公开(公告)号：US07240058B2

公开(公告)日：2007-07-03

申请号：US10087234

申请日：2002-03-01

Applicant: Ajay Kumar ,  Hanumantha Rao Susarla ,  Prakash Khemani

Inventor： Ajay Kumar ,  Hanumantha Rao Susarla ,  Prakash Khemani

IPC: G06F17/30

CPC classification number: G06F17/30362 ,  Y10S707/99938

Abstract: A client-server system may include a primary state of session data. Application servers may include client states of the session data and may access the primary state. The session data may include attributes. The distributed store may provide locked access to the primary state to processes executing within the application servers. While one process has locked access, other processes are not allowed to access the primary state. In one embodiment, the distributed store provides locked access to portions of the primary state to threads executing within a process with locked access. While a portion of the primary state is locked for a thread, other threads cannot access the portion. In one embodiment, the distributed store may request the process to release the locked access. The process may release the locked access in response to the request. In one embodiment, the process may release the locked access when no longer needed.

Abstract translation: 客户机 - 服务器系统可以包括会话数据的主要状态。 应用服务器可以包括会话数据的客户端状态，并且可以访问主状态。 会话数据可以包括属性。 分布式存储可以提供对主状态的锁定访问以在应用服务器内执行的进程。 当一个进程锁定访问时，其他进程不允许访问主要状态。 在一个实施例中，分布式存储提供对主状态的部分的锁定访问到在具有锁定访问的进程内执行的线程。 虽然主要状态的一部分被锁定为线程，但是其他线程无法访问该部分。 在一个实施例中，分布式存储可以请求该过程来释放锁定的访问。 该过程可以根据请求释放锁定的访问。 在一个实施例中，该过程可以在不再需要时释放锁定的访问。

公开(公告)号：US20070098458A1

公开(公告)日：2007-05-03

申请号：US11262577

申请日：2005-10-31

Applicant: Ajay Kumar ,  Keith Nau ,  Jonathan Sadik ,  David Reed ,  Cory Winters

Inventor： Ajay Kumar ,  Keith Nau ,  Jonathan Sadik ,  David Reed ,  Cory Winters

IPC: G03G15/09

CPC classification number: G03G15/0928 ,  G03G2215/0634

Abstract: A magnetic roll having longitudinal grooves machined in its rotating sleeve enables a pair of rolls to be rotated in a direction opposite to the direction of a photoreceptor moving through a development zone and a trim blade to be mounted proximate one of the rolls at a trim gap of approximately 0.5 to 0.7 mm. The magnetic roll includes a stationary core with at least one magnet, and a sleeve having longitudinal grooves that is mounted about the stationary core so that the sleeve rotates about the stationary core. The sleeve has a relatively smooth surface area between the grooves.

Abstract translation: 具有在其旋转套筒中加工的纵向凹槽的磁性辊使得一对辊能够在与通过显影区域移动的感光体的方向相反的方向上旋转，并且修剪叶片以一个修整间隙安装在一个辊附近 为约0.5至0.7mm。 磁辊包括具有至少一个磁体的固定铁芯和具有围绕固定铁心安装的纵向槽的套筒，以使套筒围绕固定铁心旋转。 套筒在槽之间具有相对平滑的表面积。

公开(公告)号：US20070098448A1

公开(公告)日：2007-05-03

申请号：US11263371

申请日：2005-10-31

Applicant: Steven Hart ,  Ajay Kumar

Inventor： Steven Hart ,  Ajay Kumar

IPC: G03G15/08

CPC classification number: G03G15/09 ,  G03G15/0844 ,  G03G15/0877 ,  G03G15/0893 ,  G03G2215/0822

Abstract: A developer system for developing an image in an electrophotographic printing machine, comprising: a developer housing having a toner sump containing developer material; a magnetic development member rotatably mounted in the housing for transferring toner particles to a latent image on the photoreceptive member in a development zone; a transport system for transporting developer material from the toner sump to the magnetic development member, the transport system includes: a mix/pump auger, disposed in a first auger channel, for mixing and circulating developer material along a first path within the first auger channel; a transport auger, adjacent to the mix/pump auger and disposed in a second auger channel, for circulating developer material along a second path within the second auger channel; a wall member disposed in between the mix/pump auger and the transport auger, the wall member having a first opening disposed near an inboard end of the housing and a second opening disposed near an outboard end of the housing, the first and second opening providing a recirculating path between the first and second paths; a pick up area define in the first path, the pick up area having a predefined developer material volume; and a third opening in the wall member, disposed adjacent to the pumping section associated with a pumping section of the mix/pump auger, for providing a spillway from the first path to the second path to allow excess developer material to be recirculated when the developer material volume of the pick up area is substantially full.

Abstract translation: 一种用于在电子照相印刷机中显影图像的显影剂系统，包括：具有包含显影剂材料的调色剂贮槽的显影剂外壳; 可旋转地安装在壳体中的磁性显影构件，用于将显影区中的调色剂颗粒转移到感光构件上的潜像; 用于将显影剂材料从调色剂槽传送到磁性显影构件的传送系统，所述输送系统包括：混合/泵螺旋钻，设置在第一螺旋钻通道中，用于沿着第一螺旋钻通道内的第一路径混合和循环显影剂材料 ; 运输螺旋钻，邻近混合/泵螺旋推运器并且设置在第二螺旋钻通道中，用于沿着第二螺旋钻通道内的第二路径循环显影剂材料; 设置在所述混合/泵螺旋推运器和所述输送螺旋推运器之间的壁构件，所述壁构件具有设置在所述壳体的内侧附近的第一开口和设置在所述壳体的外侧附近的第二开口，所述第一和第二开口提供 在第一和第二路径之间的再循环路径; 拾取区域限定在第一路径中，拾取区域具有预定的显影剂材料体积; 以及在壁构件中的第三开口，邻近于与混合/泵螺旋推运器的泵送部分相关联的泵送部分设置，用于提供从第一路径到第二路径的溢流道，以允许过量的显影剂材料在显影剂 拾取区域的材料体积基本上已满。

公开(公告)号：US20070077767A1

公开(公告)日：2007-04-05

申请号：US11464276

申请日：2006-08-14

Applicant: Guangxiang Jin ,  Padmapani Nallan ,  Ajay Kumar

Inventor： Guangxiang Jin ,  Padmapani Nallan ,  Ajay Kumar

IPC: C23F1/00 ,  H01L21/302 ,  C03C15/00

CPC classification number: H01L21/31122

Abstract: A method of etching high dielectric constant materials using a halogen gas, a reducing gas and an etch rate control gas chemistry.

Abstract translation: 使用卤素气体，还原气体和蚀刻速率控制气体化学法蚀刻高介电常数材料的方法。

公开(公告)号：US20060222411A1

公开(公告)日：2006-10-05

申请号：US11093124

申请日：2005-03-29

Applicant: Ajay Kumar ,  Jonathan Sadik ,  Keith Nau ,  David Reed ,  Richard Kjar

Inventor： Ajay Kumar ,  Jonathan Sadik ,  Keith Nau ,  David Reed ,  Richard Kjar

IPC: G03G15/08

CPC classification number: G03G15/0844

Abstract: In a basic design of a developer unit for electrostatographic printing apparatus, an exit port is defined in the housing of the developer unit, for the passage of waste or surplus toner therethrough. An insert, defining a predetermined spillover barrier height and a predetermined exit angle, is associated with the exit port. Different types of inserts can be provided for operating the basic design of developer unit at different print output speeds, or with different compositions of developer material.

Abstract translation: 在用于静电印刷设备的显影剂单元的基本设计中，在显影单元的壳体中限定出口，用于废物或多余调色剂的通过。 定义预定溢出势垒高度和预定出口角度的插入件与出口相关联。 可以提供不同类型的插入件以用于以不同的印刷输出速度或显影剂材料的不同组成来操作显影剂单元的基本设计。

公开(公告)号：US07105361B2

公开(公告)日：2006-09-12

申请号：US10338059

申请日：2003-01-06

Applicant: Xiaoyi Chen ,  Chentsau Ying ,  Padmapani C. Nallan ,  Ajay Kumar

Inventor： Xiaoyi Chen ,  Chentsau Ying ,  Padmapani C. Nallan ,  Ajay Kumar

IPC: H01L21/302

CPC classification number: H01L43/12

Abstract: A method of patterning a layer of magnetic material to form isolated magnetic regions. The method forms a mask on a film stack comprising a layer of magnetic material such that the protected and unprotected regions are defined. The unprotected regions are etched in a high temperature environment to form isolated magnetic regions.

Abstract translation: 图案化磁性材料层以形成隔离的磁性区域的方法。 该方法在包含磁性材料层的薄膜叠层上形成掩模，使得限定保护区和未保护区。 未受保护的区域在高温环境中被蚀刻以形成隔离的磁性区域。

公开(公告)号：US06972315B2

公开(公告)日：2005-12-06

申请号：US10199434

申请日：2002-07-19

Applicant: Richard A. Gross ,  Ajay Kumar ,  Bhanu Kalra

Inventor： Richard A. Gross ,  Ajay Kumar ,  Bhanu Kalra

IPC: C08G63/78 ,  C08G63/87 ,  C08G63/02

CPC classification number: C08G63/87 ,  C08G63/78

Abstract: A method for enzymatic condensation polymerization by combining a preselected quantity of an enzyme, a diol and/or a polyol, and a diacid in a reaction vessel; heating the reaction vessel containing the enzyme, the diol or polyol, and the diacid to a preselected temperature; and maintaining the reaction vessel containing the enzyme, the diol and/or polyol, and the diacid at the preselected temperature for a preselected time, thereby producing a condensation polymer.

Abstract translation: 一种通过将预选量的酶，二醇和/或多元醇与二酸在反应容器中组合来进行酶缩缩聚合的方法; 将含有酶，二醇或多元醇的反应容器和二酸加热至预选温度; 并在预选的温度下保持含有酶，二醇和/或多元醇和二酸的反应容器预选的时间，从而制备缩聚物。

公开(公告)号：US06964928B2

公开(公告)日：2005-11-15

申请号：US10231675

申请日：2002-08-29

Applicant: Chentsau Ying ,  Xiaoyi Chen ,  Padmapani C. Nallan ,  Ajay Kumar

Inventor： Chentsau Ying ,  Xiaoyi Chen ,  Padmapani C. Nallan ,  Ajay Kumar

IPC: H01F41/30 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/302

CPC classification number: H01L21/02071 ,  B82Y25/00 ,  B82Y40/00 ,  H01F41/308 ,  H01L21/31138 ,  H01L21/32136

Abstract: A method for removal of residue after plasma etching a film stack comprising a patterned photoresist material layer, a hard mask layer, a conductive layer, and a magnetic layer, wherein the patterned photoresist material layer and the hard mask layer form a dual mask. The method cleans a substrate containing the film stack after the dual mask of the film stack has been etched to remove residue produced during the etching process. The cleaning step is performed in a solution comprising hydrogen peroxide and ammonium hydroxide that removes the residue.

Abstract translation: 在等离子体蚀刻包括图案化的光致抗蚀剂材料层，硬掩模层，导电层和磁性层的膜堆叠之后去除残余物的方法，其中图案化的光致抗蚀剂材料层和硬掩模层形成双掩模。 该方法在已经蚀刻了膜堆叠的双重掩模以除去在蚀刻过程中产生的残留物之前，清洗含有膜堆叠的基板。 清洗步骤在包含去除残余物的过氧化氢和氢氧化铵的溶液中进行。

公开(公告)号：US06943039B2

公开(公告)日：2005-09-13

申请号：US10365008

申请日：2003-02-11

Applicant: Chentsau Ying ,  Padmapani C. Nallan ,  Ajay Kumar

Inventor： Chentsau Ying ,  Padmapani C. Nallan ,  Ajay Kumar

IPC: H01L21/02 ,  H01L21/033 ,  H01L21/311 ,  H01L21/8246 ,  H01L21/00

CPC classification number: H01L27/11585 ,  H01L21/0337 ,  H01L21/31122 ,  H01L27/1159 ,  H01L28/55

Abstract: Method of etching a ferroelectric layer includes etching an upper electrode and partially through a ferroelectric layer. A dielectric material is subsequently deposited upon the upper electrode and the partially etched ferroelectric layer. A second etch step completely etches through the remaining portion of the ferroelectric layer and also etches lower electrodes. A random access memory apparatus is constructed that includes a first conductive layer, a dielectric layer disposed upon the first conductive layer, a second conductive layer disposed upon the dielectric layer, where such layers form a stack having a sidewall. Further, the sidewall has a protective dielectric film disposed thereon and extending from the second layer down to the dielectric layer.

Abstract translation: 蚀刻铁电体层的方法包括：蚀刻上部电极，部分地通过铁电体层。 随后将电介质材料沉积在上电极和部分蚀刻的铁电层上。 第二蚀刻步骤完全蚀刻穿过铁电层的剩余部分并蚀刻下电极。 构造了随机存取存储装置，其包括第一导电层，设置在第一导电层上的电介质层，设置在电介质层上的第二导电层，其中这些层形成具有侧壁的叠层。 此外，侧壁具有设置在其上并从第二层向下延伸到电介质层的保护电介质膜。

公开(公告)号：US06911346B2

公开(公告)日：2005-06-28

申请号：US10394464

申请日：2003-03-21

Applicant: Chentsau Ying ,  Xiaoyi Chen ,  Mohit Jain ,  Ajay Kumar

Inventor： Chentsau Ying ,  Xiaoyi Chen ,  Mohit Jain ,  Ajay Kumar

IPC: C23F4/00 ,  G11B5/64 ,  G11B5/855 ,  H01F41/30 ,  H01L21/00

CPC classification number: B82Y25/00 ,  B82Y40/00 ,  C23F4/00 ,  G11B5/653 ,  G11B5/656 ,  G11B5/855 ,  H01F41/308

Abstract: A method of etching a magnetic material (e.g., nickel-iron alloy (NiFe), cobalt-iron alloy (CoFe), and the like) using a gas mixture comprising a hydrogen halide gas and a fluorocarbon-containing gas is disclosed. The method provides high etch selectivity for the magnetic materials over non-magnetic dielectric materials, such as aluminum oxide (Al2O3) and the like, as well as to photoresist.

Abstract translation: 公开了使用包含卤化氢气体和含碳氟化合物的气体的气体混合物来蚀刻磁性材料（例如镍 - 铁合金（NiFe），钴 - 铁合金（CoFe）等）的方法。 该方法对非磁性电介质材料（例如氧化铝（Al 2 O 3 3））等上的磁性材料提供高蚀刻选择性，以及光致抗蚀剂 。