Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor
    51.
    发明授权
    Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor 有权
    光敏树脂组合物,遮光滤色片及其制作方法及图像传感器

    公开(公告)号:US08119311B2

    公开(公告)日:2012-02-21

    申请号:US12411457

    申请日:2009-03-26

    IPC分类号: G02B5/20

    CPC分类号: G03F7/0007 G03F7/031

    摘要: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.

    摘要翻译: 提供至少包含(A)钛黑,(B)可聚合化合物,(C)光聚合引发剂(D)和树脂)和(E)有机溶剂的光敏树脂组合物,所述光聚合引发剂(C)使用 组合两种或更多种类型的光聚合引发剂,其包括至少一种类型的肟基光聚合引发剂。 还提供了一种具有通过使用感光性树脂组合物形成的图案的遮光滤色器,制造遮光滤色器的方法,该遮光滤色器包括用感光性树脂组合物涂布基板的步骤,成像曝光步骤 ,以及形成图案的步骤,以及具有遮光滤色器的图像传感器。

    Dye-containing negative curable composition, color filter and method for producing the same
    52.
    发明授权
    Dye-containing negative curable composition, color filter and method for producing the same 有权
    含染料的阴性固化性组合物,滤色器及其制造方法

    公开(公告)号:US08057969B2

    公开(公告)日:2011-11-15

    申请号:US11790554

    申请日:2007-04-26

    IPC分类号: G02B5/20 G03F7/00

    摘要: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.

    摘要翻译: 本发明提供含有至少两种染料(A),肟光聚合引发剂(B)和自由基聚合性单体(C)的含染料的负极固化性组合物。 或含有染料的阴性固化性组合物,其包含在东方的两种有机溶剂可溶性染料(A),肟光聚合引发剂(B),自由基聚合性单体(C)和有机溶剂(D),其中, 组合物相对于组合物的总量小于1质量%。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
    53.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION 审中-公开
    化学敏感性或辐射敏感性树脂组合物,化学放大抗蚀剂组合物,耐腐蚀薄膜和使用组合物的形成方法

    公开(公告)号:US20110269071A1

    公开(公告)日:2011-11-03

    申请号:US13095023

    申请日:2011-04-27

    IPC分类号: G03F7/004 G03F7/20

    摘要: An actinic ray-sensitive or radiation-sensitive resin composition of the first invention includes (A1) an acid-decomposable resin, the resin containing three kinds of repeating units each having a specific structure, (B) a photo-acid generator and (C1) a 2-phenylbenzimidazole-based basic compound; an actinic ray-sensitive or radiation-sensitive resin composition of the second invention includes (A2) an acid-decomposable resin, (B) a photo-acid generator and (C2) 2-heteryl benzimidazole-based basic compound; a chemical amplification resist composition of the third invention includes (A3) an acid-decomposable resin, (B) a photo-acid generator and (C3) a benzimidazole-based basic compound having a sulfur atom-containing specific structure; and a resist film and a pattern forming method each use such a composition.

    摘要翻译: 第一发明的光化射线敏感性或辐射敏感性树脂组合物包括(A1)酸分解性树脂,含有三种具有特定结构的重复单元的树脂,(B)光酸发生剂和(C1 )基于2-苯基苯并咪唑的碱性化合物; 第二发明的光化射线敏感性或辐射敏感性树脂组合物包括(A2)酸分解性树脂,(B)光酸产生剂和(C2)2-芳基苯并咪唑类碱性化合物; 第三发明的化学增幅抗蚀剂组合物包括(A3)酸分解性树脂,(B)光酸产生剂和(C3)具有含硫原子的特定结构的苯并咪唑类碱性化合物; 和抗蚀剂膜和图案形成方法均使用这种组合物。

    PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR
    54.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR 有权
    光敏树脂组合物,遮光颜料过滤器及其生产工艺及图像传感器

    公开(公告)号:US20090246650A1

    公开(公告)日:2009-10-01

    申请号:US12407935

    申请日:2009-03-20

    IPC分类号: G03F1/00 G03F7/004

    CPC分类号: G03F7/0007

    摘要: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.

    摘要翻译: 提供至少包含(A)钛黑,(B)两种或更多种可聚合化合物,(C)树脂,(D)光聚合引发剂和(E)有机溶剂)的感光性树脂组合物。 还提供了使用感光性树脂组合物形成的遮光性滤色器,以及遮光性滤色片的制造方法,其特征在于,包括使用所述感光性树脂组合物涂布基材的工序,成像曝光工序 ,以及形成图案的步骤。 此外,提供了包括遮光滤色器的图像传感器。

    GREEN CURABLE COMPOSITION, COLOR FILTER AND METHOD OF PRODUCING SAME
    55.
    发明申请
    GREEN CURABLE COMPOSITION, COLOR FILTER AND METHOD OF PRODUCING SAME 有权
    绿色可固化组合物,彩色滤光片及其生产方法

    公开(公告)号:US20090246649A1

    公开(公告)日:2009-10-01

    申请号:US12406122

    申请日:2009-03-18

    IPC分类号: G03F1/00 G02B5/23

    CPC分类号: G03F7/0007 B33Y70/00

    摘要: The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of from 6/4 to 3/7 (halogenated copper phthalocyanine pigment/barbituric acid derivative yellow pigment); a colored pattern formed from the green curable composition; a color filter including the colored pattern; a solid-state image sensor including the color filter; and a method of producing the color filter.

    摘要翻译: 本发明提供一种绿色可固化组合物,其包含相对于绿色可固化组合物的总固体含量为47.5质量%以上的着色剂,着色剂含有卤化铜酞菁颜料和巴比土酸衍生物黄色颜料 比例为6/4至3/7(卤化铜酞菁颜料/巴比妥酸衍生物黄色颜料); 由绿色可固化组合物形成的着色图案; 包括着色图案的滤色器; 包括所述滤色器的固态图像传感器; 以及制造滤色器的方法。

    Colored curable composition, color filter and method for producing the same
    57.
    发明授权
    Colored curable composition, color filter and method for producing the same 失效
    着色固化性组合物,滤色器及其制造方法

    公开(公告)号:US07575837B2

    公开(公告)日:2009-08-18

    申请号:US11412878

    申请日:2006-04-28

    IPC分类号: G03F7/00 G02B5/20

    CPC分类号: G03F7/0007 C09B67/0033

    摘要: The present invention provides a colored curable composition comprising at least one azomethine dye represented by the following formula (I) and one tetraazaporphyrin dye represented by the following formula (A), wherein R11 to R15: H or a substituent group; R16 and R17: an alkyl, an alkenyl, an aryl or a heterocyclic group; Za and Zb: —N═, or —C(R18)═, in which R18 is a hydrogen atom, an alkyl, an alkenyl, an aryl, or a heterocyclic group; rings A1 to A4: a benzene ring or a pyridine ring provided that at least one of rings A1 to A4 is a pyridine ring; R1 and R2: H or an alkyl provided that R1 and R2 do not simultaneously represent a hydrogen atom; m=1 to 8; and n=1 to 4.

    摘要翻译: 本发明提供一种着色固化性组合物,其包含至少一种由下式(I)表示的偶氮甲碱染料和由下式(A)表示的一种四氮杂卟啉染料,其中R11至R15:H或取代基; R16和R17:烷基,烯基,芳基或杂环基; Za和Zb:-N-或-C(R18) - ,其中R18是氢原子,烷基,烯基,芳基或杂环基; 环A1至A4:苯环或吡啶环,条件是环A1至A4中的至少一个为吡啶环; R1和R2:H或烷基,条件是R1和R2不同时表示氢原子; m = 1〜8; n = 1〜4。

    Positive resist composition
    59.
    发明授权
    Positive resist composition 有权
    正抗蚀剂组成

    公开(公告)号:US07255971B2

    公开(公告)日:2007-08-14

    申请号:US10244070

    申请日:2002-09-16

    IPC分类号: G03C1/73 G03F7/039

    摘要: A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.

    摘要翻译: 一种正型抗蚀剂组合物,其包含以下成分:(A)在用光化射线和辐射之一照射时能够产生酸的化合物; (B)不溶于或微溶于碱的树脂,但在酸的作用下变为碱溶性的树脂; (C)碱性化合物; 和(D)包含至少三个羟基或至少三个取代的羟基并且包含至少一个环状结构的化合物。

    Positive photosensitive composition
    60.
    发明申请
    Positive photosensitive composition 有权
    正光敏组合物

    公开(公告)号:US20070141513A1

    公开(公告)日:2007-06-21

    申请号:US11698114

    申请日:2007-01-26

    申请人: Toru Fujimori

    发明人: Toru Fujimori

    IPC分类号: G03C1/00

    摘要: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

    摘要翻译: 一种正型光敏组合物,其包含(A)在光化学射线或辐射照射时产生酸的酸产生剂,(B)具有单环或多环脂环烃结构并通过酸作用而分解以增加溶解度的树脂 在碱性显影液中,和(C)特定的碱性化合物。