公开(公告)号：US07618250B2

公开(公告)日：2009-11-17

申请号：US11440439

申请日：2006-05-25

申请人： Helmar Van Santen ,  Aleksey Yurievich Kolesnychenko ,  Yvonne Wendela Kruijt-Stegeman

发明人： Helmar Van Santen ,  Aleksey Yurievich Kolesnychenko ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： B29C59/00

CPC分类号： B29C43/021 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/52 ,  B29C2035/0827 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.

摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持压印模板，衬底台和光学编码器的模板保持器，所述光学编码器具有辐射输出，第一衍射光栅和检测器，所述辐射输出被布置成照亮 第二衍射光栅和检测器，定位成检测由第一和第二衍射光栅衍射的辐射以提供对准信号。

公开(公告)号：US09341944B2

公开(公告)日：2016-05-17

申请号：US12705018

申请日：2010-02-12

申请人： Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen ,  Yvonne Kruijt-Stegeman

发明人： Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen ,  Yvonne Kruijt-Stegeman

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.

公开(公告)号：US07354698B2

公开(公告)日：2008-04-08

申请号：US11030326

申请日：2005-01-07

申请人： Helmar Van Santen ,  Aleksey Yurievich Kolesnychenko ,  Jacobus Hermanus Maria Neijzen ,  Emile Verstegen

发明人： Helmar Van Santen ,  Aleksey Yurievich Kolesnychenko ,  Jacobus Hermanus Maria Neijzen ,  Emile Verstegen

IPC分类号： G03F7/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

摘要翻译： 公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记， 介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。

公开(公告)号：US20060144275A1

公开(公告)日：2006-07-06

申请号：US11025835

申请日：2004-12-30

申请人： Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen ,  Yvonne Kruijt-Stegeman

发明人： Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen ,  Yvonne Kruijt-Stegeman

IPC分类号： B41F33/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.

摘要翻译： 公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记 定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分 模式，并将主模板与压印介质分离。

公开(公告)号：US20090212462A1

公开(公告)日：2009-08-27

申请号：US12391954

申请日：2009-02-24

申请人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela KRUIJT-STEGEMAN ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karal Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B28B3/00 ,  B29C59/02

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US08753557B2

公开(公告)日：2014-06-17

申请号：US13331985

申请日：2011-12-20

申请人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

发明人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC分类号： B28B11/08

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US07517211B2

公开(公告)日：2009-04-14

申请号：US11312659

申请日：2005-12-21

申请人： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon

发明人： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Knaapen ,  Johan Frederik Dijksman ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon

IPC分类号： B29C59/00

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US08100684B2

公开(公告)日：2012-01-24

申请号：US12391954

申请日：2009-02-24

申请人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

发明人： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC分类号： B29C59/00 ,  B29C35/08 ,  B28B17/00

CPC分类号： B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。

公开(公告)号：US07075617B2

公开(公告)日：2006-07-11

申请号：US10976178

申请日：2004-10-29

申请人： Aleksey Yurievich Kolesnychenko ,  Ralph Kurt ,  Carolus Ida Maria Antonius Spee

发明人： Aleksey Yurievich Kolesnychenko ,  Ralph Kurt ,  Carolus Ida Maria Antonius Spee

IPC分类号： G03B27/42

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70883 ,  H01J37/18

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.

摘要翻译： 公开了一种器件制造方法。 该方法包括用图案形成装置构图辐射束，将图案化的辐射束投影到基板的目标部分上，将化学试剂供应到保持图案形成装置和/或基板的室，并从 使用化学试剂。

公开(公告)号：US07193229B2

公开(公告)日：2007-03-20

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J49/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。