CHARGED PARTICLE BEAM APPARATUS
    51.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20100102224A1

    公开(公告)日:2010-04-29

    申请号:US12651209

    申请日:2009-12-31

    CPC classification number: G01N23/225 H01J2237/21 H01J2237/2817

    Abstract: A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.

    Abstract translation: 一种带电粒子束装置,用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息,测量从 样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

    Charged particle beam apparatus
    52.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US07652249B2

    公开(公告)日:2010-01-26

    申请号:US11699065

    申请日:2007-01-29

    CPC classification number: G01N23/225 H01J2237/21 H01J2237/2817

    Abstract: A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.

    Abstract translation: 一种带电粒子束装置,用于通过向多个焦点位置处具有不平坦表面或凹陷/突起的样品照射带电粒子束来获得样品的不平坦表面或凹陷/突起的信息,测量从 样本和比较与不平坦表面的边缘部分相对应的轮廓波形。

    Inspection apparatus
    54.
    发明申请
    Inspection apparatus 有权
    检验仪器

    公开(公告)号:US20070258640A1

    公开(公告)日:2007-11-08

    申请号:US11790883

    申请日:2007-04-27

    Abstract: An inspection apparatus and method are provided, wherein even when an image that cannot be processed by a current image processing algorithm is input to an image processing unit while a working line is in operation, the inspection can be continued by newly generating an image processing algorithm optimized in keeping with a particular image. The apparatus includes an erroneous recognition detector, a teacher data generator and a switching unit for switching the current image processing algorithm to a new image processing algorithm generated based on an updated teacher data group. As a result, the inspection can be continued without extremely decreasing the accuracy even when an unexpected image is input to the working line.

    Abstract translation: 提供了一种检查装置和方法,其中即使在工作线处于运行中,当图像处理单元不能被当前图像处理算法处理的图像输入到图像处理单元时,也可以通过新生成图像处理算法来继续检查 根据特定图像进行优化。 该装置包括错误识别检测器,教师数据发生器和用于将当前图像处理算法切换到基于更新的教师数据组生成的新图像处理算法的切换单元。 结果,即使当意外的图像被输入到工作线路时,也可以继续检查,而不会极大地降低精度。

    Semiconductor inspection system
    55.
    发明授权
    Semiconductor inspection system 有权
    半导体检测系统

    公开(公告)号:US07235782B2

    公开(公告)日:2007-06-26

    申请号:US10082286

    申请日:2002-02-26

    CPC classification number: H01J37/28

    Abstract: An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

    Abstract translation: 实现了高吞吐量的无操作员和全自动半导体检测系统。 捕获和检查所需的所有条件都是从CAD数据等设计信息生成的。 为了在条件下进行实际检查,半导体检查系统由用于从设计信息产生捕获和检查所需的所有条件的导航系统和用于实际执行捕获和检查的扫描电子显微镜系统组成。 此外,在进行设计数据和SEM图像之间的匹配处理的情况下,通过使用根据多个方向的边缘信息和平滑来校正变形部分。 此外,将与检测位置对应的SEM图像重新登记为模板,由此进行匹配处理。

    Semiconductor inspection system
    57.
    发明授权

    公开(公告)号:US07026615B2

    公开(公告)日:2006-04-11

    申请号:US10365383

    申请日:2003-02-13

    CPC classification number: H01J37/28

    Abstract: An operator-free and fully automated semiconductor inspection system with high throughput is realized. All conditions required for capturing and inspection are generated from design information such as CAD data. In order to perform actual inspection under the conditions, a semiconductor inspection system is composed of a navigation system for generating all the conditions required for capturing and inspection from the design information and a scanning electron microscope system for actually performing capturing and inspection. Moreover, in the case of performing a matching process between designed data and a SEM image, deformed parts are corrected by use of edge information in accordance with multiple directions and smoothing thereof. Furthermore, a SEM image corresponding to a detected position is re-registered as a template, and the matching process is thereby performed.

    Pattern matching apparatus and scanning electron microscope using the same
    58.
    发明申请
    Pattern matching apparatus and scanning electron microscope using the same 有权
    图案匹配装置和扫描电子显微镜使用相同

    公开(公告)号:US20060045326A1

    公开(公告)日:2006-03-02

    申请号:US11207936

    申请日:2005-08-22

    Abstract: A pattern matching apparatus comprising: means for storing photographed image data of a semiconductor device; means for storing CAD data of said semiconductor device; an information input means for inputting information on the white band width contained in said image data; a pattern extracting means for extracting a pattern on the semiconductor device from said image data by using the white band width information; and a matching means for matching said pattern with the CAD data.

    Abstract translation: 一种图案匹配装置,包括:用于存储半导体器件的摄影图像数据的装置; 用于存储所述半导体器件的CAD数据的装置; 信息输入装置,用于输入包含在所述图象数据中的白带宽的信息; 模式提取装置,用于通过使用白色带宽信息从所述图像数据中提取半导体装置上的图案; 以及用于将所述图案与CAD数据相匹配的匹配装置。

    Statistic calculating method using a template and corresponding sub-image to determine similarity based on sum of squares thresholding
    60.
    发明申请
    Statistic calculating method using a template and corresponding sub-image to determine similarity based on sum of squares thresholding 失效
    使用模板和相应子图像的统计计算方法根据平方和阈值确定相似度

    公开(公告)号:US20050147305A1

    公开(公告)日:2005-07-07

    申请号:US11060400

    申请日:2005-02-18

    CPC classification number: G06K9/6203 G06T7/20

    Abstract: An apparatus for calculating a normalized correlation coefficient used as a similarity evaluation measure by using image data values of pixels in a template image and image data values of pixels in a subimage, included in a search image, corresponding to the template image, has a memory that stores image data values of pixels in the search image and calculating means that calculate a sum of image data values of pixels in the template image and a sum of image data values of pixels in the first rectangular region in the search image or a sum of squares of image data values of pixels in the template image and a sum of squares of image data values of pixels in the first rectangular region in the search image. Normalized correlation coefficient calculating means calculate a normalized correlation coefficient on the basis of the sum of image data values of pixels in the template image and the sum of image data values of pixels in the first rectangular region in the search image, or the sum of squares of image data values of pixels in the template image and the sum of squares of image data values of pixels in the first rectangular region in the search image.

    Abstract translation: 一种用于计算通过使用模板图像中的像素的图像数据值和相应于模板图像的包括在搜索图像中的子图像中的像素的图像数据值而用作相似性评估度量的归一化相关系数的装置,具有存储器 其存储搜索图像中的像素的图像数据值;以及计算装置,其计算模板图像中的像素的图像数据值的和和搜索图像中的第一矩形区域中的像素的图像数据值之和,或者 模板图像中的像素的图像数据值的平方和搜索图像中的第一矩形区域中的像素的图像数据值的平方和。 归一化相关系数计算装置基于模板图像中的像素的图像数据值之和和搜索图像中的第一矩形区域中的像素的图像数据值之和或平方和来计算归一化相关系数 的模板图像中的像素的图像数据值和搜索图像中的第一矩形区域中的像素的图像数据值的平方和。

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