公开(公告)号：US20080309941A1

公开(公告)日：2008-12-18

申请号：US12094802

申请日：2006-11-20

申请人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

发明人： Martinus Bernardus Van Der Mark ,  Michael Cornelis Van Beek ,  Levinus Pieter Bakker

IPC分类号： G01N21/00

CPC分类号： G01N21/4795 ,  G01N2021/1787 ,  G01N2021/4766 ,  G01N2021/6439

摘要： The invention relates to a method of imaging an interior of a turbid medium (45) comprising the following steps: accommodation of the turbid medium (45) inside a receiving volume; coupling transmission input light (65) from a transmission light source into the receiving volume, with said transmission input light (65) being chosen such that it is capable of propagating through the turbid medium (45); detection of transmission output light emanating from the receiving volume as a result of coupling transmission input light from the light source into the receiving volume through use of a transmission photodetector unit. The invention also relates to a system for imaging an interior of a turbid medium (45) and to a medical image acquisition system both using the method. The method, system, and medical image acquisition system are adapted such that an improved way of obtaining data relating to the exterior of the turbid medium (45) is realized. The object of the invention is realized in that the method further comprises the following steps:—coupling geometry input light (70, 75, 80) from a geometry light source into the receiving volume, with the receiving volume comprising the turbid medium (45) and with the combination of the geometry input light (70, 75, 80) and the interface (60) being chosen for creating a contrast between the turbid medium (45) and its surroundings; detection of the contrast (60) between the turbid medium (45) and its surroundings through use of a contrast photodetector unit; reconstructing an image of an interior of the turbid medium (45) using a the detected contrast (60). The system for imaging an interior of a turbid medium (45) and the medical image acquisition device are adapted to further comprise a geometry light source and a contrast photodetector unit.

公开(公告)号：US07405804B2

公开(公告)日：2008-07-29

申请号：US10958666

申请日：2004-10-06

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70191 ,  G03F7/70575

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述辐射束从至少一个掠入射镜反射，所述掠入射镜增强了所述辐射束的光谱纯度。

公开(公告)号：US07196343B2

公开(公告)日：2007-03-27

申请号：US11025851

申请日：2004-12-30

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder

IPC分类号： G03F7/20 ,  G02B27/14

CPC分类号： G03F7/70958 ,  G02B1/113 ,  G02B5/0891 ,  G03F7/70575 ,  G21K1/06 ,  G21K2201/067

摘要： An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only.

摘要翻译： 包括抗反射（AR）涂层的光学元件被配置为仅反射极紫外（EUV）辐射。

公开(公告)号：US07170586B2

公开(公告)日：2007-01-30

申请号：US11335681

申请日：2006-01-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

IPC分类号： G03B24/54

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

公开(公告)号：US07136141B2

公开(公告)日：2006-11-14

申请号：US10743270

申请日：2003-12-23

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70941 ,  G03F7/70916

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that includes a radiation source and an illumination system that supplies a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, an electrode, and a voltage source that applies an electric field between the radiation source and the electrode to generate a discharge between the radiation source and the electrode.

摘要翻译： 公开了一种光刻投影装置。 该装置包括辐射系统，其包括辐射源和提供辐射束的照明系统，以及支撑图案结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，电极和在辐射源和电极之间施加电场的电压源，以产生 在辐射源和电极之间放电。

公开(公告)号：US20050264775A1

公开(公告)日：2005-12-01

申请号：US11127312

申请日：2005-05-12

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

公开(公告)号：US06930760B2

公开(公告)日：2005-08-16

申请号：US10716443

申请日：2003-11-20

申请人： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

发明人： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

IPC分类号： G02B5/18 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70575 ,  G03F7/70191 ,  G03F7/702

摘要： In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

摘要翻译： 在光刻投影设备中，使用光栅光谱滤波器来过滤EUV投影光束。 光栅光谱滤波器优选地是闪耀的，掠入射的反射光栅。 冷却通道可以设置在光栅光谱滤波器的背面中或后面。 光栅光谱滤波器可以由对期望的辐射有效地不可见的材料形成。

公开(公告)号：US09097993B2

公开(公告)日：2015-08-04

申请号：US13372093

申请日：2012-02-13

申请人： Levinus Pieter Bakker

发明人： Levinus Pieter Bakker

IPC分类号： G02B5/18 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70575 ,  G03F7/70983

摘要： An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive layer has a second height on the elevations and the second height is about 10-500 nm. The transmissive layer is enabled to optically filter incident radiation, and the optical element is a grating.

摘要翻译： 光学元件包括包括具有高度差的倾斜轮廓的表面，从而提供具有预定最大高度差的空腔和高度，以及覆盖光学元件的腔和高度的透射层。 空腔中的透射层的第一高度基本上等于或大于预定的最大高度差，并且透射层在高度上具有第二高度，第二高度为约10-500nm。 透射层能够光学滤除入射的辐射，并且光学元件是光栅。

公开(公告)号：US08445873B2

公开(公告)日：2013-05-21

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G21G5/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20120074848A1

公开(公告)日：2012-03-29

申请号：US13376223

申请日：2010-06-02

申请人： Xiaoyan Zhu ,  Georg Greuel ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda ,  Thomas Juestel

发明人： Xiaoyan Zhu ,  Georg Greuel ,  Levinus Pieter Bakker ,  Cornelis Reinder Ronda ,  Thomas Juestel

IPC分类号： H01J7/00 ,  H01J63/04

CPC分类号： H05B41/2813 ,  Y02B20/22

摘要： The present invention provides a method of monitoring performance of a discharge lamp. The discharge lamp includes electrodes and a discharge vessel filled with gas and equipped with a luminescent layer, wherein the gas is intended to emit a first ultraviolet light in a first spectral range when the gas is excited by an electric field produced by the electrodes, and at least part of the first ultraviolet light is intended to be changed into a second ultraviolet light in a second spectral range of longer wavelength than the first spectral range by the luminescent layer. The method comprises the steps of finding the value of a first intensity of the first ultraviolet light; finding the value of a second intensity of the second ultraviolet light; and determining the conversion efficiency of the luminescent layer for converting the first ultraviolet light into the second ultraviolet light on the basis of the ratio of the value of the second intensity to the value of the first intensity.

摘要翻译： 本发明提供一种监视放电灯性能的方法。 放电灯包括电极和填充有气体并具有发光层的放电容器，其中当气体被电极产生的电场激发时，气体旨在在第一光谱范围内发射第一紫外光，以及 第一紫外光的至少一部分旨在通过发光层在比第一光谱范围更长波长的第二光谱范围内变成第二紫外光。 该方法包括以下步骤：找到第一紫外光的第一强度的值; 找到第二紫外光的第二强度的值; 并根据第二强度的值与第一强度的值确定用于将第一紫外光转换成第二紫外光的发光层的转换效率。