LIGHT EMITTING DEVICE
    51.
    发明申请
    LIGHT EMITTING DEVICE 审中-公开
    发光装置

    公开(公告)号:US20130043457A1

    公开(公告)日:2013-02-21

    申请号:US13459635

    申请日:2012-04-30

    CPC classification number: H01L33/06 H01L33/32 H01L2224/48091 H01L2924/00014

    Abstract: Provided are a light emitting device, a method of manufacturing the same, a light emitting device package, and a lighting system. The light emitting device includes: a first conductive semiconductor layer; a superlattice layer on the first conductive semiconductor layer; an active layer on the superlattice layer; and a second conductive semiconductor layer on the active layer. The superlattice layer comprises InxGa(1−x)N(0

    Abstract translation: 提供了发光器件,其制造方法,发光器件封装和照明系统。 发光器件包括:第一导电半导体层; 在第一导电半导体层上的超晶格层; 在超晶格层上的活性层; 以及在所述有源层上的第二导电半导体层。 超晶格层包括掺杂有n型掺杂剂的In x Ga(1-x)N(0

    ZnO based semiconductor devices and methods of manufacturing the same
    54.
    发明申请
    ZnO based semiconductor devices and methods of manufacturing the same 有权
    基于ZnO的半导体器件及其制造方法

    公开(公告)号:US20110101343A1

    公开(公告)日:2011-05-05

    申请号:US12929324

    申请日:2011-01-14

    CPC classification number: H01L29/7869

    Abstract: A semiconductor device may include a composite represented by Formula 1 below as an active layer. x(Ga2O3).y(In2O3).z(ZnO)  Formula 1 wherein, about 0.75≦x/z≦about 3.15, and about 0.55≦y/z≦about 1.70.Switching characteristics of displays and driving characteristics of driving transistors may be improved by adjusting the amounts of a gallium (Ga) oxide and an indium (In) oxide mixed with a zinc (Zn) oxide and improving optical sensitivity.

    Abstract translation: 半导体器件可以包括由下面的式1表示的复合物作为有源层。 x(Ga 2 O 3)y(In 2 O 3)z(ZnO)式1其中约0.75< lE; x / z≦̸约3.15和约0.55≤n1E; y /z≤n1E;约1.70。 可以通过调节与锌(Zn)氧化物混合的镓(Ga)氧化物和铟(In))的量来提高驱动晶体管的开关特性并提高光学灵敏度。

    Nano-elastic memory device and method of manufacturing the same
    57.
    发明申请
    Nano-elastic memory device and method of manufacturing the same 失效
    纳米弹性记忆装置及其制造方法

    公开(公告)号:US20090068782A1

    公开(公告)日:2009-03-12

    申请号:US12289192

    申请日:2008-10-22

    Abstract: A nano-elastic memory device and a method of manufacturing the same. The nano-elastic memory device may include a substrate, a plurality of lower electrodes arranged in parallel on the substrate, a support unit formed of an insulating material to a desired or predetermined thickness on the substrate having cavities that expose the lower electrodes, a nano-elastic body extending perpendicular from a surface of the lower electrodes in the cavities, and a plurality of upper electrodes formed on the support unit and perpendicularly crossing the lower electrodes over the nano-elastic bodies.

    Abstract translation: 纳米弹性记忆装置及其制造方法。 纳米弹性存储装置可以包括基板,在基板上平行布置的多个下电极,在基板上具有期望或预定厚度的绝缘材料形成的支撑单元,该基板具有露出下电极的空腔, 在空腔中从下电极的表面垂直延伸的弹性体,以及形成在支撑单元上并与纳米弹性体上的下电极垂直交叉的多个上电极。

    Nano-elastic memory device and method of manufacturing the same
    58.
    发明授权
    Nano-elastic memory device and method of manufacturing the same 失效
    纳米弹性记忆装置及其制造方法

    公开(公告)号:US07453085B2

    公开(公告)日:2008-11-18

    申请号:US11505970

    申请日:2006-08-18

    Abstract: A nano-elastic memory device and a method of manufacturing the same. The nano-elastic memory device may include a substrate, a plurality of lower electrodes arranged in parallel on the substrate, a support unit formed of an insulating material to a desired or predetermined thickness on the substrate having cavities that expose the lower electrodes, a nano-elastic body extending perpendicular from a surface of the lower electrodes in the cavities, and a plurality of upper electrodes formed on the support unit and perpendicularly crossing the lower electrodes over the nano-elastic bodies.

    Abstract translation: 纳米弹性记忆装置及其制造方法。 纳米弹性存储装置可以包括基板,在基板上平行布置的多个下电极,在基板上具有期望或预定厚度的绝缘材料形成的支撑单元,该基板具有露出下电极的空腔, 在空腔中从下电极的表面垂直延伸的弹性体,以及形成在支撑单元上并与纳米弹性体上的下电极垂直交叉的多个上电极。

    ZnO diode and method of forming the same
    59.
    发明申请
    ZnO diode and method of forming the same 审中-公开
    ZnO二极管及其形成方法

    公开(公告)号:US20080142796A1

    公开(公告)日:2008-06-19

    申请号:US11980454

    申请日:2007-10-31

    CPC classification number: H01L29/22 H01L29/26 H01L29/47 H01L29/872

    Abstract: A zinc oxide (ZnO) group and method of forming the same are provided. The ZnO group diode may include a first electrode and a second electrode that are separated from each other, and an active layer formed of MxIn1-xZnO (wherein “M” is a Group III metal) between the first electrode and the second electrode. The first electrode may have a work function lower than the active layer. The second electrode may have a work function higher than the active layer.

    Abstract translation: 提供氧化锌(ZnO)基团及其形成方法。 ZnO族二极管可以包括彼此分离的第一电极和第二电极,以及由M 1 x In 1 x x ZnO形成的有源层(其中“ M“是第III族金属)。 第一电极可具有低于有源层的功函数。 第二电极可具有比有源层高的功函数。

    Semiconductor device and method of manufacturing the same
    60.
    发明申请
    Semiconductor device and method of manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US20070252147A1

    公开(公告)日:2007-11-01

    申请号:US11785269

    申请日:2007-04-17

    CPC classification number: H01L29/7869

    Abstract: A semiconductor device may include a composite represented by Formula 1 below as an active layer. x(Ga2O3)·y(In2O3)·z(ZnO)  Formula 1wherein, about 0.75≦x/z≦about 3.15, and about 0.55≦y/z≦about 1.70. Switching characteristics of displays and driving characteristics of driving transistors may be improved by adjusting the amounts of a gallium (Ga) oxide and an indium (In) oxide mixed with a zinc (Zn) oxide and improving optical sensitivity.

    Abstract translation: 半导体器件可以包括由下面的式1表示的复合物作为有源层。 <?in-line-formula description =“In-line Formulas”end =“lead”?> x(Ga 2 2 O 3 3)y(In < z(ZnO)式1 <?in-line-formula description =“In-line Formulas”end =“tail”?>其中,约0.75 <= x / z <=约3.15,约0.55≤y/z≤约1.70。 可以通过调节与锌(Zn)氧化物混合的镓(Ga)氧化物和铟(In))的量来提高驱动晶体管的开关特性并提高光学灵敏度。

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