摘要:
A semiconductor device includes a gate stack; an air-gap under the gate stack; a semiconductor layer vertically between the gate stack and the air-gap; and a first dielectric layer underlying and adjoining the semiconductor layer. The first dielectric layer is exposed to the air-gap.
摘要:
A semiconductor device includes a gate stack; an air-gap under the gate stack; a semiconductor layer vertically between the gate stack and the air-gap; and a first dielectric layer underlying and adjoining the semiconductor layer. The first dielectric layer is exposed to the air-gap.
摘要:
An exemplary LCD (200) includes gate lines (23), data lines (24); a gradation voltage adjusting circuit (26) for receiving the gradation voltages respectively corresponding to the j, j+1, k, and k+1 frames interchanging the j+1 frame gradation voltage and the k frame gradation voltage when a first voltage difference between j frame gradation voltage and j+1 frame gradation voltage is less than a second voltage difference between j frame gradation voltage and k frame gradation voltage; a memory circuit (28) for storing the gradation voltages corresponding to the frames 1, 2, . . . j, j+2, . . . k−1, k+1 . . . h and storing the interchanged gradation voltages corresponding to the frames j+1 and k; and a gate driver (21) for receiving the gradation voltages stored in the memory circuit. A smallest rectangular area formed by any two adjacent gate lines together with any two adjacent data lines defines a pixel unit thereat.
摘要:
A lateral-vertical bipolar junction transistor (LVBJT) includes a well region of a first conductivity type over a substrate; a first dielectric over the well region; and a first electrode over the first dielectric. A collector of a second conductivity type opposite the first conductivity type is in the well region and on a first side of the first electrode, and is adjacent the first electrode. An emitter of the second conductivity type is in the well region and on a second side of the first electrode, and is adjacent the first electrode, wherein the second side is opposite the first side. A collector extension region having a lower impurity concentration than the collector adjoins the collector and faces the emitter. The LVBJT does not have any emitter extension region facing the collector and adjoining the emitter.
摘要:
A lateral bipolar junction transistor having improved current gain and a method for forming the same are provided. The transistor includes a well region of a first conductivity type formed over a substrate, at least one emitter of a second conductivity type opposite the first conductivity type in the well region wherein each of the at least one emitters are interconnected, a plurality of collectors of the second conductivity type in the well region wherein the collectors are interconnected to each other, and a plurality of base contacts of the first conductivity type in the well region wherein the base contacts are interconnected to each other. Preferably, all sides of the at least one emitters are adjacent the collectors, and none of the base contacts are adjacent the sides of the emitters. The neighboring emitter, collectors and base contacts are separated by spacings in the well region.
摘要:
A method for forming a high-voltage drain metal-oxide-semiconductor (HVD-MOS) device includes providing a semiconductor substrate; forming a well region of a first conductivity type; and forming an embedded well region in the semiconductor substrate and only on a drain side of the HVD-MOS device, wherein the embedded region is of a second conductivity type opposite the first conductivity type. The step of forming the embedded well region includes simultaneously doping the embedded well region and a well region of a core regular MOS device, and simultaneously doping the embedded well region and a well region of an I/O regular MOS device, wherein the core and I/O regular MOS devices are of the first conductivity type. The method further includes forming a gate stack extending from over the embedded well region to over the well region.
摘要翻译:一种用于形成高电压漏极金属氧化物半导体(HVD-MOS)器件的方法包括:提供半导体衬底; 形成第一导电类型的阱区; 以及在所述半导体衬底中并且仅在所述HVD-MOS器件的漏极侧上形成嵌入阱区域,其中所述嵌入区域是与所述第一导电类型相反的第二导电类型。 形成嵌入阱区的步骤包括同时掺杂嵌入阱区和芯规则MOS器件的阱区,并同时掺杂I / O规则MOS器件的嵌入阱区和阱区,其中核和 I / O常规MOS器件是第一导电类型。 所述方法还包括形成从所述嵌入阱区域上方延伸到所述阱区域的栅极堆叠。
摘要:
A lateral bipolar junction transistor having improved current gain and a method for forming the same are provided. The transistor includes a well region of a first conductivity type formed over a substrate, at least one emitter of a second conductivity type opposite the first conductivity type in the well region wherein each of the at least one emitters are interconnected, a plurality of collectors of the second conductivity type in the well region wherein the collectors are interconnected to each other, and a plurality of base contacts of the first conductivity type in the well region wherein the base contacts are interconnected to each other. Preferably, all sides of the at least one emitters are adjacent the collectors, and none of the base contacts are adjacent the sides of the emitters. The neighboring emitter, collectors and base contacts are separated by spacings in the well region.
摘要:
A method for driving a liquid crystal display (200) includes: providing a liquid crystal display having a plurality of pixel units and a backlight; dividing a frame time into a plurality of sub-frames; defining each pixel unit to have two states, namely on or off, in each of the sub-frames; defining the backlight to have a gradation luminance and two states, namely on or off, in each of the sub-frames; and synchronously controlling the state of each pixel unit, a time period of the on state of each pixel unit, the gradation luminance of the backlight, and a time period of the on state of the backlight in each of the sub-frames to make a resulting total luminous flux in each pixel unit corresponding to a gray scale of an image to be displayed in the frame time to be the same as that of other pixel units.
摘要:
An inertial positioning system is disclosed, which includes at least one sensor, an inertial processing unit, a step-distance determination module, a external positioning module, a Kalman filter and an output terminal, wherein the step-distance determinate module estimates an inertial step-distance via analyzing peak values of velocity and time intervals, and in addition, the external positioning module provides a precise initial state to effectively constrain error of the estimated step-distance.
摘要:
A method for manufacturing a complementary metal-oxide semiconductor sensor is provided. The present method provides a semiconductor structure including a plurality of conductors thereon. An inter-metal dielectric layer is formed on the conductors. A silicon nitride film is applied on the inter-metal dielectric layer. An oxide layer is formed on the silicon nitride film. The oxide layer, the silicon nitride film and the inter-metal dielectric are etched to expose portions of the conductors. The oxide layer and the exposed conductors are cleaned in a cleaning step later.