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85 条记录 (耗时 0.021 秒)

    Surface contrast system and method
    41.
    发明授权
    Surface contrast system and method 失效
    表面对比系统和方法

    公开(公告)号：US3815998A

    公开(公告)日：1974-06-11

    申请号：US30233772

    申请日：1972-10-30

    申请人： IBM

    发明人： TIETZE A

    IPC分类号： G02B21/00 ,  G02B27/50 ,  G01B11/30

    CPC分类号： G02B27/50

    摘要： A system and method for generating a shadow image of the surface of an object, the image capable of quantitative surface measurement by direct measurement of the slope of the surface at a given location, from which a surface roughness figure may be determined. Light of a defined angular distribution is directed upon the object surface. A collecting lens transmits an image of the surface to an image plane. An aperture located at the focal plane of the lens has at least a portion thereof in the light path to block out a portion of the possible angles of light passing through the collecting lens, limiting the reflected light from the surface to an angular light distribution in the beam to effect a contrast image between at least two areas in the image plane of an intensity contrast of at least two per cent.

    摘要翻译： 一种用于生成物体表面的阴影图像的系统和方法，所述图像能够通过直接测量在给定位置处的表面的斜率来进行定量表面测量，从该表面可以确定表面粗糙度图。 定义的角度分布的光指向物体表面。 收集透镜将表面的图像发送到图像平面。 位于透镜的焦平面处的光阑在光路中具有至少一部分，以阻挡通过聚光透镜的可能角度的一部分，将来自表面的反射光限制到角度的光分布 所述光束在至少2％的强度对比度的图像平面中的至少两个区域之间进行对比度图像。

    Optical demodulation system
    42.
    发明授权
    Optical demodulation system 失效
    光学解调系统

    公开(公告)号：US3687535A

    公开(公告)日：1972-08-29

    申请号：US3687535D

    申请日：1970-02-13

    申请人： XEROX CORP

    发明人： HEURTLEY JOHN C

    IPC分类号： G02B27/44 ,  G02B27/46 ,  G02B27/50 ,  G03G16/00 ,  G03B21/14

    CPC分类号： G02B27/4238 ,  G02B27/46 ,  G03G16/00

    摘要： Optically screened input information is recorded as excursions on the surface of a thermoplastic film. The excursions basically consist of a periodic carrier wave and a modulating signal containing the input information. Highly coherent light is directed incident upon the image bearing surface whereby the signal modulated deformations thereon cause the light to become diffracted. The diffracted light is then passed through a projection system including a spatial filter which is positionable in the focal plane of the system. The filter comprises a thin opaque mask having two clear apertures therein, which, when the mask is positioned in the systems focal plane, are coincident with the two first diffracted order focal spots, the two apertures being of a size capable of passing the modulated side bands of the input signal. The mask also has a third aperture centered about the optical center line of the system and being of a size such that the Airy disc of the zero diffracted order just fills, or preferably, slightly more than fills the central aperture when the two first diffracted order focal spots are centered in the other two apertures. The optical path length of one of the light beams passing through the filter is retarded in relation to the other beams whereby interference between the light beams is produced at the scan plane of the system.

    摘要翻译： 光学屏蔽的输入信息被记录在热塑性薄膜表面上的偏移。 偏移基本上由周期性载波和包含输入信息的调制信号组成。 高相干光被引导入射到图像承载表面上，由此在其上的信号调制变形导致光被衍射。 衍射光然后通过包括可在系统的焦平面定位的空间滤光器的投影系统。 该过滤器包括其中具有两个透明孔的薄的不透明掩模，当掩模位于系统焦平面中时，该掩模与两个第一衍射级焦点重合，这两个孔的尺寸能够通过调制侧 输入信号的频带。 掩模还具有以系统的光学中心线为中心的第三光圈，并且具有这样的尺寸，使得当零衍射阶数的艾里圆盘填充时，或者优选稍微填充中心孔，当两个第一衍射顺序 焦斑位于另外两个孔中心。 通过滤光器的光束之一的光程长度相对于其他光束延迟，由此在系统的扫描平面处产生光束之间的干扰。

    Phase object visualization apparatus and phase object visualization method
    47.
    发明授权
    Phase object visualization apparatus and phase object visualization method 有权

    公开(公告)号：US10884230B2

    公开(公告)日：2021-01-05

    申请号：US15607223

    申请日：2017-05-26

    申请人： OLYMPUS CORPORATION

    发明人： Hiroshi Ishiwata

    IPC分类号： H04N7/18 ,  G02B21/36 ,  G02B27/52 ,  G02B21/14 ,  G02B21/00 ,  G02B27/50

    摘要： A phase object visualization apparatus includes: an illumination optical system 11 that illuminates a phase object; an image formation optical system 12 that forms an image from light from sample S that corresponds to the phase object; and light blocking unit 10 for blocking light, the light blocking unit 10 being disposed between the sample S and an image plane formed by the image formation optical system 12, and including an aperture at a position decentered from the optical axis of the image formation optical system 12. The position of the aperture is such that an area occupied on the aperture by 0-order diffraction light from the sample S illuminated by the illumination optical system 11 becomes smaller than the total area of the aperture.

    METHOD AND DEVICE FOR MEASURING WAVEFRONT, AND EXPOSURE METHOD AND DEVICE
    48.
    发明申请
    METHOD AND DEVICE FOR MEASURING WAVEFRONT, AND EXPOSURE METHOD AND DEVICE 审中-公开

    公开(公告)号：US20190219451A1

    公开(公告)日：2019-07-18

    申请号：US16364351

    申请日：2019-03-26

    申请人： NIKON CORPORATION

    发明人： Katsura OTAKI ,  Katsumi SUGISAKI ,  Takashi GEMMA

    IPC分类号： G01J9/02 ,  G02B27/50 ,  G01M11/02 ,  G03F7/20

    摘要： A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.