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公开(公告)号：US4716776A
公开(公告)日：1988-01-05
申请号：US829426
申请日：1986-02-13
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
CPC分类号： G11B21/02 , F16H25/2409 , G11B5/5521 , Y10T74/1808
摘要： A rotary to linear converter is disclosed as adapted for transporting a magnetic transducer head from track to track on a magnetic disk in a disk drive. Included are an electric stepping motor coupled to a lead screw, and a head carriage engaged with the lead screw for linear travel in response to the rotation thereof. A pin is engaged with a helical groove of the lead screw. The pin is arranged in perpendicular to the lead screw. Consequently, even if distance between the lead screw and a guide rod of the head carriage deviates from a desired value, the pin is not displaced in the extending direction of the lead screw.
摘要翻译： 公开了一种旋转到线性转换器，用于将磁换能器头从磁道驱动器中的磁盘上的轨道传送到轨道。 其中包括一个电动步进马达，它连接到一个导螺杆上，一个头托架与导螺杆啮合，用于响应其旋转线性行进。 销与导螺杆的螺旋槽接合。 该销布置成与导螺杆垂直。 因此，即使引导螺杆和头托架的导杆之间的距离偏离期望值，销也不会沿着导螺杆的延伸方向移动。
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公开(公告)号：US09348222B2
公开(公告)日：2016-05-24
申请号：US12996684
申请日：2009-07-07
IPC分类号： G03F7/023 , G03F7/09 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/00 , G03F7/40
CPC分类号： G03F7/0233 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/0012 , G03F7/094 , G03F7/40 , C08F220/06 , C08F212/08 , C08F212/14
摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3≦n1≦1.0.
摘要翻译： 提供了特别用于形成微透镜和形成平坦化膜的透明性，耐热性和折射率优异的正性抗蚀剂组合物; 以及由正性抗蚀剂组合物形成的微透镜和平坦化膜。 一种正性抗蚀剂组合物，其包含组分（A）：包含具有联苯结构的单元结构的碱溶性聚合物; 成分（B）：具有被光解以产生碱溶性基团的有机基团的化合物; 和组分（C）：溶剂。 作为组分（A）的碱溶性聚合物是包含式（1）的单元结构的聚合物的正性抗蚀剂组合物：其中假设构成聚合物（A）的单元结构的总数为1.0时， 构成聚合物（A）的式（1）的单元结构的比n1满足0.3＆lt; nlE; n1＆nlE; 1.0。
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公开(公告)号：US09052437B2
公开(公告)日：2015-06-09
申请号：US13982316
申请日：2012-01-12
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： C08F216/14 , G03F7/038 , C08F222/40 , G02B1/04 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32
CPC分类号： G02B1/041 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32 , C08F216/1416 , C08F222/40 , G03F7/0382 , C08F2222/402 , C08F2216/1433
摘要： There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent (where X is a C1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; Y is an organic group that optionally has a substituent; and Z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).
摘要翻译： 提供了一种用于形成微透镜的感光性树脂组合物。 用于形成微透镜的感光性树脂组合物，所述感光性树脂组合物包含：成分（A），成分（B），成分（C）和溶剂。 组分（A）是具有下式（1）的马来酰亚胺结构单元，下式（2）的乙烯基醚结构单元和式（3），式（4）的三个结构单元中的至少一个的共聚物 ）和下式（5）中，成分（B）为光敏剂，成分（C）为交联剂（其中X为任选具有醚键或环状结构的C 1-20烃基 Y是任选具有取代基的有机基团; Z是任选具有取代基的芳族烃基或烷氧基）。
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公开(公告)号：US09029467B2
公开(公告)日：2015-05-12
申请号：US14239493
申请日：2012-08-27
申请人： Hiroyuki Soda , Takahiro Sakaguchi
发明人： Hiroyuki Soda , Takahiro Sakaguchi
IPC分类号： C08L37/00 , C08L31/00 , C09D139/04 , C08F220/36 , C08F222/40 , G02B1/04 , C09D135/02
CPC分类号： C09D139/04 , C08F220/36 , C08F222/40 , C08L2203/16 , C09D135/02 , G02B1/04 , G02B1/041 , C08F2220/346 , C08F220/20 , C08F212/08 , C08L33/10 , C08L33/08 , C08L33/24
摘要： There is provided a resin composition. A resin composition includes: a copolymer having structural units of the following Formula (1), Formula (2) and Formula (3): where X is a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group or a benzyl group, while the alkyl group, the cycloalkyl group, the phenyl group and the benzyl group optionally have a portion or all of the hydrogen atoms substituted with halogen atoms, carboxy groups, hydroxy groups, amino groups or nitro groups; each of R1s is independently a hydrogen atom or a methyl group; R2 is a single bond or a C1-5 alkylene group; R3 is a blocked isocyanate group; Y is an —O— group or an —NH— group; R4 is a single bond or a C1-5 alkylene group; and R5 is a C1-20 hydrocarbon group or a phenyl group having a hydroxy group as a substituent; and a solvent.
摘要翻译： 提供树脂组合物。 树脂组合物包括：具有下式（1），式（2）和式（3）的结构单元的共聚物：其中X是C1-5烷基，C5-6环烷基，苯基或 苄基，而烷基，环烷基，苯基和苄基任选地具有被卤素原子，羧基，羟基，氨基或硝基取代的部分或全部氢原子; R 1各自独立地为氢原子或甲基; R2是单键或C1-5亚烷基; R3是封端异氰酸酯基; Y是-O-基或-NH-基; R4是单键或C1-5亚烷基; R5为C1-20烃基或具有羟基作为取代基的苯基; 和溶剂。
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公开(公告)号：US08993699B2
公开(公告)日：2015-03-31
申请号：US13391761
申请日：2010-06-21
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24
摘要： There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
摘要翻译： 提供了用于微透镜的感光性树脂组合物。 包含组分（A），组分（B）和组分（C）的微透镜感光树脂组合物，其中组分（A）是具有式（1）的马来酰亚胺结构单元，组分（ B）是交联剂，组分（C）是光敏剂。
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公开(公告)号：US08796349B2
公开(公告)日：2014-08-05
申请号：US13989185
申请日：2011-11-21
CPC分类号： G02B1/041 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L35/00
摘要： There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), R0 is a hydrogen atom or a methyl group; R1 is a single bond or a C1-5 alkylene group; R2 is a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), R0s are optionally different from each other).
摘要翻译： 提供了一种用于微透镜的感光性树脂组合物。 用于包含组分（A），组分（B）和溶剂的微透镜的光敏树脂组合物。 组分（A）：具有式（1）的马来酰亚胺结构单元和式（2）的重复结构单元的共聚物。 组分（B）：光敏剂（式（2）中R 0为氢原子或甲基; R 1为单键或C 1-5亚烷基; R 2为可热交联的一价有机基团; 在式（2）的重复结构单元中，R 0可以彼此不同）。
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公开(公告)号：US20140200304A1
公开(公告)日：2014-07-17
申请号：US14239493
申请日：2012-08-27
申请人： Hiroyuki Soda , Takahiro Sakaguchi
发明人： Hiroyuki Soda , Takahiro Sakaguchi
IPC分类号： C09D139/04
CPC分类号： C09D139/04 , C08F220/36 , C08F222/40 , C08L2203/16 , C09D135/02 , G02B1/04 , G02B1/041 , C08F2220/346 , C08F220/20 , C08F212/08 , C08L33/10 , C08L33/08 , C08L33/24
摘要： There is provided a resin composition. A resin composition includes: a copolymer having structural units of the following Formula (1), Formula (2) and Formula (3): where X is a C1-5 alkyl group, a C5-6 cycloalkyl group, a phenyl group or a benzyl group, while the alkyl group, the cycloalkyl group, the phenyl group and the benzyl group optionally have a portion or all of the hydrogen atoms substituted with halogen atoms, carboxy groups, hydroxy groups, amino groups or nitro groups; each of R1s is independently a hydrogen atom or a methyl group; R2 is a single bond or a C1-5 alkylene group; R3 is a blocked isocyanate group; Y is an —O— group or an —NH— group; R4 is a single bond or a C1-5 alkylene group; and R5 is a C1-20 hydrocarbon group or a phenyl group having a hydroxy group as a substituent; and a solvent.
摘要翻译： 提供树脂组合物。 树脂组合物包括：具有下式（1），式（2）和式（3）的结构单元的共聚物：其中X是C1-5烷基，C5-6环烷基，苯基或 苄基，而烷基，环烷基，苯基和苄基任选地具有被卤素原子，羧基，羟基，氨基或硝基取代的部分或全部氢原子; R 1各自独立地为氢原子或甲基; R2是单键或C1-5亚烷基; R3是封端异氰酸酯基; Y是-O-基或-NH-基; R4是单键或C1-5亚烷基; R5为C1-20烃基或具有羟基作为取代基的苯基; 和溶剂。
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公开(公告)号：US20140135426A1
公开(公告)日：2014-05-15
申请号：US14129426
申请日：2012-06-27
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
CPC分类号： C08J5/18 , C08F212/08 , G02B1/041 , C08F220/34 , C08F2220/282 , C08F2220/281 , C08F2220/325 , C08F220/32 , C08F2220/343 , C08F220/20 , C08F220/58 , C08L25/14
摘要： There is provided a resin composition including a copolymer having structural units of Formula (1), Formula (2), and Formula (3), and a solvent; or a resin composition including a copolymer having structural units of Formula (1), Formula (4), and Formula (5), and a solvent.
摘要翻译： 提供了包含具有式（1），式（2）和式（3）的结构单元的共聚物和溶剂的树脂组合物; 或包含具有式（1），式（4）和式（5）的结构单元的共聚物的树脂组合物和溶剂。
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公开(公告)号：US08610385B2
公开(公告)日：2013-12-17
申请号：US13372746
申请日：2012-02-14
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： H02P6/00
摘要： A motor driving circuit includes an inverter circuit which supplies a driving current to a coil of a single phase brushless DC motor, a position detection sensor which detects a magnetic pole position of a magnet rotor of the motor and outputs a position detection signal, and a controller which controls the inverter circuit based on the position detection signal and a speed instruction signal for instructing a rotating speed of the motor. At a time of startup of the motor, the controller makes a pulse width of a PWM signal for controlling the inverter circuit constant in a first time period which starts after the position detection signal zero-crosses and lasts until the position detection signal zero-crosses next time, and narrows the pulse width of the PWM signal as time elapses in a second time period immediately after the first time period.
摘要翻译： 电动机驱动电路包括向单相无刷直流电动机的线圈供给驱动电流的逆变器电路，检测电动机的磁铁转子的磁极位置并输出位置检测信号的位置检测传感器， 控制器，其基于位置检测信号控制逆变器电路，以及用于指示电动机的转速的速度指令信号。 在电动机启动时，控制器在第一时间段内产生用于控制逆变器电路的PWM信号的脉冲宽度，该第一时间段在位置检测信号过零之后开始并持续到位置检测信号零交叉 并且在第一时间段之后的第二时间段内随着时间的推移而缩小PWM信号的脉冲宽度。
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公开(公告)号：US20100035181A1
公开(公告)日：2010-02-11
申请号：US12450599
申请日：2008-04-04
申请人： Takahiro Sakaguchi , Tetsuya Shinjo
发明人： Takahiro Sakaguchi , Tetsuya Shinjo
IPC分类号： G03F7/004
CPC分类号： G03F7/11 , G03F7/091 , H01L21/0271 , H01L21/0276
摘要： It is a problem to provide a resist underlayer film forming composition containing a fullerene derivative, which is easily applied on a substrate and from which a resist underlayer film excellent in dry etching properties can be obtained. The problem is solved by for example a resist underlayer film forming composition comprising: a fullerene derivative represented by Formula (3): (where, R4 represents one group selected from a group consisting of a hydrogen atom, an all group which optionally has a substituent, an aryl group which optionally has a substituent and a heterocyclic group which optionally has a substituent; and R5 represents an alkyl group which optionally has a substituent or an aryl group which optionally has a substituent); and an organic solvent.
摘要翻译： 提供含有富勒烯衍生物的抗蚀剂下层膜形成组合物是容易施加在基材上并且可以获得干蚀刻性能优异的抗蚀剂下层膜的问题。 该问题通过例如抗蚀剂下层膜形成组合物来解决，该组合物包含：由式（3）表示的富勒烯衍生物：其中，R4表示选自氢原子，任选具有取代基的全部基团 任选具有取代基的芳基和任选具有取代基的杂环基; R5表示任选具有取代基的烷基或任选具有取代基的芳基; 和有机溶剂。
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