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    Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
    41.
    发明授权
    Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same 失效
    使用具有1,2-二醇结构的聚合物的负光致抗蚀剂组合物和使用其形成图案的方法

    公开(公告)号：US06469197B1

    公开(公告)日：2002-10-22

    申请号：US09668275

    申请日：2000-09-25

    申请人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

    发明人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

    IPC分类号： C07C6474

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/111

    摘要： It is an object of the present invention to provide a negative photoresist composition for lithography, using short-wavelength light such as ArF excimer laser beam as a light source. The negative photoresist composition of the present invention is a negative photoresist composition comprising at least a polymer having a unit represented by the general formula (1) a crosslinking agent and a photo-acid generating agent, and the crosslinking agent is capable of crosslinking the polymer in the presence of an acid catalyst, whereby the polymer is insolubilized in a developer. Since the negative resist composition of the present invention is insolubilized in the developer by an action of an acid produced from the photo-acid generating agent at the exposed portion, a negative pattern can be obtained. Since the polymer has not a benzene ring, unlike a base polymer of a conventional negative resist, the polymer has high transparency to ArF excimer laser beam and also has high etching resistance because of its bridged alicyclic group.

    摘要翻译： 本发明的目的是提供一种用于光刻的负性光致抗蚀剂组合物，其使用诸如ArF准分子激光束的短波长光作为光源。本发明的负型光致抗蚀剂组合物是包含至少一种 具有由通式（1）表示的单元的交联剂和光酸产生剂的聚合物，并且所述交联剂能够在酸催化剂存在下使聚合物交联，由此聚合物​​在显影剂中不溶化。 由于本发明的负光刻胶组合物通过在曝光部分由光酸产生剂产生的酸的作用而在显影剂中不溶解，因此可以获得负图案。 由于聚合物不具有苯环，与常规的负性抗蚀剂的基础聚合物不同，聚合物对ArF准分子激光束具有高透明度，并且由于其桥连的脂环族基团也具有高耐蚀刻性。

    Photoresist and compounds for composing the photoresist
    43.
    发明授权
    Photoresist and compounds for composing the photoresist 失效
    用于构成光致抗蚀剂的光致抗蚀剂和化合物

    公开(公告)号：US5985522A

    公开(公告)日：1999-11-16

    申请号：US947100

    申请日：1997-10-08

    申请人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    发明人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    IPC分类号： C07C62/38 ,  C07C69/73 ,  C08F20/26 ,  C08F20/28 ,  C09D133/04 ,  C09D133/14 ,  G03F7/004 ,  G03F7/029 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027 ,  G03C5/00

    CPC分类号： C08F20/28 ,  G03F7/0045 ,  G03F7/039

    摘要： There is provided a photoresist including (a) a resin composed of a polymer having a compound represented with the following general formula [1] within a structural unit thereof, and (b) a photo acid generator. ##STR1## wherein R.sup.1 represents a hydrogen atom, R.sup.2 represents a divalent hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 and R.sup.4 represent a hydrocarbon group having a carbon number of 1 or 2, and R.sup.5 represents one of (a) a hydrocarbon group having a carbon number of 1 to 12, (b) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an alkoxy group having a carbon number of 1 to 12, and (c) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an acyl group having a carbon number of 1 to 13. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist makes it possible to form a fine pattern without resist residue, and has superior thermal stability.

    摘要翻译： 提供一种光致抗蚀剂，其包含（a）在其结构单元内由具有由以下通式[1]表示的化合物的聚合物构成的树脂，和（b）光酸产生剂。 其中，R1表示氢原子，R2表示碳原子数为7〜13的碳原子数为2〜20的碳原子数为2〜20的二价烃基，碳原子数为1〜2的烃基， R5表示（a）碳数为1〜12的烃基，（b）碳数为1〜12的烃基，碳原子数为1〜12的烷氧基取代的烃基， （c）碳原子数为1〜12的烃基，碳原子数为1〜13的酰基取代。上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂使得可以形成没有抗蚀剂残留物的精细图案，并且具有优异的热稳定性。

    Photoresist and compounds for composing the photoresist
    44.
    发明授权
    Photoresist and compounds for composing the photoresist 失效
    用于构成光致抗蚀剂的光致抗蚀剂和化合物

    公开(公告)号：US5770346A

    公开(公告)日：1998-06-23

    申请号：US763055

    申请日：1996-12-10

    申请人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    发明人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

    IPC分类号： C07C62/38 ,  C07C69/73 ,  C08F20/26 ,  C08F20/28 ,  C09D133/04 ,  C09D133/14 ,  G03F7/004 ,  G03F7/029 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

    CPC分类号： C08F20/28 ,  G03F7/0045 ,  G03F7/039

    摘要： There is provided a photoresist including (a) a resin composed of a polymer having a compound represented with the following general formula �1! within a structural unit thereof, and (b) a photo acid generator. ##STR1## wherein R.sup.1 represents a hydrogen atom, R.sup.2 represents a divalent hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 and R.sup.4 represent a hydrocarbon group having a carbon number of 1 or 2, and R.sup.5 represents one of (a) a hydrocarbon group having a carbon number of 1 to 12, (b) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an alkoxy group having a carbon number of 1 to 12, and (c) a hydrocarbon group having a carbon number of 1 to 12 and replaced with an acyl group having a carbon number of 1 to 13. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist makes it possible to form a fine pattern without resist residue, and has superior thermal stability.

    摘要翻译： 提供一种光致抗蚀剂，其包含（a）在其结构单元内由具有由以下通式[1]表示的化合物的聚合物构成的树脂，和（b）光酸产生剂。 其中，R1表示氢原子，R2表示碳原子数为7〜13的碳原子数为2的烃基，R3表示碳原子数为4的碳原子数为4的烃基， 数1或2，R5代表（a）碳数为1至12的烃基，（b）碳数为1至12的烃基，并被碳数为烷氧基取代 为1〜12，（c）碳数为1〜12的烃基，碳原子数为1〜13的酰基所取代。上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂使得可以形成没有抗蚀剂残留物的精细图案，并且具有优异的热稳定性。

    Developing device with retractable cutoff member
    45.
    发明授权
    Developing device with retractable cutoff member 失效
    具有可伸缩切断构件的显影装置

    公开(公告)号：US4959692A

    公开(公告)日：1990-09-25

    申请号：US282449

    申请日：1988-12-09

    申请人： Yuji Hayashi ,  Susumu Sakakibara ,  Katsumi Maeda

    发明人： Yuji Hayashi ,  Susumu Sakakibara ,  Katsumi Maeda

    IPC分类号： G03G15/09

    CPC分类号： G03G15/09 ,  G03G15/0921

    摘要： A developing device including a rotatable developing sleeve confronting an electrostatic latent image support member, a supply device for supplying developer to a peripheral surface of the developing sleeve, a bristle height regulating member, a device for removing from the peripheral surface of the developing sleeve, the developer having passed through a developing region, a cutoff device for cutting off supply of the developer from the supply device to the developing sleeve, which is retractably projected into a developer supply region defined between the developing sleeve and the supply device and a magnet member provided fixedly in the developing sleeve and having a developing magnetic pole confronting the support member, a first magnetic pole confronting the bristle height regulating member and a second magnetic pole of a polarity identical with that of the first magnetic pole such that the developer is continuously held in an erect state on the developing sleeve by the first and second magnetic poles.

    摘要翻译： 一种显影装置，包括面向静电潜像支撑构件的可旋转显影套筒，用于向显影套筒的外周表面供应显影剂的供应装置，刷毛高度调节构件，用于从显影套筒的外周表面移除的装置， 已经通过显影区域的显影剂，用于切断从供给装置向显影套筒供应显影剂的切断装置，其可伸缩地突出到限定在显影套筒和供给装置之间的显影剂供应区域中，磁体构件 固定地安装在显影套筒中并且具有与支撑构件相对的显影磁极，面对刷毛高度调节构件的第一磁极和与第一磁极的极性相同的极性的第二磁极，使得显影剂被连续地保持 在开发套筒上的直立状态由第一和第二 第二磁极。

    (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
    47.
    发明申请
    (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT 审中-公开
    （METH）丙烯酸衍生物，具有结构的聚合物和光催化组合物，以及使用其形成图案的方法

    公开(公告)号：US20110196122A1

    公开(公告)日：2011-08-11

    申请号：US13088311

    申请日：2011-04-15

    申请人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

    发明人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

    IPC分类号： C08F222/14

    CPC分类号： C08F222/14 ,  C07D307/93 ,  C08F20/28 ,  C08F120/28 ,  C08F220/32 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  Y10S430/111

    摘要： There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

    摘要翻译： 这里公开了使用220nm以下的光的光刻胶材料，该光致抗蚀剂材料至少包含由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R1，R2，R3 和R 5各自为氢原子或甲基; R4是酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有酸不稳定基团，具有7〜13个碳原子的脂环族烃基，其具有羧基或具有3〜 13个碳原子，其具有环氧基; R6为氢原子，碳原子数1〜12的烃基或碳原子数为7〜13的脂环族烃基，具有羧基; x，y和z是满足x + y + z = 1,0,0

    Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
    48.
    发明授权
    Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide 有权
    用于光波导形成的光敏树脂组合物，光波导和用于制造光波导的方法

    公开(公告)号：US07847017B2

    公开(公告)日：2010-12-07

    申请号：US12092679

    申请日：2006-11-01

    申请人： Katsumi Maeda ,  Kaichiro Nakano

    发明人： Katsumi Maeda ,  Kaichiro Nakano

    IPC分类号： G02B6/00 ,  B29D11/00 ,  C09K11/06

    CPC分类号： G02B6/138 ,  C08F220/28 ,  C08F220/30 ,  C08L33/14 ,  C09D133/14

    摘要： The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape accuracy at low cost; an optical waveguide; and a method for producing an optical waveguide. The present invention provides a photosensitive resin composition for optical waveguide formation comprising at least: a polymer containing at least a (meth)acrylate structure unit having an epoxy structure, and a (meth)acrylate structure unit having a lactone structure and/or a vinyl monomer structure unit having an aromatic structure; and a photoacid generator, of which one or both of a core layer and a cladding layer are formed of a cured product.

    摘要翻译： 本发明的目的是提供一种光波导形成用感光性树脂组合物，其具有低的传输损耗并且可以以低成本形成具有高形状精度的波导图案; 光波导; 以及光波导的制造方法。 本发明提供一种光波导形成用感光性树脂组合物，其至少包含：至少含有具有环氧结构的（甲基）丙烯酸酯结构单元的聚合物和具有内酯结构的（甲基）丙烯酸酯结构单元和/或乙烯基 具有芳族结构的单体结构单元; 以及光固化发生器，其中核心层和包覆层中的一个或两个由固化产物形成。