim ,  Hwa-Yeul Oh ,  Kyoung-Keun Son

Inventor： Min Kang ,  Byoung-Joo Kim ,  Hwa-Yeul Oh ,  Kyoung-Keun Son

IPC: G02F1/1339

CPC classification number: G02F1/136227 ,  G02F1/13394 ,  G02F2001/136231

Abstract: A display substrate includes gate lines and source lines, a passivation layer, a light shielding layer, an overcoat layer, and a column spacer. The passivation layer includes a first hole, partially exposing the metal layer. The passivation layer is formed on the substrate having the metal layer formed thereon. The light shielding layer overlaps the metal pattern and includes a positive photosensitive material on the passivation layer. The light shielding layer includes a second hole corresponding to the first hole. The overcoat layer includes a positive photosensitive material on the substrate having the light shielding layer thereon. The overcoat layer includes a third hole corresponding to the second hole. The column spacer is protruded from the overcoat layer corresponding to a portion of the light shielding layer. Accordingly, the number of the exposing mask used for manufacturing the display substrate may be reduced.

Abstract translation: 显示基板包括栅极线和源极线，钝化层，遮光层，外涂层和柱间隔物。 钝化层包括部分暴露金属层的第一孔。 钝化层形成在其上形成有金属层的基板上。 遮光层与金属图案重叠，并且在钝化层上包括正性感光材料。 遮光层包括对应于第一孔的第二孔。 外涂层包括在其上具有遮光层的基板上的正感光材料。 外涂层包括对应于第二孔的第三孔。 柱隔离物从与遮光层的一部分相对应的外涂层突出。 因此，可以减少用于制造显示基板的曝光掩模的数量。