摘要:
A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.
摘要:
The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the total amount of the composition.
摘要:
An actinic ray-sensitive or radiation-sensitive resin composition of the first invention includes (A1) an acid-decomposable resin, the resin containing three kinds of repeating units each having a specific structure, (B) a photo-acid generator and (C1) a 2-phenylbenzimidazole-based basic compound; an actinic ray-sensitive or radiation-sensitive resin composition of the second invention includes (A2) an acid-decomposable resin, (B) a photo-acid generator and (C2) 2-heteryl benzimidazole-based basic compound; a chemical amplification resist composition of the third invention includes (A3) an acid-decomposable resin, (B) a photo-acid generator and (C3) a benzimidazole-based basic compound having a sulfur atom-containing specific structure; and a resist film and a pattern forming method each use such a composition.
摘要:
A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.
摘要:
The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of from 6/4 to 3/7 (halogenated copper phthalocyanine pigment/barbituric acid derivative yellow pigment); a colored pattern formed from the green curable composition; a color filter including the colored pattern; a solid-state image sensor including the color filter; and a method of producing the color filter.
摘要:
The present invention provides a colored curable composition including a dye represented by the following formula (I), a color filter prepared by using the colored curable composition, and a method for manufacturing the color filter.
摘要:
The present invention provides a colored curable composition comprising at least one azomethine dye represented by the following formula (I) and one tetraazaporphyrin dye represented by the following formula (A), wherein R11 to R15: H or a substituent group; R16 and R17: an alkyl, an alkenyl, an aryl or a heterocyclic group; Za and Zb: —N═, or —C(R18)═, in which R18 is a hydrogen atom, an alkyl, an alkenyl, an aryl, or a heterocyclic group; rings A1 to A4: a benzene ring or a pyridine ring provided that at least one of rings A1 to A4 is a pyridine ring; R1 and R2: H or an alkyl provided that R1 and R2 do not simultaneously represent a hydrogen atom; m=1 to 8; and n=1 to 4.
摘要翻译:本发明提供一种着色固化性组合物,其包含至少一种由下式(I)表示的偶氮甲碱染料和由下式(A)表示的一种四氮杂卟啉染料,其中R11至R15:H或取代基; R16和R17:烷基,烯基,芳基或杂环基; Za和Zb:-N-或-C(R18) - ,其中R18是氢原子,烷基,烯基,芳基或杂环基; 环A1至A4:苯环或吡啶环,条件是环A1至A4中的至少一个为吡啶环; R1和R2:H或烷基,条件是R1和R2不同时表示氢原子; m = 1〜8; n = 1〜4。
摘要:
Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), R1 to R6 each independently represent a hydrogen atom or a substituent group; and R7 represents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.
摘要翻译:本发明提供一种可用于原色的滤色器(包括蓝,绿,红)的着色光敏固化组合物,具有高的摩尔吸光系数,并且可以降低膜厚度和优异的色纯度和牢度。 作为着色剂的着色感光性固化性组合物,含有由金属或金属化合物得到的二吡咯亚甲基金属络合物和下式(I)表示的二吡咯亚甲基系化合物:式(I)中, SUP> 1〜R 6各自独立地表示氢原子或取代基; R 7表示氢或卤素原子,或烷基,芳基或杂环基。
摘要:
A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.
摘要:
A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.