摘要:
Disclosed are a fibrous insulation block which can improve work efficiency of lining construction in various types of refractory furnace in iron works, and a construction method for a heated furnace-surface lining using the same. Specifically disclosed is a fibrous insulation block which comprises: a unit block (2) formed by laminating fibrous insulation blankets under pressure; a packing material (3) which has a pressing surface abutting section (5) covering at least a part of each pressing surface (2a, 2b) which are the side surfaces of the unit block in the direction in which the blankets are laminated, and a heating surface protection section (6) connected to the pressing surface abutting section so as to cover at least a part of a heating surface (2c) of the unit block, and in which a boundary section (7) between the pressing surface abutting section and the heating surface protection section covers an angle section formed by the pressing surfaces and the heating surface of the unit block; and a binding band (4) which maintains the shape of the unit block (2) using the packing material (3). The heating surface protection section (6) of the packing material (3) can be moved by the removal of the binding band and disposed on the same plane as the pressing surface abutting section, and has handhold sections (10) provided therein.
摘要:
To provide a semiconductor integrated circuit including: a detection circuit that detects an occurrence of latch up and can be configured while adopting a layout configuration that suppresses the occurrence of latch up; and a recovery unit that enables a recovery from the latch up without cutting off a positive potential. The semiconductor integrated circuit includes: a n-channel MOS transistor 7 that is formed on a P-type region 3 on a semiconductor substrate; and a latch up detection circuit that detects an occurrence of latch up in the n-channel MOS transistor 7. The latch up detection circuit includes: a n-MOS transistor structure 12 in which a source 10 and a back gate 8 are connected in common with a source 5 and the back gate 8 of the n-channel MOS transistor 7; and an electric current detection unit 15 that detects an electric current flowing to a drain 9 of the n-MOS transistor structure 12.
摘要:
An amplifying device for setting input impedance at several GΩ to several tens of GΩ and improving an ESD withstand current rating is provided.An ECM is connected to an input terminal 21 and frequency characteristics become flat to a voice band by high input impedance of a CMOS amplifier 20 and the input impedance is set at several GΩ to several tens of GΩ and thereby, response time after detecting a loud voice or turning on a power source of the ECM is speeded up and desired electrical characteristics are achieved. A path for releasing a surge voltage which occurs during assembly in the outside of an IC and intrudes from the input terminal 21 to a power source terminal or an earth terminal without an influence on a signal (20 Hz to 20 kHz) of a voice band entering from the input terminal 21 can be constructed by connecting a P-channel MOS transistor 27 and an N-channel MOS transistor 28 as an ESD protective element.
摘要:
A semiconductor device includes a pair of transistors formed in a first conductive type semiconductor substrate. Each of the transistors contains a collector region of a second conductive type, opposite to the first conductive type, formed in the semiconductor substrate, a base region of the first conductive type formed in the collector region, and an emitter region of the second conductive type formed in the base region, the collector region of one transistor of the pair of transistors being separated from that of the other transistor. The semiconductor device further includes a first region of the first conductive type formed between the collector regions of the pair of transistors, and a buried layer of the second conductive type formed in the semiconductor substrate under the collector region of one transistor of the pair of transistors to connect the collector regions of the transistors therethrough.
摘要:
A semiconductor device includes a pair of transistors formed in a first conductive type semiconductor substrate. Each of the transistors contains a collector region of a second conductive type, opposite to the first conductive type, formed in the semiconductor substrate, a base region of the first conductive type formed in the collector region, and an emitter region of the second conductive type formed in the base region, the collector region of one transistor of the pair of transistors being separated from that of the other transistor. The semiconductor device further includes a first region of the first conductive type formed between the collector regions of the pair of transistors, and a buried layer of the second conductive type formed in the semiconductor substrate under the collector region of one transistor of the pair of transistors to connect the collector regions of the transistors therethrough.
摘要:
On a silicon substrate, a first insulation layer, a lower conductive layer, a capacitor-insulator layer, and an upper conductive layer are formed in that order. Then, a first resist pattern is formed, the upper conductive layer is etched to form an upper electrode, and the capacitor-insulator layer is successively etched partway under the same etching condition as that of the upper conductive layer. Next, second resist pattern is formed, the remaining part of the capacitor-insulator layer is etched to form a second insulation layer, and the lower conductive layer is successively etched under the same etching condition as that of the capacitor-insulator layer so as to form a lower electrode and a lower wiring. In this manner, an MiM capacitor element constituted by the upper electrode, a part of the second insulation layer, and the lower electrode can be fabricated.
摘要:
RTV organopolysiloxane compositions comprising (A) a diorganopolysiloxane having hydroxyl or alkoxysilyl groups at both ends, (B) a polyoxypropylene-modified silicone, (C) wet silica, and (D) a silane or siloxane having at least three silicon-bonded hydrolyzable groups have improved sag control and cure at room temperature into products with improved rubber physical properties and durability.
摘要:
An electromagnetic suspension apparatus for an automotive vehicle, employs an electromagnetic actuator interleaved between a sprung mass and an unsprung mass and arranged in parallel with a suspension spring element, and an electric motor built in the electromagnetic actuator for driving the electromagnetic actuator. A motor controller calculates a displacement input, such as a suspension stroke acceleration and a suspension velocity, transmitted to the electromagnetic actuator, and controls the motor to bring a suspension damping force closer to a desired damping force suited for the displacement input. The motor controller calculates an internal inertia force of the electromagnetic actuator, and corrects or compensates for a motor output by the internal inertia force of the electromagnetic actuator.
摘要:
An infrared ray test for a semiconductor chip is conducted by irradiating infrared ray onto a bottom surface of a semiconductor chip, receiving the infrared ray reflected from a bonding pad and displaying the image of the bonding pad on a monitor. The image obtained from the infrared ray has information whether the bonding pad itself or a portion of the silicon substrate underlying the bonding pad has a defect or whether or not there is a deviation of the bonding pad with respect to the bump.
摘要:
A semiconductor integrated circuit device is fabricated from a complementary inverter circuit and an emitter coupled logic circuit, and an n-type well assigned to a p-channel type transistor extends beneath a p-type well assigned to an n-channel type transistor for partially overlapping therewith, thereby increasing capacitance across the p-n junction for eliminating noises from power voltages.