公开(公告)号：US20060072095A1

公开(公告)日：2006-04-06

申请号：US11246642

申请日：2005-10-11

申请人： Takehito Kudo ,  Shigeru Hirukawa

发明人： Takehito Kudo ,  Shigeru Hirukawa

IPC分类号： G03B27/72

CPC分类号： G03F7/70191 ,  G03B27/42 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An exposure method and apparatus simultaneously transfer patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area including the optical axis, four second areas each smaller than the first area and arranged along a first circumference surrounding the first area, and four third areas each smaller than the first area and arranged along a second circumference surrounding the first circumference and arranged along a second circumference. The distribution of intensity of light over the pupil surface is so set that the intensities of light over the nine areas are approximately equal to one another, and the intensity of light over the other area is smaller than those over the nine areas. This distribution of intensity of light is set using a diffraction optical element or a diaphragm.

摘要翻译： 曝光方法和装置以高分辨率同时传送具有各种节距的图案。 在照明系统的瞳孔表面上设置九个区域。 九个区域是包括光轴的第一区域，四个第二区域，每个小于第一区域，并且沿着围绕第一区域的第一周边布置，以及四个第三区域，每个小于第一区域，并且沿着围绕第一区域的第二周边布置 第一圆周并沿第二圆周布置。 瞳孔表面光强的分布是这样确定的，九个区域之间的光强度大致相等，另一个区域的光强比9个区域的光强要小。 使用衍射光学元件或光阑来设定光的强度分布。

公开(公告)号：US20050275818A1

公开(公告)日：2005-12-15

申请号：US11064594

申请日：2005-02-24

申请人： Wolfgang Singer

发明人： Wolfgang Singer

IPC分类号： G21K1/06 ,  G01J3/18 ,  G02B5/18 ,  G02B19/00 ,  G02B27/44 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70575 ,  G01J3/18 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B27/4244 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70158 ,  G03F7/70191

摘要： There is provided an attenuator for attenuating electromagnetic radiation of wavelengths unequal to a used wavelength, including a grating element, having i) grating grooves that produce a grating period (p), and ii) a grating plane. The grating period (p) is at least about 150 times higher than the used wavelength.

摘要翻译： 提供了一种衰减器，用于衰减不同于所使用波长的波长的电磁辐射，包括光栅元件，其具有产生光栅周期（p）的光栅槽，以及ii）光栅平面。 光栅周期（p）比使用的波长高至少约150倍。

公开(公告)号：US06967710B2

公开(公告)日：2005-11-22

申请号：US10759598

申请日：2004-01-20

申请人： Naomasa Shiraishi

发明人： Naomasa Shiraishi

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/701 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891 ,  G03F9/7088

摘要： An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.

公开(公告)号：US06927887B2

公开(公告)日：2005-08-09

申请号：US09981500

申请日：2001-10-16

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G02B5/32 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G02B5/32 ,  G03F7/70091 ,  G03F7/70158 ,  G03F7/70583

摘要： The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.

摘要翻译： 同步加速器束线的有效相干性可以通过采用移动全息漫射器和固定的低成本球面镜来调整投影光刻要求。 本发明特别适用于需要部分相干照明的光学图像处理系统的照明装置。 照明器包括：（1）相干或部分相干辐射的同步加速器源，其具有高于期望相干性的固有相干性，（2）具有接收来自所述源的入射辐射的表面的全息漫射器，（3） 用于沿着平行于全息漫射器的表面的平面二维地平移全息漫射器的表面，其中运动速率相对于所述图像处理系统的积分时间是快的; 和（4）将所述全息漫射器的表面重新成像到所述图像处理系统的入射面的聚光镜。

公开(公告)号：US20050117203A1

公开(公告)日：2005-06-02

申请号：US10985488

申请日：2004-11-10

申请人： Nils Dieckmann ,  Kirstin Becker ,  Dieter Bader

发明人： Nils Dieckmann ,  Kirstin Becker ,  Dieter Bader

IPC分类号： G02B5/18 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54 ,  G02B1/00 ,  G02B5/02 ,  G02B13/20 ,  G02B27/42 ,  G03B27/72 ,  G03F7/40

CPC分类号： G03F7/70075 ,  G02B5/1838 ,  G02B5/1857 ,  G03F7/70158 ,  G03F7/70958

摘要： In a method for producing an optical element from a quartz substrate for illumination systems with illumination sources which emit beams of wavelength 157 nm or shorter, the quartz substrate is joined to a support body on at least one side. Subsequently, from the quartz substrate material is removed to a desired value with a thickness in the μ region. The optical element can be a diffractive optical element or diffusion plate.

摘要翻译： 在从具有发射波长为157nm或更短的光束的照明源的照明系统的石英基板制造光学元件的方法中，石英基板在至少一侧与支撑体接合。 随后，从石英衬底材料中去除具有μ区域厚度的期望值。 光学元件可以是衍射光学元件或扩散板。

公开(公告)号：US20040263977A1

公开(公告)日：2004-12-30

申请号：US10860161

申请日：2004-06-04

申请人： NIKON CORPORATION

发明人： Mitsunori Toyoda ,  Osamu Tanitsu

IPC分类号： G02B005/18 ,  G02B027/42

CPC分类号： G03F7/701 ,  G03F7/70108 ,  G03F7/70158

摘要： An illumination optical system having a more simplified structure forms various quadrupole-shaped secondary light sources with two-time rotational symmetry with respect to an optical axis. The apparatus can provide illumination conditions that differ in two perpendicular directions on a radiation-receiving plane. In order to form a secondary light source with a quadrupole-shaped light intensity distribution on an illumination pupil plane, a diffractive optical device is provided in which an entrance light beam is converted into four light beams, and a light beam having a shape of four points centered about the optical axis is formed in a far field. The diffractive optical device is provided with a first diffractive optical member that is rotatable about a first axis parallel to the optical axis, and a second diffractive optical member that is rotatable about a second axis parallel to the optical axis, and that is arranged adjacent to the first diffractive optical member. A refractive optical device having first and second refractive optical members accomplishes similar results.

摘要翻译： 具有更简化的结构的照明光学系统形成相对于光轴具有两次旋转对称性的各种四极形二次光源。 该装置可以提供在辐射接收平面上在两个垂直方向上不同的照明条件。 为了在照明光瞳平面上形成具有四极形光强度分布的二次光源，提供了一种衍射光学器件，其中入射光束被转换为四个光束，并且具有四个形状的光束 以远轴为中心的点形成在远场中。 衍射光学装置设置有可围绕平行于光轴的第一轴线旋转的第一衍射光学构件和可绕平行于光轴的第二轴线旋转的第二衍射光学构件，并且其被布置为 第一衍射光学构件。 具有第一和第二折射光学构件的折射光学装置也实现了类似的结果。

公开(公告)号：US20030227684A1

公开(公告)日：2003-12-11

申请号：US10338717

申请日：2003-01-09

发明人： Akihiro Goto

IPC分类号： G02B005/18 ,  G02B027/44

CPC分类号： G03F7/70158 ,  G02B27/0043 ,  G02B27/4277

摘要： A diffractive optical element is provided with a first basic diffractive element on which a ring-shaped diffraction grating is formed; and a second basic diffractive element on which a ring-shaped diffraction grating is formed; wherein a center of the ring-shaped diffraction grating of the first basic diffractive element is eccentric in the first direction with respect to the center of a contour of the first basic diffractive element, and a center of the ring-shaped diffraction grating of the second basic diffractive element is eccentric in the second direction with respect to the center of a contour of the second basic diffractive element.

摘要翻译： 衍射光学元件设置有形成环形衍射光栅的第一基本衍射元件; 以及形成环状衍射光栅的第二基本衍射元件; 其中所述第一基本衍射元件的所述环形衍射光栅的中心在所述第一方向上相对于所述第一基本衍射元件的轮廓的中心是偏心的，并且所述第二基本衍射元件的所述环形衍射光栅的中心 基本衍射元件相对于第二基本衍射元件的轮廓的中心在第二方向上偏心。

公开(公告)号：US20030206340A1

公开(公告)日：2003-11-06

申请号：US10406933

申请日：2003-04-03

发明人： Michael Goldstein

IPC分类号： G02B005/20

CPC分类号： G03F7/70575 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702

摘要： In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

公开(公告)号：US20030081316A1

公开(公告)日：2003-05-01

申请号：US09956160

申请日：2001-09-17

发明人： Kenneth Alan Goldberg ,  Patrick P. Naulleau

IPC分类号： G02B027/42

CPC分类号： G03F7/70075 ,  G02B5/1833 ,  G02B5/1838 ,  G03F7/70158

摘要： A wavefront modulating optical element device employs two or more materials lithographically patterned with programmed thickness profiles. The spatially-varying thickness profiles are chosen to yield arbitrary relative phase-shift and attenuation upon transmission. The device can be designed to create arbitrary diffractive optical elements with specific applications including diffusers, arbitrary holographic optical elements, null-elements for wavefront compensation and control in interferometry.

摘要翻译： 波前调制光学元件器件采用光刻图案化的具有编程厚度分布的两种或更多种材料。 选择空间变化的厚度分布以在传输时产生任意相对相移和衰减。 该设备可以被设计成创建具有特定应用的任意衍射光学元件，包括扩散器，任意全息光学元件，用于波前补偿的零元素和用于干涉测量的控制。

公开(公告)号：US20030076679A1

公开(公告)日：2003-04-24

申请号：US10270556

申请日：2002-10-16

申请人： ASML US, Inc.

发明人： Mark Oskotsky ,  Lev Ryzhikov ,  Scott Coston ,  James Tsacoyeanes ,  Peter J. Baumgartner ,  Walter Augustyn

IPC分类号： F21V001/00 ,  G02B027/10

CPC分类号： G03F7/70158 ,  G03F7/70183

摘要： The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array. The second diffractive array is optically coupled to the condenser system, receives light from the condenser system, which in turn generates an illumination field at a reticle.

摘要翻译： 本发明涉及一种照明系统，包括照明源，放置在与照明源的光路中的光束调节器，第一衍射阵列，冷凝器系统和第二衍射阵列。 照明源将光通过光束调节器引导到第一衍射阵列上。 然后将光导向放置在第一衍射阵列和第二衍射阵列之间的光路中的聚光系统。 冷凝器系统包括多个固定光学元件和多个可移动光学元件。 多个可移动光学元件被放置在具有多个固定光学元件的光路中。 可移动光学元件能够在多个固定光学元件之间平移以放大从第一衍射阵列接收的光。 第二衍射阵列光耦合到冷凝器系统，接收来自冷凝器系统的光，其又在光罩处产生照明场。