Abstract:
Provided are a light emitting device, a method of manufacturing the same, a light emitting device package, and a lighting system. The light emitting device includes: a first conductive semiconductor layer; a superlattice layer on the first conductive semiconductor layer; an active layer on the superlattice layer; and a second conductive semiconductor layer on the active layer. The superlattice layer comprises InxGa(1−x)N(0
Abstract translation:提供了发光器件,其制造方法,发光器件封装和照明系统。 发光器件包括:第一导电半导体层; 在第一导电半导体层上的超晶格层; 在超晶格层上的活性层; 以及在所述有源层上的第二导电半导体层。 超晶格层包括掺杂有n型掺杂剂的In x Ga(1-x)N(0
Abstract:
In a flat panel display device and a method of manufacturing the same, the flat panel display device is manufactured by forming a display unit on a substrate, forming a hydrophobic barrier layer for preventing a material of an organic layer from flowing around the display unit, and forming a thin film sealing layer by alternately stacking an inorganic layer and the organic layer on the display unit. Accordingly, formation of an edge tail of the organic layer is prevented, thereby preventing penetration of external moisture.
Abstract:
An organic light emitting diode (OLED) display is disclosed. In one embodiment, the display includes i) a substrate, ii) a driving circuit formed on the substrate, iii) an organic light emitting diode formed on the substrate and electrically connected to the driving circuit, iv) an encapsulation thin film formed on the driving circuit and organic light emitting diode and v) a spacer formed on the substrate and surrounding the encapsulation thin film.
Abstract:
A semiconductor device may include a composite represented by Formula 1 below as an active layer. x(Ga2O3).y(In2O3).z(ZnO) Formula 1 wherein, about 0.75≦x/z≦about 3.15, and about 0.55≦y/z≦about 1.70.Switching characteristics of displays and driving characteristics of driving transistors may be improved by adjusting the amounts of a gallium (Ga) oxide and an indium (In) oxide mixed with a zinc (Zn) oxide and improving optical sensitivity.
Abstract translation:半导体器件可以包括由下面的式1表示的复合物作为有源层。 x(Ga 2 O 3)y(In 2 O 3)z(ZnO)式1其中约0.75< lE; x / z≦̸约3.15和约0.55≤n1E; y /z≤n1E;约1.70。 可以通过调节与锌(Zn)氧化物混合的镓(Ga)氧化物和铟(In))的量来提高驱动晶体管的开关特性并提高光学灵敏度。
Abstract:
A semiconductor device may include a composite represented by Formula 1 below as an active layer. x(Ga2O3).y(In2O3).z(ZnO) Formula 1 wherein, about 0.75≦x/z≦about 3.15, and about 0.55≦y/z≦about 1.70. Switching characteristics of displays and driving characteristics of driving transistors may be improved by adjusting the amounts of a gallium (Ga) oxide and an indium (In) oxide mixed with a zinc (Zn) oxide and improving optical sensitivity.
Abstract:
A memory device may include a channel including at least one carbon nanotube. A source and a drain may be arranged at opposing ends of the channel and may contact different parts of the channel. A first storage node may be formed under the channel, and a second storage node may be formed on the channel. A first gate electrode may be formed under the first storage node and a second gate electrode may be formed on the second storage node.
Abstract:
A nano-elastic memory device and a method of manufacturing the same. The nano-elastic memory device may include a substrate, a plurality of lower electrodes arranged in parallel on the substrate, a support unit formed of an insulating material to a desired or predetermined thickness on the substrate having cavities that expose the lower electrodes, a nano-elastic body extending perpendicular from a surface of the lower electrodes in the cavities, and a plurality of upper electrodes formed on the support unit and perpendicularly crossing the lower electrodes over the nano-elastic bodies.
Abstract:
A nano-elastic memory device and a method of manufacturing the same. The nano-elastic memory device may include a substrate, a plurality of lower electrodes arranged in parallel on the substrate, a support unit formed of an insulating material to a desired or predetermined thickness on the substrate having cavities that expose the lower electrodes, a nano-elastic body extending perpendicular from a surface of the lower electrodes in the cavities, and a plurality of upper electrodes formed on the support unit and perpendicularly crossing the lower electrodes over the nano-elastic bodies.
Abstract:
A zinc oxide (ZnO) group and method of forming the same are provided. The ZnO group diode may include a first electrode and a second electrode that are separated from each other, and an active layer formed of MxIn1-xZnO (wherein “M” is a Group III metal) between the first electrode and the second electrode. The first electrode may have a work function lower than the active layer. The second electrode may have a work function higher than the active layer.
Abstract translation:提供氧化锌(ZnO)基团及其形成方法。 ZnO族二极管可以包括彼此分离的第一电极和第二电极,以及由M 1 x In 1 x x ZnO形成的有源层(其中“ M“是第III族金属)。 第一电极可具有低于有源层的功函数。 第二电极可具有比有源层高的功函数。
Abstract:
A semiconductor device may include a composite represented by Formula 1 below as an active layer. x(Ga2O3)·y(In2O3)·z(ZnO) Formula 1wherein, about 0.75≦x/z≦about 3.15, and about 0.55≦y/z≦about 1.70. Switching characteristics of displays and driving characteristics of driving transistors may be improved by adjusting the amounts of a gallium (Ga) oxide and an indium (In) oxide mixed with a zinc (Zn) oxide and improving optical sensitivity.
Abstract translation:半导体器件可以包括由下面的式1表示的复合物作为有源层。 <?in-line-formula description =“In-line Formulas”end =“lead”?> x(Ga 2 2 O 3 3)y(In < z(ZnO)式1 <?in-line-formula description =“In-line Formulas”end =“tail”?>其中,约0.75 <= x / z <=约3.15,约0.55≤y/z≤约1.70。 可以通过调节与锌(Zn)氧化物混合的镓(Ga)氧化物和铟(In))的量来提高驱动晶体管的开关特性并提高光学灵敏度。