MEMORY CELLS WITH ASYMMETRICAL ELECTRODE INTERFACES

    公开(公告)号:US20220059763A1

    公开(公告)日:2022-02-24

    申请号:US17480694

    申请日:2021-09-21

    Abstract: Methods, systems, and devices for memory cells with asymmetrical electrode interfaces are described. A memory cell with asymmetrical electrode interfaces may mitigate shorts in adjacent word lines, which may be leveraged for accurately reading a stored value of the memory cell. The memory device may include a self-selecting memory component with a top surface area in contact with a top electrode and a bottom surface area in contact with a bottom electrode, where the top surface area in contact with the top electrode is a different size than the bottom surface area in contact with the bottom electrode.

    Memory cells with asymmetrical electrode interfaces

    公开(公告)号:US11133463B2

    公开(公告)日:2021-09-28

    申请号:US16856631

    申请日:2020-04-23

    Abstract: Methods, systems, and devices for memory cells with asymmetrical electrode interfaces are described. A memory cell with asymmetrical electrode interfaces may mitigate shorts in adjacent word lines, which may be leveraged for accurately reading a stored value of the memory cell. The memory device may include a self-selecting memory component with a top surface area in contact with a top electrode and a bottom surface area in contact with a bottom electrode, where the top surface area in contact with the top electrode is a different size than the bottom surface area in contact with the bottom electrode.

    Three-dimensional memory array
    43.
    发明授权

    公开(公告)号:US11011582B2

    公开(公告)日:2021-05-18

    申请号:US16785026

    申请日:2020-02-07

    Abstract: An example three-dimensional (3-D) memory array includes a first plurality of conductive lines separated from one other by an insulation material, a second plurality of conductive lines, and a plurality of pairs of conductive pillars arranged to extend substantially perpendicular to the first plurality of conductive lines and the second plurality of conductive lines. The conductive pillars of each respective pair are coupled to a same conductive line of the second plurality of conductive lines. A storage element material is formed partially around the conductive pillars of each respective pair.

    TAPERED CELL PROFILE AND FABRICATION

    公开(公告)号:US20210119123A1

    公开(公告)日:2021-04-22

    申请号:US17088253

    申请日:2020-11-03

    Abstract: Methods, systems, and devices for a tapered cell profile and fabrication are described. A memory storage component may contain multiple chalcogenide materials and may include a tapered profile. For example, a first chalcogenide material may be coupled with a second chalcogenide material. Each of the chalcogenide materials may be further coupled with a conductive material (e.g., an electrode). Through an etching process, the chalcogenide materials may tapered (e.g., step tapered). A pulse may be applied to the tapered chalcogenide materials resulting in a memory storage component that includes a mixture of the chalcogenide materials.

    MEMORY CELLS WITH ASYMMETRICAL ELECTRODE INTERFACES

    公开(公告)号:US20200321522A1

    公开(公告)日:2020-10-08

    申请号:US16856631

    申请日:2020-04-23

    Abstract: Methods, systems, and devices for memory cells with asymmetrical electrode interfaces are described. A memory cell with asymmetrical electrode interfaces may mitigate shorts in adjacent word lines, which may be leveraged for accurately reading a stored value of the memory cell. The memory device may include a self-selecting memory component with a top surface area in contact with a top electrode and a bottom surface area in contact with a bottom electrode, where the top surface area in contact with the top electrode is a different size than the bottom surface area in contact with the bottom electrode.

    MEMORY CELLS WITH ASYMMETRICAL ELECTRODE INTERFACES

    公开(公告)号:US20200119273A1

    公开(公告)日:2020-04-16

    申请号:US16706358

    申请日:2019-12-06

    Abstract: Methods, systems, and devices for memory cells with asymmetrical electrode interfaces are described. A memory cell with asymmetrical electrode interfaces may mitigate shorts in adjacent word lines, which may be leveraged for accurately reading a stored value of the memory cell. The memory device may include a self-selecting memory component with a top surface area in contact with a top electrode and a bottom surface area in contact with a bottom electrode, where the top surface area in contact with the top electrode is a different size than the bottom surface area in contact with the bottom electrode.

    Arrays of memory cells and methods of forming an array of elevationally-outer-tier memory cells and elevationally-inner-tier memory cells

    公开(公告)号:US10461128B2

    公开(公告)日:2019-10-29

    申请号:US15497503

    申请日:2017-04-26

    Abstract: A method of forming an array of memory cells, where the array comprises an elevationally-inner tier of memory cells comprising spaced-inner-tier-lower-first-conductive lines and inner-tier-programmable material directly there-above, an elevationally-outer tier of memory cells comprising spaced-outer-tier-lower-first-conductive lines and outer-tier-programmable material directly there-above, and spaced-upper-second-conductive lines that are electrically shared by the outer-tier memory cells and the inner-tier memory cells, comprises depositing conductor material for all of the shared-spaced-upper-second-conductive lines. All of the conductor material for all of the shared-spaced-upper-second-conductive lines is patterned using only a single masking step. Other method embodiments and arrays of memory cells independent of method of manufacture are disclosed.

    MEMORY CELLS WITH ASYMMETRICAL ELECTRODE INTERFACES

    公开(公告)号:US20190252606A1

    公开(公告)日:2019-08-15

    申请号:US15893108

    申请日:2018-02-09

    Abstract: Methods, systems, and devices for memory cells with asymmetrical electrode interfaces are described. A memory cell with asymmetrical electrode interfaces may mitigate shorts in adjacent word lines, which may be leveraged for accurately reading a stored value of the memory cell. The memory device may include a self-selecting memory component with a top surface area in contact with a top electrode and a bottom surface area in contact with a bottom electrode, where the top surface area in contact with the top electrode is a different size than the bottom surface area in contact with the bottom electrode.

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