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公开(公告)号：US09804509B2
公开(公告)日：2017-10-31
申请号：US15452403
申请日：2017-03-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus Sengers , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Arjen Boogaard
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70591 , G03F7/7085 , G03F7/7095
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
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Patent Agency Ranking
公开(公告)号：US09753383B2
公开(公告)日：2017-09-05
申请号：US14409048
申请日：2013-06-13
Applicant: ASML Netherlands B.V.
Inventor： Michel Riepen , Dzmitry Labetski , Wilbert Jan Mestrom , Wim Ronald Kampinga , Jan Okke Nieuwenkamp , Jacob Brinkert , Henricus Jozef Castelijns , Nicolaas Ten Kate , Hendrikus Gijsbertus Schimmel , Hans Jansen , Dennis Jozef Maria Paulussen , Brian Vernon Virgo , Reinier Theodorus Martinus Jilisen , Ramin Badie , Albert Pieter Rijpma , Johannes Christiaan Leonardus Franken , Peter Van Putten , Gerrit Van Der Straaten
CPC classification number: G03F7/70983 , F15D1/0065 , G03F7/70033 , G03F7/70916 , G21K1/06 , G21K5/08 , H05G2/005 , H05G2/008 , Y10T137/206
Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
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公开(公告)号：US09645507B2
公开(公告)日：2017-05-09
申请号：US14993810
申请日：2016-01-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
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公开(公告)号：US09360765B2
公开(公告)日：2016-06-07
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US09213247B2
公开(公告)日：2015-12-15
申请号：US14262295
申请日：2014-04-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus Sengers , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Arjen Boogaard
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70591 , G03F7/7085 , G03F7/7095
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
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公开(公告)号：US20150116677A1
公开(公告)日：2015-04-30
申请号：US14586468
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。
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