公开(公告)号：US20230023396A1

公开(公告)日：2023-01-26

申请号：US17385459

申请日：2021-07-26

申请人： Applied Materials Israel Ltd.

发明人： Yehuda Zur

IPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28 ,  H01L21/285 ,  C23C16/48 ,  C23C16/16

摘要： A method of depositing material over a sample in a deposition region of the sample with a charged particle beam column, the method comprising: positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column; cooling the deposition region by contacting the sample with a cyro-nanomanipulator tool in an area adjacent to the deposition region; injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region; generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample; and scanning the focused electron beam across the localized region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region

公开(公告)号：US11551907B2

公开(公告)日：2023-01-10

申请号：US17263017

申请日：2019-07-26

申请人： RIKEN ,  UNIVERSITY PUBLIC CORPORATION OSAKA

发明人： Ken Harada ,  Keiko Shimada ,  Shigeo Mori ,  Atsuhiro Kotani

IPC分类号： H01J37/26 ,  G01N23/201 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

摘要： An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

公开(公告)号：US20220392731A1

公开(公告)日：2022-12-08

申请号：US17663442

申请日：2022-05-16

申请人： Nuflare Technology, Inc.

发明人： Shuji YOSHINO

IPC分类号： H01J37/04 ,  H01J37/317 ,  H01J37/147

摘要： A blanking aperture array unit according to the present embodiment includes a chip configured to control a charged particle beam by blanking control of switching whether to irradiate a target with the charged particle beam; a substrate having the chip mounted thereon; a wire configured to electrically connect pads on the chip to the substrate and transmit a control signal for the blanking control from the substrate to the chip through the pads; and a conductive covering member having a first end connected to the substrate and a second end located on the chip, the covering member being provided from the first end to the second end to cover the wire while maintaining electrical insulation from the wire, and at least two end sides of the second end of the covering member are nearer a central portion of the chip than locations of the pads on the chip.

公开(公告)号：US11476082B1

公开(公告)日：2022-10-18

申请号：US17688339

申请日：2022-03-07

申请人： Integrated Dynamic Electron Solutions, Inc.

发明人： Ruth Shewmon Bloom ,  Bryan Walter Reed ,  Daniel Joseph Masiel ,  Sang Tae Park

IPC分类号： H01J37/24 ,  H01J37/29 ,  H01J37/28 ,  H01J37/147

摘要： A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

公开(公告)号：US11469072B2

公开(公告)日：2022-10-11

申请号：US17177926

申请日：2021-02-17

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： Pavel Adamec

IPC分类号： H01J37/065 ,  H01J37/21 ,  H01J37/147 ,  H01J37/28

摘要： A charged particle beam apparatus (100) is described. The charged particle beam apparatus includes a first vacuum region (121) in which a charged particle beam emitter (105) for emitting a charged particle beam (102) along an optical axis (A) is arranged, a second vacuum region (122) downstream of the first vacuum region and separated from the first vacuum region by a first gas separation wall (132) with a first differential pumping aperture (131), wherein the first differential pumping aperture (131) is configured as a first beam limiting aperture for the charged particle beam (102); and a third vacuum region (123) downstream of the second vacuum region and separated from the second vacuum region by a second gas separation wall (134) with a second differential pumping aperture (133), wherein the second differential pumping aperture (133) is configured as a second beam limiting aperture for the charged particle beam (102). Further described are a scanning electron microscope and a method of operating a charged particle beam apparatus.

公开(公告)号：US11462384B2

公开(公告)日：2022-10-04

申请号：US17017840

申请日：2020-09-11

申请人： JEOL Ltd.

发明人： Yuji Kohno

IPC分类号： H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/244 ,  H01J37/26

摘要： A method of acquiring a dark-field image for a scanning transmission electron microscope is provided. The scanning transmission electron microscope includes a dark-field detector having an annular detection region which is capable of detecting electrons scattered at a specimen in a predetermined angular range, an objective lens, and an imaging lens group disposed at a stage following the objective lens. The method includes reducing an influence of a geometrical aberration on the electrons scattered in the predetermined angular range by shifting a focus of the imaging lens group from a diffraction plane of the objective lens.

公开(公告)号：US11462380B2

公开(公告)日：2022-10-04

申请号：US17266792

申请日：2019-07-03

申请人： ASML NETHERLANDS B. V.

发明人： Pieter Willem Herman De Jager

IPC分类号： H01J37/153 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28

摘要： Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the selected target locations independently, detecting a reflected or a transmitted portion of the beamlets, and generating images of the selected target locations.

公开(公告)号：US20220277921A1

公开(公告)日：2022-09-01

申请号：US17189013

申请日：2021-03-01

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： Benjamin John Cook ,  Bernd Woellert ,  Dieter Winkler

IPC分类号： H01J37/147 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28

摘要： A method of influencing a charged particle beam (11) propagating along an optical axis (A) is described. The method includes: guiding the charged particle beam (11) through at least one opening (102) of a multipole device (100, 200) that comprises a first multipole (110, 210) with four or more first electrodes (111, 211) and a second multipole (120, 220) with four or more second electrodes (121, 221) arranged in the same sectional plane, the first electrodes and the second electrodes being arranged alternately around the at least one opening (102); and at least one of exciting the first multipole to provide a first field distribution for influencing the charged particle beam in a first manner, and exciting the second multipole to provide a second field distribution for influencing the charged particle beam in a second manner. Further, a multipole device (100, 200) with a first multipole (110, 210) and a second multipole (120, 220) provided on the same substrate as well as a charged particle beam apparatus (500) with a multipole device (100, 200) are provided.

公开(公告)号：US11417494B2

公开(公告)日：2022-08-16

申请号：US17055984

申请日：2019-05-14

申请人： Photo electron Soul Inc.

发明人： Reiki Watanabe ,  Tomohiro Nishitani ,  Atsushi Koizumi ,  Haruka Shikano

IPC分类号： H01J37/147 ,  H01J37/073 ,  H01J3/02 ,  H01J1/34

摘要： The present invention addresses the problem of providing a method for automatically adjusting an electron beam emitted from an electron gun equipped with a photocathode to the incident axis of an electron optical system.
[Solution] An incident axis alignment method for an electron gun equipped with a photocathode, the electron gun being capable of emitting an electron beam in a first state due to the photocathode being irradiated with excitation light, and the method including at least an excitation light radiation step, a first excitation light irradiation position adjustment step for changing the irradiation position of the excitation light on the photocathode and adjusting the irradiation position of the excitation light, and an electron beam center detection step for detecting whether a center line of the electron beam in the first state coincides with an incident axis of an electron optical system.

公开(公告)号：US20220216028A1

公开(公告)日：2022-07-07

申请号：US17610068

申请日：2020-05-11

申请人： ATTOLIGHT AG

发明人： BERNEY Jean

IPC分类号： H01J37/141 ,  H01J37/147 ,  H01J37/22

摘要： A scanning electron microscope having an electron column positioned to direct an electron beam onto a sample the electron column having a vacuum enclosure; an electron source; and an electromagnetic objective lens positioned within the vacuum enclosure, the electromagnetic objective lens including a housing having an entry aperture at top surface thereof and an exit aperture at bottom thereof; an electromagnetic coil radially positioned within the housing; a light objective positioned within the housing and comprising a concave minor having a first axial aperture and a convex minor having a second axial aperture; an electron beam deflector positioned within the housing and comprising a first set of deflectors and a second set of deflectors positioned below the first set of deflectors, wherein the second set of deflectors is positioned below the first axial aperture and the first set of deflectors is positioned