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73 条记录 (耗时 0.035 秒)

    Cleaning implement
    42.
    发明授权
    Cleaning implement 有权
    清洁工具

    公开(公告)号：US07708485B2

    公开(公告)日：2010-05-04

    申请号：US11386829

    申请日：2006-03-23

    申请人： Yoshinori Tanaka ,  Tomokazu Suda ,  Masatoshi Fujiwara ,  Gregory Clegg Spooner ,  Hoss Vong

    发明人： Yoshinori Tanaka ,  Tomokazu Suda ,  Masatoshi Fujiwara ,  Gregory Clegg Spooner ,  Hoss Vong

    IPC分类号： A47L1/08 ,  A47L13/26 ,  A47L13/30 ,  A46B11/00 ,  B43K5/18 ,  B43M11/06 ,  A47L13/22 ,  A46B11/06

    CPC分类号： A47L13/22 ,  A47L13/312

    摘要： A cleaning implement includes a cleaning head having a cleaning operation surface on a bottom, a holding portion arranged on the side opposite the cleaning head, a pipe for coupling the cleaning head and the holding portion, and a valve opening and closing device provided to the pipe so as to be able to hold a first container for receiving a first fluid or a second container for receiving a second fluid. The holding portion includes a lever coupled to the valve opening and closing device so as to open and close a first valve of the first container or a second valve of the second container. A first ejection nozzle can eject the first fluid forward of the cleaning head, and a second ejection nozzle can eject the second fluid rearward of the cleaning head.

    摘要翻译： 清洁器具包括：清洗头，其具有底部的清洁操作表面，与清洁头相对的一侧上设置的保持部，用于连接清洁头和保持部的管，以及设置在该清洁头上的阀开闭装置 管，以便能够容纳用于接收第一流体的第一容器或用于接收第二流体的第二容器。 保持部分包括连接到阀打开和关闭装置的杆，以打开和关闭第一容器的第一阀或第二容器的第二阀。 第一喷嘴可将清洗头前方的第一流体喷射出去，第二喷嘴可将清洗头后方的第二流体喷出。

    Holding device and cleaning tool with the holding device
    45.
    发明授权
    Holding device and cleaning tool with the holding device 有权
    带保持装置的保持装置和清洁工具

    公开(公告)号：US07219386B2

    公开(公告)日：2007-05-22

    申请号：US11012972

    申请日：2004-12-14

    申请人： Akemi Tsuchiya ,  Yoshinori Tanaka ,  Masatoshi Fujiwara

    发明人： Akemi Tsuchiya ,  Yoshinori Tanaka ,  Masatoshi Fujiwara

    IPC分类号： B25G1/04

    CPC分类号： A47L13/20 ,  A47L13/24 ,  A47L13/38 ,  A47L13/42 ,  B25G1/04 ,  B25G3/18 ,  F16B7/105 ,  Y10T16/473 ,  Y10T403/32467

    摘要： Disclosed is a holding device including: a telescopic handle having axially opposed front and rear ends and constructed of at least two separate shafts, of which a front-side separate shaft axially fits within a rear-side separate shaft being a hollow cylinder; and a support member provided at the front end of the telescopic handle for attachment of a cleaning wiper. The front-side separate shaft has an axially extending elastic arm and an engaging projection provided at a leading end of the elastic arm, while the rear-side separate shaft has a through-hole passing through a cylinder wall thereof, in which the engaging projection engages when the front-side separate shaft projects from the rear-side separate shaft by a predetermined length. Pressing the engaging projection, which engages in the through-hole, from outside the rear-side separate shaft permits release of the engaging projection from the through-hole.

    摘要翻译： 公开了一种保持装置，包括：伸缩手柄，其具有轴向相对的前端和后端，并且由至少两个分离的轴构成，前侧分离轴轴向配合在作为中空圆筒的后侧分离轴中; 以及支撑构件，其设置在伸缩手柄的前端，用于附接清洁刮水器。 前侧分离轴具有轴向延伸的弹性臂和设置在弹性臂的前端的接合突起，而后侧分离轴具有穿过其圆筒壁的通孔，其中接合突起 当前侧分离轴从后侧分离轴突出预定长度时接合。 从后侧分离轴的外部按压与通孔啮合的卡合突起允许卡合突起从通孔中释放出来。

    Method of manufacturing semiconductor devices separated from a wafer
    50.
    发明授权
    Method of manufacturing semiconductor devices separated from a wafer 失效
    制造与晶片分离的半导体器件的方法

    公开(公告)号：US06316280B1

    公开(公告)日：2001-11-13

    申请号：US09271257

    申请日：1999-03-17

    申请人： Masatoshi Fujiwara

    发明人： Masatoshi Fujiwara

    IPC分类号： H01L2100

    CPC分类号： H01S5/0201 ,  H01S5/0202 ,  H01S5/0203 ,  H01S5/0205 ,  Y10S438/942 ,  Y10S438/945

    摘要： A semiconductor device with an improved speed response has a linear ridge pattern including an active layer, a cladding layer, a current blocking layer, and a contact layer on a semiconductor substrate. The insulating layer may be formed in a pattern having a high resistance to dry etching along a longitudinal side of the ridge pattern.

    摘要翻译： 具有改善的速度响应的半导体器件具有在半导体衬底上包括有源层，包覆层，电流阻挡层和接触层的线性脊图案。 绝缘层可以沿着脊图案的纵向侧以具有高耐干腐蚀性的图案形成。