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274 条记录 (耗时 0.032 秒)

    Method and equipment for detecting pattern defect
    41.
    发明授权
    Method and equipment for detecting pattern defect 失效
    检测图案缺陷的方法和设备

    公开(公告)号：US06800859B1

    公开(公告)日：2004-10-05

    申请号：US09473296

    申请日：1999-12-28

    申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

    发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

    IPC分类号： G01N21956

    CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

    摘要： With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.

    摘要翻译： 为了提供用于检测具有高分辨率的微小电路图案的方法和设备，提供了图案缺陷检测设备，包括：紫外激光源; 相干减少装置，用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置，用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置，用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置，用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置，用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。

    Ultraviolet laser-generating device and defect inspection apparatus and method therefor
    45.
    发明授权
    Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
    紫外线激光发生装置及缺陷检查装置及其方法

    公开(公告)号：US07305015B2

    公开(公告)日：2007-12-04

    申请号：US10888980

    申请日：2004-07-13

    申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

    发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

    IPC分类号： H01S3/10

    CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

    摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

    摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

    Method and apparatus for inspecting defects of a specimen
    46.
    发明授权
    Method and apparatus for inspecting defects of a specimen 失效
    用于检查样本缺陷的方法和装置

    公开(公告)号：US06721047B2

    公开(公告)日：2004-04-13

    申请号：US09944858

    申请日：2001-08-31

    申请人： Atsushi Shimoda ,  Sachio Uto ,  Minoru Yoshida ,  Shunji Maeda ,  Toshihiko Nakata

    发明人： Atsushi Shimoda ,  Sachio Uto ,  Minoru Yoshida ,  Shunji Maeda ,  Toshihiko Nakata

    IPC分类号： G01N2100

    CPC分类号： G01N21/95684

    摘要： The object of the invention is to provide high-sensitivity detection of fine patterns on a transparent inter-layer insulative film and defects on the same layer. Detection is performed with lower-layer patterns and defects on the same layer defocused, thus allowing detection of just the defects from the process that is intended for inspection. An inspection apparatus for a specimen on which a plurality of patterns intended to have identical shapes are arranged in a uniform manner includes: an imaging optical system with a relationship between illumination wavelength and objective lens numerical aperture that provides a resolution of no more than 0.18 microns, or preferably no more than 0.13 microns; an opto-electric converter disposed at an imaging position of the imaging optical system; an auto-focus optical system formed with an optical path disposed separate from the imaging optical system, with illumination applied at an incident angle of at least 85 degrees, preferably at least 88 degrees; means for adjusting a focal position of the imaging optical system based on a detection signal from the auto-focus optical system; and means for processing electronic signals from the opto-electrical converter.

    摘要翻译： 本发明的目的是提供在透明层间绝缘膜上的精细图案的高灵敏度检测和同一层上的缺陷。 以相同层上的较低层图案和缺陷进行检测，散焦，从而允许仅检测来自用于检查的过程的缺陷。 用于其上具有相同形状的多个图案的样本的检查装置以均匀的方式布置包括：具有提供不超过0.18微米的分辨率的照明波长和物镜数值孔径之间的关系的成像光学系统 ，或优选不超过0.13微米; 设置在成像光学系统的成像位置处的光电转换器; 形成有与成像光学系统分开设置的光路的自动聚焦光学系统，其入射角至少为85度，优选为至少88度; 用于基于来自所述自动聚焦光学系统的检测信号调整所述成像光学系统的焦点位置的装置; 以及用于处理来自光电转换器的电子信号的装置。