公开(公告)号：US20120042838A1

公开(公告)日：2012-02-23

申请号：US13265845

申请日：2010-04-19

Applicant: Takayuki Ieki ,  Tatsuya Hayashi

Inventor： Takayuki Ieki ,  Tatsuya Hayashi

IPC: F22B1/02

CPC classification number: B01B1/02 ,  B01D1/14 ,  B01D1/30

Abstract: The present invention is one that is intended to prevent bubbles from being recombined to suppress the bubbles from being enlarged, and also homogenize a temperature distribution of a stored liquid source, and provided with: a liquid source container; a first heater that is provided on a side wall of the liquid source container and intended to heat the stored liquid source to a predetermined temperature; a second heater that is provided in an inside central part of the liquid source container and intended to heat the stored liquid source to the predetermined temperature; a plurality of bubble generators that are immersed into the stored liquid source, provided between the second heater and the side wall, and release carrier gas into the liquid source to perform bubbling; and a gas supply pipe that supplies the carrier gas to the bubble generators.

Abstract translation: 本发明是为了防止气泡重新组合而抑制气泡的扩大，并且使所储存的液体源的温度分布均匀化，并具有：液体源容器; 第一加热器，设置在液体源容器的侧壁上，用于将所储存的液体源加热到预定温度; 第二加热器，设置在所述液体源容器的内部中心部分中，用于将所述储存液体源加热到所述预定温度; 多个气泡发生器，其浸入存储的液体源中，设置在第二加热器和侧壁之间，并将载气释放到液体源中以进行鼓泡; 以及将气体供给到气泡发生器的气体供给管。

公开(公告)号：US07946770B2

公开(公告)日：2011-05-24

申请号：US10531519

申请日：2003-10-09

Applicant: Tatsuya Hayashi ,  Kiyotaka Kusunoki

Inventor： Tatsuya Hayashi ,  Kiyotaka Kusunoki

IPC: F16C17/04 ,  F16C33/14

CPC classification number: B21K1/04 ,  B21J5/12 ,  B21K23/00 ,  F16C17/045 ,  F16C17/107 ,  F16C33/107

Abstract: A hydrodynamic bearing device has favorable bearing performance and long endurance life. A thrust bearing part of the hydrodynamic bearing device has a second thrust surface. In the second thrust surface, a dynamic pressure generating groove area having a plurality of dynamic pressure generating grooves is formed in at least a part thereof in a radial direction. The action of dynamic pressure of lubricating oil increases the pressure in a thrust bearing clearance between an end of a flange part of an axial member and the second thrust surface, to support the axial member in an axial direction in a non-contact manner. The dynamic pressure generating groove area of the second thrust surface is formed by press working. The difference in height between the inner and outer peripheral edges of the surface of the dynamic pressure generating groove area regulated between or equal to 0 and 2 μm.

Abstract translation: 流体动力轴承装置具有良好的轴承性能和长寿命。 流体动力轴承装置的止推轴承部分具有第二推力表面。 在第二止推面中，在径向的至少一部分上形成具有多个动压产生槽的动压产生槽区域。 润滑油的动压作用增加了轴向构件的凸缘部分的端部与第二推力表面之间的止推轴承间隙中的压力，以非接触的方式在轴向方向上支撑轴向构件。 第二推动面的动压产生槽区域通过冲压加工形成。 动压产生槽面的内周缘与外周缘之间的高度差在0〜2μm之间。

公开(公告)号：US20110071742A1

公开(公告)日：2011-03-24

申请号：US12879302

申请日：2010-09-10

Applicant: Yukiyoshi Inuta ,  Hideki Oshita ,  Morimasa Yamawaki ,  Kazuo Tomioka ,  Masayuki Mannen ,  Tatsuya Hayashi

Inventor： Yukiyoshi Inuta ,  Hideki Oshita ,  Morimasa Yamawaki ,  Kazuo Tomioka ,  Masayuki Mannen ,  Tatsuya Hayashi

IPC: F16D48/06

CPC classification number: F16H61/143 ,  F16H2059/467 ,  F16H2061/0087 ,  Y10T477/688 ,  Y10T477/735 ,  Y10T477/75 ,  Y10T477/753

Abstract: When an inertia phase of an upshift of the transmission is started during a lockup clutch engagement operation, a following command oil pressure to be used during a following lockup clutch engagement operation is learned on the basis of a slip rotation speed, which is a rotation speed difference between an input side rotation speed of the torque converter and an output side rotation speed of the torque converter, at or after a start point of the inertia phase.

Abstract translation: 当在锁止离合器接合操作期间开始变速器的升挡的惯性阶段时，基于作为转速的滑移转速来学习在以下锁止离合器接合操作期间使用的跟随指令油压 转矩变换器的输入侧转速与变矩器的输出侧转速之差在惯性阶段的起点之后或之后的差。

公开(公告)号：US07633597B2

公开(公告)日：2009-12-15

申请号：US11695831

申请日：2007-04-03

Applicant: Hisashi Namba ,  Tatsuya Hayashi ,  Takashi Kamono

Inventor： Hisashi Namba ,  Tatsuya Hayashi ,  Takashi Kamono

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70933 ,  G03F7/70891

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.

Abstract translation: 曝光装置包括被配置为使用极紫外光照射掩模版的照明光学系统，配置为将掩模版的图案投影到基板上的投影光学系统，限定容纳投影光学系统的第一空间的光阑，第一 气体供给器，被配置为向第一空间供应第一气体;第一冷却单元，被配置为在第一气体供应器将第一气体供应到第一空间之前冷却第一气体。

公开(公告)号：US20090207391A1

公开(公告)日：2009-08-20

申请号：US12369648

申请日：2009-02-11

Applicant: Tatsuya Hayashi

Inventor： Tatsuya Hayashi

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: An exposure apparatus 1 that includes a projection optical system 30 and that exposes the substrate 41 and 42 via immersion liquid 35 supplied between the projection optical system 30 and the substrates 41 and 42, the exposure apparatus 1 comprising substrate stages 45 and 46 which is movable independently from each other, a transfer unit 47 provided on the substrate stage 45, a transfer unit 48 provided on the substrate stage 46, and a stage controller 60 configured to move the substrate stages 41 and 42 so that the transfer units 47 and 48 pass under the immersion liquid 35 in a state where the transfer units 47 and 48 are closely positioned, wherein at least a part of a side surface of the first transfer unit and at least a part of a side surface of the second transfer unit are constituted by a porous member.

Abstract translation: 曝光装置1包括投影光学系统30，并且通过投影光学系统30和基板41和42之间的浸没液体35曝光基板41和42，曝光装置1包括可移动的基板台45和46 彼此独立地设置在基板台45上的转印单元47，设置在基板台46上的转印单元48和用于移动基板台41和42以使转印单元47和48通过的载物台控制器60 在转印单元47和48紧密定位的状态下的浸没液35下，其中第一转印单元的侧表面的至少一部分和第二转印单元的侧表面的至少一部分由 多孔构件。

公开(公告)号：US20080285713A1

公开(公告)日：2008-11-20

申请号：US12118797

申请日：2008-05-12

Applicant: Tatsuya Hayashi

Inventor： Tatsuya Hayashi

IPC: G21K1/00

CPC classification number: G03F7/70883 ,  G03F7/70841

Abstract: An EUV exposure apparatus is configured to maintain the reflective index of the optical element as high as possible and to minimize the maintenance frequency of the optical element by restraining attachments of released gas particles by degasifying to the optical element. An exposure apparatus is configured to expose a pattern of an original on a substrate by using extreme ultraviolet light. The exposure apparatus includes an optical element configured to receive the extreme ultraviolet light, a barrel configured to support the optical element, a chamber configured to store the barrel, and a partition wall configured outside and around an optical path of the extreme ultraviolet light in the barrel.

Abstract translation: EUV曝光装置被配置为保持光学元件的反射率尽可能高，并且通过对光学元件进行脱气来限制释放的气体颗粒的附着来最小化光学元件的维护频率。 曝光装置被配置为通过使用极紫外光来曝光原稿在基板上的图案。 曝光装置包括被配置为接收极紫外光的光学元件，被配置为支撑光学元件的镜筒，被配置为存储镜筒的腔室，以及配置在远紫外光的光路外侧和周围的隔壁 桶。

公开(公告)号：US07391498B2

公开(公告)日：2008-06-24

申请号：US10949184

申请日：2004-09-24

Applicant: Tatsuya Hayashi

Inventor： Tatsuya Hayashi

IPC: G03B27/42 ,  G03B27/52

CPC classification number: G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

Abstract: An exposure apparatus includes a projection optical system which has a plurality of optical elements, and directs light from an original to an object to be exposed; a first stage which holds the object to be exposed; a first vacuum chamber which contains the first stage; and a second vacuum chamber which is adjacent to the first vacuum chamber, contains a part of the plurality of optical elements, and communicates with the first vacuum chamber through a first opening. The pressure in the second vacuum chamber is higher than pressure in the first vacuum chamber.

Abstract translation: 曝光装置包括投影光学系统，其具有多个光学元件，并将来自原稿的光引导到待曝光的物体; 第一个阶段，它保持被曝光的对象; 包含第一级的第一真空室; 并且与第一真空室相邻的第二真空室包含多个光学元件的一部分，并且通过第一开口与第一真空室连通。 第二真空室中的压力高于第一真空室中的压力。

公开(公告)号：US20080030705A1

公开(公告)日：2008-02-07

申请号：US11828814

申请日：2007-07-26

Applicant: Hisashi Namba ,  Tatsuya Hayashi

Inventor： Hisashi Namba ,  Tatsuya Hayashi

IPC: G03B27/42

CPC classification number: G03B27/42 ,  G03F7/70841 ,  G03F7/70858

Abstract: An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.

Abstract translation: 曝光装置包括投影光学系统，其将掩模版的图案投影到晶片上，设置有投影光学系统的真空室，设置在真空室中的分隔件，并将第一空间（其中的空间 存在投影光学系统的至少一部分）和第二空间（其是第一空间以外的空间），向第一空间供给气体的气体供给单元和减少气体流动的密封剂 通过管道供应到第二个空间。

公开(公告)号：US20070129839A1

公开(公告)日：2007-06-07

申请号：US11393653

申请日：2006-03-31

Applicant: Osamu Tsubakida ,  Tatsuya Hayashi ,  Yuki Nishimura ,  Satoshi Ishimoto

Inventor： Osamu Tsubakida ,  Tatsuya Hayashi ,  Yuki Nishimura ,  Satoshi Ishimoto

IPC: G06F19/00

CPC classification number: G05B19/41865 ,  G05B2219/31443 ,  G05B2219/45031 ,  Y02P90/20

Abstract: In a system for controlling a semiconductor device manufacturing process, a recipe indicating a control condition for controlling processing in a semiconductor manufacturing apparatus is calculated by a computation performed using manufacturing data obtained in the semiconductor device manufacturing process and a predetermined algorithm, and when the recipe cannot be derived, an alternative recipe prepared beforehand is transmitted to a manufacturing management system for managing the semiconductor manufacturing apparatus. The alternative recipe may be derived using the predetermined algorithm by a recomputation in which input conditions are changed. When a recipe cannot be derived by the recomputation, a planned recipe with which semiconductor devices processed by the manufacturing process fall within specification values may be used as the alternative recipe.

Abstract translation: 在用于控制半导体器件制造工艺的系统中，通过使用在半导体器件制造工艺和预定算法中获得的制造数据执行的计算来计算表示用于控制半导体制造装置中的处理的控制条件的配方，并且当配方 不能导出，预先制备的替代方案被传送到用于管理半导体制造装置的制造管理系统。 可以使用预定算法通过重新计算来导出替代配方，其中输入条件被改变。 当通过重新计算不能导出配方时，可以使用由制造过程处理的半导体器件落入规格值内的计划配方作为替代配方。

公开(公告)号：US07141328B2

公开(公告)日：2006-11-28

申请号：US10216434

申请日：2002-08-12

Applicant: Hisatoshi Fukumoto ,  Osamu Hiroi ,  Kenro Mitsuda ,  Hideo Maeda ,  Yasuhiro Yoshida ,  Tatsuya Hayashi ,  Akihisa Yoshimura

Inventor： Hisatoshi Fukumoto ,  Osamu Hiroi ,  Kenro Mitsuda ,  Hideo Maeda ,  Yasuhiro Yoshida ,  Tatsuya Hayashi ,  Akihisa Yoshimura

IPC: H01M4/86 ,  H01M4/90

CPC classification number: H01M4/881 ,  H01M4/8605 ,  H01M4/8846 ,  H01M4/8885 ,  H01M4/921 ,  H01M4/96 ,  H01M8/1004

Abstract: A fuel cell includes an electrolyte membrane, an anode on one surface of the electrolyte membrane and having an anode catalyst layer that is supplied with fuel and contains a platinum-ruthenium alloy catalyst, and a cathode on the other surface of the electrolyte membrane and having an cathode catalyst layer that is supplied with air and contains a platinum catalyst. The anode catalyst layer and the cathode catalyst layer include divided catalyst segments, and gaps between the divided catalyst segments that are adjacent to each other.

Abstract translation: 燃料电池包括电解质膜，在电解质膜的一个表面上的阳极，并且具有供给燃料且含有铂 - 钌合金催化剂的阳极催化剂层和在电解质膜的另一个表面上的阴极，并且具有 提供空气并含有铂催化剂的阴极催化剂层。 阳极催化剂层和阴极催化剂层包括分开的催化剂段和彼此相邻的分开的催化剂段之间的间隙。