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51.发明授权Photosensitive semiconductor electrode, method of manufacturing photosensitive semiconductor electrode, and photoelectric converter using photosensitive semiconductor 失效感光性半导体电极，感光性半导体电极的制造方法以及使用感光性半导体的光电转换体公开(公告)号：US06252156B1
公开(公告)日：2001-06-26
申请号：US09098519
申请日：1998-06-17
申请人： Yoshiyuki Ono , Hidekazu Hirose , Katsuhiro Sato , Akira Imai
发明人： Yoshiyuki Ono , Hidekazu Hirose , Katsuhiro Sato , Akira Imai
IPC分类号： H01L310264
CPC分类号： H01G9/2031 , H01G9/2059 , H01L51/0086 , H01L51/009 , Y02E10/542 , Y02P70/521
摘要： Disclosed is an aggregate of metal oxide fine particles having fine pores whose size frequency distribution has a plurality of peaks. Disclosed also is a method preferably used for producing the aggregate of metal oxide fine particles. The method comprises a step of reacting a precursor of a metal oxide with a compound interacting with the precursor in a solvent to yield metal oxide fine particles. Also disclosed are a photosensitive semiconductor comprising a substrate, and a metal oxide porous body having fine pores whose size frequency distribution has a plurality of peaks and a method preferably used for manufacturing the photosensitive semiconductor electrode. This photosensitive semiconductor electrode has a high energy conversion efficiency and is preferably used in a photoelectric converter.
摘要翻译： 公开了具有细孔的具有多个峰的金属氧化物微粒的集合体。 还公开了一种优选用于制造金属氧化物微粒聚集体的方法。 该方法包括使金属氧化物的前体与在溶剂中与前体相互作用的化合物反应以产生金属氧化物细颗粒的步骤。 还公开了一种光敏半导体，其包含基板和具有细孔的金属氧化物多孔体，其尺寸频率分布具有多个峰，以及优选用于制造感光半导体电极的方法。 该感光性半导体电极具有高的能量转换效率，优选用于光电转换器。
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53.发明授权
公开(公告)号：US5902705A
公开(公告)日：1999-05-11
申请号：US914086
申请日：1997-08-19
CPC分类号： G03F9/70 , G03F1/26 , G03F1/30 , G03F1/60 , G03F7/70283 , G03F7/70466
摘要： To prevent positional shifts of the image forming plane during the exposure process using the two-layer phase shift mask, the height position of the semiconductor wafer 14 is moved in the optical axis direction according to the mask substrate thickness of the second component mask 12b, prior to performing the exposure process which uses the stacked-layer mask 12 that comprises a first component mask 12a formed with a pattern of light-shielding areas and light-transmitting areas and a second component mask 12b formed with a phase shift pattern to produce a phase shift in the transmitted light.
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54.发明授权
公开(公告)号：US5817739A
公开(公告)日：1998-10-06
申请号：US732977
申请日：1996-10-16
申请人： Katsumi Nukada , Masahiro Iwasaki , Akira Imai
发明人： Katsumi Nukada , Masahiro Iwasaki , Akira Imai
CPC分类号： C08G63/6856 , G03G5/056 , G03G5/0575 , G03G5/073 , G03G5/076 , G03G5/14752 , G03G5/14769
摘要： A charge transporting polymer represented by formula (I-1) or (I-2) and an electrophotographic photoreceptor containing the same: ##STR1## wherein Y and Z each represents a divalent hydrocarbon group; A represents a group represented by formula: ##STR2## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, an alkoxy group, a substituted amino group or a halogen atom; X represents a substituted or unsubstituted divalent aromatic group; n represents an integer of 1 to 5; and k represents 0 or 1; B and B' each represents --O--(Y--O).sub.m --H or --O--(Y--O).sub.m --CO--Z--CO--OR' (wherein R' represents a hydrogen atom, an alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; Y and Z are as defined above; and m represents an integer of 1 to 5); m represents an integer of 1 to 5; and p represents an integer of 5 to 5000.The charge transporting polymer has excellent solubility and film-forming properties and can have its ionizing potential controlled.
摘要翻译： 由式（I-1）或（I-2）表示的电荷输送聚合物和含有它的电子照相感光体：（I-1）表示二价烃基; A表示由下式表示的基团：其中R 1和R 2各自表示氢原子，烷基，烷氧基，取代的氨基或卤原子; X表示取代或未取代的二价芳基; n表示1〜5的整数， 并且k表示0或1; B和B'各自表示-O-（YO）mH或-O-（YO）m -CO-Z-CO-OR'（其中R'表示氢原子，烷基，取代或未取代的芳基或 取代或未取代的芳烷基; Y和Z如上所定义; m表示1〜5的整数）; m表示1〜5的整数， p表示5〜5000的整数。电荷输送性聚合物的溶解性和成膜性优异，可以控制电离电位。
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公开(公告)号：US5521032A
公开(公告)日：1996-05-28
申请号：US337428
申请日：1994-11-08
申请人： Akira Imai , Norio Hasegawa
发明人： Akira Imai , Norio Hasegawa
摘要： Disclosed are phase-shifting masks wherein restriction of light transmission at edges of phase-shifting patterns (e.g., at an edge where a 180.degree. phase-shifting pattern ends on a light transmission region) is avoided, and methods of making such masks. The region of the transparent pattern of the mask, under the edge of the phase-shifting pattern, is made wider than that of the transparent pattern in other regions; moreover, an additional phase-shifting layer is provided at the edge of the phase-shifting pattern, the additional phase-shifting layer having a phase-shift preferably of less than 90.degree., to avoid a 180.degree. phase shift at the edge. Also disclosed is a phase-shifting mask having repaired defects, and a method for repairing defects in phase-shifting masks, using an additional phase-shifting layer.
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公开(公告)号：US5391441A
公开(公告)日：1995-02-21
申请号：US19889
申请日：1993-02-19
申请人： Akira Imai , Norio Hasegawa
发明人： Akira Imai , Norio Hasegawa
摘要： Disclosed are phase-shifting masks wherein restriction of light transmission at edges of phase-shifting patterns (e.g., at an edge where a 180.degree. phase-shifting pattern ends on a light transmission region) is avoided, and methods of making such masks. The region of the transparent pattern of the mask, under the edge of the phase-shifting pattern, is made wider than that of the transparent pattern in other regions; moreover, an additional phase-shifting layer is provided at the edge of the phase-shifting pattern, the additional phase-shifting layer having a phase-shift preferably of less than 90.degree., to avoid a 180.degree. phase shift at the edge. Also disclosed is a phase-shifting mask having repaired defects, and a method for repairing defects in phase-shifting masks, using an additional phase-shifting layer.
摘要翻译： 公开了一种移相掩模，其中避免了相移图案的边缘处的光透射的限制（例如，在光透射区域处的180°移相图案的边缘处），以及制造这种掩模的方法。 在相移图案的边缘下，掩模的透明图案的区域比其他区域中的透明图案的区域宽; 此外，在移相图案的边缘处设置附加移相层，附加移相层优选地具有小于90°的相移，以避免边缘处的180°相移。 还公开了一种具有修复缺陷的相移掩模，以及使用附加移相层修复移相掩模缺陷的方法。
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57.发明授权
公开(公告)号：US5362589A
公开(公告)日：1994-11-08
申请号：US144524
申请日：1993-11-02
申请人： Katsumi Nukada , Akira Imai , Katsumi Daimon , Masakazu Iijima
发明人： Katsumi Nukada , Akira Imai , Katsumi Daimon , Masakazu Iijima
CPC分类号： C09B67/0035 , G03G5/0696
摘要： A phthalocyanine mixed crystal comprising a halogenated indium phthalocyanine and a halogenated gallium phthalocyanine and an electrophotographic photoreceptor containing the phthalocyanine mixed crystal. The phthalocyanine mixed crystal is a charge generating material which provides an electrophotographic photoreceptor excellent in sensitivity, stability on repeated use, and environmental stability.
摘要翻译： 包含卤化铟酞菁和卤化镓酞菁的酞菁混合晶体和含有酞菁混合晶体的电子照相感光体。 酞菁混合晶体是电荷产生材料，其提供敏感性优异，重复使用时的稳定性和环境稳定性优异的电子照相感光体。
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58.发明授权
公开(公告)号：US5302479A
公开(公告)日：1994-04-12
申请号：US873026
申请日：1992-04-24
申请人： Katsumi Daimon , Katsumi Nukada , Akira Imai , Masakazu Iijima , Kazuo Yamasaki , Kiyokazu Mashimo , Yasuo Sakaguchi , Toru Ishii
发明人： Katsumi Daimon , Katsumi Nukada , Akira Imai , Masakazu Iijima , Kazuo Yamasaki , Kiyokazu Mashimo , Yasuo Sakaguchi , Toru Ishii
CPC分类号： G03G5/0696 , C09B67/0016 , C09B67/0026
摘要： Crystals of hydroxygallium phthalocyanine, a method of preparing the crystals, a photoconductive material containing the crystals, and an electrophotographic photoreceptor having the material. The photoreceptor has excellent electrophotographic characteristics. The crystals of hydroxygallium phthalocyanine have distinct diffraction peaks at (i) 7.5.degree., 9.9.degree., 12.5.degree., 16.3.degree., 18.6.degree., 25.1.degree. and 28.3.degree., or (ii) 7.7.degree., 16.5.degree., 25.1.degree. and 26.6.degree., or (iii) 7.9.degree., 16.5.degree., 24.4.degree. and 27.6.degree., or (iv) 7.0.degree., 7.5.degree., 10.5.degree., 11.7.degree., 12.7.degree., 17.3.degree., 8.1.degree., 24.5.degree., 26.2.degree. and 27.1.degree., or (v) 6.8.degree., 12.8.degree., 15.8.degree. and 26.0.degree. or (vi) 7.4.degree., 9.9.degree., 25.0.degree., 26.0.degree., and 28.2.degree. of the Bragg angle (2.theta..+-.0.2) in the X-ray diffraction spectrum. The electrophotographic photoreceptor has a light-sensitive layer containing the photoconductive material of the crystals.
摘要翻译： 羟基镓酞菁的晶体，晶体的制备方法，含有晶体的感光材料和具有该材料的电子照相感光体。 感光体具有优异的电子照相特性。 羟基镓酞菁的晶体在（i）7.5度，9.9度，12.5度，16.3度，18.6度，25.1度和28.3度，或（ii）7.7度，16.5度，25.1度和26.6度处具有不同的衍射峰， 或（iii）7.9度，16.5度，24.4度和27.6度，或（iv）7.0度，7.5度，10.5度，11.7度，12.7度，17.3度，8.1度，24.5度，26.2度和27.1度， 或（v）6.8度，12.8度，15.8度和26.0度，或（vi）布拉格角（2（θ）±0.2）的7.4度，9.9度，25.0度，26.0度和28.2度） 射线衍射谱。 电子照相感光体具有含有晶体光导材料的感光层。
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59.发明授权
公开(公告)号：US5047589A
公开(公告)日：1991-09-10
申请号：US278917
申请日：1988-12-02
申请人： Yutaka Akasaki , Akihiko Tokida , Kaoru Torikoshi , Tooru Ishii , Hidemi Suto , Akira Imai
发明人： Yutaka Akasaki , Akihiko Tokida , Kaoru Torikoshi , Tooru Ishii , Hidemi Suto , Akira Imai
IPC分类号： C07C225/22 , C07C229/66 , C07C233/43 , C07D209/86 , G03G5/06
CPC分类号： C07D209/86 , C07C225/22 , C07C229/66 , C07C233/43 , G03G5/0611 , G03G5/0618 , C07C2101/04
摘要： An electrophotographic light-sensitive material comprising a conductive support having formed thereon a light-sensitive layer containing a squarylium compound represented by formula (I) or (II) ##STR1## wherein R.sub.1 represents a hydrogen atom, a methyl group, a carboxy group, a halogen atom, a trifluoromethyl group, an alkyl or phenyl-substituted carbonamido group, or an alkyl- or phenyl-substituted sulfonamido group; X.sub.1 and X.sub.2 each represents a group shown by ##STR2## wherein Z represents an atomic group necessary for forming a ring and R.sub.2 and R.sub.3, each represents an alkyl group having from 1 to 20 carbon atoms, a phenyl group, an unsubstituted benzyl group, or a benzyl group substituted by at least one of an alkyl group having from 1 to 6 carbon atoms, a hydroxy group, an alkoxy group having from 1 to 4 carbon atoms, a halogen atom, a nitro group, a cyano group, an alkoxycarbonyl group having from 2 to 5 carbon atoms, and a trifluoromethyl group); and X.sub.3 represents a hydrogen atom, a methyl group, a fluorine atom, or a hydroxy group.
摘要翻译： 一种电子照相感光材料，包括其上形成有含有由式（I）或（II）表示的方酸化合物的光敏层的导电性载体，其中R1表示氢原子 ，甲基，羧基，卤素原子，三氟甲基，烷基或苯基取代的碳酰氨基，或烷基或苯基取代的磺酰氨基; X1和X2各自表示由
表示的基团，其中Z表示形成环所需的原子团，R 2和R 3各自表示具有1至20个碳原子的烷基，苯基，未取代的苄基， 或被至少一个具有1至6个碳原子的烷基，羟基，具有1至4个碳原子的烷氧基，卤素原子，硝基，氰基，烷氧羰基 具有2至5个碳原子的基团和三氟甲基基团）; X3表示氢原子，甲基，氟原子或羟基。 -
公开(公告)号：US4906086A
公开(公告)日：1990-03-06
申请号：US208139
申请日：1988-06-16
申请人： Akira Imai , Takahisa Suzuki , Kenichi Nishimoto , Ken Yamaguchi
发明人： Akira Imai , Takahisa Suzuki , Kenichi Nishimoto , Ken Yamaguchi
摘要： A rearview mirror device for a motorcycle is designed to reduce the area of forward projection of the motorcycle and increase the rigidity of the support member for a rearview mirror. The rearview mirror device includes a motorcycle frame, a steering handlebar projecting laterally from the motorcycle frame, a pair of handgrips mounted on opposite outer ends, respectively, of the handlebar, and a pair of rearview mirrors disposed forwardly and downwardly of the handgrips, respectively, when the handlebar is in a neutral steering position.
摘要翻译： 用于摩托车的后视镜装置被设计成减小摩托车的向前突出的面积并增加用于后视镜的支撑构件的刚性。 后视镜装置包括摩托车车架，从摩托车车架横向突出的转向车把，分别安装在把手的相对的外端上的一对手把和分别设置在手把前后的一对后视镜 当把手处于中立转向位置时。
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