公开(公告)号：US20070231738A1

公开(公告)日：2007-10-04

申请号：US11730289

申请日：2007-03-30

申请人： Tatsushi Kaneko ,  Jun Hatakeyama ,  Yuji Harada

发明人： Tatsushi Kaneko ,  Jun Hatakeyama ,  Yuji Harada

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

摘要： There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can-be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.

摘要翻译： 公开了一种抗蚀剂组合物，其至少包含由以下通式（1）表示的重复单元的聚合物。 可以提供对水具有良好的阻隔性的抗蚀剂组合物，防止抗蚀剂成分浸出到水中，对水具有高后退接触角，不需要保护膜，具有优异的工艺适用性，适用于液体 浸没式光刻技术，可以高精度地形成微图案。

公开(公告)号：US07255973B2

公开(公告)日：2007-08-14

申请号：US11101568

申请日：2005-04-08

申请人： Jun Hatakeyama ,  Tatsushi Kaneko

发明人： Jun Hatakeyama ,  Tatsushi Kaneko

IPC分类号： G03C1/73 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion.

摘要翻译： 使用包含衍生自外型酯的单体和由具有两个六氟异丙醇基团的酯衍生的单元的聚合物作为基础树脂，以配制正型抗蚀剂组合物，其通过光刻曝光和显影时通过溶胀使线边缘粗糙度最小化 在开发过程中和残渣发育后，粘附性得到改善。

公开(公告)号：US07235343B2

公开(公告)日：2007-06-26

申请号：US10842719

申请日：2004-05-11

申请人： Youichi Ohsawa ,  Katsuhiro Kobayashi ,  Tatsushi Kaneko

发明人： Youichi Ohsawa ,  Katsuhiro Kobayashi ,  Tatsushi Kaneko

IPC分类号： G03F7/031

CPC分类号： C07D335/02 ,  C07C381/12 ,  C07C2601/14 ,  C07D327/06 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/122

摘要： Photoacid generators have formula (1) wherein R1 and R2 are alkyl, or R1 and R2, taken together, may form a C4–C6 ring structure with sulfur, R is hydrogen or alkyl, R′ is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y− is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness

摘要翻译： 光酸产生剂具有式（1），其中R 1和R 2是烷基，或R 1和R 2， 一起可以与硫形成C 4 -C 6 -C 6环结构，R是氢或烷基，R'是氢，烷基，烷氧基或硝基，n是 1至6，Y - 是烷基磺酸酯，芳基磺酸酯，双烷基磺酰亚胺或三烷基磺酰基甲基。 包含该化合物的抗蚀剂组合物具有改进的分辨率，热稳定性，储存稳定性和最小化线边缘粗糙度

公开(公告)号：US07771913B2

公开(公告)日：2010-08-10

申请号：US11730289

申请日：2007-03-30

申请人： Tatsushi Kaneko ,  Jun Hatakeyama ,  Yuji Harada

发明人： Tatsushi Kaneko ,  Jun Hatakeyama ,  Yuji Harada

IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

摘要： There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.

摘要翻译： 公开了一种抗蚀剂组合物，其至少包含由以下通式（1）表示的重复单元的聚合物。 可以提供对水具有良好的阻隔性的抗蚀剂组合物，防止抗蚀剂成分浸出水，与水的后退接触角高，不需要保护膜，具有优异的工艺适用性，适用于液浸 光刻，并且可以以高精度形成微图案。

公开(公告)号：US4882517A

公开(公告)日：1989-11-21

申请号：US306962

申请日：1989-02-07

申请人： Kazumasa Maruyama ,  Tatsushi Kaneko ,  Tohru Chiba

发明人： Kazumasa Maruyama ,  Tatsushi Kaneko ,  Tohru Chiba

IPC分类号： H05B33/14 ,  C07F7/10 ,  C08K3/00 ,  C09K11/00 ,  C09K11/02 ,  C09K11/08 ,  C09K11/56 ,  G02F1/1335 ,  G02F1/13357 ,  H01B3/46 ,  H05B33/12 ,  H05B33/20

CPC分类号： H05B33/20 ,  C08K3/00 ,  C09K11/02 ,  H01B3/46 ,  Y10S428/917

摘要： An electroluminescent device of the dispersion type exhibiting high brightness of electroluminescence and having excellent heat resistance and flexibility, and usable as a backlighting unit for liquid crystal displays and as a plane light-emitting body, can be prepared by using, as the matrix material of the particulate electroluminescent material, a specific cyanoalkyl group-containing organopolysiloxane represented by the average unit formula R.sup.1.sub.a R.sup.2.sub.b SiO.sub.(4-a-b)/2, in which R.sup.1 is a cyanoalkyl group having 3 to 5 carbon atoms, R.sup.2 is a monovalent hydrocarbon group, a is 0.8 to 1.8 and b is 0 to 1.0 with the proviso that a+b is 1.1 to 1.98.

公开(公告)号：US20050227173A1

公开(公告)日：2005-10-13

申请号：US11101568

申请日：2005-04-08

申请人： Jun Hatakeyama ,  Tatsushi Kaneko

发明人： Jun Hatakeyama ,  Tatsushi Kaneko

IPC分类号： G03C1/492 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion.

摘要翻译： 使用包含衍生自外型酯的单体和由具有两个六氟异丙醇基团的酯衍生的单元的聚合物作为基础树脂，以配制正型抗蚀剂组合物，其通过光刻曝光和显影时通过溶胀使线边缘粗糙度最小化 在开发过程中和残渣发育后，粘附性得到改善。