公开(公告)号：US10520451B2

公开(公告)日：2019-12-31

申请号：US15683280

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef

IPC: G01N21/956 ,  G03F7/20

Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.

公开(公告)号：US20190391500A1

公开(公告)日：2019-12-26

申请号：US16486169

申请日：2018-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Antoine Gaston Marie KIERS ,  Scott Anderson MIDDLEBROOKS ,  Jan-Willem GEMMINK

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95 ,  G03F7/00

Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.

公开(公告)号：US20190391498A1

公开(公告)日：2019-12-26

申请号：US16561096

申请日：2019-09-05

Applicant: ASML Netherlands B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Adrianus Cornelis Matheus KOOPMAN ,  Stefan HUNSCHE ,  Willem Marie Julia Marcel COENE

IPC: G03F7/20 ,  G06T7/60 ,  G06T7/12

Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

公开(公告)号：US10514615B2

公开(公告)日：2019-12-24

申请号：US15580806

申请日：2016-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Robbert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03B27/58 ,  G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US20190383602A1

公开(公告)日：2019-12-19

申请号：US16548981

申请日：2019-08-23

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G01B11/25 ,  G03F7/20 ,  G01B11/06 ,  G03F9/00 ,  G01B11/24

Abstract: Measurement system comprising a radiation source configured to generate a measurement radiation beam, a polarizer and a grating to receive the measurement radiation beam and provide a polarized measurement radiation beam patterned by the grating, optics to form an image of the grating at a target location on a substrate. The image comprises a first part having a first polarization and a second part having a second polarization, detection optics to receive radiation from the target location of the substrate and form an image of the grating image at a second grating, and a detector to receive radiation transmitted through the second grating and produce a two output signal indicative of the intensity of the transmitted radiation for the first and second parts of the grating image respectively. Topography of the substrate can be determined from the signals.

公开(公告)号：US10508906B2

公开(公告)日：2019-12-17

申请号：US16121780

申请日：2018-09-05

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Reinald Huisman

IPC: G03F7/20 ,  G01B11/27

Abstract: A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation beam scattered from the two features of the object. The at least a portion of the radiation beam comprises: a first portion comprising at least one diffraction order and a second portion comprising at least one diffraction order that is different to a diffraction order of the first portion. The method further comprises moderating a phase difference between the first and second portions and combining the first and second portions such that they interfere to produce a time dependent intensity signal. The method further comprises determining the parameter of the patterning process from a contrast of the time dependent intensity signal.

公开(公告)号：US20190354024A1

公开(公告)日：2019-11-21

申请号：US16347944

申请日：2017-10-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Anagnostis TSIATMAS ,  Alok VERMA ,  Bert VERSTRAETEN

IPC: G03F7/20 ,  G01N21/47

Abstract: A method of measuring a parameter of a device manufacturing process is disclosed. The method includes measuring a target on a substrate by illuminating the target with measurement radiation and using an optical apparatus to detect the measurement radiation scattered by the target. The target has a target structure having a first periodic component and a second periodic component. The optical apparatus receives radiation resulting from diffraction of the measurement radiation from the target structure. The received radiation includes at least one diffraction order that would not be received from diffraction of the measurement radiation from the first periodic component alone nor from diffraction of the measurement radiation from the second periodic component alone.

公开(公告)号：US20190354021A1

公开(公告)日：2019-11-21

申请号：US16483660

申请日：2018-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Michael Johannes VERVOORDELDONK ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.

公开(公告)号：US20190353521A1

公开(公告)日：2019-11-21

申请号：US16525641

申请日：2019-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich Banine ,  Gerrit Jacobus Hendrik Brussaard ,  Willem Jakobus Cornelis Koppert ,  Otger Jan Luiten ,  Han-Kwang Nienhuys ,  Job Beckers ,  Ruud Martinus Van Der Horst

IPC: G01J1/58 ,  H01S3/09 ,  G01T1/20 ,  G03F7/20 ,  G01J1/42 ,  H01S3/13

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US10481510B2

公开(公告)日：2019-11-19

申请号：US15974661

申请日：2018-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC: G02B5/20 ,  G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/08 ,  G02B27/00 ,  G03F1/24 ,  G03F1/62 ,  G21K1/06 ,  H01B1/04 ,  H01B1/24 ,  G03B27/54 ,  G03F1/64 ,  C01B32/20

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.